公开(公告)号：US12142451B2

公开(公告)日：2024-11-12

申请号：US17778579

申请日：2020-10-21

Applicant: ASML NETHERLANDS B.V.

Inventor： Tianming Chen ,  Chiyan Kuan ,  Yixiang Wang ,  Zhi Po Wang

IPC: H01J37/02 ,  G03F7/00 ,  H01J37/28

Abstract: A system for grounding a mask using a grounding component are provided. Some embodiments of the system include a grounding component comprising a base and an extension protruding from the base and comprising a conductive prong configured to contact a conductive layer of the mask. Some embodiments of the system include a plurality of conductive prongs configured to contact multiple positions of a conductive layer of the mask. Some other embodiments of the system include an extension comprising various shapes.

公开(公告)号：US12051562B2

公开(公告)日：2024-07-30

申请号：US17753298

申请日：2020-08-25

Applicant: ASML Netherlands B.V.

Inventor： Yixiang Wang ,  Shibing Liu ,  Shanhui Cao ,  Kangsheng Qiu ,  Juying Dou ,  Ying Luo ,  Yinglong Li ,  Qiang Li ,  Ronald Van Der Wilk ,  Jan-Gerard Cornelis Van Der Toorn

IPC: H01J37/20 ,  H01L21/683

CPC classification number: H01J37/20 ,  H01L21/6833 ,  H01J2237/0044

Abstract: Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.

公开(公告)号：US11728131B2

公开(公告)日：2023-08-15

申请号：US17553357

申请日：2021-12-16

Applicant: ASML Netherlands B.V.

Inventor： Ning Ye ,  Jun Jiang ,  Jian Zhang ,  Yixiang Wang

IPC: H01J37/28 ,  H01J37/244 ,  H01J37/26

CPC classification number: H01J37/28 ,  H01J37/244 ,  H01J37/265 ,  H01J2237/0047 ,  H01J2237/2817

Abstract: Apparatuses, systems, and methods for providing beams for controlling charges on a sample surface of charged particle beam system. In some embodiments, a module comprising a laser source configured to emit a beam. The beam may illuminate an area adjacent to a pixel on a wafer to indirectly heat the pixel to mitigate a cause of a direct photon-induced effect at the pixel. An electron beam tool configured to detect a defect in the pixel, wherein the defect is induced by the indirect heating of the pixel.

公开(公告)号：US11521826B2

公开(公告)日：2022-12-06

申请号：US16650840

申请日：2018-09-21

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: H01J37/22 ,  G01C3/08 ,  G02B27/42

Abstract: An optical height detection system in a charged particle beam inspection system. The optical height detection system includes a projection unit including a modulated illumination source, a projection grating mask including a projection grating pattern, and a projection optical unit for projecting the projection grating pattern to a sample; and a detection unit including a first detection grating mask including a first detection grating pattern, a second detection grating mask including a second detection grating pattern, and a detection optical system for forming a first grating image from the projection grating pattern onto the first detection grating mask and forming a second grating image from the projection grating pattern onto the second detection grating masks. The first and second detection grating patterns at least partially overlap the first and second grating images, respectively.

公开(公告)号：US11482399B2

公开(公告)日：2022-10-25

申请号：US16652352

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Qing Jiu Chen ,  Yixiang Wang

IPC: H01J37/22 ,  G01N21/95 ,  G01N21/956 ,  G02B27/09

Abstract: A system and method for advanced charge control of a light beam is provided. The system comprising a laser source comprising a laser diode for emitting a beam and a beam homogenizer to homogenize the emitted beam. The system and methods further comprise a beam shaper configured to shape the emitted beam using an anamorphic prism group and a driver configured to direct the shaped beam to a specified position on a wafer, wherein the laser source, the beam shaper, and the driver are coaxially aligned.

公开(公告)号：US12028000B2

公开(公告)日：2024-07-02

申请号：US18132617

申请日：2023-04-10

Applicant: ASML Netherlands B.V.

Inventor： Jan-Gerard Cornelis Van Der Toorn ,  Jeroen Gertruda Antonius Huinck ,  Han Willem Hendrik Severt ,  Allard Eelco Kooiker ,  Michael Johannes Christiaan Ronde ,  Arno Maria Wellink ,  Shibing Liu ,  Ying Luo ,  Yixiang Wang ,  Chia-Yao Chen ,  Bohang Zhu ,  Jurgen Van Soest

IPC: H02N13/00 ,  G03F7/00

CPC classification number: H02N13/00 ,  G03F7/70708 ,  G03F7/70716

Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.

公开(公告)号：US11929232B2

公开(公告)日：2024-03-12

申请号：US17026044

申请日：2020-09-18

Applicant: ASML Netherlands B.V.

Inventor： Frank Nan Zhang ,  Zhongwei Chen ,  Yixiang Wang ,  Ying Crystal Shen

IPC: H01J37/26 ,  H01J37/04 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/045 ,  H01J37/266 ,  H01J37/28 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/0453 ,  H01J2237/0455 ,  H01J2237/0458 ,  H01J2237/049 ,  H01J2237/28 ,  H01J2237/2817

Abstract: Systems and methods for implementing charged particle flooding in a charged particle beam apparatus are disclosed. According to certain embodiments, a charged particle beam system includes a charged particle source and a controller which controls the charged particle beam system to emit a charged particle beam in a first mode where the beam is defocused and a second mode where the beam is focused on a surface of a sample.

公开(公告)号：US11808930B2

公开(公告)日：2023-11-07

申请号：US16650862

申请日：2018-09-25

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: G02B21/02 ,  G02B9/00 ,  G02B13/18 ,  H01J37/22 ,  H01J37/28 ,  G09B9/10 ,  G01N23/2251

CPC classification number: G02B21/02 ,  G02B9/00 ,  G02B13/18 ,  G09B9/10 ,  H01J37/226 ,  H01J37/28 ,  G01N23/2251 ,  H01J2237/26 ,  H01J2237/2802

Abstract: An objective lens for forming an image of an object. The objective lens includes, sequentially from an image side to an object side, a first lens group having negative refractive power, and a second lens group having positive refractive power.

公开(公告)号：US11682538B2

公开(公告)日：2023-06-20

申请号：US17533078

申请日：2021-11-22

Applicant: ASML Netherlands B.V.

Inventor： Jian Zhang ,  Zhiwen Kang ,  Yixiang Wang

IPC: H01J37/22 ,  H01J37/244

CPC classification number: H01J37/226 ,  H01J37/244 ,  H01J2237/20292

Abstract: An optical system used in a charged particle beam inspection system. The optical system includes one or more optical lenses, and a compensation lens configured to compensate a drift of a focal length of a combination of the one or more optical lenses from a first medium to a second medium.

公开(公告)号：US11637512B2

公开(公告)日：2023-04-25

申请号：US17351181

申请日：2021-06-17

Applicant: ASML Netherlands B.V.

Inventor： Jan-Gerard Cornelis Van Der Toorn ,  Jeroen Gertruda Antonius Huinck ,  Han Willem Hendrik Severt ,  Allard Eelco Kooiker ,  Michaël Johannes Christiaan Ronde ,  Arno Maria Wellink ,  Shibing Liu ,  Ying Luo ,  Yixiang Wang ,  Chia-Yao Chen ,  Bohang Zhu ,  Jurgen Van Soest

IPC: H02N13/00 ,  G03F7/20

Abstract: Disclosed is an object table for holding an object, comprising: an electrostatic clamp arranged to clamp the object on the object table; a neutralizer arranged to neutralize a residual charge of the electrostatic clamp; a control unit arranged to control the neutralizer, wherein the residual charge is an electrostatic charge present on the electrostatic clamp when no voltage is applied to the electrostatic clamp.