公开(公告)号：US08816270B2

公开(公告)日：2014-08-26

申请号：US13663692

申请日：2012-10-30

申请人： Aleksandra Kramer ,  Stefan Lanio

发明人： Aleksandra Kramer ,  Stefan Lanio

IPC分类号： G01D18/00 ,  G21K1/093

CPC分类号： G21K1/093 ,  H01J37/153 ,  H01J2237/1532 ,  H01J2237/1534 ,  H01J2237/28

摘要： A method of compensating mechanical, magnetic and/or electrostatic inaccuracies in a scanning charged particle beam device is described. The method includes an alignment procedure, wherein the following steps are conducted: compensating 4-fold astigmatism with an element having at least 8-pole compensation capability, wherein the aligning and compensating steps of the alignment procedure act on a charged particle beam with beam dimensions in two orthogonal directions each of at least 50 μm and coaxially aligned with at least the element having at least the 8-pole compensation capability.

摘要翻译： 描述了在扫描带电粒子束装置中补偿机械，磁性和/或静电不准确性的方法。 该方法包括对准过程，其中进行以下步骤：用具有至少8极补偿能力的元件补偿4折像散，其中对准过程的对准和补偿步骤作用于具有束尺寸的带电粒子束 在至少50μm的两个正交方向上，并且至少与具有至少8极补偿能力的元件同轴对准。

公开(公告)号：US08563927B2

公开(公告)日：2013-10-22

申请号：US13196778

申请日：2011-08-02

申请人： Dieter Winkler ,  Stefan Lanio

发明人： Dieter Winkler ,  Stefan Lanio

IPC分类号： G21K7/00 ,  G01N23/04

CPC分类号： H01J37/09 ,  H01J2237/0206 ,  H01J2237/026 ,  H01J2237/28

摘要： A shielding member for a charged particle beam apparatus includes a conductive substrate; and a through hole extending through the conductive substrate. The conductive substrate is comprised of a material having a specific electrical resistivity in a range from about 106 Ωcm to about 1012 Ωcm.

摘要翻译： 带电粒子束装置的屏蔽构件包括导电基板; 以及延伸穿过导电基板的通孔。 导电衬底由具有约106Ω·cm至约1012Ω·cm范围内的特定电阻率的材料构成。

公开(公告)号：US20070257207A1

公开(公告)日：2007-11-08

申请号：US10576547

申请日：2004-10-19

申请人： Jurgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

发明人： Jurgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

IPC分类号： H01J37/09

CPC分类号： H01J37/09 ,  H01J2237/0455

摘要： The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.

摘要翻译： 本发明涉及一种用于检查或构造包括带电粒子束源（5）以产生带电粒子束（7）的样本（3）的带电粒子束装置（1），聚焦透镜（9） 带电粒子束（7）到样品（3）上，以及孔径系统（13），用于限定带电粒子束（7）的孔（6）。 孔径系统（13）包括阻挡带电粒子束源（5）和聚焦透镜（9）之间的带电粒子束（7）的第一部分（7a）的第一构件（20），第二构件 （30）阻挡所述带电粒子束源（5）和所述聚焦透镜（9）之间的带电粒子束（7）的第二部分（7b），用于移动所述第一构件（20）的第一装置（24） 以调节带电粒子束（7）的阻塞的第一部分（7a）的尺寸，以及用于独立于第一部分（7b）移动第二部件（30）的第二装置（34）。 利用这种孔径系统（13），可以在操作期间自由地调整孔径（6）的尺寸并将其对准光轴（8）。

公开(公告)号：US20060163488A1

公开(公告)日：2006-07-27

申请号：US10540178

申请日：2003-12-12

申请人： Stefan Lanio

发明人： Stefan Lanio

IPC分类号： H01J1/50

CPC分类号： H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1405

摘要： The invention provides a lens system for a plurality of charged particle beams. Therein, at least one common excitation coil for at least two lens modules is provided. The lens modules comprise an first pole piece, a second pole piece and at least one opening for a charged particle beam. The lens modules constitute a component and share the excitation coil. Thereby, raw material availability, processing of work pieces and symmetry conditions for the lens fields are improved.

公开(公告)号：US4740704A

公开(公告)日：1988-04-26

申请号：US907040

申请日：1986-09-12

申请人： Harald Rose ,  Stefan Lanio

发明人： Harald Rose ,  Stefan Lanio

IPC分类号： H01J37/05 ,  H01J37/26 ,  H01J49/44 ,  H01J3/14 ,  G21K1/08

CPC分类号： H01J37/05

摘要： The invention is directed to an image forming omega filter having pole pieces with straight edges which has good local resolution and very good energy resolution. The omega filter includes four deflection regions, with deflection angles greater than 90.degree..

摘要翻译： 本发明涉及一种具有直边的极片的图像形成ω滤波器，其具有良好的局部分辨率和非常好的能量分辨率。 ω滤波器包括四个偏转区域，偏转角大于90°。

公开(公告)号：US20130320228A1

公开(公告)日：2013-12-05

申请号：US13543568

申请日：2012-07-06

申请人： Stefan Lanio

发明人： Stefan Lanio

IPC分类号： H01J37/244

CPC分类号： H01J37/244 ,  H01J37/28 ,  H01J2237/022 ,  H01J2237/2449

摘要： A charged particle detector arrangement is described. The detector arrangement includes a detection element and a collector electrode configured to collect charged particles released from the detection element upon impact of signal charged particles.

摘要翻译： 描述带电粒子检测器装置。 检测器装置包括检测元件和收集器电极，其被配置为在信号带电粒子撞击时收集从检测元件释放的带电粒子。

公开(公告)号：US08158954B2

公开(公告)日：2012-04-17

申请号：US12492610

申请日：2009-06-26

申请人： Stefan Lanio

发明人： Stefan Lanio

IPC分类号： H01J37/141

CPC分类号： H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1405

摘要： The invention provides a lens system for a plurality of charged particle beams. The lens system comprises an excitation coil providing a magnetic flux to a pole piece unit having a first pole piece, a second pole piece and at least two openings for charged particle beams, wherein the two openings are arranged in one row, thereby forming a lens row, and wherein the pole piece unit has an elongated shape.

摘要翻译： 本发明提供一种用于多个带电粒子束的透镜系统。 所述透镜系统包括向具有第一极片，第二极片和用于带电粒子束的至少两个开口的极片单元提供磁通的激励线圈，其中两个开口布置成一排，从而形成透镜 并且其中所述极靴单元具有细长形状。

公开(公告)号：US07763866B2

公开(公告)日：2010-07-27

申请号：US10576547

申请日：2004-10-19

申请人： Jürgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

发明人： Jürgen Frosien ,  Stefan Lanio ,  Helmut Banzhof

IPC分类号： G21K5/00

CPC分类号： H01J37/09 ,  H01J2237/0455

摘要： The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.

摘要翻译： 本发明涉及一种用于检查或构造包括带电粒子束源（5）以产生带电粒子束（7）的样本（3）的带电粒子束装置（1），聚焦透镜（9） 带电粒子束（7）到样品（3）上，以及孔径系统（13），用于限定带电粒子束（7）的孔（6）。 孔径系统（13）包括阻挡带电粒子束源（5）和聚焦透镜（9）之间的带电粒子束（7）的第一部分（7a）的第一构件（20），第二构件 30）阻挡带电粒子束源（5）和聚焦透镜（9）之间的带电粒子束（7）的第二部分（7b），第一装置（24）用于移动第一构件（20）以调整 带电粒子束（7）的阻挡的第一部分（7a）的尺寸以及用于独立于第一部分（7b）移动第二部件（30）的第二装置（34）。 利用这种孔径系统（13），可以在操作期间自由地调整孔径（6）的尺寸并将其对准光轴（8）。

公开(公告)号：US07576917B2

公开(公告)日：2009-08-18

申请号：US10540178

申请日：2003-12-12

申请人： Stefan Lanio

发明人： Stefan Lanio

IPC分类号： G02B27/10

CPC分类号： H01J37/141 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/145 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/1405

摘要： The invention provides a lens system for a plurality of charged particle beams. Therein, at least one common excitation coil for at least two lens modules is provided. The lens modules comprise an first pole piece, a second pole piece and at least one opening for a charged particle beam. The lens modules constitute a component and share the excitation coil. Thereby, raw material availability, processing of work pieces and symmetry conditions for the lens fields are improved.

摘要翻译： 本发明提供一种用于多个带电粒子束的透镜系统。 其中，提供至少一个用于至少两个透镜模块的公共激励线圈。 透镜模块包括第一极靴，第二极靴和用于带电粒子束的至少一个开口。 透镜模块构成一个部件并共享励磁线圈。 从而提高了原材料的可利用性，工件的加工和透镜领域的对称条件。

公开(公告)号：US20070200069A1

公开(公告)日：2007-08-30

申请号：US10571347

申请日：2004-09-02

申请人： Jürgen Frosien ,  Ralf Degenhardt ,  Stefan Lanio

发明人： Jürgen Frosien ,  Ralf Degenhardt ,  Stefan Lanio

IPC分类号： G21K1/08

CPC分类号： H01J37/26 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/05 ,  H01J37/153 ,  H01J37/3174 ,  H01J2237/057 ,  H01J2237/1534 ,  H01J2237/1538

摘要： The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

摘要翻译： 本发明涉及例如 用于沿着光轴具有z轴的带电粒子束的带电粒子束能量宽度减小系统以及包括以聚焦和分散方式起作用的第一元件（110）的第一和第二平面，第二元件（ 112），第一四极元件（410）被定位成使得在操作中，第一四极元件的场与以聚焦和分散方式作用的第一元件的场重叠，第二四极元件 四极元件（412）被定位成使得在操作中，第二四极元件的场与以聚焦和分散方式作用的第二元件的场重叠，第一带电粒子选择元件（618）被定位成束 方向，在第一元件以聚焦和分散方式作用之前，第二带电粒子选择元件（616; 716）在光束方向上位于第一元件作用于第一元件 聚焦和分散的方式。 因此，可以实现没有固有分散限制的虚拟色散源状位置。