公开(公告)号：US20120091099A1

公开(公告)日：2012-04-19

申请号：US13238721

申请日：2011-09-21

Applicant: MICHAEL KIEFER ,  ANDREAS NEUBER ,  DENIS DAVID ,  DANIEL O. CLARK ,  PHIL CHANDLER

Inventor： MICHAEL KIEFER ,  ANDREAS NEUBER ,  DENIS DAVID ,  DANIEL O. CLARK ,  PHIL CHANDLER

IPC: C23F1/00 ,  B08B3/08 ,  B08B7/00 ,  C23F1/08

CPC classification number: H01L21/67017

Abstract: Methods and apparatus for recovery and reuse of reagents are provided herein. In some embodiments, a system for processing substrates may include a process chamber for processing a substrate; a reagent source coupled to the process chamber to provide a reagent to the process chamber; and a reagent recovery system to collect, and at least one of purify or concentrate the reagent recovered from an effluent exhausted from the process chamber. In some embodiments, a method for recovering unreacted reagent may include providing reagent from a reagent source to a process chamber; exposing a substrate disposed in the process chamber to the reagent, forming an effluent; exhausting the effluent from the process chamber; and recovering unreacted reagent from the effluent in a reagent recovery system.

Abstract translation: 本文提供了试剂的回收和再利用的方法和设备。 在一些实施例中，用于处理衬底的系统可以包括用于处理衬底的处理室; 耦合到处理室以向处理室提供试剂的试剂源; 以及试剂回收系统，用于收集从所述处理室排出的流出物中回收的试剂的净化或浓缩中的至少一种。 在一些实施方案中，用于回收未反应试剂的方法可包括将试剂从试剂源提供至处理室; 将设置在处理室中的衬底暴露于试剂，形成流出物; 从处理室排出污水; 以及在试剂回收系统中从流出物中回收未反应的试剂。

公开(公告)号：US20090246105A1

公开(公告)日：2009-10-01

申请号：US12410435

申请日：2009-03-24

Applicant: Daniel O. Clark ,  Phil Chandler ,  Jay J. Jung

Inventor： Daniel O. Clark ,  Phil Chandler ,  Jay J. Jung

IPC: B01D53/74 ,  B01D53/54 ,  B01D53/66 ,  F15C1/00

CPC classification number: H01L21/67017 ,  B01D53/38 ,  B01D53/74 ,  C23C14/56 ,  C23C16/4412 ,  Y10T137/0318 ,  Y10T137/0419

Abstract: A method for operating an electronic device manufacturing system is provided, including: introducing an inert gas into a process tool vacuum pump at a first flow rate while the process tool is operating in a process mode; and introducing the inert gas into the process tool vacuum pump at a second flow rate while the process tool is operating in a clean mode. Numerous other embodiments are provided.

Abstract translation: 提供了一种操作电子装置制造系统的方法，包括：在处理工具以工艺模式操作时，以惰性气体以第一流量引入惰性气体; 并且在处理工具以清洁模式操作时，以第二流量将惰性气体引入过程工具真空泵。 提供了许多其他实施例。

公开(公告)号：US20090216061A1

公开(公告)日：2009-08-27

申请号：US12365886

申请日：2009-02-04

Applicant: Daniel O. Clark ,  Mehran Moalem ,  Robbert M. Vermeulen ,  Phil Chandler

Inventor： Daniel O. Clark ,  Mehran Moalem ,  Robbert M. Vermeulen ,  Phil Chandler

IPC: A62D3/30 ,  B01J19/00

CPC classification number: B01D53/005 ,  B01D53/40 ,  B01D2257/108 ,  B01D2258/0216

Abstract: A system for treating flammable effluent gas is provided. The system includes an exhaust conduit to carry the flammable effluent gas to an abatement unit, a control system coupled to the abatement unit to determine an operating parameter of the abatement unit, a bypass valve coupled to the exhaust conduit which is an operative responsive to the monitoring system, and a source of second gas to be mixed with the effluent gas diverted from the abatement unit when the bypass valve is operating in a bypass mode to provide a mixed gas having a flammability lower than the effluent gas. Methods of the invention as well as numerous other aspects are provided.

Abstract translation: 提供了一种处理易燃废气的系统。 该系统包括用于将可燃性流出气体运送到减排单元的排气管道，耦合到减排单元以确定减排单元的操作参数的控制系统;联接到排气管道的旁通阀，该旁通阀是响应于 监测系统，以及当旁通阀以旁通模式操作时与从减排单元转移的废气混合的第二气体源，以提供具有低于废气的可燃性的混合气体。 提供了本发明的方法以及许多其它方面。

公开(公告)号：US20080289167A1

公开(公告)日：2008-11-27

申请号：US12126922

申请日：2008-05-25

Applicant: Phil Chandler ,  Daniel O. Clark ,  Robbert M. Vermeulen ,  Jay J. Jung ,  Roger M. Johnson ,  Youssef A. Loldj ,  James L. Smith

Inventor： Phil Chandler ,  Daniel O. Clark ,  Robbert M. Vermeulen ,  Jay J. Jung ,  Roger M. Johnson ,  Youssef A. Loldj ,  James L. Smith

IPC: B23P11/00

CPC classification number: G05B19/4184 ,  G05B2219/31386 ,  G05B2219/45026 ,  Y02P90/04 ,  Y02P90/14 ,  Y10T29/49826 ,  Y10T29/53048

Abstract: A method for operating one or more electronic device manufacturing systems is provided, including the steps 1) performing a series of electronic device manufacturing process steps with a process tool, wherein the process tool produces effluent as a byproduct of performing the series of process steps; 2) abating the effluent with an abatement tool; 3) supplying an abatement resource to the abatement tool from a first abatement resource supply; 4) changing an abatement resource supply from the first abatement resource supply to a second abatement resource supply, wherein changing the abatement resource supply comprises: i) interrupting a flow of the abatement resource from the first abatement resource supply; and ii) beginning a flow of the abatement resource from the second abatement resource supply; and 5) continuing to perform the series of process steps with the process tool, while changing, and after changing, the abatement resource supply.

Abstract translation: 提供了一种用于操作一个或多个电子设备制造系统的方法，包括以下步骤：1）使用工艺工具执行一系列电子设备制造工艺步骤，其中所述工艺工具产生流出物作为执行所述一系列工艺步骤的副产品; 2）用减排工具减轻废水; 3）从第一减排资源提供给减排工具的减排资源; 4）将减排资源供应从第一减排资源供应改为第二减排资源供应，其中改变减排资源供应包括：i）中断来自第一减排资源供应的减排资源的流动; 和ii）从第二减排资源供应开始减排资源的流动; 5）在改变和改变减排资源供应的同时，继续与流程工具一起执行一系列流程步骤。

公开(公告)号：US08455368B2

公开(公告)日：2013-06-04

申请号：US12126922

申请日：2008-05-25

Applicant: Phil Chandler ,  Daniel O. Clark ,  Robbert M. Vermeulen ,  Jay J. Jung ,  Roger M. Johnson ,  Youssef A. Loldj ,  James L. Smith

Inventor： Phil Chandler ,  Daniel O. Clark ,  Robbert M. Vermeulen ,  Jay J. Jung ,  Roger M. Johnson ,  Youssef A. Loldj ,  James L. Smith

IPC: H01L21/00

CPC classification number: G05B19/4184 ,  G05B2219/31386 ,  G05B2219/45026 ,  Y02P90/04 ,  Y02P90/14 ,  Y10T29/49826 ,  Y10T29/53048

Abstract: A method for operating one or more electronic device manufacturing systems is provided, including the steps 1) performing a series of electronic device manufacturing process steps with a process tool, wherein the process tool produces effluent as a byproduct of performing the series of process steps; 2) abating the effluent with an abatement tool; 3) supplying an abatement resource to the abatement tool from a first abatement resource supply; 4) changing an abatement resource supply from the first abatement resource supply to a second abatement resource supply, wherein changing the abatement resource supply comprises: i) interrupting a flow of the abatement resource from the first abatement resource supply; and ii) beginning a flow of the abatement resource from the second abatement resource supply; and 5) continuing to perform the series of process steps with the process tool, while changing, and after changing, the abatement resource supply.

Abstract translation: 提供了一种用于操作一个或多个电子设备制造系统的方法，包括以下步骤：1）使用工艺工具执行一系列电子设备制造工艺步骤，其中所述工艺工具产生流出物作为执行所述一系列工艺步骤的副产品; 2）用减排工具减轻废水; 3）从第一减排资源提供给减排工具的减排资源; 4）将减排资源供应从第一减排资源供应改为第二减排资源供应，其中改变减排资源供应包括：i）中断来自第一减排资源供应的减排资源的流动; 和ii）从第二减排资源供应开始减排资源的流动; 5）在改变和改变减排资源供应的同时，继续与流程工具一起执行一系列流程步骤。

公开(公告)号：US20100192773A1

公开(公告)日：2010-08-05

申请号：US12696808

申请日：2010-01-29

Applicant: Daniel O. Clark ,  Colin John Dickinson ,  Jay J. Jung ,  Daniel Stephan Brown ,  Mehran Moalem ,  Frank F. Hooshdaran ,  Morteza Farnia ,  Barry Page ,  Gary Sypherd ,  Jonathan Dahm ,  Phil Chandler

Inventor： Daniel O. Clark ,  Colin John Dickinson ,  Jay J. Jung ,  Daniel Stephan Brown ,  Mehran Moalem ,  Frank F. Hooshdaran ,  Morteza Farnia ,  Barry Page ,  Gary Sypherd ,  Jonathan Dahm ,  Phil Chandler

IPC: B01D47/14 ,  B01D47/12 ,  B01D47/10 ,  B03C3/34

CPC classification number: B01D47/027 ,  B01D47/06 ,  B01D53/185 ,  B01D53/40 ,  B01D53/78 ,  B01D2251/604 ,  B01D2251/80 ,  B01D2258/0216

Abstract: Embodiments of an abatement apparatus are disclosed herein. In some embodiments, an abatement apparatus may include a scrubber configured to receive an effluent stream from a process chamber and further configured to remove first particles from the effluent stream; a scrubber conduit coupled to the scrubber to receive the effluent stream therefrom and configured to remove second particles from the effluent stream, the scrubber conduit having one or more inlets configured to provide a fluid to sufficiently wet an interior surface of the scrubber conduit to trap the second particles thereon and to wash the second particles therealong; and a central scrubber coupled to the scrubber via the scrubber conduit. In some embodiments, the scrubber conduit is downward sloping from the scrubber to the central scrubber. In some embodiments, a plurality of scrubbers may be coupled to the central scrubber via a plurality of scrubber conduits.

Abstract translation: 减轻装置的实施例在此公开。 在一些实施例中，减排装置可以包括洗涤器，其构造成从处理室接收流出物流，并进一步构造成从排出物流中除去第一颗粒; 洗涤器管道，其耦合到洗涤器以接收来自其的流出物流，并被配置为从流出物流中除去第二颗粒，洗涤器管道具有一个或多个入口，其配置成提供流体以充分地润湿洗涤器管道的内表面， 第二颗粒在其上并在其上洗涤第二颗粒; 以及通过洗涤器管道耦合到洗涤器的中央洗涤器。 在一些实施例中，洗涤器导管从洗涤器向下倾斜到中央洗涤器。 在一些实施例中，多个洗涤器可以经由多个洗涤器管道耦合到中央洗涤器。

公开(公告)号：US20100143222A1

公开(公告)日：2010-06-10

申请号：US12613886

申请日：2009-11-06

Applicant: Phil Chandler ,  Shaun W. Crawford

Inventor： Phil Chandler ,  Shaun W. Crawford

IPC: B01D53/86 ,  F01N3/24

CPC classification number: F01N5/02 ,  F01N3/02 ,  F01N3/24 ,  F01N2240/02 ,  F01N2240/22 ,  F23G7/065 ,  F23J15/06 ,  Y02T10/16 ,  Y02T10/20

Abstract: Exhaust condensate removal apparatuses for abatement systems and methods of removing exhaust condensate from abatement systems are described. An exhaust condensate removal apparatus includes a cabinet exhaust and a process gas exhaust, the process exhaust openly cross-exchanged with the cabinet exhaust. Another exhaust condensate removal apparatus includes a cabinet exhaust and a process gas exhaust, the process exhaust closedly cross-exchanged with the cabinet exhaust.

Abstract translation: 描述用于减排系统的排气冷凝物去除装置和从减排系统中除去排出冷凝物的方法。 排气冷凝物去除装置包括机柜排气和工艺气体排气，工艺废气与柜体排气口交叉交换。 另一种排气冷凝物去除装置包括机柜排气和工艺气体排气，工艺废气与机柜排气口完全交换。