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公开(公告)号:US12059656B2
公开(公告)日:2024-08-13
申请号:US17488897
申请日:2021-09-29
Applicant: Entegris, Inc.
Inventor: James Hamzik , Justin Brewster , Siddarth Sampath , Jad Ali Jaber , Aabid A. Mir
CPC classification number: B01D71/261 , B01D67/0093 , B01D2257/60
Abstract: The disclosure is directed to removal of metal contaminants from fluids, as well as ligand-modified filter materials useful for carrying out such methods. The filters and methods of this disclosure are particularly effective for removal of metals from liquid compositions comprising amines. Such liquid compositions with significantly reduced amounts of metals can be used in a microelectronic manufacturing process, such as liquids for removing photoresist or liquids used in etching. The ligand-modified filters, such as ligand-modified porous membranes, can be configured for use in a microelectronic manufacturing system, which can be utilized in the system as a point of use metal-removal feature for liquids entering the system.
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公开(公告)号:US20230372879A1
公开(公告)日:2023-11-23
申请号:US18199204
申请日:2023-05-18
Applicant: ENTEGRIS, INC.
Inventor: Ying Qi , James Hamzik , Lucas Benjamin Snyder , Saksatha Ly
CPC classification number: B01D69/02 , B01D71/36 , B01D2325/02834 , B01D2325/24 , B01D2257/91
Abstract: The disclosure provides porous membranes capable of removing very small particulates from a liquid composition. In certain embodiments, the porous membranes comprise poly(tetrafluoroethylene), wherein the membrane is at least partially coated with a polymer prepared from the free radical reaction of ethylenically-unsaturated monomers, wherein the monomers are comprised of monomers having an amide moiety. In particular embodiments, the membranes are capable of removing, by filtration, microbial particles such as bacteria, thus rendering the resulting liquid composition essentially sterile.
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公开(公告)号:US11731085B2
公开(公告)日:2023-08-22
申请号:US17522159
申请日:2021-11-09
Applicant: ENTEGRIS, Inc.
Inventor: Jad Ali Jaber , Saksatha Ly , James Hamzik , Testu Kohyama
IPC: B01D67/00 , B01D69/02 , B01D71/26 , B01D71/78 , B01D71/82 , B01J20/26 , B01J20/28 , B01J20/32 , C07C45/78 , C08J5/22 , G03F7/027
CPC classification number: B01D67/0088 , B01D69/02 , B01D71/26 , B01D71/78 , B01D71/82 , B01J20/267 , B01J20/28035 , B01J20/3208 , B01J20/3282 , C07C45/786 , C08J5/2243 , G03F7/027 , B01D2323/30 , B01D2325/14 , B01D2325/16 , C08J2333/26
Abstract: The present disclosure provides a porous polymeric membrane that is coated with a cross-linked polymerized monomer. The coating on the porous polymeric membrane has a charge when it is immersed in an organic liquid. The coated porous polymeric membrane, a filter utilizing the membrane, and a method for treating an organic liquid used for photoresist with the coated porous polymeric membrane to remove metal contaminants from the organic liquid are disclosed.
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公开(公告)号:US20250144574A1
公开(公告)日:2025-05-08
申请号:US19017111
申请日:2025-01-10
Applicant: ENTEGRIS, INC.
Inventor: James Hamzik , Siddarth Sampath , Justin Brewster , Ashutosh Shrikant Bhabhe
IPC: B01D69/12 , B01D67/00 , B01D71/26 , C02F1/42 , C02F1/44 , C02F101/10 , C02F101/20 , C02F101/30 , C02F103/04
Abstract: Described are filter membranes, related systems, and related method useful for producing purified (e.g., ultrapure) water, including membranes, systems, and methods of preparing purified water that will be useable in processes of manufacturing electronic and semiconductor devices.
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公开(公告)号:US20250099918A1
公开(公告)日:2025-03-27
申请号:US18891895
申请日:2024-09-20
Applicant: ENTEGRIS, INC.
Inventor: Alketa Gjoka , Jad Ali Jaber , Clifton G. Ngan , James Hamzik , David Crespo , Saksatha Ly , Christopher W. Webb , Jikku Thomas , Satoshi Kamimoto , Gaurav M. Batra , Siddarth Sampath
Abstract: Described are coated porous polymeric filter membranes that include a filter membrane substrate and an ionic polymer coating applied to the surface of the substrate; methods of making the coated porous polymeric filter membranes and filters that include such a coated membrane; and method of using the coated membranes to remove metal ions from purified water.
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公开(公告)号:US11772055B2
公开(公告)日:2023-10-03
申请号:US17184273
申请日:2021-02-24
Applicant: ENTEGRIS, INC.
Inventor: James Hamzik , Jad A. Jaber , Nicholas J. Filipancic , Justin Brewster
IPC: B01D69/12 , B01D71/26 , B01D71/36 , B01D71/58 , C02F101/20 , C02F101/22 , C02F103/34 , C02F1/44 , C07C229/16 , C08F255/02 , C08F259/08
CPC classification number: B01D71/58 , B01D69/12 , B01D71/26 , B01D71/36 , C02F1/44 , C07C229/16 , C08F255/02 , C08F259/08 , C02F2101/203 , C02F2101/22 , C02F2103/346
Abstract: Described are filter materials having polycarboxyl ligands, such as iminodiacetic acid, which are highly effective for filtering metals or metal ions from fluids. The filter materials can be particularly useful to filter various fluid compositions, such as those used for wet etching, removing photoresist, and cleaning steps in microelectronic device manufacturing.
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公开(公告)号:US11465104B2
公开(公告)日:2022-10-11
申请号:US16779181
申请日:2020-01-31
Applicant: ENTEGRIS, INC.
Inventor: James Hamzik , Jad A. Jaber , Justin Brewster , Nicholas J. Filipancic
IPC: B01D71/82 , B01D71/36 , B01D69/12 , C02F1/44 , B01J20/26 , C09K13/06 , B01J20/28 , H01L21/306 , B01J20/30 , C02F103/34 , C02F101/20
Abstract: Described are filter materials including a polyol ligand, such as n-methylglucamine, and/or a polyphosphonic acid ligand, which are highly effective for filtering metals or metal ions from fluids. The filter materials can be particularly useful to filter basic and acidic fluid compositions, such as those used for wet etching, removing photoresist, and cleaning steps in microelectronic device manufacturing.
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公开(公告)号:US20220184595A1
公开(公告)日:2022-06-16
申请号:US17543362
申请日:2021-12-06
Applicant: ENTEGRIS, INC.
Inventor: James Hamzik , Jad Ali Jaber
Abstract: This disclosure provides certain strong cation-modified ion exchange resins and membranes useful for carrying out the removal of metal and metal ion contaminants in fluid compositions. Filtered liquid compositions with significantly reduced amounts of metals can be used in a microelectronic manufacturing process, such as liquids for removing photoresist. The cation-modified ion exchange resins and membranes of the disclosure can be configured for use in a microelectronic manufacturing system, which can be utilized in the system as a point of use metal-removal feature for liquids entering the system. Advantageously, the filter materials and methods of this disclosure showed considerable improvement in preventing degradation and the formation of color bodies and dimeric and oligomeric materials from ketones (e.g., cyclohexanone) in the liquid compositions while not compromising the filter material's ability to remove undesired metal ions.
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