Charged particle beam device with aperture
    1.
    发明授权
    Charged particle beam device with aperture 有权
    带孔的带电粒子束装置

    公开(公告)号:US07763866B2

    公开(公告)日:2010-07-27

    申请号:US10576547

    申请日:2004-10-19

    IPC分类号: G21K5/00

    CPC分类号: H01J37/09 H01J2237/0455

    摘要: The present invention relates to a charged particle beam device (1) for inspecting or structuring a specimen (3) comprising a charged particle beam source (5) to generate a charged particle beam (7), a focussing lens (9) to focus the charged particle beam (7) onto the specimen (3), and an aperture system (13) for defining an aperture (6) for the charged particle beam (7). The aperture system (13) includes a first member (20) to block a first portion (7a) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), a second member (30) to block a second portion (7b) of the charged particle beam (7) between the charged particle beam source (5) and the focussing lens (9), first means (24) for moving the first member (20) to adjust the size of the blocked first portion (7a) of the charged particle beam (7), and second means (34) for moving the second member (30) independently from the first portion (7b). With such aperture system (13), it is possible to freely adjust the size of the aperture (6) and align it to the optical axis (8) during operation.

    摘要翻译: 本发明涉及一种用于检查或构造包括带电粒子束源(5)以产生带电粒子束(7)的样本(3)的带电粒子束装置(1),聚焦透镜(9) 带电粒子束(7)到样品(3)上,以及孔径系统(13),用于限定带电粒子束(7)的孔(6)。 孔径系统(13)包括阻挡带电粒子束源(5)和聚焦透镜(9)之间的带电粒子束(7)的第一部分(7a)的第一构件(20),第二构件 30)阻挡带电粒子束源(5)和聚焦透镜(9)之间的带电粒子束(7)的第二部分(7b),第一装置(24)用于移动第一构件(20)以调整 带电粒子束(7)的阻挡的第一部分(7a)的尺寸以及用于独立于第一部分(7b)移动第二部件(30)的第二装置(34)。 利用这种孔径系统(13),可以在操作期间自由地调整孔径(6)的尺寸并将其对准光轴(8)。

    HIGH THROUGHPUT SEM TOOL
    2.
    发明申请
    HIGH THROUGHPUT SEM TOOL 有权
    高通量扫描仪刀具

    公开(公告)号:US20100320382A1

    公开(公告)日:2010-12-23

    申请号:US12528307

    申请日:2008-02-22

    IPC分类号: G01N23/00 H01J37/147

    摘要: A multi-beam scanning electron beam device (100) is described. The multi-bea scanning electron beam device having a column, includes a multi-beam emitter (110) for emitting a plurality of electron beams (12,13,14), at least one common electron beam optical element (130) having a common opening for at least two of the plurality of electron beams and being adapted for commonly influencing at least two of the plurality of electron beams, at least one individual electron beam optical element (140) for individually influencing the plurality of electron beams, a common objective lens assembly (150) for focusing the plurality of electrons beams having a common excitation for focusing at least two of the plurality of electron beams, and adapted for focusing the plurality of electron beams onto a specimen (20) for generation of a plurality of signal beams (121, 131,141), and a detection assembly (170) for individually detecting each signal beam on a corresponding detection element.

    摘要翻译: 描述了多光束扫描电子束装置(100)。 具有列的多头扫描电子束装置包括用于发射多个电子束(12,13,14)的多光束发射器(110),至少一个共同的电子束光学元件(130) 用于多个电子束中的至少两个的开口,并适用于共同影响多个电子束中的至少两个,用于单独影响多个电子束的至少一个单独的电子束光学元件(140),共同的目标 透镜组件(150),用于聚焦具有用于聚焦多个电子束中的至少两个的共同激发的多个电子束,并且适于将多个电子束聚焦到样本(20)上以产生多个信号 光束(121,131,141)和检测组件(170),用于分别检测相应检测元件上的每个信号光束。

    Dynamically compensated objective lens-detection device and method
    3.
    发明授权
    Dynamically compensated objective lens-detection device and method 失效
    动态补偿物镜检测装置及方法

    公开(公告)号:US06232601B1

    公开(公告)日:2001-05-15

    申请号:US09274665

    申请日:1999-03-23

    IPC分类号: H01J37145

    CPC分类号: H01J37/21 H01J37/28

    摘要: The invention relates to a charged particle beam device and a method for inspecting a specimen, comprising a source for generating a charged particle beam, an objective lens with an optical axis for focussing said charged particle beam on a specimen, which consists of a magnetic lens and a superimposed electrostatic lens having at least two electrodes, deflection means for deflecting said charged particle beam on said specimen and detector means for detecting charged particles released at said specimen. The invention is further characterized by control means co-acting with said deflection means and one of the electrodes of the electrostatic lens for applying a dynamic voltage to said electrode, the amount of the voltage being dependent on the distance of said charged particle beam from said optical axis at the specimen, in order to increase the efficiency of detecting said charged particles released at image areas being located on the specimen with distance from the optical axis.

    摘要翻译: 本发明涉及一种带电粒子束装置和一种用于检查样本的方法,包括用于产生带电粒子束的源,具有用于将所述带电粒子束聚焦在样本上的光轴的物镜,该物镜由磁性透镜 以及具有至少两个电极的叠加的静电透镜,用于使所述带电粒子束偏转在所述样本上的偏转装置和用于检测在所述样本上释放的带电粒子的检测器装置。 本发明的特征还在于与所述偏转装置和静电透镜的一个电极共同作用的控制装置,用于向所述电极施加动态电压,所述电压的量取决于所述带电粒子束与所述电极的距离 以提高在与光轴的距离处位于样品上的图像区域处释放的带电粒子的检测效率。

    Double stage charged particle beam energy width reduction system for charged particle beam system
    4.
    发明授权
    Double stage charged particle beam energy width reduction system for charged particle beam system 有权
    用于带电粒子束系统的双级带电粒子束能量减小系统

    公开(公告)号:US07679054B2

    公开(公告)日:2010-03-16

    申请号:US10571347

    申请日:2004-09-02

    IPC分类号: H01J49/00

    摘要: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element acting in a focusing and dispersive manner, a second element acting in a focusing and dispersive manner, a first quadrupole element being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

    摘要翻译: 本发明涉及例如 用于带有沿着光轴的z轴的带电粒子束的带电粒子束能量宽度减小系统以及包括以聚焦和分散方式起作用的第一元件的第一和第二平面, 第一四极元件被定位成使得在操作中,第一四极元件的场与以聚焦和分散方式作用的第一元件的场重叠,第二四极元件被定位成使得在操作中 第二四极元件的场与以聚焦和分散方式作用的第二元件的场重叠,第一带电粒子选择元件沿光束方向定位在第一元件以聚焦和分散方式作用之前,以及 第二带电粒子选择元件在光束方向上位于第一元件以聚焦和分散方式作用之后。 因此,可以实现没有固有分散限制的虚拟色散源状位置。

    Single stage charged particle beam energy width reduction system for charged particle beam system
    5.
    发明授权
    Single stage charged particle beam energy width reduction system for charged particle beam system 有权
    用于带电粒子束系统的单级带电粒子束能量减小系统

    公开(公告)号:US07468517B2

    公开(公告)日:2008-12-23

    申请号:US10571345

    申请日:2004-09-02

    IPC分类号: G21K1/08 H01J37/21 H01J37/20

    摘要: The present invention provides a charged particle beam device. The device comprises a first lens generating a crossover a second lens positioned after the crossover and an element acting in a focusing and dispersive manner in an x-z-plane with a center of the element having essentially same z-position as the crossover. Further, a multipole element, which acts in the x-z-plane and a y-z-plane is provided. A first charged particle selection element and a second charged particle selection element are used for selecting a portion of the charged particles. Thereby, e.g. the energy width of the charged particle beam can be reduced.

    摘要翻译: 本发明提供一种带电粒子束装置。 该装置包括产生交叉的第一透镜,位于交叉后的第二透镜和以聚焦和分散方式作用在x-z平面中的元件,其中元件的中心具有与交叉点基本相同的z位置。 此外,提供了作用于x-z平面和y-z平面的多极元件。 第一带电粒子选择元件和第二带电粒子选择元件用于选择一部分带电粒子。 因此,例如 可以减少带电粒子束的能量宽度。

    Particle beam apparatus
    6.
    发明授权

    公开(公告)号:US06667478B2

    公开(公告)日:2003-12-23

    申请号:US10231686

    申请日:2002-08-30

    IPC分类号: G01N2300

    摘要: A particle beam apparatus with a source for generating a primary particle beam, means for focussing the primary particle beam onto a specimen, a detection system for detecting particles released at the specimen, first means to accelerate the primary particle beam to a first energy, first means to decelerate the primary particle beam before the detection system from the first energy to a second lower energy, second means to accelerate the primary particle beam after the detection system from the second energy to a third higher energy and second means to decelerate the primary particle beam from the third energy to a final beam energy. The detection system further comprises a converter to convert particles released at the specimen into converted secondary particles which will be detected by the detector.

    Double Stage Charged Particle Beam Energy Width Reduction System For Charged Particle Beam System
    7.
    发明申请
    Double Stage Charged Particle Beam Energy Width Reduction System For Charged Particle Beam System 有权
    用于带电粒子束系统的双级带电粒子束能量减少系统

    公开(公告)号:US20070200069A1

    公开(公告)日:2007-08-30

    申请号:US10571347

    申请日:2004-09-02

    IPC分类号: G21K1/08

    摘要: The present invention relates to e.g. a charged particle beam energy width reduction system for a charged particle beam with a z-axis along the optical axis and a first and a second plane, comprising, a first element (110) acting in a focusing and dispersive manner, a second element (112) acting in a focusing and dispersive manner, a first quadrupole element (410) being positioned such that, in operation, a field of the first quadrupole element overlaps with a field of the first element acting in a focusing and dispersive manner, a second quadrupole element (412) being positioned such that, in operation, a field of the second quadrupole element overlaps with a field of the second element acting in a focusing and dispersive manner, a first charged particle selection element (618) being positioned, in beam direction, before the first element acting in a focusing and dispersive manner, and a second charged particle selection element (616;716) being positioned, in beam direction, after the first element acting in a focusing and dispersive manner. Thereby, a virtually dispersive source-like location without an inherent dispersion limitation can be realized.

    摘要翻译: 本发明涉及例如 用于沿着光轴具有z轴的带电粒子束的带电粒子束能量宽度减小系统以及包括以聚焦和分散方式起作用的第一元件(110)的第一和第二平面,第二元件( 112),第一四极元件(410)被定位成使得在操作中,第一四极元件的场与以聚焦和分散方式作用的第一元件的场重叠,第二四极元件 四极元件(412)被定位成使得在操作中,第二四极元件的场与以聚焦和分散方式作用的第二元件的场重叠,第一带电粒子选择元件(618)被定位成束 方向,在第一元件以聚焦和分散方式作用之前,第二带电粒子选择元件(616; 716)在光束方向上位于第一元件作用于第一元件 聚焦和分散的方式。 因此,可以实现没有固有分散限制的虚拟色散源状位置。

    Charged particle beam energy width reduction system for charged particle beam system
    9.
    发明申请
    Charged particle beam energy width reduction system for charged particle beam system 有权
    带电粒子束系统的带电粒子束能量减小系统

    公开(公告)号:US20070069150A1

    公开(公告)日:2007-03-29

    申请号:US10571346

    申请日:2004-09-02

    IPC分类号: H01J1/50

    摘要: The present invention provides a charged particle beam energy width reduction system. The system comprises a first element (110) acting in a focusing and dispersive manner in an x-z-plane; a second element (112) acting in a focusing and dispersive manner in the x-z-plane; a charged particle selection element (116; 116a; 116b) positioned between the first and the second element acting in a focusing and dispersive manner; and a focusing element (114; 314, 712; 714) positioned between the first and the second element acting in a focusing and dispersive manner.

    摘要翻译: 本发明提供一种带电粒子束能量减少系统。 该系统包括以x-z平面聚焦和分散的方式起作用的第一元件(110) 在x-z平面中以聚焦和分散方式起作用的第二元件(112); 位于第一和第二元件之间的带电粒子选择元件(116; 116a; 116b)以聚焦和分散方式起作用; 以及位于第一和第二元件之间的以聚焦和分散方式起作用的聚焦元件(114; 314,712; 714)。

    Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens
    10.
    发明授权
    Multi-axis compound lens, beam system making use of the compound lens, and method using the compound lens 有权
    多轴复合透镜,使用复合透镜的光束系统,以及使用复合透镜的方法

    公开(公告)号:US07253417B2

    公开(公告)日:2007-08-07

    申请号:US10539179

    申请日:2003-12-12

    IPC分类号: H01J3/07 H01J29/51

    摘要: The invention provides an optical system for a charged particle multi-beam system. The optical system comprises an electrostatic lens component and a magnetic lens component. The components are used to focus a plurality of charged particle beams in a separate opening for each of at least a plurality a charged particle beams traveling through the optical system.

    摘要翻译: 本发明提供了一种用于带电粒子多光束系统的光学系统。 光学系统包括静电透镜部件和磁性透镜部件。 这些部件用于将多个带电粒子束聚焦在分开的开口中,用于至少多个穿过光学系统的带电粒子束中的每一个。