公开(公告)号：US20140050900A1

公开(公告)日：2014-02-20

申请号：US14063739

申请日：2013-10-25

Applicant: FUJIFILM Corporation

Inventor： Kunihiko KODAMA ,  Yuichiro GOTO

IPC: G03F7/075 ,  B29C59/16

CPC classification number: G03F7/0757 ,  B82Y10/00 ,  B82Y40/00 ,  C08F22/40 ,  C08F30/08 ,  G03F7/0002 ,  G03F7/027 ,  G03F7/0755 ,  Y10T428/24802

Abstract: Provide is a curable composition for imprints capable of keeping a good pattern and heat resistance. A curable composition for imprints comprising a polymerizable compound (Ax-1) having maleimide structure(s), or a compound (Ax-2) having a partial structure represented by formula (I) below. Formula (I)

Abstract translation: 提供一种能够保持良好图案和耐热性的印痕的可固化组合物。 一种用于印痕的可固化组合物，其包含具有马来酰亚胺结构的可聚合化合物（Ax-1）或具有由下式（I）表示的部分结构的化合物（Ax-2）。 式（I）

公开(公告)号：US20220091503A1

公开(公告)日：2022-03-24

申请号：US17542499

申请日：2021-12-06

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO

IPC: G03F7/004 ,  G03F7/20

Abstract: Provided are a composition for forming a pattern for imprinting, including (A) a polymerizable compound which contains an aromatic ring and does not contain a hydroxyl group, (B) a photopolymerization initiator which contains an aromatic ring and does not contain a hydroxyl group, and (C) a photopolymerization initiator which has a specific structure containing a hydroxyl group, in which a viscosity of components excluding a solvent from the composition for forming a pattern at 23° C. is 300 mPa·s or lower; a cured film to which the composition for forming a pattern is applied; a laminate; a pattern producing method; and a method for manufacturing a semiconductor element.

公开(公告)号：US20220009152A1

公开(公告)日：2022-01-13

申请号：US17484492

申请日：2021-09-24

Applicant: FUJIFILM Corporation

Inventor： Akihiro HAKAMATA ,  Naoya SHIMOJU ,  Yuichiro GOTO

IPC: B29C59/02 ,  C08F2/50 ,  C08F220/10 ,  G03F7/20 ,  G03F7/004

Abstract: Provided are: a composition for forming an underlayer film in an imprinting method, which includes a high-molecular-weight compound having a polymerizable functional group and a monomer having a plurality of crosslinking functional groups capable of being bonded to the polymerizable functional group, and in which a Hansen solubility parameter distance, which is a difference between a Hansen solubility parameter of the high-molecular-weight compound and a Hansen solubility parameter of the monomer, is 5.0 or less, and regarding the two crosslinking functional groups among the plurality of crosslinking functional groups, the number of atoms, which constitute a shortest atom chain mutually linking crosslinking points in the respective crosslinking functional groups, is 7 or more; a laminate including a layer formed of the composition for forming an underlayer film; and a method for manufacturing a semiconductor element, in which a semiconductor element is manufactured using a pattern obtained by a pattern producing method.

公开(公告)号：US20190212647A1

公开(公告)日：2019-07-11

申请号：US16353432

申请日：2019-03-14

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO

IPC: G03F7/00 ,  C08G65/08 ,  C08L35/02 ,  C08L71/02 ,  C09D171/02 ,  C09D135/02

CPC classification number: G03F7/0002 ,  B29C59/02 ,  C08G65/08 ,  C08L35/02 ,  C08L71/02 ,  C08L2203/20 ,  C09D129/02 ,  C09D135/02 ,  C09D171/02 ,  H01L21/027 ,  H01L21/0271

Abstract: An object of the present invention is to improve wettability of a curable composition for imprinting on a substrate. There is provided a novel composition for forming a primer layer for imprinting, a primer layer in which the above-described composition for forming a primer layer is used, and a laminate. Provided is a composition for forming a primer layer for imprinting which satisfies at least one of A and B. A: A component having a surface tension of greater than or equal to 40 mN/m at 25° C. is contained. B: A critical surface tension of a primer layer formed of the composition for forming a primer layer for imprinting is greater than or equal to 46 mN/m at 25° C.

公开(公告)号：US20180037688A1

公开(公告)日：2018-02-08

申请号：US15703115

申请日：2017-09-13

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Kazuhiro MARUMO ,  Hirotaka KITAGAWA ,  Tadashi OOMATSU

IPC: C08F222/14 ,  B29C59/02 ,  G03F7/00

CPC classification number: C08F222/14 ,  B29C59/02 ,  C08F2/48 ,  C08F222/10 ,  C08F2220/1858 ,  C08F2220/1866 ,  C08F2220/1875 ,  C08F2220/1883 ,  C08F2220/1891 ,  C08F2222/1013 ,  C08F2800/20 ,  G03F7/0002 ,  H01L21/027

Abstract: Provided are a curable composition for imprints which is capable of both improving releasability and suppressing occurrence of waviness during etching, as well as a cured product, a pattern forming method, a lithography method, a pattern, and a lithography mask, each of which uses the curable composition for imprints. The curable composition for imprints includes a monofunctional polymerizable compound, a polyfunctional polymerizable compound containing at least one of an alicyclic structure or an aromatic ring structure and having a viscosity at 25° C. of 150 mPa·s or less, and a photopolymerization initiator, in which the monofunctional polymerizable compound is contained in an amount of 5 to 30 mass % with respect to the total polymerizable compound in the curable composition for imprints, and the cured film of the curable composition for imprints has a modulus of elasticity of 3.5 GPa or less and a glass transition temperature of 90° C. or higher.

公开(公告)号：US20170285468A1

公开(公告)日：2017-10-05

申请号：US15622474

申请日：2017-06-14

Applicant: FUJIFILM Corporation

Inventor： Hirotaka KITAGAWA ,  Yuichiro GOTO

IPC: G03F7/00 ,  H01L21/027 ,  C08F222/10 ,  B41M7/00 ,  B41M5/00

CPC classification number: G03F7/0002 ,  B41M5/0047 ,  B41M7/0081 ,  C08F2/44 ,  C08F2/48 ,  C08F2/50 ,  C08F220/18 ,  C08F220/22 ,  C08F222/1006 ,  C08F2222/102 ,  C09D7/40 ,  C09D11/101 ,  C09D11/102 ,  C09D11/30 ,  G03F7/0046 ,  G03F7/027 ,  H01L21/0271 ,  C08F2220/1891 ,  C08F2222/1013

Abstract: Provided are a photocurable composition for imprints, having good releasability and temporal stability of the releasability, a pattern forming method, and a method for manufacturing a device.This photocurable composition for imprints includes a monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom, a bifunctional or higher polyfunctional (meth)acrylate (A2) not containing a fluorine atom, a monofunctional (meth)acrylate (B) containing a fluorine atom, and a photopolymerization initiator (C), in which the monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom has a boiling point of 100° C. to 200° C. at a pressure of 0.67 kPa, and the monofunctional (meth)acrylate (B) containing a fluorine atom has a boiling point of 100° C. to 200° C. at a pressure of 0.67 kPa.

公开(公告)号：US20150185606A1

公开(公告)日：2015-07-02

申请号：US14643512

申请日：2015-03-10

Applicant: FUJIFILM Corporation

Inventor： Hirotaka KITAGAWA ,  Yuichiro GOTO ,  Yuichiro ENOMOTO

IPC: G03F7/031 ,  G03F7/00 ,  H01L21/308 ,  G03F7/004

CPC classification number: G03F7/031 ,  C08F2/44 ,  C08F2/48 ,  C09D11/101 ,  C09D11/30 ,  G03F7/0002 ,  G03F7/0035 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0388 ,  H01L21/3081 ,  H01L21/3086 ,  H01L21/3088 ,  Y10T428/24355 ,  Y10T428/24802

Abstract: Provided is a curable composition for photo imprints excellent in the mold releasability and the ink jettability. THe curable composition for photo imprints, comprising: a polymerizable compound (A); a photo-polymerization initiator (B); and a mold releasing agent (C), the mold releasing agent (C) being represented by the formula (I) below. Rf represents a C1-8 fluorine-containing alkyl group having two or more fluorine atoms; m represents 1 or 2; L represents a single bond or divalent linking group; n represents 1 or 2; X represents a single bond, oxygen atom, sulfur atom, or nitrogen atom; R1 represents a C1-8 substituent being free from a polymerizable group; R2 represents a hydrogen atom, C1-8 substituent, or divalent linking group; p represents 1 or 2, q represents 0 or 1, and r represents 1 or 2; R1 and R2 may combine with each other to form a ring.

Abstract translation: 本发明提供了一种在脱模性和油墨喷射性方面优异的光印的可固化组合物。 一种用于光印的可固化组合物，包括：可聚合化合物（A）; 光聚合引发剂（B）; 和脱模剂（C），脱模剂（C）由下式（I）表示。 Rf表示具有两个以上氟原子的C 1-8含氟烷基; m表示1或2; L表示单键或二价连接基团; n表示1或2; X表示单键，氧原子，硫原子或氮原子; R1表示不含可聚合基团的C1-8取代基; R2表示氢原子，C1-8取代基或二价连接基团; p表示1或2，q表示0或1，r表示1或2; R1和R2可以相互结合形成环。

公开(公告)号：US20220002450A1

公开(公告)日：2022-01-06

申请号：US17476481

申请日：2021-09-16

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Naoya SHIMOJU

IPC: C08F20/10 ,  H01L21/306 ,  G03F7/00 ,  H01L21/3213

Abstract: Provided are: a composition for forming a pattern for imprinting, which contains a polymerizable compound, a photopolymerization initiator, and an organic halogen compound containing at least one atom selected from the group consisting of a chlorine atom, a bromine atom, and an iodine atom, in which the organic halogen compound is a compound which is stable to light of a mercury lamp, and a content of the organic halogen compound is 0.001% to 1.0% by mass with respect to a total solid content in the composition for forming a pattern; a kit including the composition for forming a pattern; a pattern producing method; a pattern; and a method for manufacturing a semiconductor element.

公开(公告)号：US20210232049A1

公开(公告)日：2021-07-29

申请号：US17210519

申请日：2021-03-24

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Naoya SHIMOJU

IPC: G03F7/038 ,  B29C59/02 ,  C08F2/48 ,  H01L21/033

Abstract: Provided are a curable composition for imprinting including a polymerizable compound, a photopolymerization initiator, and a particulate metal which has a particle diameter of 1 nm or larger, as measured by a single particle ICP-MASS method, and includes at least one kind of iron, copper, titanium, or lead, in which a content of the particulate metal is 100 ppt by mass to 30 ppb by mass with respect to a solid content of the composition; a method for producing the curable composition for imprinting; a cured product using the curable composition for imprinting; a pattern producing method; and a method for manufacturing a semiconductor element.

公开(公告)号：US20210206910A1

公开(公告)日：2021-07-08

申请号：US17211843

申请日：2021-03-25

Applicant: FUJIFILM Corporation

Inventor： Yuichiro GOTO ,  Akihiro HAKAMATA

IPC: C08G61/04 ,  C08K3/08 ,  C08F222/10 ,  H01L21/027 ,  G03F7/00

Abstract: Provided are a composition for forming an underlayer film for imprinting, including a curable component, and a particulate metal which has a particle diameter of 10 nm or larger, as measured by a single particle ICP-MASS method, and contains at least one kind of iron, copper, titanium, or lead, in which a content of the particulate metal is 50 ppt by mass to 10 ppb by mass with respect to the composition; a method for producing a composition for forming an underlayer film for imprinting; a pattern producing method; a method for manufacturing a semiconductor element; a cured product; and a kit.