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    Exposure apparatus for optical disc
    11.
    发明授权
    Exposure apparatus for optical disc 失效
    光盘曝光装置

    公开(公告)号：US06754153B2

    公开(公告)日：2004-06-22

    申请号：US09902242

    申请日：2001-07-10

    申请人： Takashi Obara

    发明人： Takashi Obara

    IPC分类号： G11B700

    CPC分类号： G11B33/08 ,  G11B7/095 ,  G11B7/261

    摘要： An exposure apparatus for an optical disc used for eliminating the vibrations in the propagating direction when a rotation mechanism rotates. The slider controller 40 and the spindle controller 41 of the exposure apparatus 1 are activated, and the then the optical disc begins to be rotated by an AC synchronized motor. Through a condensing device 9, laser beams emitted form the laser source 6 are irradiated on the optical disc for exposure. At this time, the optical disc is eccentrically chucked on the rotation mechanism, resulting a rotational vibration of the whole rotation mechanism. A measurer 17 is used for detecting a propagating component of the rotational vibration, and a vibrator controller 42 controls the vibrator 20 as the output of the measurer 17 approaches zero. Therefore, the vibration in the propagating direction of the base 2 is cancelled, and the propagation accuracy is increased and the exposure quality is enhanced.

    摘要翻译： 一种用于当旋转机构旋转时消除传播方向振动的光盘的曝光装置。 曝光装置1的滑块控制器40和主轴控制器41被激活，然后光盘由AC同步电机开始旋转。 通过冷凝装置9，从激光源6发射的激光束照射在光盘上用于曝光。 此时，光盘偏心地卡在旋转机构上，导致整个旋转机构的旋转振动。 测量器17用于检测旋转振动的传播分量，并且当测量器17的输出接近零时，振动器控制器42控制振动器20。 因此，抵消了基座2的传播方向的振动，提高了传播精度，提高了曝光质量。

    Thick cold rolled steel sheet excellent in deep drawability and method of manufacturing the same
    12.
    发明授权
    Thick cold rolled steel sheet excellent in deep drawability and method of manufacturing the same 有权
    厚拉伸性优良的厚冷轧钢板及其制造方法

    公开(公告)号：US06217680B1

    公开(公告)日：2001-04-17

    申请号：US09254871

    申请日：1999-03-15

    申请人： Yoshikazu Kawabata ,  Kaneharu Okuda ,  Kei Sakata ,  Takashi Obara ,  Atsushi Ogino

    发明人： Yoshikazu Kawabata ,  Kaneharu Okuda ,  Kei Sakata ,  Takashi Obara ,  Atsushi Ogino

    IPC分类号： C21D804

    CPC分类号： C21D8/0436 ,  C21D8/0426 ,  C21D8/0463 ,  C21D8/0473 ,  C22C38/06 ,  C22C38/12 ,  C22C38/14 ,  C22C38/60

    摘要： A steel slab having a composition that comprises at most 0.008% by weight of C, at most 0.5% by weight of Si, at most 1.0% by weight of Mn, at most 0.15% by weight of P, at most 0.02% by weight of S, from 0.01 to 0.10% by weight of Al, at most 0.008% by weight of N, from 0.035 to 0.20% by weight of Ti, and from 0.001 to 0.015% by weight of Nb, with a balance of Fe and inevitable impurities, in which those C, S, N, Ti and Nb satisfy the following condition: 1.2(C/12+N/14+S/32)

    摘要翻译： 一种钢坯，其组成为：至多0.008重量％的C，至多0.5重量％的Si，至多1.0重量％的Mn，至多0.15重量％的P，至多0.02重量％ 的S，0.01〜0.10重量％的Al，至多0.008重量％的N，0.035〜0.20重量％的Ti和0.001〜0.015重量％的Nb，余量为Fe和不可避免的 其中C，S，N，Ti和Nb满足以下条件的杂质：在钢的Ar 3相变点和Ar3相变点之间的温度下，进行粗热轧至不低于85％的压下率 950℃，然后在温度下降的温度下进行最终热轧至不低于65％的压下率。 600℃和Ar3相变点，同时被润滑，从而具有不大于0.06的平均剪切应变，然后酸洗，在700-920℃的温度下进行预退火， 轧制至不低于65％的还原率，然后在700-920℃的温度下进一步退火再结晶。

    Inverter for use in binary counter
    16.
    发明授权
    Inverter for use in binary counter 失效
    逆变器用于二进制计数器

    公开(公告)号：US4680482A

    公开(公告)日：1987-07-14

    申请号：US886156

    申请日：1986-07-16

    申请人： Takashi Obara

    发明人： Takashi Obara

    IPC分类号： H03K23/00 ,  G11C11/406 ,  H03K3/037 ,  H03K3/356 ,  H03K23/52 ,  H03K23/60

    CPC分类号： H03K3/35606 ,  H03K3/356017

    摘要： An inverter for use in a binary counter comprises a flip-flop having first and second input/output nodes respectively applied with input signals of opposite polarities, a first field effect transistor having a source-drain path connected between the first input/output node and a third node and a gate connected to receive a control clock signal, and a capacitor connected to the third node so as to hold the potential on the first input/output node when the first transistor is turned on. Further, there is provided a switch circuit connected between a supply voltage and a ground and having a first input connected to the third node, a second input connected to receive an inversion control signal, and an output connected to the first input/output node. This switch circuit is responsive to the inversion control signal so as to bring its output to a voltage condition opposite to that held in the capacitor.

    摘要翻译： 用于二进制计数器的反相器包括具有分别施加相反极性的输入信号的第一和第二输入/输出节点的触发器，具有连接在第一输入/输出节点与第一输入/输出节点之间的源极 - 漏极路径的第一场效应晶体管， 连接以接收控制时钟信号的第三节点和栅极，以及连接到第三节点的电容器，以便当第一晶体管导通时将电位保持在第一输入/输出节点上。 此外，提供了连接在电源电压和地之间并具有连接到第三节点的第一输入端的开关电路，连接以接收反相控制信号的第二输入端和连接到第一输入/输出节点的输出端。 该开关电路响应于反相控制信号，使其输出达到与保持在电容器中的电压相反的电压条件。

    Fluorine-containing alloyed copolymer
    18.
    发明授权
    Fluorine-containing alloyed copolymer 有权
    含氟合金共聚物

    公开(公告)号：US08357757B2

    公开(公告)日：2013-01-22

    申请号：US12085195

    申请日：2006-10-23

    申请人： Jun Kanega ,  Takashi Obara ,  Katsumi Suzuki ,  Takashi Enokida

    发明人： Jun Kanega ,  Takashi Obara ,  Katsumi Suzuki ,  Takashi Enokida

    IPC分类号： C08L27/14 ,  C08F8/00

    CPC分类号： C08L27/16 ,  C08K5/0025 ,  C08K5/14 ,  C08L27/18 ,  C08L2205/02 ,  C08L2666/04

    摘要： A fluorine-containing alloyed copolymer, which comprises a fluorine-containing elastomer copolymer having a fluorine content of not less than 64% by weight, and a resinous tetrafluoroethylene-perfluoro(alkyl vinyl ether) copolymer having an amount of heat of crystal fusion ΔH of not more than 10 J/g, can give crosslinked moldings having a distinguished plasma resistance against both CF4 plasma treatment and O2 plasma treatment, and also a distinguished cracking resistance at the plasma irradiation, and showing necessary normal state physical properties and compression set when used as seals, and capable of providing soft seals of low hardness, and attaining molding at relatively low temperatures.

    摘要翻译： 含有氟含量为64重量％以上的含氟弹性体共聚物和具有结晶熔融热量Dgr的树脂四氟乙烯 - 全氟（烷基乙烯基醚）共聚物的含氟合金共聚物， H不超过10J / g，可以提供对CF4等离子体处理和O 2等离子体处理都具有显着等离子体电阻的交联模制品，并且还可以在等离子体照射下具有显着的抗裂性，并且显示必要的正常状态物理性能和压缩永久变形 用作密封件，并且能够提供低硬度的软密封，并且在相对低的温度下进行成型。

    Photo mask, exposure method using the same, and method of generating data
    19.
    发明授权
    Photo mask, exposure method using the same, and method of generating data 失效
    照片掩模，使用其的曝光方法以及生成数据的方法

    公开(公告)号：US07794899B2

    公开(公告)日：2010-09-14

    申请号：US12118578

    申请日：2008-05-09

    申请人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

    发明人： Koji Hashimoto ,  Tadahito Fujisawa ,  Yuko Kono ,  Takashi Obara

    IPC分类号： G03F1/00

    CPC分类号： G03F1/36 ,  G03F1/30 ,  G03F1/32

    摘要： A photo mask formed with patterns to be transferred to a substrate using an exposure apparatus, the photo mask comprising a pattern row having three or more hole patterns surrounded by a shielding portion or a semitransparent film and arranged along one direction, and an assist pattern surrounded by the shielding portion or semitransparent film and having a longitudinal direction and a latitudinal direction, the assist pattern being located at a specified distance from the pattern row in a direction orthogonal to the one direction, the longitudinal direction of the assist pattern being substantially parallel with the one direction, the longitudinal length of the assist pattern being equivalent to or larger than the longitudinal length of the pattern row, the assist pattern being not transferred to the substrate.

    摘要翻译： 一种光掩模，其形成有使用曝光装置转印到基板的图案，所述光掩模包括具有由屏蔽部分或半透明膜围绕并沿着一个方向布置的三个或更多孔图案的图案行和辅助图案包围 通过屏蔽部分或半透明膜并具有纵向方向和纬度方向，辅助图案位于与图案行在与该一个方向正交的方向上特定距离处，辅助图案的纵向方向基本上平行于 一个方向，辅助图案的纵向长度等于或大于图案行的纵向长度，辅助图案不被转印到基底。

    Mask pattern data forming method, photomask and method of manufacturing semiconductor device
    20.
    发明授权
    Mask pattern data forming method, photomask and method of manufacturing semiconductor device 失效
    掩模图案数据形成方法，光掩模和半导体器件的制造方法

    公开(公告)号：US07426711B2

    公开(公告)日：2008-09-16

    申请号：US11357034

    申请日：2006-02-21

    申请人： Tadahito Fujisawa ,  Takeshi Ito ,  Takashi Obara

    发明人： Tadahito Fujisawa ,  Takeshi Ito ,  Takashi Obara

    IPC分类号： G06F17/50

    CPC分类号： G03F7/70425 ,  G03F1/70 ,  G03F7/70125

    摘要： There is disclosed a mask pattern data forming method comprising arranging patterns with a minimum pitch in parallel or vertically in an X or Y direction, where directions diagonally connected with respect to respective centers of gravity of the double-pole or the quadrupole illumination are defined as the X and Y direction, classifying patterns or pattern groups with a pitch larger than the patterns with the minimum pitch into a pattern type with a pitch whose exposure margin is larger than that of the patterns with the minimum pitch and a pattern type with a pitch whose exposure margin is smaller than that of the patterns with the minimum pitch; and arranging patterns or pattern groups classified into the pattern type whose exposure margin is smaller than that of the patterns with the minimum pitch in a direction deflected by 45° or 135° from the patterns with the minimum pitch.

    摘要翻译： 公开了一种掩模图案数据形成方法，包括在X或Y方向上平行或垂直布置具有最小间距的图案，其中相对于双极或四极照明的相应重心倾斜连接的方向被定义为 X和Y方向，将具有最小间距的图案的间距大于间距的图案分类为具有曝光余量大于具有最小间距的图案的间距的图案类型的图案或图案组，以及具有间距的图案类型 其曝光余量小于具有最小间距的图案的曝光裕度; 并且排列分类为其曝光余量小于距离具有最小间距的图案偏转45°或135°的方向上具有最小间距的图案的图案类型的图案或图案组。