Thin film transistor, method of fabricating thin film transistor and array substrate

    公开(公告)号:US11088283B2

    公开(公告)日:2021-08-10

    申请号:US16330990

    申请日:2018-08-27

    Abstract: The present application provides a thin film transistor, a method of fabricating a thin film transistor and an array substrate. The thin film transistor includes: a gate electrode on a substrate and having first and second side surfaces facing each other; and an active layer between the first side surface and the second side surface of the gate electrode and having a third side surface and a fourth side surface. The third side surface of the active layer and the first side surface of the gate electrode face and are spaced apart from each other, the fourth side surface of the active layer and the second side surface of the gate electrode face and are spaced apart from each other, and at least one portion of the gate electrode is in the same range as at least one portion of the active layer in a height direction.

    Array substrate and its fabricating method, display device

    公开(公告)号:US10833104B2

    公开(公告)日:2020-11-10

    申请号:US15745773

    申请日:2017-07-20

    Abstract: The present disclosure provides a fabricating method of an array substrate, comprising: forming a pattern comprising a light shading member; spreading an organic material solution; solidifying the organic material solution, to form a buffer layer; forming a pattern of an active layer on the buffer layer, wherein a position of the active layer corresponds to a position of the light shading member; and forming a gate pattern, where the gate pattern is located on the active layer and is insulated from the active layer. Correspondingly, the present disclosure further provides an array substrate and a display device.

    Array substrate and manufacturing method thereof, and display apparatus

    公开(公告)号:US10090368B2

    公开(公告)日:2018-10-02

    申请号:US14785830

    申请日:2015-02-27

    Abstract: The present invention provides an array substrate and a manufacturing method thereof, and a display apparatus; and it relates to the field of display. The array substrate includes a first thin film transistor and a first electrode which are formed on a substrate. The first thin film transistor includes a gate, a gate insulating layer, an active layer, and an etch stop layer. The etch stop layer is formed with first via holes, and the etch stop layer and the gate insulating layer are formed with a second via hole at a position corresponding to the first electrode. A maximal diameter of the first via holes is not greater than a minimal diameter of the second via hole.

    PIXEL UNIT AND METHOD OF FABRICATING THE SAME, ARRAY SUBSTRATE AND DISPLAY DEVICE
    18.
    发明申请
    PIXEL UNIT AND METHOD OF FABRICATING THE SAME, ARRAY SUBSTRATE AND DISPLAY DEVICE 有权
    像素单元及其制造方法,阵列基板和显示设备

    公开(公告)号:US20150129881A1

    公开(公告)日:2015-05-14

    申请号:US14361700

    申请日:2013-11-28

    CPC classification number: H01L27/1248 G02F1/136227 H01L27/1244 H01L27/1288

    Abstract: The present invention provides a pixel unit including a thin film transistor and a pixel electrode, the thin film transistor includes a gate, a source and a drain, and the pixel electrode is electrically connected to the drain through a via hole. An upper end surface of the via hole is connected to the pixel electrode, and a lower end surface of the via hole is connected to the drain. The via hole is a step-shaped hole, and an area of the upper end surface of the via hole is larger than that of the lower end surface of the via hole. The present invention also provides a method of fabricating the pixel unit, an array substrate including the pixel unit, and a display device including the array substrate.

    Abstract translation: 本发明提供一种包括薄膜晶体管和像素电极的像素单元,薄膜晶体管包括栅极,源极和漏极,并且像素电极通过通孔电连接到漏极。 通孔的上端面与像素电极连接,通孔的下端面与漏极连接。 通孔是台阶状的孔,通孔的上端面的面积大于通孔的下端面的面积。 本发明还提供一种制造像素单元的方法,包括该像素单元的阵列基板以及包括该阵列基板的显示装置。

    Display cover plate, method for manufacturing the same and display device

    公开(公告)号:US11640095B2

    公开(公告)日:2023-05-02

    申请号:US16908547

    申请日:2020-06-22

    Abstract: A display cover plate, a manufacturing method therefor and a display device are provided, The display cover plate includes: a substrate; and an electrochromic unit on the substrate, the electrochromic unit includes: a first electrode on the substrate; an electrochromic layer on a side of the first electrode away from the substrate; and a second electrode on a side of the electrochromic layer away from the substrate, wherein the first electrode and the second electrode are configured to generate an electric field, and the electrochromic layer allows light of different colors to pass through based on a change of the electric field.

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