摘要:
The present invention includes a method of creating a shaped image in a workpiece using a flashlamp, the method comprising positioning a template proximate the workpiece and directing radiation emitted by the flashlamp during a short pulse of less than approximately 100 .mu.sec through the template toward the workpiece.
摘要:
Semicrystalline polymers can have predetermined amounts of their surfaces rendered quasi-amorphous by irradiation. Polymer surfaces which are so modified can display enhanced heat sealability to accept bonding to other materials.
摘要:
Semicrystalline polymers can have predetermined amounts of their surfaces rendered quasi-amorphous by irradiation. Polymer surfaces which are so modified can display enhanced ability to accept bonding to other materials.
摘要:
The present invention includes a method of creating a shaped image in a workpiece using a high energy source, with the method comprising positioning a layer proximate the workpiece such that the layer prevents debris from the workpiece from dispersing, and directing radiation from the high energy source through the layer to the workpiece, the layer substantially transparent to radiation emitted by the high energy source such that the high energy source is capable of forming the shaped image.
摘要:
Semicrystalline polymers can have predetermined amounts of their surfaces rendered amorphous or quasi-amorphous by irradiation. Further treatment of these polymer surfaces which have been so modified, such as crystallization, can produce surfaces with reduced coefficients of friction.
摘要:
A described photo-sensitive system and process is useful as negative single layer photoresists with high resolution, high contrast, high sensitivity, long shelf life, and insensitivity to ambient light and allows large flexibility in the choice of polymer to be used.
摘要:
Semicrystalline polymers can have predetermined amounts of their surfaces rendered quasi-amorphous by irradiation. Polymer surfaces which are so modified can display enhanced ability to accept bonding to other materials, particularly adhesives.
摘要:
Certain patternable reflective films are used as masks to make other patterned articles, and one or more initial masks can be used to pattern the patternable reflective films. An exemplary patternable reflective film has an absorption characteristic suitable to, upon exposure to a radiant beam, absorptively heat a portion of the film by an amount sufficient to change a first reflective characteristic to a different second reflective characteristic. The change from the first to the second reflective characteristic is attributable to a change in birefringence of one or more layers or materials of the patternable film. In a related article, a mask is attached to such a patternable reflective film. The mask may have opaque portions and light-transmissive portions. Further, the mask may have light-transmissive portions with structures such as focusing elements and/or prismatic elements.
摘要:
A retarder film provides a first light retardation and can be heat processed in one or more selected areas to provide a second light retardation in the selected area(s). The retarder film may have an absorption characteristic such that the heat processing can be carried out by selectively exposing the film to a suitable radiant beam. The retarder film is composed of a stack of contiguous ultrathin layers configured to provide an effective optical medium for visible light. Visible light propagates through the stack as an effective medium having effective refractive indices along principal x-, y-, and z-axes. At least some of the ultrathin layers possess intrinsic birefringence, and the effective indices of the stack are functions of the intrinsic refractive indices of the constituent ultrathin layers. The heat processing is carried out so that the ultrathin layer stack structural integrity is not substantially altered in the processed area(s).
摘要:
Material comprising sub-micrometer particles dispersed in a polymeric matrix. The materials are useful in article, for example, for numerous applications including display applications (e.g., liquid crystal displays (LCD), light emitting diode (LED) displays, or plasma displays); light extraction; electromagnetic interference (EMI) shielding, ophthalmic lenses; face shielding lenses or films; window films; antireflection for construction applications; and construction applications or traffic signs.