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11.发明申请FLUID SUPPLY SYSTEM, A LITHOGRAPHIC APPARATUS, A METHOD OF VARYING FLUID FLOW RATE AND A DEVICE MANUFACTURING METHOD 有权流体供应系统，平面设备，流体流量变化的方法和装置制造方法公开(公告)号：US20110299051A1
公开(公告)日：2011-12-08
申请号：US13149251
申请日：2011-05-31
CPC classification number: G03F7/70341
Abstract: A fluid supply system for a lithographic apparatus includes a first fluid flow path for fluid between a fluid source and a first component and a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component. A controller is provided to vary a fluid flow rate to the first component from the fluid source by regulating flow of fluid through the drain fluid flow path.
Abstract translation: 用于光刻设备的流体供应系统包括用于流体源和第一部件之间的流体的第一流体流动路径和用于流体从第一流体流动路径中的结点流向排出部件的排出流体流动路径。 提供控制器以通过调节通过排放流体流动路径的流体的流动来改变来自流体源的第一部件的流体流量。
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公开(公告)号：US20110273675A1
公开(公告)日：2011-11-10
申请号：US13186123
申请日：2011-07-19
Applicant: Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
Inventor： Nicolaas Rudolf Kemper , Henrikus Herman Marie Cox , Sjoerd Nicolaas Lambertus Donders , Roelof Frederick De Graaf , Christiaan Alexander Hoogendam , Nicolaas Ten Kate , Jeroen Johannes Sophia Maria Mertens , Frits Van Der Meulen , Franciscus Johannes Herman Maria Teunissen , Jan-Gerard Cornelis Van Der Toorn , Martinus Cornelius Maria Verhagen , Marco Polizzi , Edwin Augustinus Matheus Van Gompel , Stefan Philip Christiaan Belfroid , Johannes Petrus Maria Smeulers , Herman Vogel , Martinus Hendrikus Antonius Leenders , Joost Jeroen Ottens
IPC: G03B27/52
CPC classification number: G03F7/70883 , G03F7/70341 , G03F7/70858 , G03F7/70866 , G03F7/7095
Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
Abstract translation: 在浸没式光刻投影装置的液体去除系统中使用多孔构件来平滑不均匀的流动。 多孔构件上的压差可以保持在多孔构件的起泡点以下，从而获得单相液体流。 或者，多孔构件可以用于减少两相流中的不均匀性。
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13.发明申请LITHOGRAPHIC APPARATUS, COVER FOR USE IN A LITHOGRAPHIC APPARATUS AND METHOD FOR DESIGNING A COVER FOR USE IN A LITHOGRAPHIC APPARATUS 审中-公开地平面设备，用于平面设备的盖子和设计用于平面设备的盖子的方法公开(公告)号：US20110228238A1
公开(公告)日：2011-09-22
申请号：US13047165
申请日：2011-03-14
Applicant: Niek Jacobus Johannes ROSET , Nicolaas TEN KATE , Sergei SHULEPOV , Raymond Wilhelmus Louis LAFARRE
Inventor： Niek Jacobus Johannes ROSET , Nicolaas TEN KATE , Sergei SHULEPOV , Raymond Wilhelmus Louis LAFARRE
CPC classification number: G03F7/70341
Abstract: A lithographic apparatus having a fluid handling structure configured to contain immersion fluid in a space adjacent to an upper surface of a substrate table and/or a substrate located in a recess of the substrate table, a cover including a planar main body that, in use, extends around a substrate from the upper surface to a peripheral section of an upper major face of the substrate in order to cover a gap between an edge of the recess and an edge of the substrate, and an immersion fluid film disruptor configured to disrupt the formation of a film of immersion fluid between an edge of the cover and immersion fluid contained by the fluid handling structure during movement of the substrate table relative to the fluid handling structure.
Abstract translation: 一种具有流体处理结构的光刻设备，其被配置为将浸没流体包含在与衬底台的上表面相邻的空间中和/或位于所述衬底台的凹部中的衬底上，所述盖包括平面主体，所述平面主体在使用中 从衬底的上表面延伸到基板的上主表面的周边部分，以覆盖凹部的边缘和基板的边缘之间的间隙，以及浸没流体膜破坏器，其构造成破坏基板 在衬底台相对于流体处理结构移动期间，在盖的边缘和由流体处理结构容纳的浸没流体之间形成浸没流体膜。
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公开(公告)号：US08004654B2
公开(公告)日：2011-08-23
申请号：US12216669
申请日：2008-07-09
Applicant: Marcel Beckers , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Ferdy Migchelbrink
Inventor： Marcel Beckers , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Ferdy Migchelbrink
CPC classification number: G03F7/70341
Abstract: A protrusion is provided on a barrier member which at least partly confines a liquid between a projection system and a substrate. The protrusion is closer to the projection system than other parts of the barrier member to promote a meniscus of liquid to adhere between the protrusion and the projection system.
Abstract translation: 在阻挡构件上设置突起，所述阻挡构件至少部分地将液体限制在投影系统和基板之间。 突起比屏障部件的其它部分更靠近投影系统，以促进液体弯液面粘附在突起和投影系统之间。
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公开(公告)号：US20110149257A1
公开(公告)日：2011-06-23
申请号：US12969635
申请日：2010-12-16
Applicant: Niek Jacobus Johannes ROSET , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Alexander Nikolov Zdravkov
Inventor： Niek Jacobus Johannes ROSET , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Alexander Nikolov Zdravkov
CPC classification number: G03F7/70716 , G03F7/70341
Abstract: An immersion lithographic apparatus is disclosed that has a fluid handling system configured to provide immersion liquid between a final element of a projection system and a surface which comprises, in cross-section, a feature, and an adjustment fluid source configured to locally change the composition of the immersion liquid to cause a local decrease in surface tension of the immersion liquid at least when a meniscus of the immersion liquid contacts the feature.
Abstract translation: 公开了一种浸没式光刻设备，其具有流体处理系统，该流体处理系统被配置为在投影系统的最终元件和包括横截面的特征之间提供浸没液体，以及被配置为局部改变组成的调节流体源 至少当浸没液体的弯月面接触该特征时，使浸渍液体的表面张力局部降低。
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Patent Agency Ranking
公开(公告)号：US20110069297A1
公开(公告)日：2011-03-24
申请号：US12881878
申请日：2010-09-14
Applicant: Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns
Inventor： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns
IPC: G03B27/58
CPC classification number: G03F7/70758 , G03F7/70341
Abstract: A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.
Abstract translation: 一种光刻设备，包括被配置为保持基板的基板台; 定位器，其被配置为相对于投影系统定位所述基板台，所述定位器包括被配置为执行精细定位运动的短行程模块，所述基准台被保持在所述定位运动上，并且所述定位器支撑在配置成执行粗略定位运动的长行程模块 ; 以及盖板，其构造成至少部分地覆盖所述短行程模块的顶表面; 其中所述盖板安装到所述长冲程模块。
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公开(公告)号：US20110025994A1
公开(公告)日：2011-02-03
申请号：US12901939
申请日：2010-10-11
Applicant: Nicolaas Rudolf KEMPER , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Sergei SHULEPOV
Inventor： Nicolaas Rudolf KEMPER , Sjoerd Nicolaas Lambertus DONDERS , Christiaan Alexander HOOGENDAM , Nicolaas TEN KATE , Sergei SHULEPOV
IPC: G03B27/52
CPC classification number: G03F7/70866 , G03F7/70341 , H01L21/67034
Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.
Abstract translation: 通过确保在待干燥的表面上的液膜中形成压力梯度，配置成干燥浸没式光刻设备中的表面的气刀被优化以去除液体。
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公开(公告)号：US07852457B2
公开(公告)日：2010-12-14
申请号：US12213589
申请日：2008-06-20
Applicant: Stefan Philip Christiaan Belfroid , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Johannes Petrus Maria Smeulers , Arno Willem Frederik Volker , Rene Breeuwer
Inventor： Stefan Philip Christiaan Belfroid , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Johannes Petrus Maria Smeulers , Arno Willem Frederik Volker , Rene Breeuwer
CPC classification number: G03F7/70341 , G03F7/70925
Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.
Abstract translation: 在浸没式光刻设备中，使用超声波来雾化衬底表面上的液体。
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公开(公告)号：US07804577B2
公开(公告)日：2010-09-28
申请号：US11391683
申请日：2006-03-29
Applicant: Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
Inventor： Martinus Hendrikus Antonius Leenders , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Joost Jeroen Ottens , Marcel Beckers , Johannes Petrus Maria Smeulers , Michel Riepen , Sergei Shulepov
IPC: G03B27/42
CPC classification number: G03F7/70341
Abstract: A barrier member is provided for use in immersion lithography. The barrier member includes an extractor assembly on a bottom surface configured to face the substrate. The extractor assembly includes a plate configured to split the space between a liquid removal device and the substrate in two such that a meniscus is formed in an upper channel between the liquid removal device and the plate and below the plate between the plate and the substrate.
Abstract translation: 提供了用于浸没式光刻中的阻挡构件。 阻挡构件包括在被配置为面向衬底的底表面上的提取器组件。 提取器组件包括被配置为将液体移除装置和基板之间的空间分成两部分的板，使得在液体移除装置和板之间的上部通道中以及在板和基板之间的板下方形成弯月面。
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20.发明授权Lithographic apparatus and device manufacturing method having liquid evaporation control 有权具有液体蒸发控制的平版印刷设备和器件制造方法公开(公告)号：US07804575B2
公开(公告)日：2010-09-28
申请号：US11205325
申请日：2005-08-17
Applicant: Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
Inventor： Theodorus Petrus Maria Cadee , Johannes Henricus Wilhelmus Jacobs , Nicolaas Ten Kate , Erik Roelof Loopstra , Aschwin Lodewijk Hendricus Johannes Vermeer , Jeroen Johannes Sophia Maria Mertens , Christianus Gerardus Maria De Mol , Marcel Johannus Elisabeth Hubertus Muitjens , Antonius Johannus Van Der Net , Joost Jeroen Ottens , Johannes Anna Quaedackers , Maria Elisabeth Reuhman-Huisken , Marco Koert Stavenga , Patricius Aloysius Jacobus Tinnemans , Martinus Cornelis Maria Verhagen , Jacobus Johannus Leonardus Hendricus Verspay , Frederik Eduard De Jong , Koen Goorman , Boris Menchtchikov , Herman Boom , Stoyan Nihtianov , Richard Moerman , Martin Frans Pierre Smeets , Bart Leonard Peter Schoondermark , Franciscus Johannes Joseph Janssen , Michel Riepen
IPC: G03B27/52
CPC classification number: G03F7/70808 , G03F7/70341 , G03F7/70841 , G03F7/70875
Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
Abstract translation: 描述了一种光刻设备，其具有液体供应系统，该液体供应系统被配置为至少部分地填充光刻设备的投影系统和具有液体的基板之间的空间，布置成基本上容纳该空间内的液体的阻挡构件，以及一个或多个元件 以控制和/或补偿来自基底的液体的蒸发。
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