公开(公告)号：US20180224755A1

公开(公告)日：2018-08-09

申请号：US15949057

申请日：2018-04-09

Applicant: ASML Netherland B.V.

Inventor： Hans BUTLER

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70191 ,  G03F7/70516 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/70825 ,  G03F7/7085 ,  G03F9/7019

Abstract: A lithographic apparatus includes a patterning device support to support a patterning device, the patterning device system including a moveable structure movably arranged relative to an object, a patterning device holder movably arranged relative to the movable structure to hold the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder with respect to the movable structure; a substrate support to hold a substrate; a projection system to project a patterned radiation beam onto a target portion of the substrate; a transmission image sensor for measuring a position of the patterned radiation beam downstream of the projection system; and a calibrator for determining a relationship between magnitude of an applied control signal to the ultra short stroke actuator and resulting change in position of the patterned radiation beam and/or patterning device holder and/or patterning device.

公开(公告)号：US20250085172A9

公开(公告)日：2025-03-13

申请号：US18286631

申请日：2022-03-29

Applicant: ASML Netherland B.V.

Inventor： Koen Martin Willem Jan BOS ,  Joost André KLUGKIST ,  Anirudh ANAND

IPC: G01K11/12 ,  G03F7/00

Abstract: An optical apparatus is disclosed, the apparatus comprising an optical element having a reflective surface for reflecting incident radiation in a beam path, and at least one sensor configured to sense radiation corresponding to a temperature of a respective portion of a backside surface of the optical element. Also disclosed is a method of controlling a temperature of a reflective surface of an optical element in a lithographic apparatus.

公开(公告)号：US20240201029A1

公开(公告)日：2024-06-20

申请号：US18286631

申请日：2022-03-29

Applicant: ASML Netherland B.V.

Inventor： Koen Martin Willem Jan BOS ,  Joost André KLUGKIST ,  Anirudh ANAND

IPC: G01K11/12 ,  G03F7/00

CPC classification number: G01K11/12 ,  G03F7/7015 ,  G03F7/70316 ,  G03F7/70525 ,  G03F7/7085 ,  G03F7/70891 ,  G03F7/70958

Abstract: An optical apparatus is disclosed, the apparatus comprising an optical element having a reflective surface for reflecting incident radiation in a beam path, and at least one sensor configured to sense radiation corresponding to a temperature of a respective portion of a backside surface of the optical element. Also disclosed is a method of controlling a temperature of a reflective surface of an optical element in a lithographic apparatus.

公开(公告)号：US20180321603A1

公开(公告)日：2018-11-08

申请号：US15771634

申请日：2016-10-25

Applicant: ASML NETHERLAND B.V.

Inventor： Sicco OOSTERHOFF ,  Paul JANSSEN ,  Beltrijs Louise Marie-Joseph Katrie VERBRUGGE

IPC: G03F7/20 ,  G03F1/64 ,  G03F1/24

CPC classification number: G03F7/70983 ,  B82Y40/00 ,  G03F1/24 ,  G03F1/62 ,  G03F1/64 ,  G03F7/70916 ,  G03F7/70958 ,  G21K2201/067

Abstract: A method for manufacturing a membrane assembly for EUV lithography, the method including: providing a stack including a membrane layer between a supporting substrate and an attachment substrate, wherein the supporting substrate includes an inner region and a border region; processing the stack, including selectively removing the inner region of the supporting substrate, to form a membrane assembly comprising: a membrane formed from at least the membrane layer; and a support holding the membrane, the support formed at least partially from the border region of the supporting substrate. The attachment substrate can be bonded to the rest of the stack.

公开(公告)号：US20180149986A1

公开(公告)日：2018-05-31

申请号：US15316526

申请日：2015-05-21

Applicant: ASML NETHERLAND B.V.

Inventor： Paul Corné Henri DE WIT ,  Stijn Willem BOERE ,  Youssef Karel Maria DE VOS ,  Peter Paul HEMPENIUS ,  Nicolaas Rudolf KEMPER ,  Robertus Mathijs Gerardus RIJS ,  Frits VAN DER MEULEN

IPC: G03F9/00 ,  G03F7/20

CPC classification number: G03F9/7073 ,  G03F7/20 ,  G03F7/70725 ,  G03F7/70875 ,  G03F7/70891 ,  G03F7/709

Abstract: A temperature conditioning system for a lithographic apparatus. Temperature variations in an object cause object deformation which prevents the object being accurately positioned. Temperature condition systems use conduit systems, provided with fluid, in or on the object to control the temperature of the object to reduce object deformation. In this way, parts of the object can be more accurately positioned. However, acceleration of the object and the temperature conditioning system induces variation in pressure within the fluid inside the conduit system on or in the object, which may also cause object deformation. To provide an improved conduit system, the lithographic apparatus further includes a control system which is used to control the movement of the object based on measurements indicating pressure variation in the conduit.

公开(公告)号：US20150138523A1

公开(公告)日：2015-05-21

申请号：US14403010

申请日：2013-05-01

Applicant: ASML Netherland B.V.

Inventor： Martin Jacobus Johan Jak ,  Armand Eugene Albert Koolen ,  Hendrik Jan Hidde Smilde

IPC: G03F7/20

CPC classification number: G03F7/70625 ,  G03F7/70483 ,  G03F7/70633 ,  G03F7/70683

Abstract: A metrology target formed by a lithographic process on a substrate includes a plurality of component gratings. Images of the target are formed using +1 and −1 orders of radiation diffracted by the component gratings. Regions of interest (ROIs) in the detected image are identified corresponding the component gratings. Intensity values within each ROI are processed and compared between images, to obtain a measurement of asymmetry and hence overlay error. Separation zones are formed between the component gratings and design so as to provide dark regions in the image. In an embodiment, the ROIs are selected with their boundaries falling within the image regions corresponding to the separation zones. By this measure, the asymmetry measurement is made more tolerant of variations in the position of the ROI. The dark regions also assist in recognition of the target in the images.

Abstract translation: 由基板上的光刻工艺形成的测量目标包括多个分量光栅。 使用由分量光栅衍射的+1和-1次辐射来形成目标的图像。 识别检测到的图像中的感兴趣区域（ROI）对应于分量光栅。 在每个ROI内的强度值被处理并在图像之间进行比较，以获得不对称性的测量并因此获得覆盖误差。 在分量光栅之间形成分离区并设计成在图像中提供暗区。 在一个实施例中，选择其边界落入对应于分离区域的图像区域内的ROI。 通过这种措施，使不对称测量更加容忍ROI的位置的变化。 黑暗的地区也有助于识别图像中的目标。

公开(公告)号：US20150064915A1

公开(公告)日：2015-03-05

申请号：US14391146

申请日：2013-03-19

Applicant: ASML Netherland B.V.

Inventor： Sander Frederik Wuister

IPC: G03F7/00 ,  B44C1/22 ,  H01L27/11 ,  H01L21/027 ,  H01L21/308 ,  C30B19/12 ,  C30B29/58

CPC classification number: G03F7/0002 ,  B44C1/227 ,  B82Y10/00 ,  B82Y40/00 ,  C30B19/12 ,  C30B29/58 ,  G03F7/0035 ,  H01L21/0271 ,  H01L21/3081 ,  H01L21/3083 ,  H01L27/11

Abstract: A method is disclosed for forming a row of mutually spaced lithography features on a substrate, such as contact electrodes for a NAND device. The method involves forming and/or using a narrow slot over the substrate defined between the edge of a hard mask layer and a side wall of a trench in a resist layer overlying the edge and the substrate. A self-assemblable block copolymer is deposited and ordered in the trench for use as a further resist for patterning the substrate along the slot. The method allows for a sub-resolution contact array to be formed using UV lithography by overlapping the trench with the hard mask edge to provide the narrow slot in which the contact electrodes may be formed.

Abstract translation: 公开了一种用于在衬底上形成一行相互间隔的光刻特征的方法，例如用于NAND器件的接触电极。 该方法涉及在覆盖边缘和衬底的抗蚀剂层中的在硬掩模层的边缘和沟槽的侧壁之间限定的衬底上形成和/或使用窄缝。 将可自组装的嵌段共聚物沉积并排列在沟槽中，以用作另一抗蚀剂，以沿着该槽形成衬底。 该方法允许使用UV光刻通过将沟槽与硬掩模边缘重叠来形成次分辨率接触阵列，以提供其中可形成接触电极的窄缝隙。