公开(公告)号：US09899635B2

公开(公告)日：2018-02-20

申请号：US15113752

申请日：2014-02-04

Applicant: Applied Materials, Inc.

Inventor： Stefan Bangert ,  Uwe Schüβler ,  Jose Manuel Dieguez-Campo ,  Dieter Haas

IPC: H01L51/40 ,  H01L51/56 ,  C23C14/04 ,  C23C14/12 ,  C23C14/24 ,  C23C14/50 ,  C23C14/56 ,  H01L51/00

CPC classification number: H01L51/56 ,  B05D1/60 ,  C23C14/042 ,  C23C14/12 ,  C23C14/243 ,  C23C14/246 ,  C23C14/505 ,  C23C14/56 ,  C23C14/562 ,  C23C14/564 ,  C23C14/566 ,  C23C14/568 ,  H01L21/67173 ,  H01L21/67196 ,  H01L21/67271 ,  H01L21/67712 ,  H01L21/67718 ,  H01L21/67727 ,  H01L21/67742 ,  H01L21/67748 ,  H01L21/6776 ,  H01L51/001 ,  H01L51/0011

Abstract: A system for depositing one or more layers, particularly layers including organic materials therein, is described. The system includes a load lock chamber for loading a substrate to be processed, a transfer chamber for transporting the substrate, a vacuum swing module provided between the load lock chamber and the transfer chamber, at least one deposition apparatus for depositing material in a vacuum chamber of the at least one deposition chamber, wherein the at least one deposition apparatus is connected to the transfer chamber; a further load lock chamber for unloading the substrate that has been processed, a further transfer chamber for transporting the substrate, a further vacuum swing module provided between the further load lock chamber and the further transfer chamber, and a carrier return track from the further vacuum swing module to the vacuum swing module, wherein the carrier return track is configured to transport the carrier under vacuum conditions and/or under a controlled inert atmosphere.

公开(公告)号：US09350040B2

公开(公告)日：2016-05-24

申请号：US13898912

申请日：2013-05-21

Applicant: Applied Materials, Inc.

Inventor： Byung-Sung Kwak ,  Stefan Bangert ,  Dieter Haas ,  Omkaram Nalamasu

IPC: H01M10/04 ,  H01M4/62 ,  H01M10/052 ,  H01M10/0585

CPC classification number: H01M10/0404 ,  H01M4/621 ,  H01M6/40 ,  H01M10/052 ,  H01M10/0585 ,  Y02E60/122 ,  Y02P70/54 ,  Y10T29/52

Abstract: Methods of and factories for thin-film battery manufacturing are described. A method includes operations for fabricating a thin-film battery. A factory includes one or more tool sets for fabricating a thin-film battery.

公开(公告)号：US12203164B2

公开(公告)日：2025-01-21

申请号：US17717642

申请日：2022-04-11

Applicant: Applied Materials, Inc.

Inventor： Tamara Heintz ,  Stefan Bangert ,  Suresh Manikkoth Kollarath ,  Ramgopal Chakkaravarthy Ramasamy

IPC: C23C14/56 ,  C23C14/24 ,  C23C14/54

Abstract: A material deposition apparatus for depositing an evaporated material onto a substrate is provided. The material deposition apparatus includes a processing drum having a cooler configured to control a substrate temperature during processing of a substrate on the processing drum; a roller guiding the substrate towards the processing drum; a first heater assembly positioned to heat the substrate in a free-span area between the roller and the processing drum; a second heater assembly positioned to heat the substrate while being supported on the processing drum; at least one deposition source provided along a substrate transport path downstream of the second heater assembly; a substrate speed sensor providing a speed signal correlating with a substrate transportation speed; and a controller having an input for the speed signal configured to control at least the first heater assembly.

公开(公告)号：US10199660B2

公开(公告)日：2019-02-05

申请号：US15076523

申请日：2016-03-21

Applicant: Applied Materials, Inc.

Inventor： Byung-Sung Leo Kwak ,  Stefan Bangert ,  Ralf Hofmann ,  Michael Koenig

IPC: H01M6/40 ,  H01M4/13 ,  H01M4/139 ,  H01M4/58 ,  H01M4/62 ,  H01M4/66 ,  C23C14/04 ,  H01M4/02

Abstract: A magnetic handling assembly for thin-film processing of a substrate, a system and method for assembling and disassembling a shadow mask to cover a top of a workpiece for exposure to a processing condition. The assembly may include a magnetic handling carrier and a shadow mask disposed over, and magnetically coupled to, the magnetic handling carrier to cover a top of a workpiece that is to be disposed between the shadow mask and the magnetic handling carrier when exposed to a processing condition. A system includes a first chamber with a first support to hold the shadow mask, a second support to hold a handling carrier, and an alignment system to align the shadow mask a workpiece to be disposed between the carrier and shadow mask. The first and second supports are moveable relative to each other.

公开(公告)号：US09450135B2

公开(公告)日：2016-09-20

申请号：US14294644

申请日：2014-06-03

Applicant: Applied Materials, Inc.

Inventor： Byung-sung Kwak ,  Kaushal K. Singh ,  Stefan Bangert ,  Nety M. Krishna

IPC: H01L31/18

CPC classification number: H01L31/18 ,  C23C16/4485 ,  C23C16/45565 ,  H01L31/03923

Abstract: The present invention generally provides a method for forming a photovoltaic device including evaporating a source material to form a large molecule processing gas and flowing the large molecule processing gas through a gas distribution showerhead and into a processing area of a processing chamber having a substrate therein. The method includes generating a small molecule processing gas, and reacting the small molecule processing gas with a film already deposited on a substrate surface to form a semiconductor film. Additionally, apparatuses that may use the methods are also provided to enable continuous inline CIGS type solar cell formation.

Abstract translation: 本发明通常提供一种形成光伏器件的方法，包括蒸发源材料以形成大分子加工气体，并使大分子处理气体通过气体分配喷头流入其中具有衬底的处理室的处理区域。 该方法包括生成小分子处理气体，并使小分子处理气体与已沉积在基板表面上的膜反应形成半导体膜。 此外，还可以使用可以使用这些方法的装置来实现连续的在线CIGS型太阳能电池的形成。