Abstract:
A system in which deformation of a substrate wafer is monitored during processing of the wafer is disclosed. In one embodiment, the distortion in the substrate wafer is measured after each exposure and processing operation by comparing the position of a plurality of reference marks to values in a database.
Abstract:
A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining positions at a plurality of measurement points per entity for providing position data; computing a correlation coefficient for each of a plurality of combinations of entities from the entity set, the correlation coefficients being based on the position data and being representative of the correlation between the associated combination of entities; comparing the correlation coefficients to a threshold amount to determine the extent of similarity between the entities. The invention also relates to a similar method incorporating determining an average value of the computed correlation coefficients, the average value providing a measure of the consistency.
Abstract:
A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.
Abstract:
A method for characterizing the similarity between measurements on a plurality of entities comprising a first entity and a second entity comprises receiving measurements taken at a plurality of measurement points per entity. A model is defined comprising a stochastic process and a model function having values which depend on a set of parameters and the measurement points. A set (β) of parameters is estimated by fitting the model function to the measurements. Residual data is determined for at least a part of the plurality of measurement points for the first entity and the second entity by subtracting the fitted function from the measurements. A correlation coefficient for the first entity (i′) and the second entity (i″) is estimated based on the determined residual data and the estimated correlation coefficient is used to characterize the similarity between the measurements. The model is defined such that the residual data is expected to have a deterministic component which depends on the measurement points and that dominates the estimate of the correlation coefficient. The correlation coefficient is estimated using an estimate for the entity average residue averaged over the measurement points of the first entity and using an estimate for the entity average residue averaged over the measurement points of the second entity.
Abstract:
A method of characterizing the similarity between entities in a set of entities, wherein an entity is selected from substrate layers, substrate fields and substrates. Including determining positions at a plurality of measurement points per entity for providing position data; computing a correlation coefficient for each of a plurality of combinations of entities from the entity set, the correlation coefficients being based on the position data and being representative of the correlation between the associated combination of entities; comparing the correlation coefficients to a threshold amount to determine the extent of similarity between the entities. The invention also relates to a similar method incorporating determining an average value of the computed correlation coefficients, the average value providing a measure of the consistency.
Abstract:
A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
Abstract:
A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and one or more elements to control and/or compensate for evaporation of liquid from the substrate.
Abstract:
A method for characterizing the similarity between measurements on a plurality of entities comprising a first entity and a second entity comprises receiving measurements taken at a plurality of measurement points per entity. A model is defined comprising a stochastic process and a model function having values which depend on a set of parameters and the measurement points. A set (β) of parameters is estimated by fitting the model function to the measurements. Residual data is determined for at least a part of the plurality of measurement points for the first entity and the second entity by subtracting the fitted function from the measurements. A correlation coefficient for the first entity (i′) and the second entity (i″) is estimated based on the determined residual data and the estimated correlation coefficient is used to characterize the similarity between the measurements. The model is defined such that the residual data is expected to have a deterministic component which depends on the measurement points and that dominates the estimate of the correlation coefficient. The correlation coefficient is estimated using an estimate for the entity average residue averaged over the measurement points of the first entity and using an estimate for the entity average residue averaged over the measurement points of the second entity.