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公开(公告)号:US20210017422A1
公开(公告)日:2021-01-21
申请号:US16981560
申请日:2018-09-25
发明人: Tomohiro IWANO
IPC分类号: C09G1/02 , C09K3/14 , B24B37/04 , H01L21/3105
摘要: A polishing liquid containing abrasive grains, a hydroxy acid, a polyol, and a liquid medium, in which a zeta potential of the abrasive grains is positive, and the hydroxy acid has one carboxyl group and one to three hydroxyl groups.
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公开(公告)号:US20200299545A1
公开(公告)日:2020-09-24
申请号:US16642120
申请日:2018-08-30
IPC分类号: C09G1/02 , C09K3/14 , H01L21/3105
摘要: A slurry containing abrasive grains, a liquid medium, and a salt of a compound represented by formula (1) below, in which the abrasive grains include first particles and second particles in contact with the first particles, the first particles contain cerium oxide, and the second particles contain a hydroxide of a tetravalent metal element. [In formula (1), R represents a hydroxyl group or a monovalent organic group.]
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公开(公告)号:US20200032106A1
公开(公告)日:2020-01-30
申请号:US16497558
申请日:2018-01-29
IPC分类号: C09G1/02 , C08K3/20 , C08K5/09 , C08K5/17 , C08L71/02 , H01L21/304 , H01L21/3105
摘要: A polishing liquid containing abrasive grains, a hydroxy acid, a polyol, a cationic compound, and a liquid medium, in which a zeta potential of the abrasive grains is positive and a weight average molecular weight of the cationic compound is less than 1000.
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公开(公告)号:US20180251664A1
公开(公告)日:2018-09-06
申请号:US15970353
申请日:2018-05-03
IPC分类号: C09K3/14 , B24B37/04 , H01L21/3105 , C09G1/02
摘要: The slurry of the invention comprises abrasive grains and water, wherein the abrasive grains include tetravalent cerium hydroxide particles and produce light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with the content of the abrasive grains adjusted to 1.0 mass%. The polishing liquid of the invention comprises abrasive grains, an additive and water, wherein the abrasive grains include tetravalent cerium hydroxide particles and produce light transmittance of at least 50%/cm for light with a wavelength of 500 nm in an aqueous dispersion with the content of the abrasive grains adjusted to 1.0 mass %.
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公开(公告)号:US20160319159A1
公开(公告)日:2016-11-03
申请号:US15108001
申请日:2014-09-10
发明人: Hisataka MINAMI , Tomohiro IWANO , Toshiaki AKUTSU
IPC分类号: C09G1/02 , B24B37/04 , H01L21/3105
CPC分类号: C09G1/02 , B24B37/044 , C09K3/1409 , C09K3/1472 , H01L21/31053 , H01L21/76224
摘要: A polishing agent comprises: a fluid medium; an abrasive grain containing a hydroxide of a tetravalent metal element; a first additive; a second additive; and a third additive, wherein: the first additive is at least one selected from the group consisting of a compound having a polyoxyalkylene chain and a vinyl alcohol polymer; the second additive is a cationic polymer; and the third additive is an amino group-containing sulfonic acid compound.
摘要翻译: 抛光剂包括:流体介质; 包含四价金属元素的氢氧化物的磨料颗粒; 第一种添加剂; 第二种添加剂; 和第三添加剂,其中:所述第一添加剂为选自具有聚氧化烯链和乙烯醇聚合物的化合物中的至少一种; 第二种添加剂是阳离子聚合物; 并且第三添加剂是含氨基的磺酸化合物。
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公开(公告)号:US20160137881A1
公开(公告)日:2016-05-19
申请号:US14897771
申请日:2014-04-28
CPC分类号: C09G1/02 , B24B37/044 , C09K3/1409 , C09K3/1463 , H01L21/31053 , H01L21/76229
摘要: A polishing liquid for CMP, comprising: an abrasive grain including a cerium-based compound; a 4-pyrone-based compound; a polymer compound having an aromatic ring and a polyoxyalkylene chain; a cationic polymer; and water.
摘要翻译: 一种用于CMP的抛光液,包括:包含铈基化合物的磨料颗粒; 4-吡喃酮基化合物; 具有芳香环和聚氧化烯链的高分子化合物; 阳离子聚合物; 和水。
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公开(公告)号:US20160040041A1
公开(公告)日:2016-02-11
申请号:US14918834
申请日:2015-10-21
IPC分类号: C09G1/02 , H01L21/762
CPC分类号: C09G1/02 , C09K3/1409 , C09K3/1436 , C09K3/1463 , H01L21/30625 , H01L21/31053 , H01L21/76224
摘要: The polishing agent of the invention comprises water, an abrasive grain containing a hydroxide of a tetravalent metal element, and a specific glycerin compound.
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