公开(公告)号：US10663281B2

公开(公告)日：2020-05-26

申请号：US15574294

申请日：2017-09-14

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew Hill

IPC: G01B11/02 ,  G01B9/02 ,  G03F7/20 ,  G01B11/27

Abstract: Methods and systems for focusing and measuring by mean of an interferometer device, having an optical coherence tomography (OCT) focusing system, by separately directing an overlapped measurement and reference wavefront towards a focus sensor and towards an imaging sensor; where a predefined focusing illumination spectrum of the overlapped wavefront is directed towards the focus sensor, and where a predefined measurement illumination spectrum of the overlapped wavefront is directed towards the imaging sensor. Methods and systems for maintaining focus of an interferometer device, having an OCT focusing system, during sample's stage moves.

公开(公告)号：US09958385B2

公开(公告)日：2018-05-01

申请号：US14581719

申请日：2014-12-23

Applicant: Kla-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew Hill ,  Daniel Kandel ,  Ilan Sela ,  Ohad Bachar ,  Barak Bringoltz

IPC: G01N21/55 ,  G01B11/00 ,  G01N21/95 ,  G01N21/956

CPC classification number: G01N21/55 ,  G01B11/00 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/104

Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

公开(公告)号：US09886764B2

公开(公告)日：2018-02-06

申请号：US14926984

申请日：2015-10-29

Applicant: KLA-TENCOR CORPORATION

Inventor： Guoheng Zhao ,  Stanley E. Stokowski ,  Andrew Hill ,  Johan De Greeve ,  Maarten Van Der Burgt ,  Karel Van Gils

IPC: G06T7/00 ,  H04N5/372 ,  G01B11/06 ,  G01B11/25 ,  G06T7/586

CPC classification number: G06T7/586 ,  G01B11/0608 ,  G01B11/2513 ,  G01B11/2522 ,  G06T2207/10052 ,  G06T2207/20208 ,  H04N5/37206

Abstract: The invention relates to an image acquisition system and an image acquisition method, as well as to an inspection system having at least one such image acquisition system. A projector projects a pattern on a surface of a sample, a camera records light intensity information from within at least two detection fields defined by the camera on the surface of the sample. A relative motion between the sample on the one hand and the camera and projector on the other hand is generated. From the acquired at least one image a height profile of the surface of the sample may be inferred. The pattern may comprise a number of sub-patterns related to each other by a phase shift. Alternatively, the pattern may be a fringe pattern.

公开(公告)号：US20150036142A1

公开(公告)日：2015-02-05

申请号：US14516540

申请日：2014-10-16

Applicant: KLA-Tencor Corporation

Inventor： Daniel Kandel ,  Vladimir Levinski ,  Alexander Svizher ,  Joel Seligson ,  Andrew Hill ,  Ohad Bachar ,  Amnon Manassen ,  Yung-Ho Alex Chuang ,  Ilan Sela ,  Moshe Markowitz ,  Daria Negri ,  Efraim Rotem

IPC: G01N21/47 ,  G01N21/956 ,  G01N21/95 ,  G01B11/02

CPC classification number: G01N21/47 ,  G01B11/02 ,  G01B11/0641 ,  G01B2210/56 ,  G01N21/211 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/4792 ,  G01N2201/06113 ,  G01N2201/105 ,  G03F7/70625 ,  G03F7/70633

Abstract: Various metrology systems and methods are provided. One metrology system includes a light source configured to produce a diffraction-limited light beam, an apodizer configured to shape the light beam in the entrance pupil of illumination optics, and optical elements configured to direct the diffraction-limited light beam from the apodizer to an illumination spot on a grating target on a wafer and to collect scattered light from the grating target. The metrology system further includes a field stop and a detector configured to detect the scattered light that passes through the field stop. In addition, the metrology system includes a computer system configured to determine a characteristic of the grating target using output of the detector.

Abstract translation: 提供了各种计量系统和方法。 一个计量系统包括被配置为产生衍射受限光束的光源，被配置为使照明光学器件的入射光瞳中的光束成形的变迹器，以及被配置为将来自变迹器的衍射受限光束引导到 在晶片上的光栅目标上的照明点并且收集来自光栅目标的散射光。 测量系统还包括场停止器和检测器，其被配置为检测通过场停止器的散射光。 此外，计量系统包括被配置为使用检测器的输出来确定光栅目标的特性的计算机系统。

公开(公告)号：US11313669B2

公开(公告)日：2022-04-26

申请号：US16848056

申请日：2020-04-14

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew Hill

IPC: G01B9/02 ,  G01B9/02091 ,  G03F7/20 ,  G01B11/27

Abstract: Methods and systems for focusing and measuring by mean of an interferometer device, having an optical coherence tomography (OCT) focusing system, by separately directing an overlapped measurement and reference wavefront towards a focus sensor and towards an imaging sensor; where a predefined focusing illumination spectrum of the overlapped wavefront is directed towards the focus sensor, and where a predefined measurement illumination spectrum of the overlapped wavefront is directed towards the imaging sensor. Methods and systems for maintaining focus of an interferometer device, having an OCT focusing system, during sample's stage moves.

公开(公告)号：US11060845B2

公开(公告)日：2021-07-13

申请号：US16665759

申请日：2019-10-28

Applicant: KLA-Tencor Corporation

Inventor： Eran Amit ,  Barry Loevsky ,  Andrew Hill ,  Amnon Manassen ,  Nuriel Amir ,  Vladimir Levinski ,  Roie Volkovich

IPC: G01B11/06 ,  G01B11/27 ,  G01N21/95 ,  G01N21/956 ,  G06F30/392 ,  G06F30/398 ,  H01L21/66 ,  G01N21/88

Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.

公开(公告)号：US10458777B2

公开(公告)日：2019-10-29

申请号：US14949444

申请日：2015-11-23

Applicant: KLA-TENCOR CORPORATION

Inventor： Eran Amit ,  Barry Loevsky ,  Andrew Hill ,  Amnon Manassen ,  Nuriel Amir ,  Vladimir Levinski ,  Roie Volkovich

IPC: G01B11/06 ,  G01B11/27 ,  G01N21/95 ,  G01N21/956 ,  G06F17/50 ,  H01L21/66 ,  G01N21/88

Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.

公开(公告)号：US10209183B2

公开(公告)日：2019-02-19

申请号：US15650652

申请日：2017-07-14

Applicant: KLA-Tencor Corporation

Inventor： Tzahi Grunzweig ,  Andrew Hill ,  Barry Loevsky

IPC: G01N21/47 ,  G03F7/20

Abstract: A scatterometry measurement system includes an objective lens with a central obscuration and an illumination source configured to illuminate a scatterometry target through the objective lens with a first illumination beam at a first illumination angle and a second illumination beam at a second illumination angle in which the scatterometry target includes periodic structures located in at least two layers. The objective lens collects at least one diffracted order from the first illumination beam and at least one diffracted order from the second illumination beam such that the at least one diffracted order from the first illumination beam and the at least one diffracted order from the second illumination beam have a non-overlapping distribution in a portion of an imaging pupil plane not blocked by the central obscuration.

公开(公告)号：US20180292198A1

公开(公告)日：2018-10-11

申请号：US15574294

申请日：2017-09-14

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew Hill

IPC: G01B9/02 ,  G01B11/27

Abstract: Methods and systems for focusing and measuring by mean of an interferometer device, having an optical coherence tomography (OCT) focusing system, by separately directing an overlapped measurement and reference wavefront towards a focus sensor and towards an imaging sensor; where a predefined focusing illumination spectrum of the overlapped wavefront is directed towards the focus sensor, and where a predefined measurement illumination spectrum of the overlapped wavefront is directed towards the imaging sensor. Methods and systems for maintaining focus of an interferometer device, having an OCT focusing system, during sample's stage moves.

公开(公告)号：US20180106723A1

公开(公告)日：2018-04-19

申请号：US15841219

申请日：2017-12-13

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew Hill ,  Daniel Kandel ,  Ilan Sela ,  Ohad Bachar ,  Barak Bringoltz

IPC: G01N21/55 ,  G01B11/00 ,  G01N21/956 ,  G01N21/95

CPC classification number: G01N21/55 ,  G01B11/00 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/104

Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.