公开(公告)号：US12144101B2

公开(公告)日：2024-11-12

申请号：US18373128

申请日：2023-09-26

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  David T. Blahnik ,  Wai-Ming Tam ,  Charles T. Carlson ,  Frank Sinclair

IPC: H05H7/02 ,  H05H7/12 ,  H05H9/00

Abstract: An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.

公开(公告)号：US20240194438A1

公开(公告)日：2024-06-13

申请号：US18080555

申请日：2022-12-13

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Adam Calkins ,  Tyler Rockwell ,  Kevin M. Daniels ,  Christopher Campbell

IPC: H01J37/09

CPC classification number: H01J37/09 ,  H01J37/08 ,  H01J2237/002 ,  H01J2237/0453 ,  H01J2237/20235

Abstract: A processing system may include a plasma chamber and an extraction optics, disposed along a side of the plasma chamber. The extraction optics may include an extraction plate, having an outer side and an inner side, where the extraction plate defines at least one extraction aperture. The extraction optics may include a beam blocker, overlapping the at least one extraction aperture, and disposed towards the inner side of the extraction plate. The beam blocker may have a cross-section that defines a boomerang shape, and may comprise a first metallic material, where the extraction plate comprises a second metallic material. The processing system may further include a substrate platen, disposed outside of the plasma chamber, and movable along a scan direction with respect to the extraction aperture.

公开(公告)号：US11818830B2

公开(公告)日：2023-11-14

申请号：US17163251

申请日：2021-01-29

Applicant: Applied Materials, Inc.

Inventor： Frank Sinclair ,  Wai-Ming Tam ,  Costel Biloiu ,  William Davis Lee

IPC: H05H9/04 ,  H01J37/317 ,  H05H7/22 ,  H05H7/02

CPC classification number: H05H9/04 ,  H01J37/3171 ,  H05H7/02 ,  H05H7/22 ,  H01J2237/04732 ,  H05H2007/222 ,  H05H2007/227

Abstract: An apparatus may include a drift tube assembly, the drift tube assembly defining a triple gap configuration, and arranged to accelerate and transmit an ion beam along abeam path. The apparatus may include a resonator, to output an RF signal to the drift tube assembly, and an RF quadrupole triplet, connected to the drift tube assembly, and arranged circumferentially around the beam path.

公开(公告)号：US11710617B2

公开(公告)日：2023-07-25

申请号：US17378327

申请日：2021-07-16

Applicant: APPLIED Materials, Inc.

Inventor： Costel Biloiu ,  Michael Honan ,  Robert B. Vopat ,  David Blahnik ,  Charles T. Carlson ,  Frank Sinclair ,  Paul Murphy

IPC: H01J23/18 ,  H01J37/30 ,  H01J37/317

CPC classification number: H01J37/3007 ,  H01J23/18 ,  H01J37/3171 ,  H01J2237/0473

Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

公开(公告)号：US20220174810A1

公开(公告)日：2022-06-02

申请号：US17108747

申请日：2020-12-01

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Charles T. Carlson ,  Frank Sinclair ,  Paul J. Murphy ,  David T. Blahnik

IPC: H05H7/22 ,  H01J37/317

Abstract: An apparatus may include a drift tube assembly, arranged to transmit an ion beam. The drift tube assembly may include a first ground electrode; an RF drift tube assembly, disposed downstream of the first ground electrode; and a second ground electrode, disposed downstream of the RF drift tube assembly. The RF drift tube assembly may define a triple gap configuration. The apparatus may include a resonator, where the resonator comprises a toroidal coil, having a first end, connected to a first RF drift tube of the RF drift tube assembly, and a second end, connected to a second RF drift tube of the RF drift tube assembly.

公开(公告)号：US20210210307A1

公开(公告)日：2021-07-08

申请号：US16734746

申请日：2020-01-06

Applicant: APPLIED Materials, Inc.

Inventor： Costel Biloiu ,  Michael Honan ,  Robert B. Vopat ,  David Blahnik ,  Charles T. Carlson ,  Frank Sinclair ,  Paul Murphy

IPC: H01J37/30 ,  H01J37/317

Abstract: Embodiments herein are directed to a resonator for an ion implanter. In some embodiments, a resonator may include a housing, and a first coil and a second coil partially disposed within the housing. Each of the first and second coils may include a first end including an opening for receiving an ion beam, and a central section extending helically about a central axis, wherein the central axis is parallel to a beamline of the ion beam, and wherein an inner side of the central section has a flattened surface.

公开(公告)号：US11948781B2

公开(公告)日：2024-04-02

申请号：US17160042

申请日：2021-01-27

Applicant: Applied Materials, Inc.

Inventor： Christopher Campbell ,  Costel Biloiu ,  Peter F. Kurunczi ,  Jay R. Wallace ,  Kevin M. Daniels ,  Kevin T. Ryan ,  Minab B. Teferi ,  Frank Sinclair ,  Joseph C. Olson

IPC: H01J37/32

CPC classification number: H01J37/32788 ,  H01J37/32568

Abstract: A processing system may include a plasma chamber operable to generate a plasma, and an extraction assembly, arranged along a side of the plasma chamber. The extraction assembly may include an extraction plate including an extraction aperture, the extraction plate having a non-planar shape, and generating an extracted ion beam at a high angle of incidence with respect to a perpendicular to a plane of a substrate, when the plane of the substrate is arranged parallel to the side of the plasma chamber.

公开(公告)号：US20230124350A1

公开(公告)日：2023-04-20

申请号：US17506185

申请日：2021-10-20

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  David T. Blahnik ,  Wai-Ming Tam ,  Charles T. Carlson ,  Frank Sinclair

IPC: H05H7/02 ,  H05H9/00 ,  H05H7/12

Abstract: An exciter for a high frequency resonator. The exciter may include an exciter coil inner portion, extending along an exciter axis, an exciter coil loop, disposed at a distal end of the exciter coil inner portion. The exciter may also include a drive mechanism, including at least a rotation component to rotate the exciter coil loop around the exciter axis.

公开(公告)号：US11596051B2

公开(公告)日：2023-02-28

申请号：US17108747

申请日：2020-12-01

Applicant: Applied Materials, Inc.

Inventor： Costel Biloiu ,  Charles T. Carlson ,  Frank Sinclair ,  Paul J. Murphy ,  David T. Blahnik

IPC: H05H7/22 ,  H01J37/317

Abstract: An apparatus may include a drift tube assembly, arranged to transmit an ion beam. The drift tube assembly may include a first ground electrode; an RF drift tube assembly, disposed downstream of the first ground electrode; and a second ground electrode, disposed downstream of the RF drift tube assembly. The RF drift tube assembly may define a triple gap configuration. The apparatus may include a resonator, where the resonator comprises a toroidal coil, having a first end, connected to a first RF drift tube of the RF drift tube assembly, and a second end, connected to a second RF drift tube of the RF drift tube assembly.

公开(公告)号：US11495430B2

公开(公告)日：2022-11-08

申请号：US16929626

申请日：2020-07-15

Applicant: Applied Materials, Inc.

Inventor： Jay R. Wallace ,  Costel Biloiu ,  Kevin M. Daniels

IPC: H01J37/08 ,  H01J37/04

Abstract: An ion beam processing system including a plasma chamber, a plasma plate, disposed alongside the plasma chamber, the plasma plate defining a first extraction aperture, a beam blocker, disposed within the plasma chamber and facing the extraction aperture, a blocker electrode, disposed on a surface of the beam blocker outside of the plasma chamber, and an extraction electrode disposed on a surface of the plasma plate outside of the plasma chamber.