公开(公告)号：US06566683B1

公开(公告)日：2003-05-20

申请号：US09708608

申请日：2000-11-09

申请人： Tetsuya Ogawa ,  Hidetada Tokioka ,  Yukio Sato ,  Mitsuo Inoue ,  Tomohiro Sasagawa ,  Mitsutoshi Miyasaka

发明人： Tetsuya Ogawa ,  Hidetada Tokioka ,  Yukio Sato ,  Mitsuo Inoue ,  Tomohiro Sasagawa ,  Mitsutoshi Miyasaka

IPC分类号： H01L2904

CPC分类号： H01L27/1285 ,  B23K26/0732 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02686 ,  H01L21/268 ,  H01L27/1296

摘要： The laser heat treatment of an amorphous or polycrystalline silicon film material is conducted by forming a laser beam generated from a pulse laser source having a wavelength of 350 nm to 800 nm into a linear beam having a width and a length, and directing the linear beam onto a film material formed on a substrate.

摘要翻译： 通过将具有350nm至800nm波长的脉冲激光源产生的激光束形成为具有宽度和长度的直线光束来进行非晶或多晶硅膜材料的激光热处理，并且引导线性光束 在形成在基板上的薄膜材料上。

公开(公告)号：US06437284B1

公开(公告)日：2002-08-20

申请号：US09599645

申请日：2000-06-23

申请人： Tatsuki Okamoto ,  Tetsuya Ogawa ,  Keisuke Furuta ,  Hidetada Tokioka ,  Tomohiro Sasagawa ,  Junichi Nishimae ,  Mitsuo Inoue ,  Yukio Sato

发明人： Tatsuki Okamoto ,  Tetsuya Ogawa ,  Keisuke Furuta ,  Hidetada Tokioka ,  Tomohiro Sasagawa ,  Junichi Nishimae ,  Mitsuo Inoue ,  Yukio Sato

IPC分类号： B23K2606

CPC分类号： B23K26/0732 ,  B23K2101/40 ,  H01L21/02675 ,  H01L21/2026

摘要： An optical system that controls laser beam spot profile for forming a high performance thin film by a laser heat treatment process is provided. In the optical system that irradiates a rectangular laser beam on a film formed on a substrate, intensity distribution forming, apparatus makes the intensity distribution uniform in the longitudinal direction while maintaining the properties of the laser beam 2 such as directivity in the direction of shorter side, making it possible to concentrate the light to a limit permitted by the nature of the laser beam and achieve the maximum intensity gradient on the film disposed on the substrate. Thus a steep temperature distribution can be generated on the film disposed on the substrate and, as a result, high performance thin film can be formed.

摘要翻译： 提供了通过激光热处理工艺控制用于形成高性能薄膜的激光束光斑轮廓的光学系统。 在形成在基板上的膜上照射矩形激光束的光学系统中，强度分布形成装置使得强度分布沿长度方向均匀，同时保持激光束2的特性，例如沿短边方向的方向性 ，使得可以将光集中到由激光束的性质允许的极限，并且在设置在基板上的膜上实现最大强度梯度。 因此，可以在设置在基板上的膜上产生陡峭的温度分布，结果，可以形成高性能的薄膜。

公开(公告)号：US5135546A

公开(公告)日：1992-08-04

申请号：US564947

申请日：1990-08-09

申请人： Masami Sato ,  Mitsuo Inoue

发明人： Masami Sato ,  Mitsuo Inoue

IPC分类号： B24D3/00 ,  B24D3/28 ,  B24D11/00

CPC分类号： B24D11/00 ,  B24D3/28

摘要： An abrasive tape comprises a flexible substrate and an abrasive layer, which is overlaid on the flexible substrate and which is primarily constituted of abrasive grains and a binder. The abrasive grains are composed of first abrasive grains and second abrasive grains. The first abrasive grains and the second abrasive grains are constituted of at least one type of angular grains which are selected from the group consisting of Cr.sub.2 O.sub.3, SiC, and Al.sub.2 O.sub.3, and which are obtained from a pulverizing process. The mean grain diameter of the first abrasive grains falls within the range of 6 .mu.m to 9 .mu.m. The mean grain diameter of the second abrasive grains falls within the range of 4 .mu.m to 6 .mu.m. The binder is contained in a proportion falling within the range of 10% by weight to 30% by weight with respect to the abrasive grains. A 40% by weight to 65% by weight portion of the binder is constituted of a polyisocyanate.

摘要翻译： 研磨带包括柔性基底和研磨层，其覆盖在柔性基底上，并且主要由磨料颗粒和粘合剂构成。 磨粒由第一磨粒和第二磨粒构成。 第一磨粒和第二磨粒由至少一种选自Cr 2 O 3，SiC和Al 2 O 3的角粒组成，并由粉碎过程得到。 第一磨粒的平均粒径在6μm〜9μm的范围内。 第二磨粒的平均粒径在4μm〜6μm的范围内。 粘合剂的含量相对于磨粒为10重量％〜30重量％。 40重量％〜65重量％的粘合剂由多异氰酸酯构成。

公开(公告)号：US07886509B2

公开(公告)日：2011-02-15

申请号：US11895865

申请日：2007-08-28

申请人： Kazuo Itoh ,  Mitsuo Inoue ,  Masayuki Shimoda

发明人： Kazuo Itoh ,  Mitsuo Inoue ,  Masayuki Shimoda

IPC分类号： A01D41/14

CPC分类号： A01D34/90

摘要： A power-driven grass mower includes an operation division having a grass cutter; a motor division having an electric motor and a power-source division having a battery, wherein the operation division is provided with a first means for watching if the motor division is locked for some reason or other, and a second means for putting the motor division into the inching operation in response to any signal from the first means indicating that the motor division is in a locking condition.

摘要翻译： 动力驱动的割草机包括具有割草机的操作部分; 具有电动机的电机部分和具有电池的电源部分，其中所述操作部分设置有用于由于某种原因等待所述电动机分配是否被锁定的第一装置，以及用于将所述电动机分配 响应于来自第一装置的任何指示电动机分配处于锁定状态的信号进入微动作业。

公开(公告)号：US20080224640A1

公开(公告)日：2008-09-18

申请号：US12075489

申请日：2008-03-12

申请人： Kazuo Itoh ,  Toshiyuki Tachibana ,  Mitsuo Inoue

发明人： Kazuo Itoh ,  Toshiyuki Tachibana ,  Mitsuo Inoue

IPC分类号： H02P3/14 ,  H02P1/04 ,  H03K5/00

CPC分类号： H02P6/24

摘要： A brake-controllable brushless motor has a rotor and a stator having polyphase coils; a polar position detector whereby electric power is supplied to the coil selected by its phase in response to the polar positions of the rotor detected by the polar position detector; a driver division for controlling the electric supply to the coils; a motor pulse identifier for recognizing motor pulse signals fed from the polar position detector; and a delayed pulse generator for producing phase-delayed pulse signals in response to the pulse signals fed from the motor pulse identifier, thereby ensuring that when the brushless motor is braked, the phase delay of the delayed pulse signals is progressively and continuously enlarged, and that the coils receive a controlled electric supply from the driver division in response to the delayed pulse signals.

摘要翻译： 制动控制无刷电动机具有转子和具有多相线圈的定子; 极位置检测器，其响应于由极位置检测器检测的转子的极性位置，向由其相位选择的线圈提供电力; 用于控制线圈供电的驱动器部分; 用于识别从极位置检测器馈送的电动机脉冲信号的电动机脉冲识别器; 以及延迟脉冲发生器，用于响应于从电动机脉冲识别器馈送的脉冲信号产生相位延迟的脉冲信号，从而确保当无刷电动机被制动时，延迟脉冲信号的相位延迟逐渐地和连续地增大， 线圈响应于延迟的脉冲信号从驱动器分段接收受控电源。

公开(公告)号：US20060141683A1

公开(公告)日：2006-06-29

申请号：US10529373

申请日：2004-08-17

申请人： Mitsuo Inoue ,  Hidetada Tokioka ,  Shinsuke Yura

发明人： Mitsuo Inoue ,  Hidetada Tokioka ,  Shinsuke Yura

IPC分类号： H01L21/84 ,  H01L21/20 ,  C30B11/00

CPC分类号： H01L21/02686 ,  H01L21/02678 ,  H01L21/02691 ,  H01L21/2026 ,  H01L29/66757

摘要： A method of fabricating a thin-film of a semiconductor material includes: a scanning irradiation step of, in order to form a polycrystalline silicon film on the surface of a substrate, focusing first pulse laser light having a visible wavelength into a line shape having an intensity distribution of an approximately Gaussian shape in a width direction on the surface of the substrate and applying the light such that the line shape is shifted in the width direction; an edge processing step of, after performing the scanning irradiation step in one position in one direction, applying second pulse laser light having an ultraviolet wavelength to an end region of an edge parallel to the width direction of a region having undergone the scanning irradiation; and a step of applying the scanning irradiation step again to cover a region that is adjacent to the region covered by the scanning irradiation step as well as overlaps the end region having undergone the edge processing step.

摘要翻译： 制造半导体材料薄膜的方法包括：扫描照射步骤，为了在基板的表面上形成多晶硅膜，将具有可见波长的第一脉冲激光聚焦成具有 在基板的表面上的宽度方向上的大致高斯形状的强度分布，并且施加光，使得线形状在宽度方向上偏移; 边缘处理步骤，在沿一个方向的一个位置执行扫描照射步骤之后，将具有紫外线波长的第二脉冲激光施加到与经过扫描照射的区域的宽度方向平行的边缘的端部区域; 以及再次施加扫描照射步骤以覆盖与扫描照射步骤所覆盖的区域相邻的区域以及与已经经历边缘处理步骤的端部区域重叠的步骤。

公开(公告)号：US20050174306A1

公开(公告)日：2005-08-11

申请号：US10513755

申请日：2003-06-17

申请人： Masafumi Agari ,  Hidetada Tokioka ,  Ryuichi Hashido ,  Takahiro Urakabe ,  Suehiro Gotoh ,  Masashi Okabe ,  Mitsuo Inoue

发明人： Masafumi Agari ,  Hidetada Tokioka ,  Ryuichi Hashido ,  Takahiro Urakabe ,  Suehiro Gotoh ,  Masashi Okabe ,  Mitsuo Inoue

IPC分类号： G09G3/32 ,  G09G3/30

CPC分类号： G09G3/3283 ,  G09G3/3241 ,  G09G2300/0417 ,  G09G2300/0842 ,  G09G2300/0861 ,  G09G2310/027 ,  G09G2310/0297 ,  G09G2320/0242

摘要： Signal lines for supplying signal currents to respective pixel circuits having light emitting elements are arranged. A signal line driving circuit generates, on a signal line, a signal current corresponding to the image data, by switching bit weighting currents output from bit weighting current source circuits provided for respective bits of the image data, using a switch circuit turned on/off dependent on the corresponding bit. Each current source circuit has a function of correcting the level of the bit weighting current output from itself, based on a reference current of the bit weighting current supplied from a reference current line. Therefore, even when the characteristics of TFTs forming respective current source circuits vary widely, variation in signal currents among the signal lines can be suppressed, and unevenness in emission luminance can be suppressed.

摘要翻译： 布置用于向具有发光元件的各个像素电路提供信号电流的信号线。 信号线驱动电路通过使用开关电路接通/断开来切换信号线上产生与图像数据相对应的信号电流，通过切换由针对图像数据的各个比特设置的比特加权电流源电路输出的比特加权电流 取决于相应的位。 每个电流源电路具有基于从参考电流线提供的比特加权电流的参考电流来校正其自身输出的比特加权电流的电平的功能。 因此，即使形成各个电流源电路的TFT的特性变化很大，也可以抑制信号线之间的信号电流的变化，能够抑制发光亮度的不均匀。

公开(公告)号：US06884699B1

公开(公告)日：2005-04-26

申请号：US10148562

申请日：2000-10-06

申请人： Tetsuya Ogawa ,  Hidetada Tokioka ,  Junichi Nishimae ,  Tatsuki Okamoto ,  Yukio Sato ,  Mitsuo Inoue ,  Mitsutoshi Miyasaka ,  Hiroaki Jiroku

发明人： Tetsuya Ogawa ,  Hidetada Tokioka ,  Junichi Nishimae ,  Tatsuki Okamoto ,  Yukio Sato ,  Mitsuo Inoue ,  Mitsutoshi Miyasaka ,  Hiroaki Jiroku

IPC分类号： C23C14/58 ,  H01L21/20 ,  H01L21/336 ,  H01L21/00 ,  H01L21/331 ,  H01L21/26

CPC分类号： C23C14/5813 ,  B23K26/0604 ,  B23K26/0738 ,  B23K26/0838 ,  B23K26/352 ,  B23K2101/40 ,  B23K2103/52 ,  H01L21/02532 ,  H01L21/02678 ,  H01L21/02691 ,  H01L29/66757 ,  Y10S438/969

摘要： A process for making a polycrystalline silicon film includes forming, on a glass substrate, an amorphous silicon film having a first region and a second region that contacts the first region, forming a first polycrystalline portion by irradiating the first region of the amorphous silicon film with laser light having a wavelength not less than 390 nm and not more than 640 nm and forming a second polycrystalline portion that contacts the first polycrystalline portion by irradiating the second region and the portion of the region of the first polycrystalline portion that contacts the second region of the amorphous silicon film with the laser light.

摘要翻译： 一种制造多晶硅膜的方法包括在玻璃基板上形成具有与第一区域接触的第一区域和第二区域的非晶硅膜，通过用非晶硅膜的第一区域照射非晶硅膜形成第一多晶部分， 具有不小于390nm且不大于640nm的波长的激光，并且通过照射第二区域和形成与第一多晶部分接触的第二多晶部分的区域的部分形成第二多晶部分， 具有激光的非晶硅膜。

公开(公告)号：US20050067553A1

公开(公告)日：2005-03-31

申请号：US10496948

申请日：2002-12-09

申请人： Masafumi Agari ,  Mitsuo Inoue ,  Takashi Yamamoto ,  Shigeyuki Yoshida ,  Takao Sakamoto

发明人： Masafumi Agari ,  Mitsuo Inoue ,  Takashi Yamamoto ,  Shigeyuki Yoshida ,  Takao Sakamoto

IPC分类号： G02F1/13357 ,  G02F1/1362 ,  G09G3/34 ,  G09G3/36 ,  G01J1/32

CPC分类号： G02F1/1336 ,  G02F1/13454 ,  G02F2001/133616 ,  G02F2001/133618 ,  G02F2001/133626 ,  G02F2201/58 ,  G02F2203/02 ,  G09G3/3406 ,  G09G3/3648 ,  G09G2300/0408 ,  G09G2320/0626 ,  G09G2320/0633 ,  G09G2320/064 ,  G09G2360/144 ,  G09G2360/145 ,  H01L27/1251

摘要： A reflective liquid crystal display device is integrated with a liquid crystal display panel (1), detects display surface illuminance by a plurality of light sensors (10) provided in the vicinity of the display surface, and in accordance with the detection result, controls luminous intensity of a front light (lighting means) (19) using a lighting control circuit (22) so that the display surface illuminance becomes a predetermined magnitude. Even if the use environment of the reflective liquid crystal display device changes, or more specifically, intensity of external light shone from outside of the device into the display surface varies, the configuration allows controlling automatically the amount of emission from the front light to automatically maintain an appropriate display luminance and to reduce electric power consumption.

摘要翻译： 反射型液晶显示装置与液晶显示面板（1）一体化，通过设置在显示面附近的多个光传感器（10）检测显示面照度，根据检测结果，控制发光 使用照明控制电路（22）使前灯（照明装置）（19）的强度使得显示面照度成为预定的大小。 即使反射型液晶显示装置的使用环境发生变化，或者更具体地说，从设备外部照射到显示面上的外部光的强度变化，能够自动地控制前方的发光量自动维持 适当的显示亮度并降低电力消耗。

公开(公告)号：US06573161B1

公开(公告)日：2003-06-03

申请号：US09674645

申请日：2000-11-02

申请人： Mitsutoshi Miyasaka ,  Tetsuya Ogawa ,  Hidetada Tokioka ,  Yukio Satoh ,  Mitsuo Inoue ,  Tomohiro Sasagawa

发明人： Mitsutoshi Miyasaka ,  Tetsuya Ogawa ,  Hidetada Tokioka ,  Yukio Satoh ,  Mitsuo Inoue ,  Tomohiro Sasagawa

IPC分类号： H01L2120

CPC分类号： H01L21/02686 ,  H01L21/02422 ,  H01L21/02532 ,  H01L21/0262 ,  H01L21/02683 ,  H01L21/02691 ,  H01L21/2026 ,  H01L21/268 ,  H01L27/1296 ,  H01L29/04 ,  H01L29/66757

摘要： A fabrication process is provided for semiconductor devices having a crystalline semiconductor film formed on a substrate, the semiconductor film being an active layer of a transistor and being mainly composed of silicon, and includes at least an underlevel protection layer fabrication step of forming a silicon oxide film as an underlevel protection layer on the substrate; a first processing step of forming a semiconductor film, which is mainly composed of silicon, on the underlevel protection layer; and a second processing step of irradiating a pulsed laser light on the semiconductor film. The semiconductor film is irradiated by a pulsed laser, the wavelength of the pulsed laser light is between 370 and 710 nm. As a result, using a low temperature process, high performance thin film semiconductor devices can be produced simply and reliably.

摘要翻译： 本发明提供一种半导体器件的制造方法，该半导体器件具有在基板上形成的结晶半导体膜，该半导体膜是主要由硅组成的晶体管的有源层，并且至少包括形成氧化硅的底层保护层制造步骤 膜作为衬底上的底层保护层; 在衬底保护层上形成主要由硅构成的半导体膜的第一处理步骤; 以及在半导体膜上照射脉冲激光的第二处理步骤。 半导体膜被脉冲激光照射，脉冲激光的波长在370和710nm之间。 结果，使用低温工艺，可以简单可靠地制造高性能薄膜半导体器件。