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    Optical beam transformation system and illumination system comprising an optical beam transformation system
    13.
    发明申请
    Optical beam transformation system and illumination system comprising an optical beam transformation system 有权
    光束变换系统和包括光束变换系统的照明系统

    公开(公告)号：US20060146384A1

    公开(公告)日：2006-07-06

    申请号：US11271976

    申请日：2005-11-14

    申请人： Joerg Schultz ,  Markus Deguenther ,  Markus Brotsack ,  Gerhard Fuerter ,  Wolfgang Singer ,  Manfred Maul ,  Alexander Kohl ,  Damian Fiolka

    发明人： Joerg Schultz ,  Markus Deguenther ,  Markus Brotsack ,  Gerhard Fuerter ,  Wolfgang Singer ,  Manfred Maul ,  Alexander Kohl ,  Damian Fiolka

    IPC分类号： G03H1/08

    CPC分类号： G03F7/70183 ,  G02B5/32 ,  G02B27/09 ,  G02B27/0927 ,  G02B27/0944 ,  G02B27/095 ,  G02B27/0977 ,  G03F7/70108 ,  G03F7/70566

    摘要： An optical beam transformation system, which can be designed to be utilized in an illuminating system of a microlithograpic projection exposure apparatus, has a sequence of optical elements arranged along an optical axis of the optical beam transformation system and designed for transforming an entrance light distribution striking an entrance surface of the optical beam transformation system into an exit light distribution emerging from an exit surface of the optical beam transformation system by radial redistribution of light intensity. The optical elements include at least one transformation element causing a radial redistribution of light intensity and having at least one transformation surface inclined to the optical axis and causing a polarization-selective reflection of a light distribution incident on the transformation surface according to an efficiency symmetry characteristic for the transformation surface. The optical elements further include at least one optical compensation element effecting a spatially dependent compensation of transmission inhomogeneties caused by the polarization-selective reflection at the transformation surface according to a compensation symmetry adapted to the efficiency symmetry of the transformation surface. Axicon elements with axicon surfaces may be used as transformation elements.

    摘要翻译： 可以设计用于微光学投影曝光装置的照明系统的光束转换系统具有沿着光束转换系统的光轴布置的光学元件序列，并被设计用于转换入射光分布 光束转换系统的入射表面通过光强度的径向再分布从光束转换系统的出射表面出射到出射光分布中。 光学元件包括至少一个变换元件，其导致光强度的径向重新分布并且具有至少一个相对于光轴倾斜的变换表面，并且根据效率对称特性引起入射在相变表面上的光分布的偏振选择反射 用于转化面。 光学元件还包括至少一个光学补偿元件，该光学补偿元件根据适应于转换表面的效率对称性的补偿对称性，对由变换表面处的偏振选择反射引起的透射不均匀性进行空间依赖的补偿。 具有转轴表面的Axicon元件可用作转换元件。

    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method
    15.
    发明授权
    Method for improving the imaging properties of at least two optical elements and photolithographic fabrication method 失效
    用于改善至少两个光学元件的成像特性和光刻制造方法的方法

    公开(公告)号：US06963449B2

    公开(公告)日：2005-11-08

    申请号：US10709098

    申请日：2004-04-13

    申请人： Birgit Mecking ,  Toralf Gruner ,  Alexander Kohl

    发明人： Birgit Mecking ,  Toralf Gruner ,  Alexander Kohl

    IPC分类号： G02B7/00 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G02B27/28 ,  G03B27/42 ,  G03B27/72

    CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

    摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarization-dependent perturbation. In a further step a polarization-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarization-dependent perturbations and polarization-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

    摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。

    METHOD FOR IMPROVING THE IMAGING PROPERTIES OF AT LEAST TWO OPTICAL ELEMENTS AND PHOTOLITHOGRAPHIC FABRICATION METHOD
    16.
    发明申请
    METHOD FOR IMPROVING THE IMAGING PROPERTIES OF AT LEAST TWO OPTICAL ELEMENTS AND PHOTOLITHOGRAPHIC FABRICATION METHOD 失效
    用于改善最小二重光学元件和光刻制造方法的成像特性的方法

    公开(公告)号：US20050013012A1

    公开(公告)日：2005-01-20

    申请号：US10709098

    申请日：2004-04-13

    申请人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

    发明人： Birgit Kurz ,  Toralf Gruner ,  Alexander Kohl

    IPC分类号： G02B7/00 ,  G02B5/30 ,  G03F7/20 ,  H01L21/027 ,  G02B3/00 ,  G02B9/00

    CPC分类号： G03F7/70591 ,  G02B5/3083 ,  G03F7/70258 ,  G03F7/70566 ,  G03F7/70966 ,  Y10S359/90

    摘要： A method for improving imaging properties of two or more optical elements comprises the step of determining for at least one of the two optical elements a polarisation-dependent perturbation. In a further step a polarisation-independent perturbation is determined for at least one of the two optical elements. Then a target position for the at least one movable optical element is calculated such that, in the target position, the total perturbation of the at least two optical elements which is made up of the polarisation-dependent perturbations and polarisation-independent perturbations of the two optical elements, is minimized. Finally the at least one movable optical element is moved the to the calculated target position.

    摘要翻译： 一种用于改善两个或多个光学元件的成像特性的方法包括确定两个光学元件中的至少一个偏振相关扰动的步骤。 在另一步骤中，确定两个光学元件中的至少一个的偏振无关扰动。 然后，计算出至少一个可移动光学元件的目标位置，使得在目标位置中，由偏振相关扰动和两极偏振无关的扰动构成的至少两个光学元件的总扰动 光学元件被最小化。 最后，将至少一个可移动光学元件移动到计算出的目标位置。

    Illumination system for illuminating a mask in a microlithographic exposure apparatus
    17.
    发明授权
    Illumination system for illuminating a mask in a microlithographic exposure apparatus 有权
    用于在微光刻曝光设备中照射掩模的照明系统

    公开(公告)号：US08467031B2

    公开(公告)日：2013-06-18

    申请号：US12795014

    申请日：2010-06-07

    申请人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

    发明人： Erich Schubert ,  Alexander Kohl ,  Gerhard-Wilhelm Ziegler ,  Michael Patra ,  Markus Deguenther ,  Michael Layh

    IPC分类号： G03B27/68 ,  G03B27/32

    CPC分类号： G03F7/70083 ,  G03F7/70116 ,  G03F7/70191 ,  G03F7/70433

    摘要： An illumination system of a micro-lithographic projection exposure apparatus is provided, which is configured to illuminate a mask positioned in a mask plane. The system includes a pupil shaping optical subsystem and illuminator optics that illuminate a beam deflecting component. For determining a property of the beam deflecting component, an intensity distribution in a system pupil surface of the illumination system is determined. Then the property of the beam deflecting component is determined such that the intensity distribution produced by the pupil shaping subsystem in the system pupil surface approximates the intensity distribution determined before. At least one of the following aberrations are taken into account in this determination: (i) an aberration produced by the illuminator optics; (ii) an aberration produced by the pupil shaping optical subsystem; (iii) an aberration produced by an optical element arranged between the system pupil surface and the mask plane.

    摘要翻译： 提供微光刻投影曝光装置的照明系统，其被配置为照亮位于掩模平面中的掩模。 该系统包括光束成形光学子系统和照射光束偏转部件的照明器光学器件。 为了确定光束偏转分量的特性，确定照明系统的系统光瞳表面中的强度分布。 然后确定光束偏转分量的特性，使得瞳孔成形子系统在系统光瞳表面中产生的强度分布近似于之前确定的强度分布。 在该确定中考虑以下像差中的至少一个：（i）由照明器光学器件产生的像差; （ii）由光瞳成形光学子系统产生的像差; （iii）由布置在系统光瞳表面和掩模平面之间的光学元件产生的像差。