Image processing apparatus, image processing method, and recording medium

    公开(公告)号:US12141936B2

    公开(公告)日:2024-11-12

    申请号:US17825781

    申请日:2022-05-26

    Applicant: Socionext Inc.

    Inventor: Kazuyuki Ohhashi

    Abstract: An image processing apparatus is disclosed. The image processing apparatus includes a processor connected to a memory. The processor functions as a deformation unit. The deformation unit serves to deform a reference projection screen that is a projection screen of a surrounding image of a moving object. The reference projection screen is deformed by using position information in which detection points around the moving object are accumulated and using self-location information of the moving object.

    Semiconductor device
    14.
    发明授权

    公开(公告)号:US12119301B2

    公开(公告)日:2024-10-15

    申请号:US17716299

    申请日:2022-04-08

    Applicant: Socionext Inc.

    CPC classification number: H01L23/528 H01L23/5226

    Abstract: A semiconductor device includes a chip that includes a substrate and a first interconnection layer on a surface of the substrate; and a second interconnection layer on another surface opposite to the surface of the substrate. The second interconnection layer includes a first power line having a first power potential, a second power line having a second power potential, and a switch between the first power line and the second power line. The chip includes a first grounding line, a third power line having the second power potential, a first region having the first grounding line and the third power line, a second grounding line, a fourth power line having the first power potential, and a second region having the second grounding line and the fourth power line. In plan view, the switch is between the first region and the second region.

    SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    15.
    发明公开

    公开(公告)号:US20240332304A1

    公开(公告)日:2024-10-03

    申请号:US18738947

    申请日:2024-06-10

    Applicant: Socionext Inc.

    CPC classification number: H01L27/11807 H01L2027/11881

    Abstract: First and second semiconductor chips are stacked one upon the other with the back face of the first semiconductor chip opposed to the principal face of the second semiconductor chip. The first semiconductor chip includes: first and second power lines formed in a buried interconnect layer, extending in the X direction, and adjoining each other in the Y direction; first and second contacts provided between the first and second power lines and the chip back face; and a third contact provided between a signal line and the chip back face. The third contact is located between the first and second power lines in the Y direction, and at a position different from the positions of the first and second contacts in the X direction, in planar view.

    Semiconductor device
    16.
    发明授权

    公开(公告)号:US12087735B2

    公开(公告)日:2024-09-10

    申请号:US17210743

    申请日:2021-03-24

    Applicant: SOCIONEXT INC.

    Abstract: A semiconductor device includes a first semiconductor chip, and a second semiconductor chip, wherein the first semiconductor chip includes a substrate including a first principal surface facing the second semiconductor chip and a second principal surface opposite to the first principal surface, a first power supply line and a second power supply line arranged on the second principal surface of the substrate, a power supply switch circuit arranged electrically between the first power supply line and the second power supply line, a first via arranged in the substrate to extend from the first power supply line to the first principal surface, and a second via arranged in the substrate to extend from the second power supply line to the first principal surface, wherein the second semiconductor chip includes a third power supply line connected to the first via, and a fourth power supply line connected to the second via.

    SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    18.
    发明公开

    公开(公告)号:US20240290715A1

    公开(公告)日:2024-08-29

    申请号:US18399335

    申请日:2023-12-28

    Applicant: Socionext Inc.

    Inventor: Yasuhiko MAKI

    Abstract: In a semiconductor integrated circuit device, a first semiconductor chip includes: a buried power rail that supplies first power; and a power line that is provided in a layer above the buried power rail and supplies second power. The buried power rail receives supply of the first power from the back face of the first semiconductor chip via a first through electrode, and the power line receives supply of the second power from the back face of the first semiconductor chip via a second through electrode. The cross-sectional area of the second through electrode is greater than the cross-sectional area of the first through electrode.

    SEMICONDUCTOR DEVICE
    20.
    发明公开

    公开(公告)号:US20240274536A1

    公开(公告)日:2024-08-15

    申请号:US18432890

    申请日:2024-02-05

    Applicant: SOCIONEXT INC.

    CPC classification number: H01L23/5286 H01L27/0922 H01L27/0924

    Abstract: A semiconductor device includes: a substrate; a circuit region provided on the substrate; a first power supply line and a second power supply line, positioned in the circuit region; a first fin and a second fin, each extending in a first direction in the circuit region, in plan view, and protruding from the substrate; a first power supply switching circuit, positioned in the circuit region and including a first transistor formed with the first fin, the first circuit electrically connecting the first and second power supply lines, and the first fin extending in the first power supply switching circuit without cutting; and a second power supply switching circuit, positioned in the circuit region and including a second transistor formed with the second fin, the second circuit electrically connecting the first and second power supply lines, and including a fin-cut part in which the second fin is cut.

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