摘要:
The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.
摘要:
The invention relates to a charged particle beam device and a method for inspecting a specimen, comprising a source for generating a charged particle beam, an objective lens with an optical axis for focussing said charged particle beam on a specimen, which consists of a magnetic lens and a superimposed electrostatic lens having at least two electrodes, deflection means for deflecting said charged particle beam on said specimen and detector means for detecting charged particles released at said specimen. The invention is further characterized by control means co-acting with said deflection means and one of the electrodes of the electrostatic lens for applying a dynamic voltage to said electrode, the amount of the voltage being dependent on the distance of said charged particle beam from said optical axis at the specimen, in order to increase the efficiency of detecting said charged particles released at image areas being located on the specimen with distance from the optical axis.
摘要:
The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.
摘要:
The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.
摘要:
The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element acting in a focusing and dispersive manner, a second element acting in a focusing and dispersive manner, a first quadrupole element being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.
摘要:
The present invention provides a charged particle beam device. The device comprises a first lens generating a crossover a second lens positioned after the crossover and an element acting in a focusing and dispersive manner in an x-z-plane with a center of the element having essentially same z-position as the crossover. Further, a multipole element, which acts in the x-z-plane and a y-z-plane is provided. A first charged particle selection element and a second charged particle selection element are used for selecting a portion of the charged particles. Thereby, e.g. the energy width of the charged particle beam can be reduced.
摘要:
A particle beam apparatus with a source for generating a primary particle beam, means for focussing the primary particle beam onto a specimen, a detection system for detecting particles released at the specimen, first means to accelerate the primary particle beam to a first energy, first means to decelerate the primary particle beam before the detection system from the first energy to a second lower energy, second means to accelerate the primary particle beam after the detection system from the second energy to a third higher energy and second means to decelerate the primary particle beam from the third energy to a final beam energy. The detection system further comprises a converter to convert particles released at the specimen into converted secondary particles which will be detected by the detector.
摘要:
The present invention provides a charged particle beam energy width reduction system. The system comprises a first element acting in a focusing and dispersive manner in an x-z-plane; a second element acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element positioned between the first and the second element acting in a focusing and dispersive manner.
摘要:
The present invention provides a charged particle beam energy width reduction system. The system comprises a first element (110) acting in a focusing and dispersive manner in an x-z-plane; a second element (112) acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element (116; 116a; 116b) positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element (114; 314, 712; 714) positioned between the first and the second element acting in a focusing and dispersive manner.
摘要:
A secondary charged particle detection device for detection of a signal beam is described. The device includes a detector arrangement having at least two detection elements with active detection areas, wherein the active detection areas are separated by a gap (G), a particle optics configured for separating the signal beam into a first portion of the signal beam and into at least one second portion of the signal beam, and configured for focusing the first portion of the signal beam and the at least one second portion of the signal beam. The particle optics includes an aperture plate and at least a first inner aperture openings in the aperture plate, and at least one second radially outer aperture opening in the aperture plate, wherein the aperture plate is configured to be biased to one potential surrounding the first inner aperture opening and the at least one outer aperture opening.