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23 条记录 (耗时 0.039 秒)

    Structures and methods of replicating the same
    12.
    发明授权
    Structures and methods of replicating the same 有权
    复制的结构和方法

    公开(公告)号：US09370881B2

    公开(公告)日：2016-06-21

    申请号：US11816257

    申请日：2006-02-27

    申请人： John T. Fourkas ,  Christopher Lafratta

    发明人： John T. Fourkas ,  Christopher Lafratta

    IPC分类号： B29C33/40 ,  B29C39/02 ,  B29C33/38 ,  B29C33/48 ,  B29C39/36 ,  B29C41/14

    CPC分类号： B29C39/026 ,  B29C33/3878 ,  B29C33/48 ,  B29C39/36 ,  B29C41/14

    摘要： The invention features a method for producing replicas of a desired structure, a master and a mold obtained from it for use in such a method. The master includes a desired structure (200) to be reproduced and an additional structure (206, 208) that assists in removal of the master from a mold, e.g. by permitting portions of the mold on opposite sides of the additional structure to flex away from one another when the master is removed from the mold. The method includes immersing the master comprising the desired structure (200) and the additional structure (206, 208) in a molding material (142), solidifying the molding material (142) to make a mold, removing the master from the mold and using the mold to produce replicas of the desired structure (200). For example, the desired structure of the master may include a loop that defines a fluid flow pathway, and the additional structure includes a membrane configured to prevent the molding material from completely passing through the loop when the mold is made from the master.

    摘要翻译： 本发明的特征在于一种用于生产所需结构的副本的方法，一种从其获得的母版和模具，用于这种方法。 主人包括要再现的期望的结构（200）和辅助主模从模具中移除的附加结构（206,208）。 通过允许在将模具从模具中取出时，附加结构的相对侧上的模具的部分彼此远离。 该方法包括将包含所需结构（200）和附加结构（206,208）的母版浸入模制材料（142）中，固化模制材料（142）以制造模具，将模具从模具中移除并使用 该模具以产生所需结构（200）的副本。 例如，主体的期望结构可以包括限定流体流动路径的环，并且附加结构包括构造成当模具由主体制成时防止模制材料完全通过环的膜。

    Method for Polymer Coating and Functionalization of Metal Nanorods
    14.
    发明申请
    Method for Polymer Coating and Functionalization of Metal Nanorods 审中-公开
    金属纳米棒的聚合物涂层和功能化方法

    公开(公告)号：US20110183140A1

    公开(公告)日：2011-07-28

    申请号：US13009114

    申请日：2011-01-19

    申请人： John T. Fourkas ,  Linjie Li ,  Sanghee Nah

    发明人： John T. Fourkas ,  Linjie Li ,  Sanghee Nah

    IPC分类号： D02G3/36 ,  B05D3/06 ,  B82Y5/00 ,  B82Y15/00

    摘要： The present invention relates to polymers and their use in coating metal nanorods (especially gold nanorods), and to the coated nanorods compositions. In particular, the invention relates to a process for forming cetyltrimethylammonium bromide (CTAB)-coated gold nanorods and to such coated nanorods that additionally comprise an external cross-linked polymer coating.

    摘要翻译： 本发明涉及聚合物及其在涂覆金属纳米棒（特别是金纳米棒）以及涂覆的纳米棒组合物中的用途。 特别地，本发明涉及形成十六烷基三甲基溴化铵（CTAB）涂覆的金纳米棒和另外包含外部交联聚合物涂层的这种涂覆的纳米棒的方法。

    Microfluidic Devices and Methods of Fabrication
    15.
    发明申请
    Microfluidic Devices and Methods of Fabrication 有权
    微流体装置和制造方法

    公开(公告)号：US20140191438A1

    公开(公告)日：2014-07-10

    申请号：US14187673

    申请日：2014-02-24

    申请人： Christopher T. Fourkas ,  John T. Fourkas

    发明人： John T. Fourkas ,  Christopher N. LaFratta

    IPC分类号： B29C39/36

    CPC分类号： B29C39/36 ,  B29C33/3857 ,  B29C33/405 ,  B29C39/006 ,  B29L2031/756 ,  Y10T137/2224 ,  Y10T137/8593 ,  Y10T137/85938

    摘要： The present invention relates to microfluidic devices that comprise a 3-D microfluidic network of microchannels of arbitrary complexity and to a method for fabricating such devices. In particular, the invention relates to a method of forming microfluidic devices having 3-D microfluidic networks that contain open or closed loop microchannels using a single-step molding process without the need for layer-by-layer fabrication, and to the resultant microfluidic devices. The networks of such microfluidic devices may comprise one or more microchannel circuits which may be discrete or interconnected.

    摘要翻译： 本发明涉及包含具有任意复杂性的微通道的3-D微流体网络的微流体装置以及制造这种装置的方法。 特别地，本发明涉及一种形成具有3-D微流体网络的微流体装置的方法，所述微流体网络包含使用单步模制工艺而不需要逐层制造的开环或闭环微通道，以及所产生的微流体装置 。 这种微流体装置的网络可以包括一个或多个可以是离散的或互连的微通道电路。

    Method and system for photolithographic fabrication with resolution far below the diffraction limit
    16.
    发明授权
    Method and system for photolithographic fabrication with resolution far below the diffraction limit 有权
    分辨率远低于衍射极限的光刻制造方法和系统

    公开(公告)号：US08432533B2

    公开(公告)日：2013-04-30

    申请号：US12652410

    申请日：2010-01-05

    申请人： John T. Fourkas ,  Erez H. Gershgoren ,  Linjie Li ,  Hana Hwang

    发明人： John T. Fourkas ,  Erez H. Gershgoren ,  Linjie Li ,  Hana Hwang

    IPC分类号： G03B27/72 ,  G03F7/00

    CPC分类号： G03B27/72 ,  G03F7/2022 ,  G03F7/2053 ,  G03F7/70375

    摘要： A method and system for photolithography is provided. The system includes a photoresist comprising a photoinitiator and a prepolymer resin. The system further includes a first light source operable to generate at least a first beam of light which is focused on a first area of the photoresist. The first beam of light is configured to excite the photoinitiator. The system further includes a second light source operable to generate at least a second beam of light which is focused on a second area of the photoresist, the second beam of light configured to deactivate at least temporarily the photoinitiator excited by the first beam of light. The first area and second area overlap at least partially. A time difference of at least 10 ns exists between the photoinitiator being excited by the first beam of light and the photoinitiator initiating polymerization.

    摘要翻译： 提供了一种用于光刻的方法和系统。 该系统包括包含光引发剂和预聚物树脂的光致抗蚀剂。 该系统还包括第一光源，其可操作以产生聚焦在光致抗蚀剂的第一区域上的至少第一光束。 第一光束被配置为激发光引发剂。 该系统还包括第二光源，其可操作以产生聚焦在光致抗蚀剂的第二区域上的至少第二光束，第二光束被配置为至少暂时停用由第一光束激发的光引发剂。 第一区域和第二区域至少部分重叠。 在由第一光束激发的光引发剂和光引发剂引发聚合之间存在至少10ns的时间差。

    Electrical Detection of Plasmon Resonances
    19.
    发明申请
    Electrical Detection of Plasmon Resonances 审中-公开
    等离子体共振的电气检测

    公开(公告)号：US20080285040A1

    公开(公告)日：2008-11-20

    申请号：US11816252

    申请日：2006-02-27

    申请人： John T. Fourkas ,  Daniel Lim ,  Christopher Lafratta ,  Michael J. Naughton

    发明人： John T. Fourkas ,  Daniel Lim ,  Christopher Lafratta ,  Michael J. Naughton

    IPC分类号： G01N21/62 ,  G01R27/02

    CPC分类号： G01N21/554

    摘要： A method includes detecting a plasmon resonance in a material based on a change in at least one electrical property of the material. For example, the material can be a sensor portion of an electrical circuit, wherein the method can further include: exposing the sensor portion to a test material; optically illuminating the sensor portion when the test material is present, and monitoring the change in the at least one electrical property of the sensor portion in response to the optical illumination. The monitored changed in the at least one electrical property of the sensor portion can provide information about the test material, such as the presence or absence of selected analytes and/or their binding affinities. In another example, the material is a part of a receiver for a plasmonic circuit. An apparatus for carrying out the method is also disclosed.

    摘要翻译： 一种方法包括基于材料的至少一种电性质的变化来检测材料中的等离子体共振。 例如，该材料可以是电路的传感器部分，其中该方法还可以包括：将传感器部分暴露于测试材料; 当存在测试材料时光学照射传感器部分，并响应于光学照明监测传感器部分的至少一个电特性的变化。 在传感器部分的至少一个电性能中监测的监测变化可以提供关于测试材料的信息，例如选择的分析物的存在或不存在和/或其结合亲和力。 在另一示例中，材料是等离子体激元电路的接收器的一部分。 还公开了一种用于执行该方法的装置。