公开(公告)号：US08771916B2

公开(公告)日：2014-07-08

申请号：US13139074

申请日：2009-12-11

Applicant: Shuji Hirano ,  Kaoru Iwato ,  Hiroshi Saegusa ,  Yusuke Iizuka

Inventor： Shuji Hirano ,  Kaoru Iwato ,  Hiroshi Saegusa ,  Yusuke Iizuka

IPC: G03F7/075 ,  G03F7/20 ,  G03F7/30

CPC classification number: C07D307/93 ,  C07D407/12 ,  C07D493/08 ,  C07D493/18 ,  C07D495/18 ,  C08F24/00 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition, includes: (A) a resin capable of increasing the solubility of the resin (A) in an alkali developer by the action of an acid; and (C) a resin having at least either a fluorine atom or a silicon atom and containing (c) a repeating unit having at least two or more polarity conversion groups.

Abstract translation: 光化射线敏感或辐射敏感性树脂组合物包括：（A）能够通过酸的作用增加树脂（A）在碱性显影剂中的溶解度的树脂; 和（C）至少具有氟原子或硅原子的树脂，并含有（c）具有至少两个以上极性转换基团的重复单元。

公开(公告)号：US20130130178A1

公开(公告)日：2013-05-23

申请号：US13807623

申请日：2011-08-26

Applicant: Yusuke Iizuka ,  Akinori Shibuya

Inventor： Yusuke Iizuka ,  Akinori Shibuya

IPC: G03F7/004 ,  G03F7/20

CPC classification number: G03F7/004 ,  C08F12/20 ,  C08F12/22 ,  C08L25/18 ,  C09D133/062 ,  C09D133/16 ,  C09D143/04 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/20 ,  G03F7/2041

Abstract: Provided is an actinic-ray- or radiation-sensitive resin composition including a resin (B) containing at least either a fluorine atom or a silicon atom, the resin (B) containing any of repeating units of general formulae (I-1) and (I-2) below: Wherein each of R1s independently represents a hydrogen atom, an alkyl group or a halogen atom, X1 represents a bivalent organic group, X2 represents a single bond or a bivalent organic group, each of Ar1s independently represents a monovalent aromatic ring group, Ar2 represents a bivalent aromatic ring group, and each of L's independently represents a single bond or a bivalent organic group.

Abstract translation: 本发明提供包含含有至少含有氟原子或硅原子的树脂（B）的光化射线或辐射敏感性树脂组合物，所述树脂（B）含有通式（I-1）和 （I-2）：其中R1各自独立地表示氢原子，烷基或卤素原子，X1表示二价有机基团，X2表示单键或二价有机基团，Ar1各自独立地表示一价 芳环基团，Ar 2表示二价芳环基团，L 1各自独立地表示单键或二价有机基团。

公开(公告)号：US08252877B2

公开(公告)日：2012-08-28

申请号：US12635998

申请日：2009-12-11

Applicant: Shuji Hirano ,  Kaoru Iwato ,  Hiroshi Saegusa ,  Yusuke Iizuka

Inventor： Shuji Hirano ,  Kaoru Iwato ,  Hiroshi Saegusa ,  Yusuke Iizuka

IPC: C08F24/00

CPC classification number: C07D493/20 ,  C07D493/14 ,  C08F220/30

Abstract: Provided is a polymerizable compound represented by the following general formula (ca-1) or (cb-1): wherein the variables in the formulae are defined in the specification.

Abstract translation: 提供由以下通式（ca-1）或（cb-1）表示的可聚合化合物：其中式中的变量在说明书中定义。

公开(公告)号：US20120164573A1

公开(公告)日：2012-06-28

申请号：US13323179

申请日：2011-12-12

Applicant: Naohiro Tango ,  Yusuke Iizuka ,  Akinori Shibuya ,  Shuhei Yamaguchi ,  Shohei Kataoka

Inventor： Naohiro Tango ,  Yusuke Iizuka ,  Akinori Shibuya ,  Shuhei Yamaguchi ,  Shohei Kataoka

IPC: G03F7/20 ,  G03F7/027

CPC classification number: G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/2041

Abstract: An actinic-ray-sensitive or radiation-sensitive resin composition capable of forming a pattern having excellent critical dimension uniformity (CDU) in the line width, and a pattern forming method using the same are provided.The actinic-ray-sensitive or radiation-sensitive resin composition of the present invention includes (A) a resin containing a repeating unit having a specific lactone structure and a repeating unit having a specific monocyclic alicyclic structure, which increases a solubility in an alkaline developer by the action of an acid, and (B) a compound having a specific structure, which generates an acid upon irradiation with an actinic-ray or a radiation.

Abstract translation: 提供能够形成在线宽度上具有优异临界尺寸均匀性（CDU）的图案的光化射线敏感性或辐射敏感性树脂组合物和使用其的图案形成方法。 本发明的光化射线敏感性或辐射敏感性树脂组合物包括（A）含有具有特定内酯结构的重复单元的树脂和具有特定单环脂肪结构的重复单元，其增加了在碱性显影剂中的溶解度 通过酸的作用，和（B）具有特定结构的化合物，其在用光化射线或辐射照射时产生酸。

公开(公告)号：US20120076996A1

公开(公告)日：2012-03-29

申请号：US13246606

申请日：2011-09-27

Applicant: Kei YAMAMOTO ,  Yusuke IIZUKA ,  Akinori SHIBUYA ,  Shuhei YAMAGUCHI

Inventor： Kei YAMAMOTO ,  Yusuke IIZUKA ,  Akinori SHIBUYA ,  Shuhei YAMAGUCHI

IPC: G03F7/20 ,  B32B3/00 ,  G03F7/027

CPC classification number: G03F7/0392 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0048 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  Y10T428/24835

Abstract: Provided is a resist composition, including (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, the compound being any of those of general formulae (I) and (II) below, (C) a resin containing at least either a fluorine atom or a silicon atom, and (D) a mixed solvent containing a first solvent and a second solvent, at least either the first solvent or the second solvent exhibiting a normal boiling point of 200° C. or higher.

Abstract translation: 提供一种抗蚀剂组合物，其包含（A）当被酸作用时分解的树脂，从而增加其在碱性显影剂中的溶解度，（B）当暴露于光化射线或辐射时产生酸的化合物， 所述化合物为下述通式（I）和（II）中的任一种，（C）至少含有氟原子或硅原子的树脂，（D）含有第一溶剂和第二溶剂的混合溶剂 ，表现出200℃以上的标准沸点的第一溶剂或第二溶剂中的至少一种。

公开(公告)号：US20100152400A1

公开(公告)日：2010-06-17

申请号：US12636076

申请日：2009-12-11

Applicant: Yusuke IIZUKA ,  Kaoru IWATO ,  Hiroshi SAEGUSA ,  Shuji HIRANO

Inventor： Yusuke IIZUKA ,  Kaoru IWATO ,  Hiroshi SAEGUSA ,  Shuji HIRANO

IPC: C08G63/08 ,  C07D307/77

CPC classification number: C07D307/77 ,  C07D493/18 ,  C08F220/18 ,  C08F220/24 ,  C08F220/30 ,  C08F2220/1808

Abstract: A polymerizable compound having a lactone structure represented by formula (1) is provided: wherein A represents a polymerizable site; R2 represents a single bond or an alkylene group; R3 represents a hydrocarbon group in which hydrogen atoms are substituted with a fluorine atom; R4 represents a halogen atom, a cyano group, a hydroxy group, an amide group, an alkyl group, a cycloalkyl group, an alkoxy group, a phenyl group, an acyl group, an alkoxycarbonyl group, or a group represented by R—C(═O)— or R—C(═O)O—, wherein R represents an alkyl group or a cycloalkyl group; X represents an alkylene group, an oxygen atom or a sulfur atom; Z represents a single bond, an ether bond, an ester bond, an amide bond, a urethane bond or a urea bond; n represents an integer of from 0 to 5; and m represents an integer of from 0 to 7.

Abstract translation: 提供具有由式（1）表示的内酯结构的可聚合化合物：其中A表示可聚合位点; R2表示单键或亚烷基; R3表示氢原子被氟原子取代的烃基; R 4表示卤素原子，氰基，羟基，酰胺基，烷基，环烷基，烷氧基，苯基，酰基，烷氧基羰基或由R-C （= O） - 或R-C（= O）O-，其中R表示烷基或环烷基; X表示亚烷基，氧原子或硫原子; Z表示单键，醚键，酯键，酰胺键，氨基甲酸酯键或脲键; n表示0〜5的整数， m表示0〜7的整数。

公开(公告)号：US08846293B2

公开(公告)日：2014-09-30

申请号：US13431736

申请日：2012-03-27

Applicant: Yusuke Iizuka ,  Akinori Shibuya ,  Naohiro Tango ,  Shohei Kataoka

Inventor： Yusuke Iizuka ,  Akinori Shibuya ,  Naohiro Tango ,  Shohei Kataoka

IPC: G03F7/004 ,  G03F7/38 ,  G03F7/039 ,  G03F7/075 ,  G03F7/20

CPC classification number: G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

Abstract: The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains (A) a resin capable of increasing the solubility in an alkaline developer by the action of an acid, and (C) at least one selected from the group of compounds represented by the following formula (ZI-3), (ZI-4) or (ZI-5) and capable of generating an acid upon irradiation of actinic rays or radiation, wherein the resin (A) contains at least one repeating unit having a group capable of decomposing by the action of an acid to leave a leaving group having a ring structure, and the leaving group having a ring structure has at least one of a polar group as a substituent and a polar atom as a part of the ring structure, and a compound derived from the leaving group having a ring structure has a logP value of not less than 0 and less than 2.8.

Abstract translation: 本发明的光化射线敏感性或辐射敏感性树脂组合物含有（A）能够通过酸作用增加在碱性显影剂中的溶解性的树脂，（C）选自化合物组中的至少一种 由下式（ZI-3），（ZI-4）或（ZI-5）表示，并且能够在光化射线或辐射照射时产生酸，其中树脂（A）含有至少一个具有 能够通过酸的作用分解离开具有环结构的离去基团的基团，具有环结构的离去基团具有作为取代基的极性基团和作为环结构的一部分的极性原子中的至少一种 ，衍生自具有环结构的离去基团的化合物的logP值不小于0且小于2.8。

公开(公告)号：US08617788B2

公开(公告)日：2013-12-31

申请号：US13257403

申请日：2010-03-30

Applicant: Takayuki Kato ,  Hiroshi Saegusa ,  Kaoru Iwato ,  Shuji Hirano ,  Yusuke Iizuka ,  Shuhei Yamaguchi ,  Akinori Shibuya

Inventor： Takayuki Kato ,  Hiroshi Saegusa ,  Kaoru Iwato ,  Shuji Hirano ,  Yusuke Iizuka ,  Shuhei Yamaguchi ,  Akinori Shibuya

IPC: G03F7/00 ,  G03F7/004 ,  G03F7/028

CPC classification number: G03F7/0046 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition, wherein when a film having a film thickness of 100 nm is formed from the actinic ray-sensitive or radiation-sensitive resin composition, the film has a transmittance of 55 to 80% for light at a wavelength of 193 nm, and a pattern forming method using the composition are provided.

Abstract translation: 光化射线敏感或辐射敏感性树脂组合物，其中当由光化射线敏感或辐射敏感性树脂组合物形成膜厚度为100nm的膜时，该膜对于光线具有55至80％的透射率 在波长193nm下，提供使用该组合物的图案形成方法。

公开(公告)号：US20130004740A1

公开(公告)日：2013-01-03

申请号：US13537843

申请日：2012-06-29

Applicant: Shohei KATAOKA ,  Yusuke IIZUKA ,  Akinori SHIBUYA ,  Tomoki MATSUDA ,  Naohiro TANGO

Inventor： Shohei KATAOKA ,  Yusuke IIZUKA ,  Akinori SHIBUYA ,  Tomoki MATSUDA ,  Naohiro TANGO

IPC: G03F7/004 ,  B32B3/10 ,  G03F7/20

CPC classification number: G03F7/2041 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/11 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/128 ,  Y10T428/24802

Abstract: An actinic-ray-sensitive or radiation-sensitive resin composition which is capable of improving line edge roughness (LER) and inhibiting pattern collapse, a resist film and a pattern forming method each using the same, a method for preparing an electronic device, and an electronic device are provided.The actinic-ray-sensitive or radiation-sensitive resin composition contains: (A) a resin having repeating units having a structure represented by any one of the following general formulae (I-1) to (I-3), and repeating units containing at least one selected from the group consisting of a lactone structure, a sultone structure, and a cyano group; and (B) a compound that generates an acid by irradiation with actinic rays or radiations.

Abstract translation: 能够改善线边缘粗糙度（LER）并抑制图案塌陷的光化射线敏感性或辐射敏感性树脂组合物，抗蚀剂膜和各自使用它们的图案形成方法，制备电子器件的方法和 提供电子设备。 光化射线敏感性或辐射敏感性树脂组合物含有：（A）具有由以下通式（I-1）至（I-3）中任一个表示的结构的重复单元的树脂和含有 选自内酯结构，磺内酯结构和氰基中的至少一种; 和（B）通过用光化射线或辐射照射产生酸的化合物。

公开(公告)号：US20120251948A1

公开(公告)日：2012-10-04

申请号：US13431736

申请日：2012-03-27

Applicant: Yusuke IIZUKA ,  Akinori SHIBUYA ,  Naohiro TANGO ,  Shohei KATAOKA

Inventor： Yusuke IIZUKA ,  Akinori SHIBUYA ,  Naohiro TANGO ,  Shohei KATAOKA

IPC: G03F7/20 ,  G03F7/027

CPC classification number: G03F7/0046 ,  G03F7/0045 ,  G03F7/0397 ,  G03F7/0758 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

Abstract: The actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains (A) a resin capable of increasing the solubility in an alkaline developer by the action of an acid, and (C) at least one selected from the group of compounds represented by the following formula (ZI-3), (ZI-4) or (ZI-5) and capable of generating an acid upon irradiation of actinic rays or radiation, wherein the resin (A) contains at least one repeating unit having a group capable of decomposing by the action of an acid to leave a leaving group having a ring structure, and the leaving group having a ring structure has at least one of a polar group as a substituent and a polar atom as a part of the ring structure, and a compound derived from the leaving group having a ring structure has a log P value of not less than 0 and less than 2.8.

Abstract translation: 本发明的光化射线敏感性或辐射敏感性树脂组合物含有（A）能够通过酸作用增加在碱性显影剂中的溶解性的树脂，（C）选自化合物组中的至少一种 由下式（ZI-3），（ZI-4）或（ZI-5）表示，并且能够在光化射线或辐射照射时产生酸，其中树脂（A）含有至少一个具有 能够通过酸的作用分解离开具有环结构的离去基团的基团，具有环结构的离去基团具有作为取代基的极性基团和作为环结构的一部分的极性原子中的至少一种 ，并且衍生自具有环结构的离去基团的化合物的log P值不小于0且小于2.8。