公开(公告)号：US09470988B2

公开(公告)日：2016-10-18

申请号：US14437441

申请日：2013-10-17

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Albert Johannes Maria Jansen ,  Andre Bernardus Jeunink ,  Johannes Mathias Theodorus Antonius Adriaens ,  Frank Auer ,  Peterjan Broomans ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Willem Herman Gertruda Anna Koenen ,  Sebastiaan Smit ,  Joris Wilhelmus Henricus Vermunt

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70516 ,  G03F7/70716

Abstract: A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.

Abstract translation: 一种用于将物体定位在光刻设备中的定位系统，包括：可在操作区域中移动的第一和第二物镜台; 第一位置测量系统，用于在操作区域中提供相对于参考的第二对象表的增量位置测量，其中第一位置测量系统被配置为提供第一对象表相对于参考的绝对位置测量; 第二位置测量系统，用于提供相对于第二对象表的第一对象表的绝对位置测量，并且其中，第一位置测量系统还被配置为提供第二对象表相对于参考的绝对位置测量，基于 第一对象表相对于参考的绝对位置测量以及第一对象表相对于第二对象表的绝对位置测量。

公开(公告)号：US20150277242A1

公开(公告)日：2015-10-01

申请号：US14437441

申请日：2013-10-17

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Albert Johannes Maria Jansen ,  Andre Bernardus Jeunink ,  Johannes Mathias Theodorus Antonius Adriaens ,  Frank Auer ,  Peterjan Broomans ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Willem Herman Gertruda Anna Koenen ,  Sebastiaan Smit ,  Joris Wilhelmus Henricus Vermunt

IPC: G03F7/20

CPC classification number: G03F7/70775 ,  G03F7/70516 ,  G03F7/70716

Abstract: A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table.

Abstract translation: 一种用于将物体定位在光刻设备中的定位系统，包括：可在操作区域中移动的第一和第二物镜台; 第一位置测量系统，用于在操作区域中提供相对于参考的第二对象表的增量位置测量，其中第一位置测量系统被配置为提供第一对象表相对于参考的绝对位置测量; 第二位置测量系统，用于提供相对于第二对象表的第一对象表的绝对位置测量，并且其中，第一位置测量系统还被配置为提供第二对象表相对于参考的绝对位置测量，基于 第一对象表相对于参考的绝对位置测量以及第一对象表相对于第二对象表的绝对位置测量。

公开(公告)号：US12247883B2

公开(公告)日：2025-03-11

申请号：US18048119

申请日：2022-10-20

Applicant: ASML Netherlands B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Koen Govert Olivier Van De Meerakker ,  Ivo Widdershoven

IPC: G01J9/02 ,  G01B9/02001 ,  G01B9/02002 ,  G01B9/02015 ,  G01B11/00 ,  G03F7/00

Abstract: The invention provides a wavelength tracking system comprising a wavelength tracking unit and an interferometer system. The wavelength tracking unit has reflection surfaces at stabile positions providing a first reflection path with a first path length and a second reflection path with a second path length. The first path length is substantially larger than the second path length. The interferometer system comprises: a beam splitter to split a light beam in a first measurement beam and a second measurement beam; at least one optic element to guide the first measurement beam, at least partially, along the first reflection path and the second measurement beam, at least partially, along the second reflection path; a first light sensor arranged at an end of the first reflection path to receive the first measurement beam and to provide a first sensor signal on the basis of the first measurement beam; a second light sensor arranged at an end of the second reflection path to receive the second measurement beam and to provide a second sensor signal on the basis of the second measurement beam; and a processing unit to determine a wavelength or change in wavelength on the basis of the first sensor signal and the second sensor signal.

公开(公告)号：US11940739B2

公开(公告)日：2024-03-26

申请号：US17562446

申请日：2021-12-27

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Arie Jeffrey Den Boef ,  Duygu Akbulut ,  Marinus Johannes Maria Van Dam ,  Hans Butler ,  Hugo Augustinus Joseph Cramer ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Ferry Zijp ,  Jeroen Arnoldus Leonardus Johannes Raaymakers ,  Marinus Petrus Reijnders

IPC: G03F7/20 ,  G01N21/956 ,  G03F7/00

CPC classification number: G03F7/70625 ,  G01N21/956 ,  G03F7/7015 ,  G03F7/70633

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US09915880B2

公开(公告)日：2018-03-13

申请号：US15077439

申请日：2016-03-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Andre Bernardus Jeunink ,  Robbert Edgar Van Leeuwen ,  Emiel Jozef Melanie Eussen

IPC: G03B27/58 ,  G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/70775 ,  G03F7/7085

Abstract: A measurement system configured to measure a position dependent signal of an object table, the measurement system including at least one sensor mountable on the object table and a sensor target object mountable on a substantially stationary frame, and a mounting device configured to mount the sensor target object on the substantially stationary frame, wherein the measurement system further includes a compensator configured to compensate movements and/or deformations of the sensor target object with respect to the substantially stationary frame. The compensator may include a passive or an active damper and/or a feedback position controller. In an alternative embodiment, the compensator includes a gripping device which fixes the position of the sensor target object during a high accuracy movement of the movable object.

公开(公告)号：US09785060B2

公开(公告)日：2017-10-10

申请号：US14423405

申请日：2013-08-19

Applicant: ASML Netherlands B.V.

Inventor： Ruud Antonius Catharina Maria Beerens ,  Rob Johan Theodoor Rutten ,  Jan Steven Christiaan Westerlaken ,  Koen Jacobus Johannes Maria Zaal ,  Richard Henricus Adrianus Van Lieshout ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC: G03F7/20 ,  G01D5/38 ,  G01D5/34

CPC classification number: G03F7/70725 ,  G01D5/34 ,  G01D5/38 ,  G03F7/70775 ,  G03F7/70933

Abstract: A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap.

公开(公告)号：US20150241795A1

公开(公告)日：2015-08-27

申请号：US14430507

申请日：2013-09-12

Applicant: ASML NETHERLANDS B.V.

Inventor： Jeroen Dekkers ,  Andre Bernardus Jeunink ,  Erik Roelof Loopstra ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Michael Jozef Mathijs Renkens ,  Carolus Johannes Catharina Schoormans ,  Peter Hoekstra

IPC: G03F7/20 ,  G01D18/00 ,  G01D5/347

CPC classification number: G03F7/70775 ,  G01D5/2449 ,  G01D5/34707 ,  G01D18/00 ,  G01D18/008 ,  G03F7/70516

Abstract: A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.

Abstract translation: 一种用于校准具有第一方向的标记阵列的编码器刻度的方法，包括相对于第一编码器型传感器，第二编码器型传感器和第三编码器型传感器沿第一方向移动编码器刻度，其中 第一编码器型传感器和第二编码器型传感器在第一方向上相对于彼此以第一距离固定间隔，其中第二编码器型传感器和第三编码器型传感器在第一方向上固定间隔开 在相对于彼此的第二距离处。

公开(公告)号：US20150212428A1

公开(公告)日：2015-07-30

申请号：US14419910

申请日：2013-08-02

Applicant: ASML NETHERLANDS B.V.

Inventor： Engelbertus Antonius Fransiscus Van Der Pasch ,  Ruud Antonius Catharina Maria Beerens ,  Martinus Agnes Willem Cuijpers ,  Christiaan Alexander Hoogendam ,  Fransiscus Mathijs Jacobs ,  Willem Herman Gertruda Anna Koenen ,  Erik Roelof Loopstra

IPC: G03F7/20

CPC classification number: G03F7/70483 ,  G03F7/70725 ,  G03F7/70775

Abstract: A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision.

Abstract translation: 一种光刻设备，包括可移动物体（WT）和位移测量系统，其布置成确定可移动物体的位置量。 位移测量系统包括编码器（BC）和网格结构。 编码器和网格结构之一连接到可移动对象。 栅格结构包括高精度栅格部分（HG）和低精度栅格部分（LG）。 编码器配置成与高精度格栅部分配合，以高精度确定相对于格栅结构的位置量。 编码器配置成与低精度格栅部分配合，以较低精度确定相对于格栅结构的位置数量。

公开(公告)号：US11287242B2

公开(公告)日：2022-03-29

申请号：US16311193

申请日：2017-06-29

Applicant: ASML NETHERLANDS B.V.

Inventor： Maarten Jozef Jansen ,  Engelbertus Antonius Fransiscus Van Der Pasch ,  Suzanne Johanna Antonetta Geertruda Cosijns

IPC: G01B9/02 ,  G01B9/02056 ,  G01B9/02001 ,  G03F7/20 ,  G01B9/02055 ,  G01B9/02003

Abstract: An interferometer system, including a heterodyne interferometer and a processing system. The heterodyne interferometer is arranged to provide a reference signal and a measurement signal. The reference signal has a reference phase. The measurement signal has a measurement phase and an amplitude. The processing system is arranged to determine a cyclic error of the heterodyne interferometer based on the reference phase, the measurement phase and the amplitude.

公开(公告)号：US10345717B2

公开(公告)日：2019-07-09

申请号：US15959115

申请日：2018-04-20

Applicant: ASML Netherlands B.V.

Inventor： Günes Nakiboglu ,  Suzanne Johanna Antonetta Geertruda Cosijns ,  Anne Willemijn Bertine Quist ,  Lukasz Sosniak ,  Frank Johannes Jacobus Van Boxtel ,  Engelbertus Antonius Fransiscus Van Der Pasch

IPC: G03F7/20

Abstract: A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.