ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, DISPLAY PANEL AND DISPLAY DEVICE
    11.
    发明申请
    ARRAY SUBSTRATE, MANUFACTURING METHOD THEREOF, DISPLAY PANEL AND DISPLAY DEVICE 有权
    阵列基板,其制造方法,显示面板和显示装置

    公开(公告)号:US20160197102A1

    公开(公告)日:2016-07-07

    申请号:US14804841

    申请日:2015-07-21

    Inventor: Liang SUN

    Abstract: The present disclosure provides an array substrate, a manufacturing method thereof, a display panel and a display device. A base substrate of the array substrate or a buffer layer on the base substrate is provided with a plurality of recessed sections, each recessed section is provided with at least one inclined surface, and a thin film transistor (TFT) is arranged at the inclined surface of each recessed section. The recessed sections are divided into at least two types. In the recessed sections of different types, angles between a horizontal surface of the array substrate and the inclined surfaces on which the TFTs are arranged are different from each other.

    Abstract translation: 本公开提供了阵列基板,其制造方法,显示面板和显示装置。 阵列基板的基底或基底基板上的缓冲层设置有多个凹部,每个凹部具有至少一个倾斜面,在该倾斜面配置有薄膜晶体管(TFT) 每个凹进部分。 凹陷部分分为至少两种类型。 在不同类型的凹部中,阵列基板的水平表面与其上布置TFT的倾斜表面之间的角度彼此不同。

    DISPLAY PANEL AND DISPLAY DEVICE
    13.
    发明申请

    公开(公告)号:US20210233969A1

    公开(公告)日:2021-07-29

    申请号:US17230146

    申请日:2021-04-14

    Abstract: A display panel, including: a plurality of pixels arranged in an array in a first direction and a second direction intersecting the first direction, each pixel including: a first sub-pixel having a first light-emitting zone configured to emit light of a first color; a second sub-pixel having a second light-emitting zone configured to emit light of a second color; and a third sub-pixel having a third light-emitting zone configured to emit light of a third color, wherein the plurality of pixels include a first pixel, the first light-emitting zone of the first pixel has a substantially polygonal shape, the substantially polygonal shape including: a first side substantially parallel to one side of the second light-emitting zone of the first pixel, and the one side of the second light-emitting zone of the first pixel being opposite to the first light-emitting zone; and a second side substantially parallel to one side of the third light-emitting zone of the first pixel, and the one side of the third light-emitting zone of the first pixel being opposite to the first light-emitting zone.

    FILM-MARGIN ADJUSTER
    15.
    发明申请

    公开(公告)号:US20160096189A1

    公开(公告)日:2016-04-07

    申请号:US14369381

    申请日:2013-04-02

    CPC classification number: B05C9/02 C23C14/04 C23C16/04

    Abstract: A film-margin adjuster, including: four shielding plates, for shielding an area of the peripheral edge-portions of a film-formation substrate respectively; the four shielding plates are oppositely disposed in pairs, and at least one pair of the oppositely disposed shielding plates has a adjustable relative distance therebetween. The film-margin adjuster, by virtue of the at least one pair of the oppositely disposed shielding plates having an adjustable relative distance therebetween, can adjust the area of the peripheral edge-portions of the film-formation substrate shielded by the shielding plates, thus achieving adjustment of the size of film-margin, and improving yield of production line.

    Abstract translation: 一种胶片边缘调节器,包括:四个屏蔽板,用于分别屏蔽成膜基材的周边部分的区域; 四个屏蔽板成对地相对设置,并且至少一对相对设置的屏蔽板之间具有可调节的相对距离。 薄膜边缘调节器由于至少一对相对设置的屏蔽板之间具有可调节的相对距离,可以调节由屏蔽板屏蔽的成膜基板的周边边缘部分的面积,从而 实现电影幅度调整,提高生产线产量。

    METHOD FOR MANUFACTURING FAN-OUT LINES ON ARRAY SUBSTRATE
    16.
    发明申请
    METHOD FOR MANUFACTURING FAN-OUT LINES ON ARRAY SUBSTRATE 有权
    在阵列基板上制造扇形线的方法

    公开(公告)号:US20140134809A1

    公开(公告)日:2014-05-15

    申请号:US14077770

    申请日:2013-11-12

    CPC classification number: H01L27/1288 H01L27/124 H01L27/127 H01L29/66765

    Abstract: A method for manufacturing fan-out lines on an array substrate is disclosed. The fan-out lines comprise an amorphous silicon layer, an ohmic contact layer and a source-drain electrode layer disposed on a gate insulating layer. The manufacturing processes can be conducted by forming a first layer of photoresist on the source-drain electrode layer and performing a half-exposure development process on the first layer of photoresist; etching the amorphous silicon layer, the ohmic contact layer and the source-drain electrode layer by an etching process; removing the first layer of photoresist; foiming a second layer of photoresist and performing full-exposure development process on the second layer of photoresist; and etching the amorphous silicon layer by etching process to form the fan-out lines.

    Abstract translation: 公开了一种在阵列基板上制造扇出线的方法。 扇出线包括非晶硅层,欧姆接触层和设置在栅极绝缘层上的源极 - 漏极电极层。 可以通过在源极 - 漏极电极层上形成第一层光致抗蚀剂并在第一层光致抗蚀剂上进行半曝光显影处理来进行制造工艺; 通过蚀刻工艺蚀刻非晶硅层,欧姆接触层和源极 - 漏极电极层; 去除第一层光刻胶; 在第二层光致抗蚀剂上形成第二层光致抗蚀剂并进行全曝光显影处理; 并通过蚀刻工艺蚀刻非晶硅层以形成扇出线。

    OLED LIGHT-EMITTING DEVICE, PRODUCTION METHOD THEREOF AND DISPLAY APPARATUS

    公开(公告)号:US20180212201A1

    公开(公告)日:2018-07-26

    申请号:US15321576

    申请日:2015-12-14

    Abstract: This disclosure provides an OLED light-emitting device, a production method thereof as well as a display apparatus, and relates to the technical field of OLED display, which can enhance the internal quantum efficiency of a blue OLED light-emitting device. This OLED light-emitting device comprises a substrate, and an anode, a hole transport layer, a blue light-emitting layer and a cathode provided on the substrate; the OLED light-emitting device further comprises an Ag nanolayer located between the anode and the hole transport layer; wherein the blue light-emitting layer is a blue phosphorescent light-emitting layer; the absorption spectrum of the Ag nanolayer overlaps the emission spectrum of the blue phosphorescent light-emitting layer, and the blue phosphorescent light-emitting layer is located within the penetration depth of surface plasma of Ag nanoparticles in the Ag nanolayer. It is used in the production of a blue OLED light-emitting device and a display apparatus comprising the same.

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