公开(公告)号：US20240282606A1

公开(公告)日：2024-08-22

申请号：US18649968

申请日：2024-04-29

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Toshihiro Kawai ,  Gengoro Ogura

IPC: H01L21/67 ,  B01D46/00 ,  B01D46/10

CPC classification number: H01L21/67201 ,  B01D46/0041 ,  H01L21/67196 ,  B01D46/10 ,  B01D2273/30

Abstract: Particles in an accommodation chamber are also easily discharged while facilitating replacement of an atmosphere in the accommodation chamber with an inert gas. An EFEM includes a load port 4, a housing configured to define, in the housing, a transfer chamber closed by connecting the load port 4 to an opening provided in a partition wall, a supply pipe for supplying nitrogen to a transfer chamber, and a discharge pipe 49 for discharging a gas in the transfer chamber. The load port 4 includes an opening/closing mechanism 54 capable of opening and closing a lid 101 of a mounted FOUP 100, and an accommodation chamber 60 kept in communication with the transfer chamber via a slit 51b and configured to accommodate a part of the opening/closing mechanism 54. The discharge pipe 49 is connected to the accommodation chamber 60 to discharge the gas in the transfer chamber via the accommodation chamber 60.

公开(公告)号：US12068648B2

公开(公告)日：2024-08-20

申请号：US17617656

申请日：2020-06-16

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Hiroki Wakabayashi ,  Takakuni Iitsuka ,  Yutaka Wakita ,  Tetsuhiro Tomita

IPC: H02K3/24 ,  H02K1/16 ,  H02K1/20 ,  H02K9/19

CPC classification number: H02K3/24 ,  H02K1/165 ,  H02K1/20 ,  H02K9/19 ,  H02K2201/03

Abstract: There is provided motor, including: a stator including a plurality of laminated plates; and a rotor arranged inside the stator with a gap between the rotor and the stator, wherein the stator further includes an annular yoke located outside of the stator and a plurality of teeth protruding from an inner peripheral surface of the yoke toward the rotor, wherein slots in which coils wound around the teeth are arranged are formed between the teeth that are adjacently arranged, wherein gaps to which a cooling medium is supplied are formed between bottom portions of the slots and the coils, and wherein the stator further includes end plate members arranged so as to face the laminated plates.

公开(公告)号：US20240236450A9

公开(公告)日：2024-07-11

申请号：US18381117

申请日：2023-10-17

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Keigo Sato ,  Yuji Miyashita ,  Katsumi Yasuda

IPC: H04N23/45 ,  G06T7/00 ,  H01L21/67

CPC classification number: H04N23/45 ,  G06T7/0004 ,  H01L21/67265 ,  G06T2207/30148

Abstract: The load port includes a FOUP configured to accommodate a plurality of substrates in multiple stages, cameras configured to image each of the substrates accommodated in the FOUP and including a low-magnification camera with a wide horizontal angle of view and a high-magnification camera with a narrow horizontal angle of view, and a CPU configured to detect the accommodation state of each of the substrates based on the imaging data acquired from the low-magnification camera and the high-magnification camera, respectively.

公开(公告)号：US12027398B2

公开(公告)日：2024-07-02

申请号：US16980764

申请日：2019-03-13

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Toshihiro Kawai ,  Gengoro Ogura

IPC: H01L21/673 ,  H01L21/67 ,  H01L21/677

CPC classification number: H01L21/67393 ,  H01L21/67253 ,  H01L21/6773

Abstract: In the present disclosure, when a supply flow rate of an inert gas is changed, a pressure fluctuation in a circulation path is suppressed. An EFEM includes a supply valve configured to be capable of changing a supply flow rate of the inert gas supplied to the circulation path, a discharge valve configured to be capable of changing a discharge flow rate of a gas discharged from the circulation path, a concentration detection part configured to detect a change in an atmosphere inside the circulation path, a pressure detection part configured to detect a pressure in the circulation path, and a control part configured to control the supply valve and the discharge valve. The control part is configured to determine an opening degree of the discharge valve to a predetermined value based on a detection result obtained by the concentration detection part.

公开(公告)号：US20240038554A1

公开(公告)日：2024-02-01

申请号：US18484546

申请日：2023-10-11

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Toshihiro Kawai ,  Takashi Shigeta ,  Munekazu Komiya ,  Yasushi Taniyama

IPC: H01L21/67 ,  F24F13/28 ,  F24F7/06 ,  B01D53/04 ,  B65G49/07 ,  H01L21/677 ,  F24F3/167 ,  F24F7/08 ,  H01L21/673 ,  F24F7/003 ,  B01D53/40 ,  B01D53/42 ,  C12M1/12 ,  F24F6/00 ,  H01L21/687

CPC classification number: H01L21/67196 ,  F24F13/28 ,  F24F7/06 ,  B01D53/04 ,  B65G49/07 ,  H01L21/67766 ,  H01L21/67017 ,  F24F3/167 ,  F24F7/065 ,  F24F7/08 ,  H01L21/67389 ,  H01L21/67393 ,  F24F7/003 ,  B01D53/40 ,  B01D53/42 ,  C12M37/00 ,  F24F6/00 ,  H01L21/68707 ,  B01D2258/02

Abstract: The EFEM comprises: a transfer chamber in which a transfer robot is disposed, a first fan that forms a downward air flow in the transfer chamber, a gas return space that circulates the gas flowing downward in the transfer chamber above the first fan, a box that communicates with the transfer chamber and is provided with a gas outlet, and a connecting and disconnecting means configured to switch connection and disconnection of the box to and from the transport chamber. A circulation path in which gas circulates is formed by the transfer chamber, the gas return space, and the box. When the transfer chamber and the box are separated by the connecting and disconnecting means, a shortened circulation path is formed in which the gas circulates without passing through the box.

公开(公告)号：US11823934B2

公开(公告)日：2023-11-21

申请号：US18115044

申请日：2023-02-28

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Yasushi Taniyama ,  Toshihiro Kawai

IPC: H01L21/677 ,  B65G1/04 ,  F24F13/06 ,  H01L21/687 ,  B25J11/00

CPC classification number: H01L21/67778 ,  B65G1/0485 ,  F24F13/06 ,  H01L21/67766 ,  H01L21/67769 ,  H01L21/68707 ,  B25J11/0095 ,  B65G2201/0297

Abstract: A wafer stocker capable of further improving an environment around wafers is provided. The wafer stocker includes a housing, a loading device provided on a front surface of the housing, a wafer cassette shelf arranged in the housing, a wafer transfer robot configured to move the wafers from a transfer container mounted on the loading device to a wafer cassette in the wafer cassette shelf, a wafer cassette delivery device configured to move the wafer cassette in the wafer cassette shelf to a stage having a different height, and a fan filter unit configured to generate a laminar flow in a wafer transfer space and in a wafer cassette transfer space.

公开(公告)号：US20230253842A1

公开(公告)日：2023-08-10

申请号：US18106654

申请日：2023-02-07

Applicant: SINFONIA TECHNOLOGY CO., LTD.

Inventor： Akihiro Ito ,  Nobuo Aruga ,  Tatsuya Nemoto ,  Tokio Morohoshi

IPC: H02K1/276 ,  H02K1/2783 ,  H01F41/02

CPC classification number: H02K1/2766 ,  H01F41/0253 ,  H02K1/2783 ,  H02K41/02

Abstract: Provided is a magnet that allows the orientation direction of main and auxiliary pole pieces to be set precisely and enables easy fabrication of flux focusing permanent magnet units having a high magnetic flux density A magnet 22 includes permanent magnet units 22a each including a main pole piece 221 and auxiliary pole pieces 222. The main pole piece 221 is composed of permanent magnet sheets 221a with substantially the same thickness stacked in the thickness direction. The auxiliary pole pieces 222 are composed of permanent magnet sheets 222a with substantially the same thickness stacked in the thickness direction and arranged at positions adjacent to the main pole piece 221 with orientation directions different from the orientation direction of the main pole piece 221 thereby to focus the magnetic flux at the main pole piece 221.

公开(公告)号：US20230241764A1

公开(公告)日：2023-08-03

申请号：US18102042

申请日：2023-01-26

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Hiroki Wakabayashi ,  Yasumichi Mieno ,  Takeshi Yabe ,  Manabu Funato

IPC: B25J9/04 ,  B25J9/12 ,  B25J11/00

CPC classification number: B25J9/042 ,  B25J9/126 ,  B25J11/005

Abstract: An arm unit of a transfer robot includes an R-axis motor configured to relatively rotate a second arm with respect to a first arm. The R-axis motor is fixed to the first arm so as to protrude to below an arm axis holding portion of the first arm with an output shaft thereof facing upward. The output shaft is configured to penetrate the first arm from below. The output shaft is fixed to the second arm by a shaft fixing portion.

公开(公告)号：US20230077810A1

公开(公告)日：2023-03-16

申请号：US17959247

申请日：2022-10-03

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Toshihiro Kawai ,  Gengoro Ogura

IPC: H01L21/67 ,  B01D46/00

Abstract: Particles in an accommodation chamber are also easily discharged while facilitating replacement of an atmosphere in the accommodation chamber with an inert gas. An EFEM includes a load port 4, a housing configured to define, in the housing, a transfer chamber closed by connecting the load port 4 to an opening provided in a partition wall, a supply pipe for supplying nitrogen to a transfer chamber, and a discharge pipe 49 for discharging a gas in the transfer chamber. The load port 4 includes an opening/closing mechanism 54 capable of opening and closing a lid 101 of a mounted FOUP 100, and an accommodation chamber 60 kept in communication with the transfer chamber via a slit 51b and configured to accommodate a part of the opening/closing mechanism 54. The discharge pipe 49 is connected to the accommodation chamber 60 to discharge the gas in the transfer chamber via the accommodation chamber 60.

公开(公告)号：US20230033168A1

公开(公告)日：2023-02-02

申请号：US17788647

申请日：2020-09-23

Applicant: Sinfonia Technology Co., Ltd.

Inventor： Hiroaki Nakamura ,  Toshihiro Kawai ,  Kosuke Sugiura ,  Gengoro Ogura ,  Yasushi Taniyama

IPC: B65G47/90 ,  H01L21/687 ,  H01L21/67 ,  H01L21/677

Abstract: A conveyance system discriminates the front and back of a frame wafer without human intervention. A frame is partially formed asymmetrically with respect to a predetermined center line when viewed in a direction orthogonal to a surface of a wafer. The conveyance system includes a hand configured to hold the frame so that the frame extends in a predetermined virtual plane, a first sensor configured to detect a portion of the frame held on the hand and located in a predetermined first region in the virtual plane, a second sensor configured to detect a portion of the frame held on the hand and located in a second region opposite to the first region across the center line, and a controller configured to determine the front and back of the frame wafer based on a detection result obtained by the first sensor and a detection result obtained by the second sensor.