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11.发明申请公开(公告)号：US20070159718A1
公开(公告)日：2007-07-12
申请号：US11643761
申请日：2006-12-22
Applicant: Hae-sung Kim , Jin-seung Sohn , Myung-bok Lee , Byung-kyu Lee , Sung-dong Suh , Eun-hyoung Cho
Inventor： Hae-sung Kim , Jin-seung Sohn , Myung-bok Lee , Byung-kyu Lee , Sung-dong Suh , Eun-hyoung Cho
CPC classification number: G11B5/127 , G11B5/02 , G11B5/314 , G11B2005/001 , G11B2005/0021
Abstract: A heat-assisted magnetic recording head (HAMR) head includes a magnetic recording head including a recording pole for applying a magnetic recording field on a magnetic recording medium and a return pole magnetically connected to the recording pole to form a magnetic path, a light source for emitting light, and an optical transmission module including an photonic crystal waveguide disposed at a side of the magnetic recording head to guide light incident from the light source and a nano aperture for enhancing an optical field by varying an intensity distribution of the light guided through the photonic crystal waveguide.
Abstract translation: 热辅助磁记录头（HAMR）头包括磁记录头，磁记录头包括用于在磁记录介质上施加磁记录场的记录磁极和与记录磁极磁连接以形成磁路的返回磁极，光源 以及光传输模块，其包括设置在磁记录头侧的光子晶体波导以引导从光源入射的光，以及纳米孔径，用于通过改变导光的光的强度分布来增强光场 光子晶体波导。
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公开(公告)号：US09360751B2
公开(公告)日：2016-06-07
申请号：US13617874
申请日：2012-09-14
Applicant: Ki-yeon Yang , Woong Ko , Jae-kwan Kim , Du-hyun Lee , Byung-kyu Lee
Inventor： Ki-yeon Yang , Woong Ko , Jae-kwan Kim , Du-hyun Lee , Byung-kyu Lee
CPC classification number: G03F7/0002 , B29C59/022 , B82Y10/00 , B82Y40/00 , Y10S977/887
Abstract: An imprinting stamp and a nano-imprinting method using the imprinting stamp are provided. The imprinting stamp includes a first substrate; one or more field regions on the first substrate, the first substrate including nano-patterns; and a first dummy pattern region on the first substrate and adjacent to the field region, the dummy pattern region including first dummy patterns having greater dimensions than that of the nano-patterns, the first dummy patterns being a plurality of polygons, each of the polygons having a vertex pointing in a first direction proceeding from the field region toward the first dummy pattern region.
Abstract translation: 提供使用印记印记的印记印记和纳米印记法。 印记印模包括第一基板; 所述第一基板上的一个或多个场区域，所述第一基板包括纳米图案; 以及在所述第一基板上并且与所述场区域相邻的第一虚设图案区域，所述虚设图案区域包括具有比所述纳米图案的尺寸更大的尺寸的第一虚设图案，所述第一虚设图案是多个多边形，每个所述多边形 具有指向从场区域朝向第一虚拟图案区域的第一方向的顶点。
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13.发明申请STAMP, METHOD OF MANUFACTURING THE SAME, AND IMPRINTING METHOD USING THE STAMP 有权印章，其制造方法和使用印章的印刷方法公开(公告)号：US20130042779A1
公开(公告)日：2013-02-21
申请号：US13489968
申请日：2012-06-06
Applicant: Woong Ko , Ki-yeon Yang , Byung-kyu Lee , Du-hyun Lee , Jae-kwan Kim
Inventor： Woong Ko , Ki-yeon Yang , Byung-kyu Lee , Du-hyun Lee , Jae-kwan Kim
CPC classification number: B29C33/424 , B29C43/021 , B29C2043/025
Abstract: A stamp includes at least one protrusion on a protrusion pattern, and an end portion of the at least one protrusion may have a non-planarized surface. The end portion of the protrusion may have a concave structure, that is, the end portion includes a center region and an edge region, and the edge region is higher than the center region.
Abstract translation: 印模包括在突起图案上的至少一个突起，并且所述至少一个突起的端部可以具有非平坦化表面。 突起的端部可以具有凹形结构，即，端部包括中心区域和边缘区域，并且边缘区域高于中心区域。
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14.发明申请ORGANIC- INORGANIC HYBRID MATERIAL AND STAMP FOR NANOIMPRINT MANUFACTURED FROM THE SAME 审中-公开有机无机混合材料和印花从其制造的纳米薄膜公开(公告)号：US20120048184A1
公开(公告)日：2012-03-01
申请号：US13096471
申请日：2011-04-28
Applicant: Du-hyun Lee , Byung-kyu Lee , Woong Ko
Inventor： Du-hyun Lee , Byung-kyu Lee , Woong Ko
CPC classification number: C08G79/00
Abstract: Organic-inorganic hybrid materials may be inorganic-based materials including more inorganic material than organic material. The organic-inorganic hybrid materials may include a backbone material, a release material, and a photoinitiator. The backbone material may be formed of an inorganic material, and at least one of the release material and the photoinitiator may be formed of an organic material. The backbone material may include a compound (e.g., an oxide or a nitride) containing at least one selected from the group consisting of Si, In, Zn, Al, and Ti. The release material may include at least one selected from the group consisting of alkyl (CnH2n+1), C, F, and Si.
Abstract translation: 有机 - 无机混合材料可以是包括比有机材料更多的无机材料的无机基材料。 有机 - 无机混合材料可以包括骨架材料，剥离材料和光引发剂。 骨架材料可以由无机材料形成，并且剥离材料和光引发剂中的至少一种可以由有机材料形成。 骨架材料可以包括含有选自Si，In，Zn，Al和Ti中的至少一种的化合物（例如，氧化物或氮化物）。 剥离材料可以包括选自烷基（C n H 2n + 1），C，F和Si中的至少一种。
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15.发明申请Cross point memory arrays, methods of manufacturing the same, masters for imprint processes, and methods of manufacturing masters 有权交叉点存储器阵列，其制造方法，用于压印过程的主机以及制造主机的方法公开(公告)号：US20100090191A1
公开(公告)日：2010-04-15
申请号：US12588107
申请日：2009-10-05
Applicant: Byung-kyu Lee , Du-hyun Lee , Myoung-jae Lee
Inventor： Byung-kyu Lee , Du-hyun Lee , Myoung-jae Lee
CPC classification number: G11C13/0007 , G11C13/00 , G11C2213/32 , G11C2213/34 , G11C2213/71 , H01L27/2409 , H01L27/2481 , H01L45/04 , H01L45/1233 , H01L45/146 , H01L45/16
Abstract: A cross point memory array includes a structure in which holes are formed in an insulating layer and a storage node is formed in each of the holes. The storage node may include a memory resistor and a switching structure. The master for an imprint process used to form the cross-point memory array includes various pattern shapes, and the method of manufacturing the master uses various etching methods.
Abstract translation: 交叉点存储器阵列包括其中在绝缘层中形成空穴并且在每个孔中形成存储节点的结构。 存储节点可以包括存储器电阻器和开关结构。 用于形成交叉点存储器阵列的压印处理的主机包括各种图案形状，并且制造母版的方法使用各种蚀刻方法。
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Patent Agency Ranking
公开(公告)号：US20070172704A1
公开(公告)日：2007-07-26
申请号：US11652586
申请日：2007-01-12
Applicant: Byung-kyu Lee , No-yeol Park , Jin-seung Sohn , Seong-yong Yoon
Inventor： Byung-kyu Lee , No-yeol Park , Jin-seung Sohn , Seong-yong Yoon
CPC classification number: G11B5/855 , Y10T428/24942
Abstract: A patterned medium and a method of manufacturing the same are provided. The patterned medium includes a data region having a plurality of recording dots arrayed along a plurality of tracks; and a non-data region comprising a part of the patterned medium other than the data region, the non-data region having a plurality of pattern marks. The method includes depositing an aluminum layer on a base substrate; depositing a photo-resist on the aluminum layer; forming a pattern on the photo-resist using a lithography process; forming a fine pattern by forming a plurality of cavities on a portion of the aluminum layer which is exposed through the photo-resist; removing the photo-resist; forming a mold pattern; imprinting the mold pattern on a media substrate to form cavities on the media substrate; and filling the cavities with a recording material.
Abstract translation: 提供了图案化介质及其制造方法。 图案化介质包括具有沿多个轨道排列的多个记录点的数据区域; 以及非数据区域，包括除了数据区域之外的图案化介质的一部分，非数据区域具有多个图案标记。 该方法包括在基底基底上沉积铝层; 在铝层上沉积光刻胶; 使用光刻工艺在光致抗蚀剂上形成图案; 通过在通过光致抗蚀剂曝光的铝层的一部分上形成多个空腔来形成精细图案; 去除光刻胶; 形成模具图案; 将模具图案压印在介质基板上以在介质基板上形成空腔; 并用记录材料填充空腔。
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公开(公告)号：US20060147759A1
公开(公告)日：2006-07-06
申请号：US11364172
申请日：2006-03-01
Applicant: Byung-kyu Lee , Hoon-sang Oh , Kyung-jin Lee
Inventor： Byung-kyu Lee , Hoon-sang Oh , Kyung-jin Lee
IPC: G11B5/66
CPC classification number: G11B5/66 , G11B5/656 , G11B5/667 , G11B5/7325 , G11B5/74 , G11B2005/0005 , G11B2005/001 , G11B2005/0029
Abstract: A perpendicular magnetic recording medium having a good thermal stability and a high recording density is provided. The perpendicular magnetic recording medium includes at least a first and a second perpendicular magnetic recording layer and a substrate supporting the first and the second perpendicular magnetic recording layers. The first and the second perpendicular magnetic recording layers have different physical/magnetic properties and are formed of materials that compensate the different physical/magnetic properties. The first and the second perpendicular magnetic recording layers are selected from a layer for improving perpendicular magnetic anisotropic energy (Ku), a layer for reducing the size of crystal grains, a layer for reducing the size of magnetic domains, a layer for increasing an SNR, a layer for improving signal output, a layer for reducing noise, a layer for improving the uniformity of crystal grain sizes, and a layer for improving the uniformity of magnetic domain sizes.
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18.发明申请公开(公告)号：US20050186453A1
公开(公告)日：2005-08-25
申请号：US11065152
申请日：2005-02-25
Applicant: Hoon-sang Oh , Tae-hyo Lee , Byung-kyu Lee
Inventor： Hoon-sang Oh , Tae-hyo Lee , Byung-kyu Lee
CPC classification number: G11B5/8404 , G11B5/653 , G11B5/656 , G11B5/667 , G11B5/7325 , G11B5/7379
Abstract: Provided are a perpendicular magnetic recording medium having an underlayer between a substrate and a recording layer and a method of manufacturing the perpendicular magnetic recording medium. The method of manufacturing a perpendicular magnetic recording medium includes forming the underlayer of a plural-layer structure by at least 2 step processes under different deposition conditions. When using the underlayer formed by a 2-step manufacturing method, superior crystalline and high perpendicular magnetic anisotropy can be secured due to the lower underlayer, and the perpendicular magnetic recording layer having a high perpendicular coercivity and a small magnetic domain can be formed due to the underlayer beneath the recording layer.
Abstract translation: 提供了一种在基板和记录层之间具有底层的垂直磁记录介质以及垂直磁记录介质的制造方法。 制造垂直磁记录介质的方法包括在不同沉积条件下通过至少两步工艺形成多层结构的底层。 当使用通过2步制造方法形成的底层时，由于较低的底层可以确保优异的晶体和高垂直磁各向异性，并且由于可以形成具有高垂直矫顽力和小磁畴的垂直磁记录层 记录层下面的底层。
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19.发明授权公开(公告)号：US09333682B2
公开(公告)日：2016-05-10
申请号：US13620219
申请日：2012-09-14
Applicant: Ki-yeon Yang , Byung-kyu Lee , Du-hyun Lee , Woong Ko , Jae-kwan Kim
Inventor： Ki-yeon Yang , Byung-kyu Lee , Du-hyun Lee , Woong Ko , Jae-kwan Kim
CPC classification number: B29C43/021 , B29C43/10 , B29C2043/025 , B29C2043/3233 , B29C2043/3238 , B29C2043/3615 , B82Y10/00 , B82Y40/00 , G03F7/0002
Abstract: A stamp includes a transparent body having an inner chamber containing an inlet/outlet tube configured to have a fluid injected and removed therefrom.
Abstract translation: 邮票包括具有内部腔室的透明主体，该内部腔室包括被配置为具有从其喷射和移除的流体的入口/出口管。
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公开(公告)号：US08562842B2
公开(公告)日：2013-10-22
申请号：US13181660
申请日：2011-07-13
Applicant: Du-hyun Lee , Byung-kyu Lee , Woong Ko
Inventor： Du-hyun Lee , Byung-kyu Lee , Woong Ko
CPC classification number: G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017
Abstract: A method of fabricating a nanoimprint stamp includes forming a resist pattern having a nano size width on a stamp substrate by performing imprint processes repeatedly. In the imprint processes, resist layers that are selectively etched are sequentially used. The stamp substrate is etched using the resist pattern as an etch mask.
Abstract translation: 制造纳米压印印模的方法包括通过重复进行压印处理，在印模基板上形成具有纳米尺寸宽度的抗蚀剂图案。 在压印工艺中，依次使用被选择性蚀刻的抗蚀剂层。 使用抗蚀剂图案作为蚀刻掩模蚀刻印模基板。
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