公开(公告)号：US20230164900A1

公开(公告)日：2023-05-25

申请号：US18011593

申请日：2021-06-21

Applicant: ASML Netherlands B.V.

Inventor： Alexander Igorevich Ershov ,  Chirag Rajyaguru ,  Dietmar Uwe Herbert Trees ,  Joshua Mark Lukens ,  Theodorus Wilhelmus Driessen ,  Robert Jay Rafac ,  Georgiy Olegovich Vaschenko

IPC: H05G2/00

CPC classification number: H05G2/006 ,  H05G2/008 ,  G03F7/70033

Abstract: Apparatus for and method of accelerating droplets used to generate EUV radiation that comprise an arrangement producing a laser beam directed to an irradiation region and a droplet source. The droplet source includes a fluid exiting a nozzle in a stream that breaks up into droplets that then undergo coalescence. The droplets are then subjected to a stream of gas that entrains and accelerates the droplets.

公开(公告)号：US09693440B1

公开(公告)日：2017-06-27

申请号：US14975436

申请日：2015-12-18

Applicant: ASML Netherlands B.V.

Inventor： Alexander Igorevich Ershov

IPC: G01N23/00 ,  H05G2/00

CPC classification number: H05G2/008 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006

Abstract: A method and apparatus for controlling a dose of extreme ultraviolet (EUV) radiation generated by a laser produced plasma (LPP) EUV light source. In one embodiment, a running total of the EUV energy generated over a predetermined number of laser pulses is measured; once that number of pulses is exceeded, the energy from the pulse immediately preceding the most recent predetermined number of pulses is dropped from the running total, so that the running total is from the most recent predetermined number of pulses. If the running total of the EUV energy exceeds a target dose, the next pulse is caused to not hit a droplet. This avoids the unwanted side effects of various prior art solutions, such as needing to miss many droplets in a row, or requiring the laser pulses to be shortened or reduced in power as in other prior art solutions.

公开(公告)号：US12222050B2

公开(公告)日：2025-02-11

申请号：US18010312

申请日：2021-07-13

Applicant: ASML Netherlands B.V.

Inventor： Benjamin Andrew Sams ,  Dietmar Uwe Herbert Trees ,  Vikas Giridhar Telkar ,  Alexander Igorevich Ershov ,  Theodorus Wilhelmus Driessen ,  Serkan Kincal

IPC: F16L17/06 ,  F16L17/02 ,  H05G2/00

Abstract: A target material supply apparatus includes: first and second fluid flow components (1122, 1126) that define an axial flow path when joined together, in which the axial flow path is between a source of target material fluid and a nozzle supply apparatus; and a coupling apparatus configured to seal the joint between the first and second fluid flow components. The coupling apparatus includes a gasket (1105) having an annular shape defining an inner opening that is a part of the axial flow path when seated and sealed. When the gasket is seated between the first and second fluid flow components to thereby seal the joint formed by attaching the first and second fluid flow components, pressure applied to the gasket from target material fluid traversing the gasket inner opening along the axial flow path improves the hermetic function of the seal at the joint. Optionally, a functional insert like e.g. a flow restrictor (1160) can be seated in the gasket.

公开(公告)号：US11846887B2

公开(公告)日：2023-12-19

申请号：US17715641

申请日：2022-04-07

Applicant: ASML Netherlands B.V.

Inventor： Yue Ma ,  Antonius Theodorus Wilhelmus Kempen ,  Klaus Martin Hummler ,  Johannes Hubertus Josephina Moors ,  Jeroen Hubert Rommers ,  Hubertus Johannes Van De Wiel ,  Andrew David Laforge ,  Fernando Brizuela ,  Rob Carlo Wieggers ,  Umesh Prasad Gomes ,  Elena Nedanovska ,  Celal Korkmaz ,  Alexander Downn Kim ,  Rui Miguel Duarte Rodrigues Nunes ,  Hendrikus Alphonsus Ludovicus Van Dijck ,  William Peter Van Drent ,  Peter Gerardus Jonkers ,  Qiushi Zhu ,  Parham Yaghoobi ,  Jan Steven Christiaan Westerlaken ,  Martinus Hendrikus Antonius Leenders ,  Alexander Igorevich Ershov ,  Igor Vladimirovich Fomenkov ,  Fei Liu ,  Johannes Henricus Wilhelmus Jacobs ,  Alexey Sergeevich Kuznetsov

IPC: G03F7/00

CPC classification number: G03F7/70166 ,  G03F7/70033 ,  G03F7/70883 ,  G03F7/70916 ,  G03F7/70925

Abstract: Degradation of the reflectivity of one or more reflective optical elements in a system for generating EUV radiation is reduced by the controlled introduction of a gas into a vacuum chamber containing the optical element. The gas may be added to the flow of another gas such as hydrogen or alternated with the introduction of hydrogen radicals.

公开(公告)号：US20220295625A1

公开(公告)日：2022-09-15

申请号：US17637654

申请日：2020-09-04

Applicant: ASML Netherlands B.V.

Inventor： Georgiy Olegovich Vaschenko ,  Bob Rollinger ,  Joshua Mark Lukens ,  Alexander Igorevich Ershov ,  Yoshiho Amada

IPC: H05G2/00

Abstract: An apparatus includes: a tube; a body including: a first body wall and a second body wall; and a support structure including: a first support portion and a second support portion. The first body wall extends in a first direction, the second body wall extends in a second direction that is different than the first direction, a first portion of the tube passes through an opening in the second body wall the first support portion is configured to attach to the first body wall, and a second portion of the tube is configured to pass through the second support portion when the first support portion is attached to the first body wall. An interior of the tube and an interior of the body are configured to receive molten target material, and the target material emits extreme ultraviolet (EUV) light when in a plasma state.

公开(公告)号：US20210392733A1

公开(公告)日：2021-12-16

申请号：US17284060

申请日：2019-10-25

Applicant: ASML Netherlands B.V.

Inventor： Bob Rollinger ,  Georgiy Olegovich Vaschenko ,  Chirag Rajyaguru ,  Alexander Igorevich Ershov ,  Joshua Mark Lukens ,  Mathew Cheeran Abraham

IPC: H05G2/00

Abstract: Disclosed is a system for generating EUV radiation in which current flowing through target material in the orifice 320 of a nozzle in a droplet generator is controlled by providing alternate lower impedance paths for the current and/or by limiting a high frequency component of a drive signal applied to the droplet generator.

公开(公告)号：US10955749B2

公开(公告)日：2021-03-23

申请号：US16469689

申请日：2018-01-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Dzmitry Labetski ,  Christianus Wilhelmus Johannes Berendsen ,  Rui Miguel Duarte Rodriges Nunes ,  Alexander Igorevich Ershov ,  Kornelis Frits Feenstra ,  Igor Vladimirovich Fomenkov ,  Klaus Martin Hummler ,  Arun Johnkadaksham ,  Matthias Kraushaar ,  Andrew David Laforge ,  Marc Guy Langlois ,  Maksim Loginov ,  Yue Ma ,  Seyedmohammad Mojab ,  Kerim Nadir ,  Alexander Shatalov ,  John Tom Stewart, IV ,  Henricus Gerardus Tegenbosch ,  Chunguang Xia

IPC: G03F7/20 ,  H05G2/00

Abstract: An extreme ultraviolet radiation (EUV) source, including: a vessel having an inner vessel wall and an intermediate focus (IF) region; an EUV collector disposed inside the vessel, the EUV collector including a reflective surface configured to reflect EUV radiation toward the intermediate focus region, the reflective surface configured to directionally face the IF region of the vessel; a showerhead disposed along at least a portion of the inner vessel wall, the showerhead including a plurality of nozzles configured to introduce gas into the vessel; and one or more exhausts configured to remove gas introduced into the vessel, the one or more exhausts being oriented along at least a portion of the inner vessel wall so that the gas is caused to flow away from the EUV collector.