Abstract:
A system for growing a crystal ingot from a melt is provided. The system includes a first crucible, a barrier, and a shield. The first crucible has a first base and a first sidewall forming a first cavity for containing the melt. The barrier is disposed within the first cavity of the first crucible to inhibit movement of the melt from outward of the barrier to inward of the barrier. The barrier extends from the first base to above the melt. The barrier has an inner arm and an outer arm extending upward to form a channel therebetween. The shield extends downward between the inner arm and the outer arm to inhibit passage of contaminants.
Abstract:
A computing device is configured to execute a first instance of a single-threaded script engine in a first thread associated with a first execution context, wherein the first instance of the single-threaded script engine accesses at least one shared script object through a first reference counted script base value object. The computing device is also configured to concurrently execute a second instance of the single-threaded script engine in a second thread_associated with a second execution context, wherein the second instance of the single-threaded script engine accesses the at least one shared script object through a second reference counted script base value object. The script engine does not switch between the execution contexts.
Abstract:
An improved system based on the Czochralski process for continuous growth of a single crystal ingot comprises a low aspect ratio, large diameter, and substantially flat crucible, including an optional weir surrounding the crystal. The low aspect ratio crucible substantially eliminates convection currents and reduces oxygen content in a finished single crystal silicon ingot. A separate level controlled silicon pre-melting chamber provides a continuous source of molten silicon to the growth crucible advantageously eliminating the need for vertical travel and a crucible raising system during the crystal pulling process. A plurality of heaters beneath the crucible establish corresponding thermal zones across the melt. Thermal output of the heaters is individually controlled for providing an optimal thermal distribution across the melt and at the crystal/melt interface for improved crystal growth. Multiple crystal pulling chambers are provided for continuous processing and high throughput.
Abstract:
A photovoltaic (PV) module includes a laminate, a frame, a junction box, and an electronic assembly. The laminate includes a top surface, a bottom surface, and a plurality of PV cells disposed between the top surface and the bottom surface. The frame circumscribes at least a portion of the laminate. The junction box is attached adjacent to the bottom surface of the laminate and electrically coupled to the plurality of PV cells. The electronic assembly is attached adjacent to the bottom surface of the laminate and external of the junction box. The electronic assembly includes a bypass diode electrically coupled to at least one PV cell of the plurality of PV cells.
Abstract:
A method for scheduling cleaning of a photovoltaic (“PV”) system is implemented by a soiling monitoring computer system. The method includes determining a soiling level and a soiling rate for a photovoltaic (PV) system, calculating a cost associated with cleaning the PV system at each of a plurality of possible cleaning times, determining an expected energy output gain associated with cleaning the PV system at each of the plurality of possible times based on the soiling level and the soiling rate, calculating an expected benefit associated with cleaning the PV system at each of the plurality of possible cleaning times based on the expected energy output gain associated with each possible cleaning time, determining a first time of the plurality of possible times when the expected benefit exceeds the cost, and scheduling a cleaning time based on at least the determined first time.
Abstract:
Processes and systems for purifying silane-containing streams and, in particular, for purifying silane-containing streams that also contain ethylene are disclosed. The processes and systems may be arranged such that one or more ethylene reactors are downstream of light-end distillation operations.
Abstract:
Processes for suppressing minority carrier lifetime degradation in silicon wafers are disclosed. The processes involve quench cooling the wafers to increase the density of nano-precipitates in the silicon wafers and the rate at which interstitial atoms are consumed by the nano-precipitates.
Abstract:
Apparatus and processes for preparing heterostructures with reduced strain are disclosed. The heterostructures may include a semiconductor structure that conforms to a surface layer having a different crystal lattice constant than the structure to form a relatively low-defect heterostructure.
Abstract:
A system for growing a crystal ingot from a melt is provided. The system includes a crucible assembly, a first heater, a second heater, and a passive heater. The crucible assembly includes a crucible and a weir separating an outer melt zone of the melt from an inner melt zone of the melt. The first heater is configured to supply thermal energy to the melt by conduction through the crucible. The second heater is configured to generate thermal radiation. The passive heater is configured to supply thermal energy to the outer melt zone by transferring thermal radiation generated by the second heater to the outer melt zone.
Abstract:
A liner assembly for a substrate processing system includes a first liner and a second liner. The first liner includes an annular body and an outer peripheral surface including a first fluid guide. The first fluid guide is curved about a circumferential line extending around the first liner. The second liner includes an annular body, an outer rim, an inner rim, a second fluid guide extending between the outer rim and the inner rim, and a plurality of partition walls extending outwardly from the second fluid guide. The second fluid guide is curved about the circumferential line when the first and second liners are positioned within the processing system.