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    STACKED SOLID-STATE ELECTROLYTIC CAPACITOR WITH MULTI-DIRECTIONAL PRODUCT LEAD FRAME STRUCTURE
    152.
    发明申请
    STACKED SOLID-STATE ELECTROLYTIC CAPACITOR WITH MULTI-DIRECTIONAL PRODUCT LEAD FRAME STRUCTURE 有权
    具有多方向产品引线框架结构的堆叠式固态电解电容器

    公开(公告)号：US20110216475A1

    公开(公告)日：2011-09-08

    申请号：US12833421

    申请日：2010-07-09

    Applicant: Chi-Hao Chiu ,  Yui-Shin Fran ,  Ching-Feng Lin ,  Chun-Chia Huang ,  Chun-Hung Lin ,  Wen-Yen Huang

    Inventor： Chi-Hao Chiu ,  Yui-Shin Fran ,  Ching-Feng Lin ,  Chun-Chia Huang ,  Chun-Hung Lin ,  Wen-Yen Huang

    IPC: H01G9/00

    CPC classification number: H01G9/00

    Abstract: A stacked solid-state electrolytic capacitor with multi-directional product lead frame structure includes a plurality of capacitor units, a substrate unit and a package unit. The capacitor units are stacked onto each other. Each capacitor unit has a positive electrode and a negative electrode, the positive electrode of each capacitor unit has a positive pin extended outwards, the positive pins are electrically stacked onto each other, and the negative electrodes are electrically stacked onto each other. The substrate unit has at least one positive guiding substrate electrically connected to the positive pins of the capacitor units and a plurality of negative guiding substrates electrically connected to the negative electrodes of the capacitor units. The package unit covers the capacitor units and one part of the substrate unit in order to expose an end of the at least one positive guiding substrate and an end of each negative guiding substrate.

    Abstract translation: 具有多方向产品引线框架结构的堆叠式固态电解电容器包括多个电容器单元，基板单元和封装单元。 电容器单元堆叠在一起。 每个电容器单元具有正极和负极，每个电容器单元的正极具有向外延伸的正极，正极彼此电叠置，并且负极彼此电叠置。 基板单元具有电连接到电容器单元的正极销的至少一个正引导基板和电连接到电容器单元的负电极的多个负引导基板。 封装单元覆盖电容器单元和衬底单元的一部分，以暴露至少一个正引导衬底的端部和每个负引导衬底的端部。

    Solid-state light emitting display and fabrication method thereof
    154.
    发明授权
    Solid-state light emitting display and fabrication method thereof 有权

    公开(公告)号：US07998764B2

    公开(公告)日：2011-08-16

    申请号：US12175597

    申请日：2008-07-18

    Applicant: Chia-Hung Hung ,  Chia-Chiang Chang ,  Chun-Hung Lin

    Inventor： Chia-Hung Hung ,  Chia-Chiang Chang ,  Chun-Hung Lin

    IPC: H01L21/00

    CPC classification number: G09F9/30 ,  G09F9/33

    Abstract: A solid-state light emitting display and a fabrication method thereof are proposed. The light emitting display includes a metallic board formed with conductive circuits, and a plurality of luminous microcrystals disposed on a surface of the metallic board and electrically connected to the conductive circuits. The metallic board provides the features of lightness and thinness, and flexibility, and the luminous microcrystals are in the form of light emitting components, so as to improve the luminous efficiency of display and attain the effect of environmental protection and energy saving, thereby providing display technology with performance satisfactory for various display requirements.

    PLASMA DEPOSITION APPARATUS AND DEPOSITION METHOD UTILIZING SAME
    156.
    发明申请
    PLASMA DEPOSITION APPARATUS AND DEPOSITION METHOD UTILIZING SAME 有权
    等离子体沉积装置和使用方法的沉积方法

    公开(公告)号：US20110120372A1

    公开(公告)日：2011-05-26

    申请号：US13019269

    申请日：2011-02-01

    Applicant: Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

    Inventor： Chia-Chiang Chang ,  Chin-Jyi Wu ,  Shin-Chih Liaw ,  Chun-Hung Lin

    IPC: C23C16/455 ,  C23C16/50 ,  B05C11/00 ,  C23C16/458

    CPC classification number: C23C16/402 ,  C23C16/345 ,  C23C16/45563 ,  C23C16/45595 ,  C23C16/513

    Abstract: A plasma deposition apparatus is provided. The plasma deposition apparatus comprises a chamber. A pedestal is placed in the chamber. A plasma generator is placed in the chamber and over the pedestal. The plasma generator comprises a plasma jet for plasma thin film deposition having a discharge direction angle θ1 larger than 0° and less than 90° between a normal direction of the pedestal and the discharge direction of the plasma jet. A gas-extracting pipe extends into the chamber and over the pedestal. The gas-extracting pipe provides a pumping path for particles and side-products having a pumping direction angle θ2 larger than 0° and less than 90° between the normal direction of the pedestal and the pumping direction of the gas-extracting pipe. The chamber is kept at an ambient atmospheric pressure.

    Abstract translation: 提供了一种等离子体沉积装置。 等离子体沉积设备包括一个室。 底座放置在腔室中。 等离子体发生器放置在腔室中并在基座上方。 等离子体发生器包括用于等离子体薄膜沉积的等离子体射流，其具有放电方向角度θ;在基座的法线方向与等离子体射流的排出方向之间大于0°且小于90°的1。 气体提取管延伸到腔室中并且在基座上。 气体提取管为具有泵送方向角度的颗粒和副产物提供泵送路径; 2在基座的法线方向与气体提取管的泵送方向之间大于0°且小于90°。 室保持在环境大气压力。

    Coding method and system with an adaptive bitplane coding mode
    158.
    发明授权
    Coding method and system with an adaptive bitplane coding mode 有权
    具有自适应位平面编码模式的编码方法和系统

    公开(公告)号：US07840082B2

    公开(公告)日：2010-11-23

    申请号：US11896962

    申请日：2007-09-07

    Applicant: Chun-Hung Lin ,  Tung-Hai Wu

    Inventor： Chun-Hung Lin ,  Tung-Hai Wu

    IPC: G06K9/36

    CPC classification number: H04N19/184 ,  H04N19/109 ,  H04N19/11 ,  H04N19/12 ,  H04N19/152 ,  H04N19/16 ,  H04N19/196 ,  H04N19/463 ,  H04N19/91

    Abstract: A coding method and system with an adaptive bitplane coding mode is provided to code multiple bitplanes of a frame consisting of multiple macroblocks. Each bitplane consists of macroblock modes used by the macroblocks of the frame. The method includes the steps of: (A) initializing a bitplane coding mode of the frame as a compress mode; (B) coding the frame and the bitplanes to thereby obtain coded bitplanes, and calculating the bit number of coded bitplanes; (C) calculating the bit number of uncoded bitplanes; (D) executing step (A) when the bit number of coded bitplanes is smaller than the bit number of uncoded bitplanes; (E) initializing the bitplane coding mode of the frame as a raw mode when the bit number of coded bitplanes is not smaller than the bit number of uncoded bitplanes.

    Abstract translation: 提供具有自适应位平面编码模式的编码方法和系统来对由多个宏块组成的帧的多个位平面进行编码。 每个位平面由帧的宏块使用的宏块模式组成。 该方法包括以下步骤：（A）将帧的位平面编码模式初始化为压缩模式; （B）对帧和位平面进行编码，从而获得编码位平面，并计算编码位面的比特数; （C）计算未编码位面的位数; （D）执行步骤（A），当编码位平面的位数小于未编码位板的位数时; （E）当编码位平面的位数不小于未编码位板的位数时，初始化帧的位平面编码模式为原始模式。

    Methods and systems for forming semiconductor structures
    159.
    发明授权
    Methods and systems for forming semiconductor structures 有权
    用于形成半导体结构的方法和系统

    公开(公告)号：US07787977B2

    公开(公告)日：2010-08-31

    申请号：US11563947

    申请日：2006-11-28

    Applicant: Chien-Hsun Lin ,  An-Kuo Yang ,  Yao-Wen Guo ,  Chun-Hung Lin

    Inventor： Chien-Hsun Lin ,  An-Kuo Yang ,  Yao-Wen Guo ,  Chun-Hung Lin

    IPC: G06F19/00

    CPC classification number: H01L22/20

    Abstract: A method for processing substrates to manufacture semiconductor structures thereon includes analyzing at least one first processing parameter of a first apparatus for processing a substrate, thereby yielding at least one first throughput rate of the first apparatus. At least one second processing parameter of a second apparatus is analyzed for processing the substrate, thereby yielding at least one second throughput rate of the second apparatus. The first throughput rate and the second throughput rate are compared, thereby yielding at least one comparison result for processing the substrate.

    Abstract translation: 一种用于处理衬底以在其上制造半导体结构的方法，包括分析用于处理衬底的第一装置的至少一个第一处理参数，从而产生第一装置的至少一个第一吞吐率。 分析第二装置的至少一个第二处理参数以处理基板，从而产生第二装置的至少一个第二吞吐率。 比较第一吞吐率和第二吞吐率，从而产生用于处理基板的至少一个比较结果。

    Coil frame capable of connecting with another coil frame
    160.
    发明授权
    Coil frame capable of connecting with another coil frame 失效
    线圈框架能够与另一个线圈框架连接

    公开(公告)号：US07750785B2

    公开(公告)日：2010-07-06

    申请号：US11695060

    申请日：2007-04-02

    Applicant: Wen-Sheng Chen ,  Chun-Hung Lin

    Inventor： Wen-Sheng Chen ,  Chun-Hung Lin

    IPC: H01F27/28 ,  H01F27/30

    CPC classification number: H01F27/326 ,  H01F3/10 ,  H01F27/303 ,  H01F27/325 ,  H01F30/10 ,  H01F2005/022

    Abstract: Coil frames and transformers are provided. A coil frame includes a sub-coil-frame and an extended frame. The sub-coil-frame is utilized for winding a metal coil thereon. The extended frame is attached to the sub-coil-frame. The extended frame has a hole and a protrusion. The hole of the coil frame can be connected with the protrusion of another coil frame.

    Abstract translation: 提供线圈框架和变压器。 线圈框架包括子线圈框架和延伸框架。 子线圈框架用于在其上缠绕金属线圈。 延伸框架连接到子线圈框架。 延伸框架具有孔和突起。 线圈框架的孔可以与另一个线圈框架的突起连接。

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