公开(公告)号：US06257000B1

公开(公告)日：2001-07-10

申请号：US09532268

申请日：2000-03-22

Applicant: Luping Wang

Inventor： Luping Wang

IPC: F17C704

CPC classification number: F17C9/00 ,  F17C7/00 ,  F17C13/025 ,  F17C13/04 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/032 ,  F17C2201/056 ,  F17C2203/0636 ,  F17C2203/066 ,  F17C2203/0663 ,  F17C2205/018 ,  F17C2205/0326 ,  F17C2205/0329 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2205/0394 ,  F17C2221/014 ,  F17C2221/016 ,  F17C2221/017 ,  F17C2223/033 ,  F17C2223/035 ,  F17C2223/036 ,  F17C2223/038 ,  F17C2227/044 ,  F17C2250/0626 ,  F17C2250/0636 ,  F17C2250/072 ,  F17C2270/0518 ,  Y02E60/321

Abstract: A fluid storage and dispensing system including a vessel for holding a fluid, an adjustable set point pressure regulator in the interior volume of the vessel, a dispensing assembly in fluid flow communication with the regulator for dispensing fluid at a pressure determined by the set point of the regulator, and an adjusting assembly exterior to the vessel for in situ adjustment of the set point of the internally disposed regulator. By such arrangement, fluid storage and dispensing operations can have respectively differing regulator set point pressures, as for example a sub-atmospheric pressure set point for storage and a super-atmospheric pressure set point for dispensing.

Abstract translation: 流体存储和分配系统，包括用于保持流体的容器，在容器的内部容积中的可调节的设定点压力调节器，与调节器流体流动连通的分配组件，用于以由设定点 调节器和调节组件，用于原位调节内部调节器的设定点。 通过这种布置，流体储存和分配操作可以具有分别不同的调节器设定点压力，例如用于储存的次大气压力设定点和用于分配的超大气压力设定点。

公开(公告)号：US20090272272A1

公开(公告)日：2009-11-05

申请号：US12364800

申请日：2009-02-03

Applicant: W. Karl Olander ,  Joseph D. Sweeney ,  Luping Wang

Inventor： W. Karl Olander ,  Joseph D. Sweeney ,  Luping Wang

IPC: B03C3/38 ,  B01D50/00

CPC classification number: C23C14/48 ,  B01D53/74 ,  C23C14/564 ,  Y10S438/905 ,  Y10S438/909

Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.

Abstract translation: 一种半导体制造工艺设备，其中需要使用其中的排气用于其操作，这种设施包括洁净室和灰色房间部件，洁净室在其中具有至少一个半导体制造工具，并且其中排气流过干净的区域 房间。 该设施包括排气处理设备，其布置成（i）在其流过所述洁净室的所述区域之后接收排气，（ii）产生经处理的排气，以及（iii）将经处理的排气再循环到环境空气环境 在设施中，例如，到设施的灰色房间。

公开(公告)号：US20050019026A1

公开(公告)日：2005-01-27

申请号：US10625179

申请日：2003-07-23

Applicant: Luping Wang ,  Thomas Baum ,  Chongying Xu

Inventor： Luping Wang ,  Thomas Baum ,  Chongying Xu

IPC: B01D1/00 ,  B01D7/00 ,  C23C14/00 ,  C23C16/00 ,  C23C16/448

CPC classification number: C23C16/4481 ,  B01D1/0082

Abstract: The present invention relates to a delivery system for vaporizing and delivering vaporized solid and liquid precursor materials at a controlled rate having particular utility for semiconductor manufacturing applications. The system includes a vaporization vessel, a processing tool and a connecting vapor line therebetween, where the system further includes an input flow controller and/or an output flow controller to provide a controlled delivery of a vaporizable source material to the vaporization vessel and a controlled flow rate of vaporized source material to the processing tool.

Abstract translation: 本发明涉及一种用于以对于半导体制造应用具有特殊用途的受控速率蒸发和输送蒸发的固体和液体前体材料的输送系统。 该系统包括蒸发容器，处理工具和它们之间的连接蒸汽管线，其中系统还包括输入流量控制器和/或输出流量控制器，以向蒸发容器提供可蒸发的源材料的受控输送， 蒸发的原料流向加工工具的流量。

公开(公告)号：US06716271B1

公开(公告)日：2004-04-06

申请号：US10282377

申请日：2002-10-29

Applicant: Jose Arno ,  Edward Sturm ,  Luping Wang ,  James Dietz

Inventor： Jose Arno ,  Edward Sturm ,  Luping Wang ,  James Dietz

IPC: B01D5304

CPC classification number: B01D53/04 ,  B01D2253/102 ,  B01D2259/40083 ,  B01D2259/40086 ,  B01D2259/40088 ,  B01D2259/4525 ,  Y10S95/901

Abstract: A germane storage and dispensing system, in which germane gas is sorptively retained on an activated carbon sorbent medium in a vessel containing adsorbed and free germane gas. The activated carbon sorbent medium is deflagration-resistant in relation to the germane gas adsorbed thereon, i.e., under deflagration conditions of 65° C. and 650 torr, under which free germane gas undergoes deflagration, the activated carbon sorbent medium does not sustain deflagration of the adsorbed germane gas or thermally desorb the germane gas so that it undergoes subsequent deflagration. The deflagration-resistance of the activated carbon sorbent medium is promoted by pre-treatment of the sorbent material to remove extraneous sorbables therefrom and by maintaining the fill level of the sorbent medium in the gas storage and dispensing vessel at a substantial value, e.g., of at least 30%.

Abstract translation: 锗烷存储和分配系统，其中将锗烷气体吸附保留在含有吸附和游离的锗烷气体的容器中的活性炭吸附剂介质上。 活性炭吸附剂介质相对于其上吸附的锗烷气体，即在65℃和650托的爆燃条件下，具有爆燃阻力，在此条件下，游离的锗烷气体经历爆燃，活性炭吸附剂介质不能保持爆燃 吸附的锗烷气体或热解吸锗烷气体，使其经历随后的爆燃。 通过预处理吸附剂材料来促进活性炭吸附剂介质的防爆性，以从其中除去外来的吸附物，并且通过将吸附剂介质在气体储存和分配容器中的填充水平保持在基本值，例如 至少30％。

公开(公告)号：US06474076B2

公开(公告)日：2002-11-05

申请号：US10017970

申请日：2001-11-12

Applicant: Luping Wang ,  Glenn M. Tom ,  James A. Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

Inventor： Luping Wang ,  Glenn M. Tom ,  James A. Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

IPC: F17C704

CPC classification number: F17C7/04 ,  F17C7/02 ,  F17C13/025 ,  F17C13/04 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/032 ,  F17C2201/058 ,  F17C2203/0643 ,  F17C2203/0646 ,  F17C2205/018 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0382 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/0153 ,  F17C2223/035 ,  F17C2250/032 ,  F17C2250/034 ,  F17C2250/043 ,  F17C2250/0636 ,  F17C2265/04 ,  F17C2270/025 ,  F17C2270/05 ,  F17C2270/0518

Abstract: A fluid storage and dispensing system including a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid. The vessel includes a fluid discharge port for discharging fluid from the vessel. A pressure regulating element in the interior volume of the fluid storage and dispensing vessel is arranged to flow fluid therethrough to the fluid discharge port at a set pressure for dispensing thereof. A controller external of the fluid storage and dispensing vessel is arranged to transmit a control input into the vessel to cause the pressure regulating element to change the set pressure of the fluid flowed from the pressure regulating element to the fluid discharge port. By such arrangement, the respective storage and dispensing operations can have differing regulator set point pressures, as for example a subatmospheric pressure set point for storage and a superatmospheric pressure set point for dispensing.

Abstract translation: 一种流体存储和分配系统，包括包围用于保持流体的内部容积的流体存储和分配容器。 容器包括用于从容器排出流体的流体排出口。 流体存储和分配容器的内部容积中的压力调节元件布置成以一定的压力使流体流过流体排出口，用于分配。 流体存储和分配容器外部的控制器布置成将控制输入传送到容器中，以使压力调节元件将从压力调节元件流出的流体的设定压力改变到流体排出口。 通过这种布置，相应的存储和分配操作可以具有不同的调节器设定点压力，例如用于存储的低于大气压的压力设定点和用于分配的超大气压力设定点。

公开(公告)号：US06360546B1

公开(公告)日：2002-03-26

申请号：US09635961

申请日：2000-08-10

Applicant: Luping Wang ,  Glenn M. Tom ,  James A Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

Inventor： Luping Wang ,  Glenn M. Tom ,  James A Dietz ,  Steven M. Lurcott ,  Steven J. Hultquist

IPC: F17C704

CPC classification number: F17C7/04 ,  F17C7/02 ,  F17C13/025 ,  F17C13/04 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/032 ,  F17C2201/058 ,  F17C2203/0643 ,  F17C2203/0646 ,  F17C2205/018 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/0382 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2223/0123 ,  F17C2223/0153 ,  F17C2223/035 ,  F17C2250/032 ,  F17C2250/034 ,  F17C2250/043 ,  F17C2250/0636 ,  F17C2265/04 ,  F17C2270/025 ,  F17C2270/05 ,  F17C2270/0518

Abstract: A fluid storage and dispensing system including a fluid storage and dispensing vessel enclosing an interior volume for holding a fluid. The vessel includes a fluid discharge port for discharging fluid from the vessel. A pressure regulating element in the interior volume of the fluid storage and dispensing vessel is arranged to flow fluid therethrough to the fluid discharge port at a set pressure for dispensing thereof. A controller external of the fluid storage and dispensing vessel is arranged to transmit a control input into the vessel to cause the pressure regulating element to change the set pressure of the fluid flowed from the pressure regulating element to the fluid discharge port. By such arrangement, the respective storage and dispensing operations can have differing regulator set point pressures, as for example a subatmospheric pressure set point for storage and a super atmospheric pressure set point for dispensing.

Abstract translation: 一种流体存储和分配系统，包括包围用于保持流体的内部容积的流体存储和分配容器。 容器包括用于从容器排出流体的流体排出口。 流体存储和分配容器的内部容积中的压力调节元件布置成以一定的压力使流体流过流体排出口，用于分配。 流体存储和分配容器外部的控制器布置成将控制输入传送到容器中，以使压力调节元件将从压力调节元件流出的流体的设定压力改变到流体排出口。 通过这种布置，相应的存储和分配操作可以具有不同的调节器设定点压力，例如用于存储的低于大气压的压力设定点和用于分配的超大气压设定点。

公开(公告)号：US06343476B1

公开(公告)日：2002-02-05

申请号：US09552347

申请日：2000-04-19

Applicant: Luping Wang ,  Glenn M. Tom

Inventor： Luping Wang ,  Glenn M. Tom

IPC: F17C1100

CPC classification number: F17C13/04 ,  F17C1/00 ,  F17C7/00 ,  F17C11/00 ,  F17C13/02 ,  F17C13/025 ,  F17C2201/0109 ,  F17C2201/0114 ,  F17C2201/032 ,  F17C2201/056 ,  F17C2201/058 ,  F17C2203/0617 ,  F17C2203/0643 ,  F17C2203/0648 ,  F17C2205/0305 ,  F17C2205/0326 ,  F17C2205/0329 ,  F17C2205/0335 ,  F17C2205/0338 ,  F17C2205/0341 ,  F17C2205/035 ,  F17C2205/0382 ,  F17C2205/0385 ,  F17C2205/0391 ,  F17C2209/221 ,  F17C2221/03 ,  F17C2223/0123 ,  F17C2223/035 ,  F17C2227/044 ,  F17C2270/025 ,  F17C2270/0518 ,  Y02E60/321

Abstract: A gas storage and dispensing system comprising a vessel for holding a gas at a desired pressure. The vessel has a gas pressure regulator in its interior volume, to maintain pressure of dispensed gas at a desired pressure determined by the set point of the regulator. A second gas pressure regulator may be joined in series gas flow communication with the first gas pressure regulator, with the second gas pressure regulator being in initial contact with gas that is dispensed prior to its flow through the first gas pressure regulator, and with the set point pressure of the second gas pressure regulator being at least twice the set point pressure of the first gas pressure regulator.

Abstract translation: 一种气体储存和分配系统，包括用于将气体保持在所需压力下的容器。 容器在其内部容积中具有气体压力调节器，以将分配气体的压力保持在由调节器的设定点确定的期望压力。 第二气体压力调节器可以与第一气体压力调节器串联气流连通，第二气体压力调节器与其在流过第一气体压力调节器之前被分配的气体初始接触，并且与该组 第二气体压力调节器的点压力至少是第一气体压力调节器的设定点压力的两倍。

公开(公告)号：US6083298A

公开(公告)日：2000-07-04

申请号：US143809

申请日：1998-08-31

Applicant: Luping Wang ,  James V. McManus

Inventor： Luping Wang ,  James V. McManus

IPC: B01D53/04 ,  B01J4/02 ,  B01J20/08 ,  B01J20/10 ,  B01J20/14 ,  B01J20/16 ,  B01J20/18 ,  B01J20/20 ,  B01J20/26 ,  B01J20/34 ,  F17C11/00

CPC classification number: B01D53/0407 ,  B01J20/18 ,  B01J20/20 ,  B01J20/28004 ,  B01J20/28019 ,  F17C11/00 ,  B01D2253/102 ,  B01D2253/104 ,  B01D2253/106 ,  B01D2253/202 ,  B01D2253/308 ,  B01D2257/502 ,  B01D2257/504 ,  B01D2259/4525 ,  B01J2220/66 ,  F17C2205/0338 ,  F17C2205/0391 ,  Y02C10/08 ,  Y02E60/321

Abstract: A process for fabricating a gas storage and dispensing system including a dispenser container for holding a physical sorbent material having sorptive affinity for (i) a sorbable dispensing gas to be held in and subsequently selectively discharged from the dispenser container, and (ii) extraneous sorbables, in which the physical sorbent material, having extraneous sorbables sorbed thereon, is treated to desorb from the sorbent material at least part of the extraneous sorbables, prior to loading the sorbent material into a gas storage and dispensing container.

Abstract translation: 一种用于制造气体储存和分配系统的方法，包括用于保持具有吸附亲合力的物理吸附剂材料的分配器容器，用于（i）可吸附的分配气体被保持在分配器容器中并随后从分配器容器中选择性地排出，以及（ii）无关的可吸取物 其中在将吸附剂材料装入气体储存和分配容器之前，其中具有吸附在其上的外来吸附物质的物理吸附剂材料被处理以从吸附材料解吸至少部分外来吸附物。

公开(公告)号：US08539781B2

公开(公告)日：2013-09-24

申请号：US12666208

申请日：2008-06-22

Applicant: J. Donald Carruthers ,  Karl Boggs ,  Luping Wang ,  Shaun Wilson ,  Jose I. Arno ,  Paul J. Marganski ,  Steven M. Bilodeau ,  Peng Zou ,  Brian Bobita ,  Joseph D. Sweeney ,  Douglas Edwards

Inventor： J. Donald Carruthers ,  Karl Boggs ,  Luping Wang ,  Shaun Wilson ,  Jose I. Arno ,  Paul J. Marganski ,  Steven M. Bilodeau ,  Peng Zou ,  Brian Bobita ,  Joseph D. Sweeney ,  Douglas Edwards

IPC: F25B15/00

CPC classification number: B01J20/26 ,  B01J20/20 ,  B01J20/28054 ,  B01J20/28092 ,  B01J20/30 ,  B01J20/305 ,  B01J20/3078 ,  B01J2220/445 ,  C09K5/047 ,  F25B17/08 ,  F25B27/007 ,  F25B35/04 ,  F25B37/00 ,  F25B2500/01

Abstract: An adsorption structure is described that includes at least one adsorbent member formed of an adsorbent material and at least one porous member provided in contact with a portion of the adsorbent member to allow gas to enter and exit the portion of the adsorbent member. Such adsorption structure is usefully employed in adsorbent-based refrigeration systems. A method also is described for producing an adsorbent material, in which a first polymeric material is provided having a first density and a second polymeric material is provided having a second density, in which the second polymeric material is in contact with the first polymeric material to form a structure. The structure is pyrolyzed to form a porous adsorbent material including a first region corresponding to the first polymeric material and a second region corresponding to the second polymeric material, in which at least one of the pore sizes and the pore distribution differs between the first region and the second region.

Abstract translation: 描述了吸附结构，其包括由吸附剂材料形成的至少一个吸附构件和与吸附构件的一部分接触设置的至少一个多孔构件，以允许气体进入和离开吸附构件的该部分。 这种吸附结构在吸附剂型制冷系统中有用。 描述了一种用于生产吸附材料的方法，其中提供具有第一密度的第一聚合物材料和第二聚合物材料，其具有第二密度，其中第二聚合物材料与第一聚合物材料接触， 形成一个结构。 该结构被热解以形成多孔吸附剂材料，其包括对应于第一聚合物材料的第一区域和对应于第二聚合物材料的第二区域，其中孔径和孔分布中的至少一个在第一区域和第 第二个地区。

公开(公告)号：US07485169B2

公开(公告)日：2009-02-03

申请号：US11519681

申请日：2006-09-12

Applicant: W. Karl Olander ,  Joseph D. Sweeney ,  Luping Wang

Inventor： W. Karl Olander ,  Joseph D. Sweeney ,  Luping Wang

IPC: F24F3/16 ,  H01L21/00

CPC classification number: C23C14/48 ,  B01D53/74 ,  C23C14/564 ,  Y10S438/905 ,  Y10S438/909

Abstract: A semiconductor manufacturing process facility requiring use therein of air exhaust for its operation, such facility including clean room and gray room components, with the clean room having at least one semiconductor manufacturing tool therein, and wherein air exhaust is flowed through a region of the clean room. The facility includes an air exhaust treatment apparatus arranged to (i) receive air exhaust after flow thereof through said region of said clean room, (ii) produce a treated air exhaust, and (iii) recirculate the treated air exhaust to an ambient air environment in the facility, e.g., to the gray room of the facility.

Abstract translation: 一种半导体制造工艺设备，其中需要使用其中的排气用于其操作，这种设施包括洁净室和灰色房间部件，洁净室在其中具有至少一个半导体制造工具，并且其中排气流过干净的区域 房间。 该设施包括排气处理设备，其布置成（i）在其流过所述洁净室的所述区域之后接收排气，（ii）产生经处理的排气，以及（iii）将经处理的排气再循环到环境空气环境 在设施中，例如，到设施的灰色房间。