Negative crystalline photoresists for UV photoimaging
    16.
    发明授权
    Negative crystalline photoresists for UV photoimaging 失效
    用于UV光成像的负型结晶光致抗蚀剂

    公开(公告)号:US5061604A

    公开(公告)日:1991-10-29

    申请号:US518880

    申请日:1990-05-04

    IPC分类号: G03F7/20 G03F7/26 G03F7/36

    CPC分类号: G03F7/2006 G03F7/265 G03F7/36

    摘要: A described photo-sensitive system and process is useful as negative single layer photoresists with high resolution, high contrast, high sensitivity, long shelf life, and insensitivity to ambient light and allows large flexibility in the choice of polymer to be used.

    摘要翻译: 所描述的光敏系统和方法可用作具有高分辨率,高对比度,高灵敏度,长保质期和对环境光的不敏感性的负单层光刻胶,并且在选择使用的聚合物方面允许大的灵活性。

    Mask processing using films with spatially selective birefringence reduction
    18.
    发明授权
    Mask processing using films with spatially selective birefringence reduction 有权
    使用具有空间选择性双折射降低的膜的掩模处理

    公开(公告)号:US09101956B2

    公开(公告)日:2015-08-11

    申请号:US13703549

    申请日:2011-06-29

    摘要: Certain patternable reflective films are used as masks to make other patterned articles, and one or more initial masks can be used to pattern the patternable reflective films. An exemplary patternable reflective film has an absorption characteristic suitable to, upon exposure to a radiant beam, absorptively heat a portion of the film by an amount sufficient to change a first reflective characteristic to a different second reflective characteristic. The change from the first to the second reflective characteristic is attributable to a change in birefringence of one or more layers or materials of the patternable film. In a related article, a mask is attached to such a patternable reflective film. The mask may have opaque portions and light-transmissive portions. Further, the mask may have light-transmissive portions with structures such as focusing elements and/or prismatic elements.

    摘要翻译: 某些可图案化的反射膜用作掩模以制造其它图案制品,并且可以使用一个或多个初始掩模来对可图案化的反射膜进行图案化。 示例性的可图案化反射膜具有适于在暴露于辐射束时吸收特性的吸收特性,以将膜的一部分吸收热量足以将第一反射特性改变为不同的第二反射特性。 从第一反射特性到第二反射特性的变化归因于图案化膜的一个或多个层或材料的双折射变化。 在相关文章中,将掩模附着到这种可图案化的反射膜。 掩模可以具有不透明部分和透光部分。 此外,掩模可以具有诸如聚焦元件和/或棱镜元件的结构的透光部分。

    Effective media retarder films with spatially selective birefringence reduction
    19.
    发明授权
    Effective media retarder films with spatially selective birefringence reduction 有权
    具有空间选择性双折射降低的有效介质延迟膜

    公开(公告)号:US09081147B2

    公开(公告)日:2015-07-14

    申请号:US13342807

    申请日:2012-01-03

    摘要: A retarder film provides a first light retardation and can be heat processed in one or more selected areas to provide a second light retardation in the selected area(s). The retarder film may have an absorption characteristic such that the heat processing can be carried out by selectively exposing the film to a suitable radiant beam. The retarder film is composed of a stack of contiguous ultrathin layers configured to provide an effective optical medium for visible light. Visible light propagates through the stack as an effective medium having effective refractive indices along principal x-, y-, and z-axes. At least some of the ultrathin layers possess intrinsic birefringence, and the effective indices of the stack are functions of the intrinsic refractive indices of the constituent ultrathin layers. The heat processing is carried out so that the ultrathin layer stack structural integrity is not substantially altered in the processed area(s).

    摘要翻译: 延迟膜提供第一光延迟并且可以在一个或多个选定区域中进行热处理以在所选择的区域中提供第二光延迟。 延迟膜可以具有吸收特性,使得可以通过将膜选择性地暴露于合适的辐射束来进行热处理。 延迟膜由连续的超薄层的叠层组成,其被配置为提供可见光的有效光学介质。 可见光通过堆叠传播,作为沿着主要x轴,y轴和z轴具有有效折射率的有效介质。 至少一些超薄层具有固有的双折射,并且叠层的有效折射率是组成超薄层的固有折射率的函数。 进行热处理,使得超薄层堆叠结构完整性在经处理的区域中基本上不改变。