公开(公告)号：US20240329531A1

公开(公告)日：2024-10-03

申请号：US18621906

申请日：2024-03-29

Applicant: FUJIFILM Corporation

Inventor： Takamitsu TOMIGA ,  Hideaki Tsubaki ,  Asahi Takaki

IPC: G03F7/039 ,  C08F212/14 ,  C08F220/28 ,  C08F220/38 ,  C08L25/18 ,  G03F7/004 ,  G03F7/038

CPC classification number: G03F7/039 ,  C08F212/24 ,  C08F220/282 ,  C08F220/283 ,  C08F220/38 ,  C08L25/18 ,  G03F7/0045 ,  G03F7/038

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition having a concentration of solid contents of 15% or more, the resin composition containing (A) a resin including a repeating unit (a1) having an acid-decomposable group and a repeating unit (a2) having an aromatic ring, (B) a resin including a repeating unit (b1) represented by a specified general formula (1), and (C) a compound that generates an acid upon irradiation with an actinic ray or a radiation, wherein a content of a repeating unit having an acid-decomposable group and included in the resin (B) is 5 mol % or less relative to all repeating units in the resin (B).

公开(公告)号：US11640113B2

公开(公告)日：2023-05-02

申请号：US16368522

申请日：2019-03-28

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Hajime Furutani ,  Akihiro Kaneko ,  Wataru Nihashi ,  Shuji Hirano

IPC: G03F7/039 ,  G03F7/38 ,  G03F7/038 ,  C08F220/18 ,  G03F7/16 ,  G03F7/20 ,  G03F7/32 ,  H01L21/027

Abstract: Provided is an actinic ray-sensitive or radiation-sensitive resin composition including: (A) a resin including a repeating unit (a) represented by Formula (1); (B) a compound that generates an acid by irradiation with actinic rays or radiation; and (C) an organic solvent. A concentration of solid contents of the actinic ray-sensitive or radiation-sensitive resin composition is 4 mass % or less. (in the formula, R11 and R12 each independently represent a hydrogen atom, a halogen atom, or a monovalent organic group. R13 represents a hydrogen atom, a halogen atom, or a monovalent organic group or is a single bond or an alkylene group, and is bonded to L or Ar in the formula to form a ring. L represents a single bond or a divalent linking group. Ar represents an aromatic ring group. n represents an integer of 2 or more.)

公开(公告)号：US10788754B2

公开(公告)日：2020-09-29

申请号：US15853973

申请日：2017-12-26

Applicant: FUJIFILM Corporation

Inventor： Wataru Nihashi ,  Toru Tsuchihashi ,  Hideaki Tsubaki

IPC: G03F7/32 ,  G03F7/20 ,  G03F7/039 ,  G03F7/038 ,  G03F7/004

Abstract: Provided are a positive tone pattern forming method in which development is carried out using a developer containing an organic solvent with use of a composition containing (A) a resin which has a repeating unit containing a moiety capable of forming a polar interaction and whose polarity is decreased due to release of the polar interaction by the action of an acid or a base, or a composition containing (A′) a resin having a repeating unit containing a polar group and (B) a compound capable of forming a polar interaction with the polar group of the resin (A′); and an electronic device manufacturing method including such a pattern forming method.

公开(公告)号：US10761426B2

公开(公告)日：2020-09-01

申请号：US15904439

申请日：2018-02-26

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Wataru Nihashi ,  Toru Tsuchihashi ,  Kei Yamamoto

IPC: G03F7/038 ,  G03F7/11 ,  G03F7/039 ,  G03F7/09 ,  G03F7/32 ,  G03F7/075 ,  H01L21/027 ,  G03F7/095

Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film using a composition for forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer containing an organic solvent, in which the composition for forming an upper layer film includes a resin and at least one of a compound capable of generating an acid with actinic rays or radiation, a compound capable of generating an acid with heat, and an acid, in which the resin includes a repeating unit represented by General Formula (II). The method for manufacturing an electronic device includes the pattern forming method. A laminate includes the film and the upper layer film.

公开(公告)号：US20180180996A1

公开(公告)日：2018-06-28

申请号：US15904439

申请日：2018-02-26

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Wataru Nihashi ,  Toru Tsuchihashi ,  Kei Yamamoto

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/11 ,  G03F7/32 ,  H01L21/027

Abstract: The pattern forming method includes forming an actinic ray-sensitive or radiation-sensitive film using an actinic ray-sensitive or radiation-sensitive composition, forming an upper layer film using a composition for forming an upper layer film on the actinic ray-sensitive or radiation-sensitive film, exposing the actinic ray-sensitive or radiation-sensitive film having the upper layer film formed thereon, and developing the exposed actinic ray-sensitive or radiation-sensitive film using a developer containing an organic solvent, in which the composition for forming an upper layer film includes a resin and at least one of a compound capable of generating an acid with actinic rays or radiation, a compound capable of generating an acid with heat, and an acid, in which the resin includes a repeating unit represented by General Formula (II). The method for manufacturing an electronic device includes the pattern forming method. A laminate includes the film and the upper layer film.

公开(公告)号：US09459531B2

公开(公告)日：2016-10-04

申请号：US14744963

申请日：2015-06-19

Applicant: FUJIFILM Corporation

Inventor： Natsumi Yokokawa ,  Hiroo Takizawa ,  Hideaki Tsubaki

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/30 ,  G03F7/32 ,  C08F8/02 ,  C08F8/12 ,  C08F8/14 ,  C08F212/14 ,  C08F212/32 ,  C08F216/10 ,  C08F216/38 ,  C08F220/30 ,  C08F8/34 ,  C08F8/36

Abstract: There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit represented by the following Formula (A) and having at least two of a repeating unit represented by the following Formula (B), a repeating unit represented by the following Formula (C), a repeating unit represented by the following Formula (D) and a repeating unit represented by the following Formula (E).

公开(公告)号：US09411230B2

公开(公告)日：2016-08-09

申请号：US14227344

申请日：2014-03-27

Applicant: FUJIFILM Corporation

Inventor： Hiroo Takizawa ,  Kaoru Iwato ,  Hideaki Tsubaki

IPC: G03F7/038 ,  G03F7/32 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/20 ,  G03F7/40

CPC classification number: G03F7/0388 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/038 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/405

Abstract: There is provided a pattern forming method comprising (1) a step of forming a film by using an electron beam-sensitive or extreme ultraviolet-sensitive resin composition, (2) a step of exposing the film by using an electron beam or an extreme ultraviolet ray, and (3) a step of developing the exposed film by using an organic solvent-containing developer, wherein the electron beam-sensitive or extreme ultraviolet-sensitive resin composition contains (A) a resin containing (R) a repeating unit having a structural moiety capable of decomposing upon irradiation with an electron beam or an extreme ultraviolet ray to generate an acid, and (B) a solvent.

Abstract translation: 提供了一种图案形成方法，其包括（1）通过使用电子束敏感或极紫外线敏感性树脂组合物形成膜的步骤，（2）通过使用电子束或极紫外线曝光该膜的步骤 （3）通过使用含有机溶剂的显影剂显影曝光膜的步骤，其中电子束敏感性或极紫外线敏感性树脂组合物含有（A）含有（R）重复单元的树脂，其具有 能够在用电子束或极紫外线照射时分解以产生酸的结构部分，和（B）溶剂。

公开(公告)号：US09291904B2

公开(公告)日：2016-03-22

申请号：US14549164

申请日：2014-11-20

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Shinichi Kanna

IPC: G03F7/20 ,  G03F7/30 ,  G03F7/32 ,  G03F7/039 ,  G03F7/40

CPC classification number: G03F7/325 ,  G03F7/038 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/16 ,  G03F7/2002 ,  G03F7/2024 ,  G03F7/30 ,  G03F7/32 ,  G03F7/40 ,  Y10T428/24802

Abstract: A pattern forming method, including: (A) coating a substrate with a positive resist composition of which solubility in a positive developer increases and solubility in a negative developer decreases upon irradiation with actinic rays or radiation, so as to form a resist film; (B) exposing the resist film; and (D) developing the resist film with a negative developer; a positive resist composition for multiple development used in the method; a developer for use in the method; and a rinsing solution for negative development used in the method.

公开(公告)号：US09188862B2

公开(公告)日：2015-11-17

申请号：US14303090

申请日：2014-06-12

Applicant: FUJIFILM Corporation

Inventor： Shuji Hirano ,  Hiroo Takizawa ,  Hideaki Tsubaki

IPC: G03F7/039 ,  G03F7/20 ,  G03F7/038 ,  C07D233/06 ,  C07D233/56 ,  C07D235/22 ,  C08F12/22 ,  C07D295/22 ,  C08F220/10 ,  G03F7/004 ,  G03F7/11 ,  C08F220/18 ,  C08F12/20 ,  C08F12/30 ,  C08F212/14 ,  C07D401/12 ,  C07C313/06 ,  C07C313/24 ,  C07D267/00 ,  G03F7/32

CPC classification number: G03F7/0388 ,  C07C313/06 ,  C07C313/24 ,  C07D233/06 ,  C07D233/56 ,  C07D235/22 ,  C07D267/00 ,  C07D295/22 ,  C07D401/12 ,  C08F12/20 ,  C08F12/22 ,  C08F12/30 ,  C08F212/14 ,  C08F220/10 ,  C08F220/18 ,  G03F7/004 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/322 ,  G03F7/325 ,  C08F2220/1825

Abstract: An actinic ray-sensitive or radiation-sensitive resin composition, which is excellent in sensitivity, resolution, a pattern profile and a depth of focus (DOF), and, an actinic ray-sensitive or radiation-sensitive film and a pattern forming method, each using the same, are provided. The actinic ray-sensitive or radiation-sensitive resin composition includes a nitrogen-containing compound and a resin (Ab) capable of varying a polarity or an alkali solubility thereof by the action of an acid.

Abstract translation: 灵敏度，分辨率，图案轮廓和焦深（DOF）优异的光化射线敏感或辐射敏感性树脂组合物，以及光化射线敏感或辐射敏感膜和图案形成方法， 每个使用相同的。 光化射线敏感或辐射敏感性树脂组合物包括含氮化合物和能够通过酸的作用改变其极性或碱溶性的树脂（Ab）。

公开(公告)号：US10599038B2

公开(公告)日：2020-03-24

申请号：US15849689

申请日：2017-12-21

Applicant: FUJIFILM Corporation

Inventor： Hideaki Tsubaki ,  Toru Tsuchihashi ,  Wataru Nihashi

IPC: G03F7/00 ,  G03F7/32 ,  G03F7/40 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039

Abstract: Provided are a rinsing liquid which is used for rinsing a resist film obtained from an actinic ray-sensitive or radiation-sensitive composition and includes a hydrocarbon-based solvent having a branched alkyl group. The hydrocarbon-based solvent having a branched alkyl group contains at least one of isodecane or isododecane.