Scanning electron microscope
    11.
    发明申请
    Scanning electron microscope 失效
    扫描电子显微镜

    公开(公告)号:US20070235646A1

    公开(公告)日:2007-10-11

    申请号:US11655275

    申请日:2007-01-19

    IPC分类号: G01N23/00

    摘要: Disclosed is a scanning electron microscope capable of performing speedy focusing by automatically measuring an electrostatic voltage of a surface of a wafer inside a specimen chamber in an accurate, and easy speedy manner, the wafer assuming different electrostatic voltages inside and outside the specimen chamber. The scanning electron microscope that controls optical systems measures an electrostatic voltage of the specimen according to an electrostatic capacitance between the both parts of the divided electrode plate, by dividing an electrode plate into two parts and switching potentials of electrodes obtained by the division with each other, an electrostatic voltage of the specimen based on an electrostatic capacitance between the both parts of the divided electrode plate. The electrode plate is used for applying a retarding voltage and arranged over a specimen.

    摘要翻译: 公开了一种扫描电子显微镜,其能够以准确且容易的方式自动测量样品室内的晶片表面的静电电压,从而在晶片内部和外部具有不同的静电电压来进行快速聚焦。 控制光学系统的扫描电子显微镜通过将电极板分成两部分并通过彼此分割获得的电极的切换电位来测量根据分隔电极板的两个部分之间的静电电容的样品的静电电压 基于分割电极板的两个部分之间的静电电容的试样的静电电压。 电极板用于施加延迟电压并且布置在试样上。

    Charged particle beam apparatus
    12.
    发明授权
    Charged particle beam apparatus 有权
    带电粒子束装置

    公开(公告)号:US07247864B2

    公开(公告)日:2007-07-24

    申请号:US11305109

    申请日:2005-12-19

    IPC分类号: H01J37/18

    摘要: A sample measuring method and a charged particle beam apparatus are provided which remove contaminants, that have adhered to a sample in a sample chamber of an electron microscope, to eliminate adverse effects on the subsequent manufacturing processes. To achieve this objective, after the sample measurement or inspection is made by using a charged particle beam, contaminants on the sample are removed before the next semiconductor manufacturing process. This allows the contaminants adhering to the sample in the sample chamber to be removed and therefore failures or defects that may occur in a semiconductor fabrication process following the measurement and inspection can be minimized.

    摘要翻译: 提供了样品测量方法和带电粒子束装置,其去除了附着在电子显微镜的样品室中的样品的污染物,以消除对后续制造工艺的不利影响。 为了达到这个目标,在通过使用带电粒子束进行样品测量或检查之后,在下一个半导体制造过程之前去除样品上的污染物。 这允许去除样品室中附着在样品上的污染物,因此可以使在测量和检查之后的半导体制造过程中可能发生的故障或缺陷被最小化。

    Scanning electron microscope and image signal processing method
    14.
    发明申请
    Scanning electron microscope and image signal processing method 有权
    扫描电子显微镜和图像信号处理方法

    公开(公告)号:US20070064100A1

    公开(公告)日:2007-03-22

    申请号:US11520802

    申请日:2006-09-14

    IPC分类号: H04N7/18

    摘要: The SEM has a dynamic range reference value setting unit for setting dynamic range reference values, a dynamic range adjustment unit for receiving an observation image signal delivered out of a secondary electron detector, adjusting the dynamic range of the observation image signal on the basis of the dynamic range reference values and outputting the thus adjusted observation image signal as an observation image signal after adjustment, a display image generation unit for determining luminous intensity levels of individual pixels of an image to be displayed based on the observation image signal after adjustment to generate a display image, a histogram generation unit for generating a histogram of luminous intensity levels of the display image and extracting, as a luminous intensity peak value, at which the frequency of luminous intensity is maximized, and a display unit for displaying the generated histogram and the extracted luminous intensity peak value.

    摘要翻译: SEM具有用于设定动态范围基准值的动态范围基准值设定单元,用于接收从二次电子检测器输出的观察图像信号的动态范围调整单元,基于该观测图像信号调整观测图像信号的动态范围 动态范围基准值,并输出调整后的观察图像信号作为调整后的观察图像信号;显示图像生成单元,其根据调整后的观察图像信号,决定要显示的图像的各个像素的发光强度水平,生成 显示图像,直方图生成单元,用于生成显示图像的发光强度级别的直方图,并且提取作为发光强度的频率最大化的发光强度峰值,以及用于显示所生成的直方图的显示单元和 提取发光强度峰值。

    Electrostatic Charge Measurement Method, Focus Adjustment Method, and Scanning Electron Microscope
    17.
    发明申请
    Electrostatic Charge Measurement Method, Focus Adjustment Method, and Scanning Electron Microscope 有权
    静电电荷测量方法,焦点调整方法和扫描电子显微镜

    公开(公告)号:US20100237241A1

    公开(公告)日:2010-09-23

    申请号:US12792808

    申请日:2010-06-03

    IPC分类号: G01N23/22 H01J37/28

    摘要: A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.

    摘要翻译: 公开了一种方法和装置,用于当通过扫描电子束测量样品的静电电荷量或通过扫描电子束时,基于电子束扫描,基于静电电荷存储来抑制静电电荷量或散焦的误差。 静电电荷测量方法,焦点调节方法或用于测量静电电荷量或控制对样品的施加电压的扫描电子显微镜,在将电子束的扫描位置移动到样品上的同时,将能量过滤器的施加电压改变 。

    Scanning electron microscope with measurement function
    18.
    发明申请
    Scanning electron microscope with measurement function 审中-公开
    扫描电子显微镜具有测量功能

    公开(公告)号:US20080109755A1

    公开(公告)日:2008-05-08

    申请号:US11953777

    申请日:2007-12-10

    IPC分类号: G06F3/048

    摘要: A scanning electron microscope which efficiently makes measurements for plural measurement items at a time and allows easy entry, confirmation and revision of auto measurement parameters. Parameters for creation of a line profile from an image captured by the scanning electron microscope are entered as auto measurement parameters (AMP) to be used as common conditions for all measurement items. Also, plural combinations of edge detection methods and measurement calculation methods are entered as auto measurement parameters to make measurements for plural items.

    摘要翻译: 一种扫描电子显微镜,可以一次有效地进行多个测量项目的测量,并可以方便地进入,确认和修改自动测量参数。 从扫描电子显微镜拍摄的图像中创建线轮廓的参数作为自动测量参数(AMP)输入,用作所有测量项目的常用条件。 此外,边缘检测方法和测量计算方法的多个组合被输入作为自动测量参数以对多个项进行测量。

    Electron Beam Apparatus and Method for Production of Its Specimen Chamber
    19.
    发明申请
    Electron Beam Apparatus and Method for Production of Its Specimen Chamber 有权
    电子束装置及其试样室的制造方法

    公开(公告)号:US20080048118A1

    公开(公告)日:2008-02-28

    申请号:US11907375

    申请日:2007-10-11

    IPC分类号: G01N23/00

    摘要: A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.

    摘要翻译: 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室,其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金,镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。