公开(公告)号：US08975712B2

公开(公告)日：2015-03-10

申请号：US13893524

申请日：2013-05-14

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Mahbub Rashed ,  Juhan Kim ,  Yunfei Deng ,  Suresh Venkatesan

IPC: H01L27/092 ,  H01L21/336 ,  H01L27/088 ,  H01L21/8234 ,  H01L21/84 ,  H01L21/338 ,  H01L21/8238 ,  G06F17/50

CPC classification number: H01L29/0696 ,  G06F17/5072 ,  H01L21/823431 ,  H01L21/823821 ,  H01L21/845 ,  H01L27/0886 ,  H01L27/0924 ,  H01L27/1211 ,  H01L29/6681 ,  H01L29/785

Abstract: One method disclosed herein includes forming first and second transistor devices in and above adjacent active regions that are separated by an isolation region, wherein the transistors comprise a source/drain region and a shared gate structure, forming a continuous conductive line that spans across the isolation region and contacts the source/drain regions of the transistors and etching the continuous conductive line to form separated first and second unitary conductive source/drain contact structures that contact the source/drain regions of the first and second transistors, respectively. A device disclosed herein includes a gate structure, source/drain regions, first and second unitary conductive source/drain contact structures, each of which contacts one of the source/drain regions, and first and second conductive vias that contact the first and second unitary conductive source/drain contact structures, respectively.

Abstract translation: 本文公开的一种方法包括在由隔离区域分隔的相邻有源区域中和上方形成第一和第二晶体管器件，其中晶体管包括源极/漏极区域和共享栅极结构，形成跨越隔离的连续导电线 区域并与晶体管的源极/漏极区域接触并蚀刻连续导电线以形成分别与第一和第二晶体管的源极/漏极区域接触的分离的第一和第二整体导电源极/漏极接触结构。 本文公开的器件包括栅极结构，源极/漏极区域，第一和第二整体导电源极/漏极接触结构，其每一个接触源极/漏极区域之一，以及接触第一和第二整体的第一和第二导电通孔 导电源极/漏极接触结构。

公开(公告)号：US20140327146A1

公开(公告)日：2014-11-06

申请号：US13874803

申请日：2013-05-01

Applicant: Globalfoundries Inc

Inventor： Yunfei Deng ,  Lei Yuan ,  Hidekazu Yoshida ,  Juhan Kim ,  Mahbub Rashed ,  Jongwook Kye

IPC: G06F17/50 ,  H01L23/48

CPC classification number: G06F17/5077 ,  G06F17/5072 ,  H01L27/0207 ,  H01L27/11807 ,  H01L2027/11831 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A design methodology for routing for an integrated circuit is disclosed. The method includes placement of cells having double diffusion breaks, which create an extended intercell region. Metal layer prohibit zones are defined to prohibit any M1 structures in the prohibit zones. Metal layer allow zones are placed adjacent to outer metal lines, and jogs are formed in the metal layer allow zones. Vias and viabars may then be applied on the jogs.

Abstract translation: 公开了用于集成电路布线的设计方法。 该方法包括放置具有双扩散断裂的电池，这产生扩展的电池间​​区域。 金属层禁止区被定义为禁止禁区内的任何M1结构。 金属层允许区域邻近外部金属线放置，并且在金属层中形成点动允许区域。 然后将通风口和viabars应用于慢跑。

公开(公告)号：US11205033B2

公开(公告)日：2021-12-21

申请号：US17070708

申请日：2020-10-14

Applicant: GLOBALFOUNDRIES INC.

Inventor： Lei Yuan ,  Juhan Kim

IPC: G06F7/50 ,  G06F30/392 ,  H01L23/522 ,  H01L23/528 ,  G06F30/394 ,  G06F119/06

Abstract: At least one method, apparatus and system disclosed involves a circuit layout for an integrated circuit device comprising a plurality of wider-than-default metal formations for a functional cell. A design for an integrated circuit device is received. The design comprises at least one functional cell. A first pair of wide metal formations are provided. The first pair of wide metal formations comprise a first metal formation and a second metal placed about a first cell boundary of the functional cell for providing additional space for routing, for high-drive routing, and/or for power routing.

公开(公告)号：US10678287B2

公开(公告)日：2020-06-09

申请号：US16159831

申请日：2018-10-15

Applicant: GLOBALFOUNDRIES INC.

Inventor： Arif A. Siddiqi ,  Juhan Kim ,  Mahbub Rashed

IPC: G11C5/14 ,  G05F3/20

Abstract: Embodiments of the disclosure provide a circuit structure for producing a full range biasing voltage including: a logic control node; first and second voltage generators, coupled to the logic control node, the first and second voltage generators configured to generate a positive voltage output at a positive voltage node and a negative voltage output at a negative voltage node; first and second multiplexer cells, coupled to the logic control node, configured to multiplex the positive voltage level received from the first or the second positive voltage node and the negative voltage level received from the first or the second negative voltage node to provide a multiplexed output; and an output node coupled to each of the first multiplexer cell and the second multiplexer cell configured to receive the multiplexed output to provide a biasing voltage range to at least one transistor having a back-gate terminal.

公开(公告)号：US10290582B2

公开(公告)日：2019-05-14

申请号：US15473371

申请日：2017-03-29

Applicant: GLOBALFOUNDRIES INC.

Inventor： Lei Yuan ,  Juhan Kim

IPC: H01L21/00 ,  H01L23/00 ,  H01L27/00 ,  G06F17/50 ,  H01L23/528 ,  H01L21/027 ,  H01L21/8234 ,  H01L23/522 ,  H01L27/02 ,  H01L27/088 ,  H01L49/02

Abstract: At least one method, apparatus and system disclosed involves circuit layout for an integrated circuit device comprising an asymmetrically placed metal formation. A design for an integrated circuit device is received. The design comprises at least one functional cell. A first metal formation is placed asymmetrically about a first cell boundary of the functional cell for providing additional space for routing.

公开(公告)号：US10108771B2

公开(公告)日：2018-10-23

申请号：US15140183

申请日：2016-04-27

Applicant: GLOBALFOUNDRIES INC.

Inventor： Juhan Kim ,  Mahbub Rashed

IPC: H01L27/02 ,  G06F17/50 ,  H01L27/118

Abstract: At least one method, apparatus and system disclosed herein for forming a semiconductor device comprising a plurality of cells having metal features formed using triple patterning processes. An overall pattern layout is created for a first cell that is to be manufactured using a triple patterning process for forming a plurality of metal features on a metal layer. A first color metal feature is formed in the metal layer. The first color metal feature is associated with a first patterning process of the triple patterning process. A second color metal feature is formed in the metal layer. The second color metal feature is associated with a second patterning process of the triple patterning process. A third color metal feature is formed in the metal layer. The third color metal feature is associated with a third patterning process of the triple patterning process. At least one of the first, second, and third color metal features is re-colorable.

公开(公告)号：US09536035B2

公开(公告)日：2017-01-03

申请号：US14809698

申请日：2015-07-27

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Lei Yuan ,  Juhan Kim ,  Jongwook Kye ,  Mahbub Rashed

IPC: H01L23/52 ,  G06F17/50 ,  H01L23/522 ,  H01L27/02 ,  H01L27/118

CPC classification number: G06F17/5077 ,  H01L23/5226 ,  H01L27/0207 ,  H01L27/11807 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Embodiments described herein provide approaches for improved circuit routing using a wide-edge pin. Specifically, provided is an integrated circuit (IC) device comprising a standard cell having a first metal layer (M1) pin coupled to a second metal layer (M2) wire at a via. The M1 pin has a width greater than a width of the via sufficient to satisfy an enclosure rule for the via, while the M1 pin extends vertically past the via a distance substantially equal to or greater than zero. This layout increases the number of available pin access points within the standard cell and thus improves routing efficiency and chip size.

Abstract translation: 本文描述的实施例提供了使用宽边缘引脚改进电路布线的方法。 具体地，提供了一种集成电路（IC）装置，其包括具有在通孔处耦合到第二金属层（M2）线的第一金属层（M1）引脚的标准单元。 M1引脚的宽度大于通孔的宽度，足以满足通孔的外壳规则，而M1引脚垂直延伸超过基本上等于或大于零的距离。 该布局增加了标准单元内可用引脚接入点的数量，从而提高了布线效率和芯片尺寸。

公开(公告)号：US09105643B2

公开(公告)日：2015-08-11

申请号：US14337596

申请日：2014-07-22

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Juhan Kim ,  Mahbub Rashed

IPC: H01L29/40 ,  H01L23/48 ,  H01L21/337 ,  H01L21/205 ,  H01L23/538 ,  H01L27/02 ,  H01L27/11

CPC classification number: H01L23/5386 ,  H01L27/0207 ,  H01L27/11 ,  H01L27/1104 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An approach for providing SRAM bit cells with double patterned metal layer structures is disclosed. Embodiments include: providing, via a first patterning process, a word line structure, a ground line structure, a power line structure, or a combination thereof; and providing, via a second patterning process, a bit line structure proximate the word line structure, the ground line structure, the power line structure, or a combination thereof. Embodiments include: providing a first landing pad as the word line structure, and a second landing pad as the ground line structure; and providing the first landing pad to have a first tip edge and a first side edge, and the second landing pad to have a second tip edge and a second side edge, wherein the first side edge faces the second side edge.

Abstract translation: 公开了一种提供具有双图案化金属层结构的SRAM位单元的方法。 实施例包括：经由第一图案化工艺提供字线结构，接地线结构，电力线结构或其组合; 以及经由第二图案化处理提供靠近所述字线结构，所述接地线结构，所述电力线结构或其组合的位线结构。 实施例包括：提供作为字线结构的第一着陆焊盘和作为接地线结构的第二着陆焊盘; 以及提供所述第一着陆垫具有第一末端边缘和第一侧边缘，并且所述第二着陆垫具有第二末端边缘和第二侧边缘，其中所述第一侧边缘面向所述第二侧边缘。

公开(公告)号：US08881083B1

公开(公告)日：2014-11-04

申请号：US13874803

申请日：2013-05-01

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Yunfei Deng ,  Lei Yuan ,  Hidekazu Yoshida ,  Juhan Kim ,  Mahbub Rashed ,  Jongwook Kye

IPC: G06F17/50 ,  H01L23/48

CPC classification number: G06F17/5077 ,  G06F17/5072 ,  H01L27/0207 ,  H01L27/11807 ,  H01L2027/11831 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A design methodology for routing for an integrated circuit is disclosed. The method includes placement of cells having double diffusion breaks, which create an extended intercell region. Metal layer prohibit zones are defined to prohibit any M1 structures in the prohibit zones. Metal layer allow zones are placed adjacent to outer metal lines, and jogs are formed in the metal layer allow zones. Vias and viabars may then be applied on the jogs.

Abstract translation: 公开了用于集成电路布线的设计方法。 该方法包括放置具有双扩散断裂的电池，这产生扩展的电池间​​区域。 金属层禁止区被定义为禁止禁区内的任何M1结构。 金属层允许区域邻近外部金属线放置，并且在金属层中形成点动允许区域。 然后将通风口和viabars应用于慢跑。

公开(公告)号：US20140273474A1

公开(公告)日：2014-09-18

申请号：US13799539

申请日：2013-03-13

Applicant: GLOBALFOUNDRIES INC.

Inventor： Youngtag WOO ,  Dinesh Somasekhar ,  Juhan Kim ,  Yunfei Deng ,  Jongwook Kye

IPC: H01L21/308

CPC classification number: H01L21/31144 ,  H01L21/0337 ,  H01L27/0207 ,  H01L27/11

Abstract: Methodology enabling a generation of an interconnection design utilizing an SIT process is disclosed. Embodiments include: providing a hardmask on a substrate; forming a mandrel layer on the hardmask including: first and second vertical portions extending along a vertical direction and separated by a horizontal distance; and a plurality of horizontal portions extending in a horizontal direction, wherein each of the horizontal portions is positioned between the first and second vertical portions and at a different position along the vertical direction; and forming a spacer layer on outer edges of the mandrel layer.

Abstract translation: 公开了能够利用SIT过程产生互连设计的方法。 实施例包括：在基板上提供硬掩模; 在所述硬掩模上形成心轴层，包括：沿着垂直方向延伸并分开水平距离的第一和第二垂直部分; 以及沿水平方向延伸的多个水平部分，其中每个水平部分位于第一和第二垂直部分之间以及沿着垂直方向的不同位置; 以及在心轴层的外边缘上形成间隔层。