公开(公告)号：US20110260391A1

公开(公告)日：2011-10-27

申请号：US13079662

申请日：2011-04-04

申请人： Shinya SUGIMOTO

发明人： Shinya SUGIMOTO

IPC分类号： B65H7/20 ,  B65H7/02 ,  B65H9/00 ,  B65H1/00

CPC分类号： B65H7/02 ,  B65H1/14 ,  B65H2220/02 ,  B65H2511/417 ,  B65H2511/51 ,  B65H2511/515 ,  B65H2513/53 ,  B65H2551/20 ,  B65H2801/06 ,  B65H2220/01 ,  B65H2220/03

摘要： According to one embodiment, an error detection device including a sensor which detects a state where an object has moved to a predetermined position, a drive device which drives the object to a predetermined position, and an error determination device which reports that a predetermined process is to be performed with respect to the target, if the sensor detects a state where the target does not move to the predetermined position within a predetermined time from if the drive device starts driving.

摘要翻译： 根据一个实施例，一种错误检测装置，包括检测物体移动到预定位置的状态的传感器，将目标驱动到预定位置的驱动装置，以及报告预定处理的错误判定装置 如果传感器在从驱动装置开始驱动的预定时间内检测到目标物不移动到预定位置的状态，则执行该目标。

公开(公告)号：US07571991B2

公开(公告)日：2009-08-11

申请号：US11520818

申请日：2006-09-14

申请人： Shinya Sugimoto

发明人： Shinya Sugimoto

IPC分类号： B41J2/045

CPC分类号： B41J2/1606 ,  B41J2/161 ,  B41J2/1626 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2/1646

摘要： The liquid ejection head includes: a first SOI substrate which has a first active layer, a first dielectric layer and a first supporting layer; a second SOI substrate which has a second active layer, a second dielectric layer and a second supporting layer, the second active layer being bonded to the first supporting layer; and a nozzle which is formed between the first supporting layer and the second dielectric layer, the nozzle ejecting liquid in an ejection direction perpendicular to a thickness direction of the first SOI substrate and the second SOI substrate, a cross-sectional width of the nozzle perpendicular to the ejection direction being defined by a thickness of the second active layer.

摘要翻译： 液体喷射头包括：具有第一有源层，第一介电层和第一支撑层的第一SOI衬底; 具有第二有源层，第二介电层和第二支撑层的第二SOI衬底，所述第二有源层被结合到所述第一支撑层; 以及形成在所述第一支撑层和所述第二电介质层之间的喷嘴，所述喷嘴喷射液体在垂直于所述第一SOI衬底和所述第二SOI衬底的厚度方向的喷射方向上，所述喷嘴的横截面宽度垂直 喷射方向由第二活性层的厚度限定。

公开(公告)号：US20090067908A1

公开(公告)日：2009-03-12

申请号：US12207439

申请日：2008-09-09

申请人： Masataka MURATANI ,  Kazumasa Yasui ,  Kenichiro Shishikura ,  Shinya Sugimoto

发明人： Masataka MURATANI ,  Kazumasa Yasui ,  Kenichiro Shishikura ,  Shinya Sugimoto

IPC分类号： G03G15/00

CPC分类号： G03G15/6552 ,  G03G15/234 ,  G03G15/6579 ,  G03G2215/00434 ,  G03G2221/1672

摘要： According to an aspect of the invention, an image forming apparatus includes, an image forming section which forms an image on a sheet-like recording medium, a conveying path through which the recording medium passes, a conveying section which conveys the recording medium along the path in a conveying direction and has a reverse conveying portion which reversely conveys the recording medium in a direction opposite to the conveying direction, a main body, a first medium holding section which is disposed on the main body to hold the recording medium discharged from a first discharge port, a second medium holding section which holds the recording medium discharged from a second discharge port disposed above the first discharge port of the main body, and a third medium holding section which is disposed below the second medium holding section to hold the recording medium reversely conveyed by the conveying section.

摘要翻译： 根据本发明的一个方面，一种图像形成装置包括：在片状记录介质上形成图像的图像形成部，记录介质通过的输送路径，沿着该记录介质传送记录介质的传送部 具有沿与输送方向相反的方向反向输送记录介质的反转输送部，主体，设置在主体上的第一介质保持部，用于保持记录介质从输送方向排出的记录介质 第一排出口，第二介质保持部，其保持从设置在主体的第一排出口上方的第二排出口排出的记录介质;以及第三介质保持部，其设置在第二介质保持部下方以保持记录 介质由输送部反向输送。

公开(公告)号：US10442195B2

公开(公告)日：2019-10-15

申请号：US15630590

申请日：2017-06-22

申请人： Yoshikazu Hishinuma ,  Shinya Sugimoto ,  Youming Li ,  Christoph Menzel ,  Mats G. Ottoson ,  Darren Imai

发明人： Yoshikazu Hishinuma ,  Shinya Sugimoto ,  Youming Li ,  Christoph Menzel ,  Mats G. Ottoson ,  Darren Imai

IPC分类号： B41J2/14 ,  B41J2/145 ,  B41J2/16 ,  H01L41/312 ,  H01L41/047 ,  H01L41/293 ,  H01L41/297

摘要： A piezoelectric device and method of manufacturing the same and an inkjet head are described. In one embodiment, the inkjet print head comprises a plurality of jets, wherein each of the plurality of jets comprises a nozzle, a pressure chamber connected with the nozzle, a piezoelectric body coupled to the pressure chamber, and an electrode coupled to the piezoelectric body to cause displacement of the piezoelectric body to apply pressure to the pressure chamber in response to a voltage applied to the electrode; and wherein electrodes of two or more of the plurality of jets have different sizes to cause their associated piezoelectric bodies to have a uniform displacement amount when the voltage is applied to the electrodes.

公开(公告)号：US20180370234A1

公开(公告)日：2018-12-27

申请号：US15630590

申请日：2017-06-22

申请人： Yoshikazu Hishinuma ,  Shinya Sugimoto ,  Youming Li ,  Christoph Menzel ,  Mats G. Ottoson ,  Darren Imai

发明人： Yoshikazu Hishinuma ,  Shinya Sugimoto ,  Youming Li ,  Christoph Menzel ,  Mats G. Ottoson ,  Darren Imai

IPC分类号： B41J2/14 ,  B41J2/145 ,  B41J2/16 ,  H01L41/047 ,  H01L41/293 ,  H01L41/297 ,  H01L41/312

CPC分类号： B41J2/14201 ,  B41J2/14233 ,  B41J2/145 ,  B41J2/1607 ,  B41J2/161 ,  B41J2/1628 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2002/14266 ,  B41J2002/14459 ,  B41J2002/14491 ,  H01L41/047 ,  H01L41/0472 ,  H01L41/29 ,  H01L41/293 ,  H01L41/297 ,  H01L41/312

摘要： A piezoelectric device and method of manufacturing the same and an inkjet head are described. In one embodiment, the inkjet print head comprises a plurality of jets, wherein each of the plurality of jets comprises a nozzle, a pressure chamber connected with the nozzle, a piezoelectric body coupled to the pressure chamber, and an electrode coupled to the piezoelectric body to cause displacement of the piezoelectric body to apply pressure to the pressure chamber in response to a voltage applied to the electrode; and wherein electrodes of two or more of the plurality of jets have different sizes to cause their associated piezoelectric bodies to have a uniform displacement amount when the voltage is applied to the electrodes.

公开(公告)号：US20130051530A1

公开(公告)日：2013-02-28

申请号：US13221540

申请日：2011-08-30

申请人： Mark Nepomnishy ,  Shinya Sugimoto ,  Yasuhisa Kaneko

发明人： Mark Nepomnishy ,  Shinya Sugimoto ,  Yasuhisa Kaneko

IPC分类号： G21K1/06

CPC分类号： G21K1/06 ,  G21K1/025 ,  G21K2201/067

摘要： Semiconductor substrates with high aspect ratio recesses formed therein are described. The high aspect ratio recesses have bottom surface profile characteristics that promote formation of initial growth sites of plated metal as compared to the side surfaces of the recesses. Processes for making and plating the recesses are also disclosed. The metal-plated high aspect ratio recesses can be used as X-ray gratings in Phase Contrast X-ray imaging apparatuses.

公开(公告)号：US06795664B2

公开(公告)日：2004-09-21

申请号：US10423906

申请日：2003-04-28

申请人： Shinya Sugimoto

发明人： Shinya Sugimoto

IPC分类号： G03G1500

CPC分类号： G06K15/021 ,  G03G15/6594 ,  G03G2215/00523

摘要： A method for printing a tab heading on a tab portion of a paper including displaying an initial menu on an operation panel, allowing pressing of a tab button on a second menu, allowing pressing of a tab-layout button on a third menu, allowing input of contents of the tab heading on the fourth menu, allowing setting of a tab-size and a number of tabs on a fifth menu, and printing the tab heading on the tab portion of the paper based on the layout of the tab heading, the contents of the tab heading, the tab size, and the number of tabs.

摘要翻译： 一种用于在纸张的标签部分上打印标签标题的方法，包括在操作面板上显示初始菜单，允许按压第二菜单上的标签按钮，允许按压第三菜单上的标签布局按钮，允许输入 在第四菜单上的标签标题的内容，允许在第五菜单上设置标签尺寸和多个标签，并且基于标签标题的布局在纸张的标签部分上打印标签标题， 标签标题的内容，标签大小和选项卡数量。

公开(公告)号：US08969105B2

公开(公告)日：2015-03-03

申请号：US13810696

申请日：2011-07-22

申请人： Paul A. Hoisington ,  Jeffrey Birkmeyer ,  Andreas Bibl ,  Mats G. Ottosson ,  Gregory De Brabander ,  Zhenfang Chen ,  Mark Nepomnishy ,  Shinya Sugimoto

发明人： Paul A. Hoisington ,  Jeffrey Birkmeyer ,  Andreas Bibl ,  Mats G. Ottosson ,  Gregory De Brabander ,  Zhenfang Chen ,  Mark Nepomnishy ,  Shinya Sugimoto

IPC分类号： H01L21/00 ,  H01L41/22 ,  B41J2/14 ,  B41J2/16 ,  H01L41/09 ,  H01L41/316 ,  H01L41/33

CPC分类号： H01L41/332 ,  B41J2/14233 ,  B41J2/1607 ,  B41J2/161 ,  B41J2/1626 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2002/14241 ,  H01L41/098 ,  H01L41/22 ,  H01L41/316 ,  H01L41/33

摘要： Processes for forming an actuator having a curved piezoelectric membrane are disclosed. The processes utilize a profile-transferring substrate having a curved surface surrounded by a planar surface to form the curved piezoelectric membrane. The piezoelectric material used for the piezoelectric actuator is deposited on at least the curved surface of the profile-transferring substrate before the profile-transferring substrate is removed from the underside of the curved piezoelectric membrane. The resulting curved piezoelectric membrane includes grain structures that are columnar and aligned, and all or substantially all of the columnar grains are locally perpendicular to the curved surface of the piezoelectric membrane.

摘要翻译： 公开了一种用于形成具有弯曲压电膜的致动器的工艺。 该工艺利用具有由平面表面包围的弯曲表面的轮廓转印衬底以形成弯曲的压电膜。 用于压电致动器的压电材料沉积在轮廓转移衬底的至少曲面上，然后从曲面压电膜的下侧移除轮廓转移衬底。 所形成的弯曲压电膜包括柱状和对准的晶粒结构，并且所有或基本上所有的柱状晶粒局部垂直于压电膜的弯曲表面。

公开(公告)号：US20130210175A1

公开(公告)日：2013-08-15

申请号：US13810696

申请日：2011-07-22

申请人： Paul A. Hoisington ,  Jeffrey Birkmeyer ,  Andreas Bibl ,  Mats G. Ottosson ,  Gregory De Brabander ,  Zhenfang Chen ,  Mark Nepomnishy ,  Shinya Sugimoto

发明人： Paul A. Hoisington ,  Jeffrey Birkmeyer ,  Andreas Bibl ,  Mats G. Ottosson ,  Gregory De Brabander ,  Zhenfang Chen ,  Mark Nepomnishy ,  Shinya Sugimoto

IPC分类号： H01L41/22

CPC分类号： H01L41/332 ,  B41J2/14233 ,  B41J2/1607 ,  B41J2/161 ,  B41J2/1626 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1632 ,  B41J2/1642 ,  B41J2/1646 ,  B41J2002/14241 ,  H01L41/098 ,  H01L41/22 ,  H01L41/316 ,  H01L41/33

摘要： Processes for forming an actuator having a curved piezoelectric membrane are disclosed. The processes utilize a profile-transferring substrate having a curved surface surrounded by a planar surface to form the curved piezoelectric membrane. The piezoelectric material used for the piezoelectric actuator is deposited on at least the curved surface of the profile-transferring substrate before the profile-transferring substrate is removed from the underside of the curved piezoelectric membrane. The resulting curved piezoelectric membrane includes grain structures that are columnar and aligned, and all or substantially all of the columnar grains are locally perpendicular to the curved surface of the piezoelectric membrane.

公开(公告)号：US20080073319A1

公开(公告)日：2008-03-27

申请号：US11902907

申请日：2007-09-26

申请人： Shinya Sugimoto

发明人： Shinya Sugimoto

IPC分类号： G11B5/127

CPC分类号： B41J2/161 ,  B41J2/1628 ,  B41J2/1629 ,  B41J2/1631 ,  B41J2/1642 ,  B41J2/1643 ,  B41J2/1645 ,  B41J2/1646

摘要： A method of manufacturing a liquid ejection head in which a pressure chamber for storing an ejection liquid is connected with an ink supply channel through a restrictor, includes the steps of: forming first spaces for the liquid supply channel and the pressure chamber in a silicon substrate by performing anisotropic etching on a surface of the silicon substrate, the surface of the silicon substrate being parallel to a Si(110) plane, each of the first spaces being defined by two vertical walls and two inclined walls, each of the two vertical walls being parallel to a Si(111) plane that is perpendicular to the surface of the silicon substrate, each of the two inclined walls being parallel to a Si(111) plane that is inclined with respect to the surface of the silicon substrate; then forming an etching protection film on the silicon substrate, the etching protection film protecting the silicon substrate from being etched; then forming an opening corresponding to a second space for the restrictor in the etching protection film; and then performing anisotropic etching on the surface of the silicon substrate through the opening of the etching protection film to form the second space in the silicon substrate, the second space for the restrictor being defined by two inclined walls each of which is parallel to the Si(111) plane that is inclined with respect to the surface of the silicon substrate, the second space connecting the first spaces for the liquid supply channel and the pressure chamber with each other.

摘要翻译： 一种制造液体喷射头的方法，其中用于存储喷射液体的压力室通过限流器与供墨通道连接，包括以下步骤：在硅衬底中形成液体供应​​通道和压力室的第一空间 通过在硅衬底的表面上进行各向异性蚀刻，硅衬底的表面平行于Si（110）面，每个第一空间由两个垂直壁和两个倾斜壁限定，两个垂直壁 平行于与硅衬底的表面垂直的Si（111）平面，两个倾斜壁中的每一个平行于相对于硅衬底的表面倾斜的Si（111）平面; 然后在硅衬底上形成蚀刻保护膜，保护硅衬底的蚀刻保护膜被蚀刻; 然后形成与蚀刻保护膜中的限制器的第二空间对应的开口; 然后通过蚀刻保护膜的开口在硅衬底的表面上进行各向异性蚀刻，以在硅衬底中形成第二空间，限制器的第二空间由两个平行于Si的倾斜壁限定 （111）面，其相对于所述硅基板的表面倾斜，所述第二空间将所述液体供给路径的第一空间与所述压力室连接。