公开(公告)号：US20250044236A1

公开(公告)日：2025-02-06

申请号：US18843138

申请日：2023-02-17

Applicant: ASML Netherlands B.V.

Inventor： Douglas C. CAPPELLI ,  Ferry ZIJP ,  Bram Antonius Gerardus LOMANS ,  Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN

IPC: G01N21/88 ,  G01N21/95 ,  G01N21/956 ,  G02B7/18 ,  G02B7/182

Abstract: An inspection apparatus includes a radiation source, an optical system, and a detector. The radiation source is configured to generate a beam of radiation. The optical system is configured to receive and direct the beam along an optical axis and toward a target so as to produce scattered radiation from the target. The optical system includes a beam displacer. The beam displacer includes two or more reflective surfaces. The beam displacer is configured to receive the beam along the optical axis, perform reflections of the beam so as to displace the optical axis of the beam, move linearly in at least a first dimension to shift the displaced optical axis, and preserve an optical property of the beam such that the optical property is invariant to the linear movement. The detector is configured to receive the scattered radiation and to generate a measurement signal based on the scattered radiation.

公开(公告)号：US20220121127A1

公开(公告)日：2022-04-21

申请号：US17562446

申请日：2021-12-27

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Arie Jeffrey DEN BOEF ,  Duygu AKBULUT ,  Marimus Johannes Maria VAN DAM ,  Hans BUTLER ,  Hugo Augustinus Joseph CRAMER ,  Engelbertus Antonius Franciscus VAN DER PASCH ,  Ferry ZIJP ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Marinus Petrus REIJNDERS

IPC: G03F7/20 ,  G01N21/956

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US20190385760A1

公开(公告)日：2019-12-19

申请号：US16440099

申请日：2019-06-13

Applicant: ASML Netherlands B.V.

Inventor： Ferry ZIJP

IPC: G21K1/06 ,  B24C1/08

Abstract: Some embodiment describe a reflector comprising a hollow body having an interior surface defining a passage. The interior surface has an optical surface part configured to reflect radiation and a supporter surface part. The optical surface part has a predetermined optical power and the supporter surface part does not. The reflector can be made by providing an axially symmetric mandrel, shaping a part of the circumferential surface of the mandrel to form an inverse optical surface part that is not rotationally symmetric about the axis of the mandrel, forming a reflector body around the mandrel and releasing the reflector body from the mandrel whereby the reflector body has an optical surface defined by the inverse optical surface part and a supporter surface part defined by the rest of the outer surface of the mandrel.

公开(公告)号：US20190212660A1

公开(公告)日：2019-07-11

申请号：US16331547

申请日：2017-08-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Nitish KUMAR ,  Adrianus Johannes Hendrikus SCHELLEKENS ,  Sietse Thijmen VAN DER POST ,  Ferry ZIJP ,  Willem Maria Julia Marcel COENE ,  Peter Danny VAN VOORST ,  Duygu AKBULUT ,  Sarathi ROY

IPC: G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70341 ,  G03F7/70516 ,  G03F7/7085 ,  G03F7/70916 ,  G03F7/70941

Abstract: An optical system delivers illuminating radiation and collects radiation after interaction with a target structure on a substrate. A measurement intensity profile is used to calculate a measurement of the property of the structure. The optical system may include a solid immersion lens. In a method, the optical system is controlled to obtain a first intensity profile using a first illumination profile and a second intensity profile using a second illumination profile. The profiles are used to derive a correction for mitigating the effect of, e.g., ghost reflections. Using, e.g., half-moon illumination profiles in different orientations, the method can measure ghost reflections even where a solid immersion lens would cause total internal reflection. The optical system may include a contaminant detection system to control a movement based on received scattered detection radiation. The optical system may include an optical component having a dielectric coating to enhance evanescent wave interaction.

公开(公告)号：US20190072853A1

公开(公告)日：2019-03-07

申请号：US16117589

申请日：2018-08-30

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Stefan Michael Bruno BÄUMER ,  Peter Danny VAN VOORST ,  Teunis Willem TUKKER ,  Ferry ZIJP ,  Han-Kwang NIENHUYS ,  Jacobus Maria Antonius VAN DEN EERENBEEMD

IPC: G03F7/20 ,  G21K1/06 ,  G01N21/47 ,  G01N21/95

Abstract: An optical system (OS) for focusing a beam of radiation (B) on a region of interest in a metrology apparatus is described. The beam of radiation (B) comprises radiation in a soft X-ray or Extreme Ultraviolet spectral range. The optical system (OS) comprises a first stage (S1) for focusing the beam of radiation at an intermediate focus region. The optical system (OS) comprises a second stage (S2) for focusing the beam of radiation from the intermediate focus region onto the region of interest. The first and second stages each comprise a Kirkpatrick-Baez reflector combination. At least one reflector comprises an aberration-correcting reflector.

公开(公告)号：US20180188658A1

公开(公告)日：2018-07-05

申请号：US15580500

申请日：2016-07-05

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Ferry ZIJP ,  Sander Bas ROOBOL

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/7085

Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

公开(公告)号：US20170102620A1

公开(公告)日：2017-04-13

申请号：US15286319

申请日：2016-10-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Ferry ZIJP ,  Sietse Thijmen VAN DER POST ,  Fanhe KONG ,  Duygu AKBULUT

IPC: G03F7/20

CPC classification number: G03F7/70133 ,  G01N21/956 ,  G02B21/242 ,  G03F7/70625 ,  G03F7/70633

Abstract: A method including obtaining a plurality of radiation distributions of measurement radiation redirected by the target, each of the plurality of radiation distributions obtained at a different gap distance between the target and an optical element of a measurement apparatus, the optical element being the nearest optical element to the target used to provide the measurement radiation to the target, and determining a parameter related to the target using data of the plurality of radiation distributions in conjunction with a mathematical model describing the measurement target.