Abstract:
The present invention relates to novel copolymers, compositions comprising novel copolymers, and electronic devices comprising at least one layer containing the copolymer.
Abstract:
The present invention relates to novel compounds and polymers, compositions comprising novel compounds or polymers, and electronic devices comprising at least one layer containing the compound or polymer.
Abstract:
A method for fabricating circuitized substrates which reduces shorts, and does not require baking and resulting film. The method employs a photoimageable dielectric film, having a solvent content less than about 5%, and a glass transition temperature, when cured, which is greater than about 110° C. A photoimageable dielectric film is provided having from about 95% to about 100% solids, and comprising: from 0% to about 30% of the solids, of a particulate rheology modifier; from about 70% to about 100% of the solids of an epoxy resin system (liquid at 20° C.) comprising: from about 85% to about 99.9% epoxy resins; and from about 0.1 to 15 parts of the total resin weight, a cationic photoinitiator; from 0% to about 5% solvent; applying the photoimageable dielectric film to a circuitized substrate; and exposing the film to actinic radiation.
Abstract:
A method for fabricating circuitized substrates which reduces shorts, and does not require baking and resulting film. The method employs a photoimageable dielectric film, having a solvent content less than about 5%, and a glass transition temperature, when cured, which is greater than about 110° C. A photoimageable dielectric film, is provided having from about 95% to about 100% solids, and comprising: from 0% to about 30% of the solids, of a particulate rheology modifier, from about 70% to about 100% of the solids of an epoxy resin system (liquid at 20° C. comprising: from about 85% to about 99.9% epoxy resins; and from about 0.1 to 15 parts of the total resin weight, a cationic photoinitiator; from 0 to about 5% solvent, applying the photoimageable dielectric film to a circuitized substrate; and exposing the film to actinic radiation.
Abstract:
A compound having Formula I, Formula II, or Formula III: Ar1 may independently be phenylene, substituted phenylene, naphthylene, or substituted naphthylene. Ar2 is the same or different at each occurrence and is an aryl group. M is the same or different at each occurrence and is a conjugated moiety. T1 and T2 are independently the same or different at each occurrence and are conjugated moieties which are connected in a non-planar configuration; a and e are the same or different at each occurrence and are an integer from 1 to 6; b, c, and d are mole fractions such that b+c+d=1.0, with the proviso that c is not zero, and at least one of b and d is not zero, and when b is zero, M has at least two triarylamine units; and n is an integer greater than 1.
Abstract translation:具有式I,式II或式III的化合物:Ar 1可以独立地是亚苯基,取代的亚苯基,亚萘基或取代的亚乙基。 Ar2在每次出现时相同或不同,为芳基。 M在每次出现时相同或不同,为共轭部分。 T1和T2在每次出现时独立地相同或不同,并且是以非平面构型连接的共轭部分; a和e在每次出现时相同或不同,为1〜6的整数; b,c和d是摩尔分数,使得b + c + d = 1.0,条件是c不为零,b和d中的至少一个不为零,当b为零时,M至少为 两个三芳基胺单元; 并且n是大于1的整数。
Abstract:
There is provided a process for forming a contained second layer over a first layer, including the steps: forming the first layer having a first surface energy; treating the first layer with a priming material to form a priming layer; exposing the priming layer patternwise with radiation resulting in exposed areas and unexposed areas; developing the priming layer to effectively remove the priming layer from the unexposed areas resulting in a first layer having a pattern of priming layer, wherein the pattern of priming layer has a second surface energy that is higher than the first surface energy; and forming the second layer by liquid depositions on the pattern of priming layer on the first layer.The priming material has Formula I or Formula I′: In Formula I or Formula I′: Ar1 and Ar2 are the same or different and are aryl groups; R1 through R5 are independently the same or different at each occurrence and are D, F, alkyl, aryl, alkoxy, silyl, or a crosslinkable group; R6 is H, D, or halogen; a through e are independently an integer from 0 to 4; f is 1 or 2; g is 0, 1 or 2; h is 1 or 2; and n is an integer greater than 0.
Abstract:
A compound having Formula I, Formula II, or Formula III: Ar1 may independently be phenylene, substituted phenylene, naphthylene, or substituted naphthylene. Ar2 is the same or different at each occurrence and is an aryl group. M is the same or different at each occurrence and is a conjugated moiety. T1 and T2 are independently the same or different at each occurrence and are conjugated moieties which are connected in a non-planar configuration; a and e are the same or different at each occurrence and are an integer from 1 to 6; b, c, and d are mole fractions such that b+c+d=1.0, with the proviso that c is not zero, and at least one of b and d is not zero, and when b is zero, M has at least two triarylamine units; and n is an integer greater than 1.
Abstract translation:具有式I,式II或式III的化合物:Ar 1可以独立地是亚苯基,取代的亚苯基,亚萘基或取代的亚乙基。 Ar2在每次出现时相同或不同,为芳基。 M在每次出现时相同或不同,为共轭部分。 T1和T2在每次出现时独立地相同或不同,并且是以非平面构型连接的共轭部分; a和e在每次出现时相同或不同,为1〜6的整数; b,c和d是摩尔分数,使得b + c + d = 1.0,条件是c不为零,b和d中的至少一个不为零,当b为零时,M至少为 两个三芳基胺单元; 并且n是大于1的整数。
Abstract:
A composition for use in making high optical contrast and UV light fluorescing dielectric material usuable in printed circuit boards, which in turn may form part of an electronic package. The composition comprises a resin, a coloring agent, and a fluorescing agent. A dielectric material is also defined that comprises a reinforcing material combined with the composition, the dielectric material forming at least one layer in combination with at least one conductive layer for the electronic package.
Abstract:
There is disclosed a compound having Formula I or Formula I′: In Formula I and Formula I′: Ar1 and Ar2 are the same or different and are aryl groups; R1 through R5 are independently the same or different at each occurrence and are D, F, alkyl groups, aryl groups, alkoxy groups, silyl groups, or crosslinkable groups; R6 is H, D, or halogen; a through e are independently an integer from 0 to 4; f is 1 or 2; g is 0, 1 or 2; h is 1 or 2; and n is an integer greater than 0.