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    Feed Forward of Metrology Data in a Metrology System
    11.
    发明申请
    Feed Forward of Metrology Data in a Metrology System 有权
    计量系统中计量数据的前馈

    公开(公告)号：US20160290796A1

    公开(公告)日：2016-10-06

    申请号：US15090389

    申请日：2016-04-04

    Applicant: KLA-Tencor Corporation

    Inventor： Ady Levy ,  Daniel Kandel ,  Michael E. Adel ,  Leonid Poslavsky ,  John Robinson ,  Tal Marciano ,  Barak Bringoltz ,  Tzahi Grunzweig ,  Dana Klein ,  Tal Itzkovich ,  Nadav Carmel ,  Nuriel Amir ,  Vidya Ramanathan ,  Janay Camp ,  Mark Wagner

    IPC: G01B11/27 ,  G01N21/21

    CPC classification number: G01B11/272 ,  G01N21/211 ,  G01N21/31 ,  G01N21/41 ,  G01N21/4738 ,  G01N21/4788 ,  G01N21/6489 ,  G01N21/9501 ,  G01N2021/213 ,  G03F7/705 ,  G03F7/70525 ,  G03F7/70533 ,  G03F7/70616

    Abstract: A metrology performance analysis system includes a metrology tool including one or more detectors and a controller communicatively coupled to the one or more detectors. The controller is configured to receive one or more metrology data sets associated with a metrology target from the metrology tool in which the one or more metrology data sets include one or more measured metrology metrics and the one or more measured metrology metrics indicate deviations from nominal values. The controller is further configured to determine relationships between the deviations from the nominal values and one or more selected semiconductor process variations, and determine one or more root causes of the deviations from the nominal values based on the relationships between values of the one or more metrology metrics and the one or more selected semiconductor process variations.

    Abstract translation: 计量性能分析系统包括包括一个或多个检测器的计量工具和通信地耦合到所述一个或多个检测器的控制器。 所述控制器被配置为从所述计量工具接收与度量目标相关联的一个或多个度量数据集，其中所述一个或多个测量数据集包括一个或多个测量的度量度量，并且所述一个或多个测量的度量度量指示与标称值的偏差 。 控制器还被配置为确定与标称值和一个或多个所选择的半导体工艺变化的偏差之间的关系，并且基于一个或多个测量值的值之间的关系确定偏离标称值的一个或多个根本原因 度量和一个或多个所选择的半导体工艺变化。

    ESTIMATING AND ELIMINATING INTER-CELL PROCESS VARIATION INACCURACY
    13.
    发明申请
    ESTIMATING AND ELIMINATING INTER-CELL PROCESS VARIATION INACCURACY 有权
    估计和消除细胞间过程变异不准确

    公开(公告)号：US20150292877A1

    公开(公告)日：2015-10-15

    申请号：US14727038

    申请日：2015-06-01

    Applicant: KLA-Tencor Corporation

    Inventor： Tal Marciano ,  Eran Amit ,  Barak Bringoltz ,  Nuriel Amir ,  Amit Shaked

    IPC: G01B11/27 ,  G06F17/50

    CPC classification number: G01B11/27 ,  G06F17/5081

    Abstract: Metrology methods and targets are provided, for estimating inter-cell process variation by deriving, from overlay measurements of at least three target cells having different designed misalignments, a dependency of a measured inaccuracy on the designed misalignments (each designed misalignment is between at least two overlapping periodic structures in the respective target cell). Inaccuracies which are related to the designed misalignments are reduced, process variation sources are detected and targets and measurement algorithms are optimized according to the derived dependency.

    Abstract translation: 提供了计量方法和目标，用于通过从具有不同设计的不对准的至少三个目标单元的重叠测量推导出测量的不准确度对所设计的不对准的依赖性（每个设计的未对准在至少两个 各个靶细胞中重叠的周期性结构）。 与设计的不对准相关的不准确被减少，检测到过程变化源，并根据派生的依赖性优化目标和测量算法。

    Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology
    14.
    发明授权
    Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology 有权

    公开(公告)号：US10533940B2

    公开(公告)日：2020-01-14

    申请号：US16188218

    申请日：2018-11-12

    Applicant: KLA-Tencor Corporation

    Inventor： Amnon Manassen ,  Andrew V. Hill ,  Daniel Kandel ,  Ilan Sela ,  Ohad Bachar ,  Barak Bringoltz

    IPC: G01N21/55 ,  G01N21/95 ,  G01N21/956 ,  G01B11/00

    Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

    Reflection symmetric scatterometry overlay targets and methods
    16.
    发明授权
    Reflection symmetric scatterometry overlay targets and methods 有权

    公开(公告)号：US10234280B2

    公开(公告)日：2019-03-19

    申请号：US14687074

    申请日：2015-04-15

    Applicant: KLA-Tencor Corporation

    Inventor： Barak Bringoltz ,  Daniel Kandel

    IPC: G01B11/27 ,  G03F7/20

    Abstract: A method for target measurement is provided which comprises designing a reflection-symmetric target and measuring overlays of the target along at least one reflection symmetry direction of the target. Also, a tool calibration method comprising calibrating a scatterometry measurement tool with respect to a reflection symmetry of a reflection symmetric target. Further provided are methods of measuring scatterometry overlay using first order and zeroth order scatterometry measurements of a reflection-symmetric scatterometry targets. Also, a scatterometry target comprising a reflection-symmetric target having two cells in each of at least two measurement directions, wherein respective cells have different offsets along one measurement direction and similar offsets along other measurement directions. Further, a scatterometry measurement system comprising a reflection symmetric illumination and calibrated to measure reflection symmetric targets. Also, metrology tool comprising an illumination path and a collection path of the tool which are symmetric to reflection symmetries of a target.

    REMOVING PROCESS-VARIATION-RELATED INACCURACIES FROM SCATTEROMETRY MEASUREMENTS
    19.
    发明申请
    REMOVING PROCESS-VARIATION-RELATED INACCURACIES FROM SCATTEROMETRY MEASUREMENTS 有权
    从分析测量中去除过程变化相关不准确

    公开(公告)号：US20150316490A1

    公开(公告)日：2015-11-05

    申请号：US14797754

    申请日：2015-07-13

    Applicant: KLA-Tencor Corporation

    Inventor： Eran Amit ,  Zeev Bomzon ,  Barak Bringoltz ,  Boris Efraty

    IPC: G01N21/88 ,  G01N21/47

    CPC classification number: G01N21/8851 ,  G01N21/47 ,  G03F7/70633

    Abstract: Metrology methods and respective software and module are provided, which identify and remove measurement inaccuracy which results from process variation leading to target asymmetries. The methods comprise identifying an inaccuracy contribution of process variation source(s) to a measured scatterometry signal (e.g., overlay) by measuring the signal across a range of measurement parameter(s) (e.g., wavelength, angle) and targets, and extracting a measurement variability over the range which is indicative of the inaccuracy contribution. The method may further assume certain functional dependencies of the resulting inaccuracy on the target asymmetry, estimate relative donations of different process variation sources and apply external calibration to further enhance the measurement accuracy.

    Abstract translation: 提供了计量方法和各自的软件和模块，其识别和消除由过程变化导致的目标不对称性的测量不准确度。 所述方法包括通过测量跨越测量参数（例如波长，角度）和目标的范围的信号来识别过程变化源对测量的散射测量信号（例如，覆盖）的不准确贡献，并且提取 在范围内的测量变异性表示不准确的贡献。 该方法可以进一步假设所得到的不准确性对目标不对称性的某些功能依赖性，估计不同过程变化源的相对捐赠并应用外部校准以进一步提高测量精度。

    Apodization for pupil imaging scatterometry
    20.
    发明授权
    Apodization for pupil imaging scatterometry 有权
    瞳孔成像散射的变迹

    公开(公告)号：US09091650B2

    公开(公告)日：2015-07-28

    申请号：US13936529

    申请日：2013-07-08

    Applicant: KLA-Tencor Corporation

    Inventor： Andrew V. Hill ,  Amnon Manassen ,  Barak Bringoltz ,  Ohad Bachar ,  Mark Ghinovker ,  Zeev Bomzon ,  Daniel Kandel

    IPC: G01B11/14 ,  G01N21/55 ,  G03F7/20

    CPC classification number: G02B27/58 ,  G01B11/00 ,  G01N21/47 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/068 ,  G03F7/70625 ,  G03F7/70633

    Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

    Abstract translation: 本公开涉及用于瞳孔成像散射测量的各种变迹方案。 在一些实施例中，该系统包括设置在照明路径的光瞳平面内的变迹器。 在一些实施例中，系统还包括照明扫描器，其构造成用至少一部分变迹照明来扫描样品的表面。 在一些实施例中，系统包括配置成提供四极照明功能的变迹瞳孔。 在一些实施例中，系统还包括变迹集合区域停止。 可以组合这里描述的各种实施例以实现某些优点。

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