Controlling Exhaust Gas Recirculation
    11.
    发明申请
    Controlling Exhaust Gas Recirculation 有权
    控制排气再循环

    公开(公告)号:US20100242936A1

    公开(公告)日:2010-09-30

    申请号:US12415026

    申请日:2009-03-31

    CPC classification number: F02D41/0052 F02D41/187 F02D2200/0411 Y02T10/47

    Abstract: In controlling an engine, an amount of an intake charge provided, during operation of the engine, to a combustion chamber of the engine is determined. The intake charge includes an air component, a fuel component and a diluent component. An amount of the air component of the intake charge is determined. An amount of the diluent component of the intake charge is determined utilizing the amount of the intake charge, the amount of the air component and, in some instances, the amount of the fuel component. An amount of a diluent supplied to the intake charge is adjusted based at least in part on the determined amount of diluent component of the intake charge.

    Abstract translation: 在控制发动机时,确定在发动机运转期间向发动机的燃烧室提供的进气量。 进气装置包括空气部件,燃料部件和稀释剂部件。 确定进气量的空气分量的量。 使用进气量的量,空气成分的量以及在某些情况下燃料成分的量来确定进气量的稀释剂成分的量。 至少部分地基于确定的进料量的稀释剂组分的量来调节供应到进气装置的稀释剂的量。

    System and method for monitoring defects in structures

    公开(公告)号:US20050075800A1

    公开(公告)日:2005-04-07

    申请号:US10664196

    申请日:2003-09-17

    CPC classification number: G01B7/281

    Abstract: A system and method for monitoring defects in a structure are provided. The system includes a power supply for supplying an electric current to a monitoring area of the structure and a reference; a measurement circuit for measuring a potential drop across at least two contact points of the monitoring area and at least two contact points of the reference; and a processor adapted to determine a ratio of the monitoring area potential drop to the reference potential drop indicative of a percentage change in a thickness of the structure. The method includes the steps of supplying the current to the monitoring area and the reference; measuring a first potential drop across the monitoring area and the reference; and determining the ratio indicative of the percentage change in the thickness of the structure.

    METHOD AND SYSTEM FOR CRYSTALLIZATION AND X-RAY DIFFRACTION SCREENING
    19.
    发明申请
    METHOD AND SYSTEM FOR CRYSTALLIZATION AND X-RAY DIFFRACTION SCREENING 有权
    用于结晶和X射线衍射筛选的方法和系统

    公开(公告)号:US20120021523A1

    公开(公告)日:2012-01-26

    申请号:US13168041

    申请日:2011-06-24

    CPC classification number: G01N23/20025

    Abstract: An integrated fluidic circuit includes a substrate layer and a first structure coupled to the substrate layer and including a plurality of channels. The first structure is configured to provide for flow of one or more materials through the plurality of channels. The integrated fluidic circuit also includes a second structure coupled to the substrate layer. The second structure includes a plurality of control channels configured to receive an actuation pressure. The integrated fluidic circuit is characterized by a thickness of less than 1.5 mm.

    Abstract translation: 集成流体回路包括衬底层和耦合到衬底层并且包括多个通道的第一结构。 第一结构被配置为提供通过多个通道的一种或多种材料的流动。 集成流体回路还包括耦合到衬底层的第二结构。 第二结构包括被配置为接收致动压力的多个控制通道。 集成流体回路的特征在于厚度小于1.5mm。

    METHOD AND SYSTEM FOR CRYSTALLIZATION AND X-RAY DIFFRACTION SCREENING
    20.
    发明申请
    METHOD AND SYSTEM FOR CRYSTALLIZATION AND X-RAY DIFFRACTION SCREENING 有权
    用于结晶和X射线衍射筛选的方法和系统

    公开(公告)号:US20090147918A1

    公开(公告)日:2009-06-11

    申请号:US12118185

    申请日:2008-05-09

    CPC classification number: G01N23/20025

    Abstract: An integrated fluidic circuit includes a substrate layer and a first structure coupled to the substrate layer and including a plurality of channels. The first structure is configured to provide for flow of one or more materials through the plurality of channels. The integrated fluidic circuit also includes a second structure coupled to the substrate layer. The second structure includes a plurality of control channels configured to receive an actuation pressure. The integrated fluidic circuit is characterized by a thickness of less than 1.5 mm.

    Abstract translation: 集成流体回路包括衬底层和耦合到衬底层并且包括多个通道的第一结构。 第一结构被配置为提供通过多个通道的一种或多种材料的流动。 集成流体回路还包括耦合到衬底层的第二结构。 第二结构包括被配置为接收致动压力的多个控制通道。 集成流体回路的特征在于厚度小于1.5mm。

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