Machining Of Fusion-Drawn Glass Laminate Structures Containing A Photomachinable Layer
    12.
    发明申请
    Machining Of Fusion-Drawn Glass Laminate Structures Containing A Photomachinable Layer 有权
    加工融合拉制的玻璃层压结构包含可光致变色层

    公开(公告)号:US20140238078A1

    公开(公告)日:2014-08-28

    申请号:US13798479

    申请日:2013-03-13

    Abstract: Methods for machining glass structures may be performed on fusion-drawn glass laminates having a core layer interposed between a first cladding layer and a second cladding layer. The core layer may be formed from a core glass composition having a core photosensitivity, the first cladding layer may be formed from a glass composition having a photosensitivity different from the core photosensitivity, and the second cladding layer may be formed from a glass composition having a photosensitivity different from the core photosensitivity. At least one of the core layer, the first cladding layer, and the second cladding layer is a photomachinable layer. The methods may include exposing a selected region of a photomachinable layer in the fusion-drawn laminate to ultraviolet radiation; heating the glass structure until the selected region crystallizes; and removing the crystallized material selectively from the photomachinable layer.

    Abstract translation: 用于加工玻璃结构的方法可以在具有介于第一包层和第二包层之间的芯层的熔融拉制玻璃层压板上进行。 芯层可以由具有芯光敏性的芯玻璃组合物形成,第一包层可以由具有不同于芯光敏性的光敏性的玻璃组合物形成,第二包层可以由玻璃组合物形成,所述玻璃组合物具有 光敏性与核心感光度不同。 核心层,第一包层和第二包层中的至少一个是可光致变色层。 所述方法可以包括将熔融拉制的层压体中的可光致热敏化层的选定区域暴露于紫外线辐射; 加热玻璃结构直到所选区域结晶; 并从所述可光致敏化层中选择性地除去所述结晶材料。

    SHEET OF SEMICONDUCTING MATERIAL, SYSTEM FOR FORMING SAME, AND METHOD OF FORMING SAME
    13.
    发明申请
    SHEET OF SEMICONDUCTING MATERIAL, SYSTEM FOR FORMING SAME, AND METHOD OF FORMING SAME 审中-公开
    半导体材料,其形成系统及其形成方法

    公开(公告)号:US20140099232A1

    公开(公告)日:2014-04-10

    申请号:US13841995

    申请日:2013-03-15

    Abstract: A method of forming a sheet of semiconductor material utilizes a system. The system comprises a first convex member extending along a first axis and capable of rotating about the first axis and a second convex member spaced from the first convex member and extending along a second axis and capable of rotating about the second axis. The first and second convex members define a nip gap therebetween. The method comprises applying a melt of the semiconductor material on an external surface of at least one of the first and second convex members to form a deposit on the external surface of at least one of the first and second convex members. The method further comprises rotating the first and second convex members in a direction opposite one another to allow for the deposit to pass through the nip gap, thereby forming the sheet of semiconductor material.

    Abstract translation: 形成半导体材料片的方法利用了一种系统。 该系统包括沿着第一轴线延伸并且能够围绕第一轴线旋转的第一凸起构件和与第一凸起构件间隔开并且沿着第二轴线延伸并能够围绕第二轴线旋转的第二凸起构件。 第一和第二凸起构件在它们之间限定了夹持间隙。 所述方法包括将所述半导体材料的熔体施加在所述第一和第二凸起构件中的至少一个的外表面上,以在所述第一和第二凸起构件中的至少一个的外部表面上形成沉积物。 该方法还包括使第一和第二凸出部件沿彼此相反的方向旋转,以允许沉积物通过夹持间隙,由此形成半导体材料片。

    METHODS OF TREATING A MOLD AND FORMING A SOLID LAYER OF A SEMICONDUCTING MATERIAL THEREON
    14.
    发明申请
    METHODS OF TREATING A MOLD AND FORMING A SOLID LAYER OF A SEMICONDUCTING MATERIAL THEREON 审中-公开
    处理模具的方法和形成其半导体材料的固体层

    公开(公告)号:US20130300025A1

    公开(公告)日:2013-11-14

    申请号:US13841773

    申请日:2013-03-15

    CPC classification number: B29C33/56

    Abstract: A method of forming a solid layer of a semiconducting material on an external surface of a treated mold which extends between a leading edge and a trailing edge comprises selectively modifying a temperature gradient of a mold such that a temperature of the leading edge (T1) is less than a temperature of the trailing edge (T2) to form the treated mold. The method further comprises submersing the treated mold into a molten semiconducting material such that the leading edge of the treated mold is first submersed into the molten semiconducting material. The method also comprises withdrawing the treated mold from the molten semiconducting material to form the solid layer of the semiconducting material on the external surface of the treated mold.

    Abstract translation: 在处理的模具的外表面上形成半导体材料的固体层的方法,其在前缘和后缘之间延伸,包括选择性地改变模具的温度梯度,使得前缘(T1)的温度为 小于后缘(T2)的温度以形成经处理的模具。 该方法还包括将经处理的模具浸入熔融半导体材料中,使得经处理的模具的前缘首先浸入熔融半导体材料中。 该方法还包括从熔融半导体材料中取出经处理的模具,以在被处理的模具的外表面上形成半导体材料的固体层。

    Machining of fusion-drawn glass laminate structures containing a photomachinable layer
    16.
    发明授权
    Machining of fusion-drawn glass laminate structures containing a photomachinable layer 有权
    包含可光致变色层的熔融玻璃层压结构的加工

    公开(公告)号:US09340451B2

    公开(公告)日:2016-05-17

    申请号:US13798479

    申请日:2013-03-13

    Abstract: Methods for machining glass structures may be performed on fusion-drawn glass laminates having a core layer interposed between a first cladding layer and a second cladding layer. The core layer may be formed from a core glass composition having a core photosensitivity, the first cladding layer may be formed from a glass composition having a photosensitivity different from the core photosensitivity, and the second cladding layer may be formed from a glass composition having a photosensitivity different from the core photosensitivity. At least one of the core layer, the first cladding layer, and the second cladding layer is a photomachinable layer. The methods may include exposing a selected region of a photomachinable layer in the fusion-drawn laminate to ultraviolet radiation; heating the glass structure until the selected region crystallizes; and removing the crystallized material selectively from the photomachinable layer.

    Abstract translation: 用于加工玻璃结构的方法可以在具有介于第一包层和第二包层之间的芯层的熔融拉制玻璃层压板上进行。 芯层可以由具有芯光敏性的芯玻璃组合物形成,第一包层可以由具有不同于芯光敏性的光敏性的玻璃组合物形成,第二包层可以由具有核心光敏性的玻璃组合物形成, 光敏性与核心感光度不同。 核心层,第一包层和第二包层中的至少一个是可光致变色层。 所述方法可以包括将熔融拉制的层压体中的可光致热敏化层的选定区域暴露于紫外线辐射; 加热玻璃结构直到所选区域结晶; 并从所述可光致敏化层中选择性地除去所述结晶材料。

    MECHANICAL AND CHEMICAL TEXTURIZATION OF A SILICON SHEET FOR PHOTOVOLTAIC LIGHT TRAPPING
    17.
    发明申请
    MECHANICAL AND CHEMICAL TEXTURIZATION OF A SILICON SHEET FOR PHOTOVOLTAIC LIGHT TRAPPING 审中-公开
    用于光伏照明的硅片的机械和化学文化

    公开(公告)号:US20130344641A1

    公开(公告)日:2013-12-26

    申请号:US13841109

    申请日:2013-03-15

    Abstract: A process for modifying a surface of a cast polycrystalline silicon sheet to decrease the light reflectance of the cast polycrystalline sheet is disclosed. The cast polycrystalline silicon sheet has at least one structural feature resulting from the cast polycrystalline silicon sheet being directly cast to a thickness less than 1000 micrometers. The process comprises grit blasting the surface of the cast polycrystalline silicon sheet to give an abraded surface on the cast polycrystalline silicon sheet. The process further comprises chemically etching the abraded surface of the cast polycrystalline silicon sheet to give a chemically-etched, abraded surface. The light reflectance of the chemically-etched, abraded surface is decreased in comparison to the light reflectance of the surface of the cast polycrystalline silicon sheet before the step of grit blasting.

    Abstract translation: 公开了一种用于改变流延多晶硅片的表面以降低铸塑多晶片的光反射率的方法。 铸造的多晶硅片具有至少一个由铸造的多晶硅片直接铸造成小于1000微米厚度的结构特征。 该方法包括喷砂铸造多晶硅片的表面以在铸造多晶硅片上产生磨损表面。 该方法还包括化学蚀刻流延多晶硅片的磨损表面以产生化学蚀刻的磨损表面。 与喷砂步骤之前的铸造多晶硅片的表面的光反射率相比,化学蚀刻的磨损表面的光反射率降低。

    MACHINING OF FUSION-DRAWN GLASS LAMINATE STRUCTURES CONTAINING A PHOTOMACHINABLE LAYER
    20.
    发明申请
    MACHINING OF FUSION-DRAWN GLASS LAMINATE STRUCTURES CONTAINING A PHOTOMACHINABLE LAYER 审中-公开
    包含可光化层的熔融玻璃层状结构的加工

    公开(公告)号:US20160221865A1

    公开(公告)日:2016-08-04

    申请号:US15094353

    申请日:2016-04-08

    Abstract: Methods for machining glass structures may be performed on fusion-drawn glass laminates having a core layer interposed between a first cladding layer and a second cladding layer. The core layer may be formed from a core glass composition having a core photosensitivity, the first cladding layer may be formed from a glass composition having a photosensitivity different from the core photosensitivity, and the second cladding layer may be formed from a glass composition having a photosensitivity different from the core photosensitivity. At least one of the core layer, the first cladding layer, and the second cladding layer is a photomachinable layer. The methods may include exposing a selected region of a photomachinable layer in the fusion-drawn laminate to ultraviolet radiation; heating the glass structure until the selected region crystallizes; and removing the crystallized material selectively from the photomachinable layer.

    Abstract translation: 用于加工玻璃结构的方法可以在具有介于第一包层和第二包层之间的芯层的熔融拉制玻璃层压板上进行。 芯层可以由具有芯光敏性的芯玻璃组合物形成,第一包层可以由具有不同于芯光敏性的光敏性的玻璃组合物形成,第二包层可以由玻璃组合物形成,所述玻璃组合物具有 光敏性与核心感光度不同。 核心层,第一包层和第二包层中的至少一个是可光致变色层。 所述方法可以包括将熔融拉制的层压体中的可光致热敏化层的选定区域暴露于紫外线辐射; 加热玻璃结构直到所选区域结晶; 并从所述可光致敏化层中选择性地除去所述结晶材料。

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