公开(公告)号：US20060192120A1

公开(公告)日：2006-08-31

申请号：US11411349

申请日：2006-04-25

申请人： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

发明人： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

IPC分类号： G21K7/00 ,  G01N23/00

CPC分类号： H01J37/26 ,  G01N23/225 ,  H01J37/1471 ,  H01J37/226 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/2482 ,  H01J2237/2538 ,  H01J2237/262 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2823 ,  H01J2237/2826 ,  H01J2237/30438

摘要： Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the E×B in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.

公开(公告)号：US07083707B2

公开(公告)日：2006-08-01

申请号：US10206622

申请日：2002-07-26

申请人： Toshihiko Miura ,  Hiroshi Kubo ,  Kinya Kato ,  Masahiro Kawaguchi ,  Akira Kuriyama

发明人： Toshihiko Miura ,  Hiroshi Kubo ,  Kinya Kato ,  Masahiro Kawaguchi ,  Akira Kuriyama

IPC分类号： C02F1/461

CPC分类号： B09C1/085 ,  A62D2203/10 ,  C02F1/467 ,  C02F2101/36

摘要： A decomposition apparatus for decomposition of decomposition targets such as organic chlorinated compounds is provided. The decomposition apparatus includes a contact section with an internal space to allow a decomposition target to come into contact with and be taken into a liquid, a flow path to lead along with the liquid the decomposition target taken into the liquid to a position different from the internal space, a decomposing device positioned along the flow path in a state cut off from the outside air to decompose the decomposition target that has been led through the flow path, and a device to introduce to the contact section a liquid that contains products produced from the decomposition of the decomposition target by the decomposing device. The decomposing apparatus have plate-shaped electrodes that come into contact with and electrolyze the decomposition target that flows through the flow path, and wherein the surfaces of the electrodes are positioned within the decomposing device at an angle different from the flow direction of the liquid in the flow path, for example, perpendicular to the flow direction of the liquid in the flow path.

公开(公告)号：US06833115B2

公开(公告)日：2004-12-21

申请号：US09988105

申请日：2001-11-19

申请人： Kinya Kato ,  Masahiro Kawaguchi ,  Akira Kuriyama

发明人： Kinya Kato ,  Masahiro Kawaguchi ,  Akira Kuriyama

IPC分类号： B01J1908

CPC分类号： A62D3/176 ,  A62D2203/10 ,  B01J19/0006 ,  B01J19/123 ,  B01J19/26 ,  B01J2219/00186

摘要： The present invention enables efficient decomposition work without involving burdensome operations of carrying out decomposition of undecomposed pollutants discharged at the time of starting decomposition processing and undecomposed pollutants remaining at the time of interruption and termination of decomposition processing, separately from primary decomposition. At the time of starting decomposition, the steps of supplying a substance having a function to decompose the pollutant to a decomposition area, irradiating the decomposition area with light and supplying a decomposition target substance to the reaction area are carried out in the described order, while at the time of ending start of decomposition, the operations of supplying the decomposition target substance, irradiating the decomposition area with light and supplying the substance having a function to decompose the pollutant to the decomposition area are carried out in the described order.

摘要翻译： 本发明能够有效地进行分解工作，而不需要在分解处理开始时分解未分解污染物的分解和在分解处理中断和终止分解处理时残留的未分解污染物与主分解相分离的繁琐操作。 在开始分解时，将具有分解污染物功能的物质分解成分解区域，用光照射分解区域并向反应区域供给分解对象物质的步骤按照所述顺序进行，同时 在结束分解开始时，按照所述的顺序进行供给分解对象物质，用光照射分解区域并将具有分解污染物质的物质供给到分解区域的操作。

公开(公告)号：US06599431B2

公开(公告)日：2003-07-29

申请号：US09880761

申请日：2001-06-15

申请人： Masahiro Kawaguchi ,  Kinya Kato ,  Akira Kuriyama

发明人： Masahiro Kawaguchi ,  Kinya Kato ,  Akira Kuriyama

IPC分类号： C02F130

CPC分类号： B09C1/002 ,  B01D53/007 ,  C02F1/20 ,  C02F1/32 ,  C02F1/4674 ,  C02F2101/36 ,  C02F2103/06

摘要： A method and an apparatus for purifying water including groundwater contaminated with a pollutant such as organohalogenated compounds are provided. The contaminated water is purified by aeration to expel the pollutant into gas phase, and the pollutant containing gas is then mixed with a chlorine-containing gas under light irradiation to decompose the pollutant, where the chlorine-containing gas may generated from functional water by aeration.

公开(公告)号：US6121040A

公开(公告)日：2000-09-19

申请号：US208376

申请日：1998-12-10

申请人： Masanori Sakuranaga ,  Kinya Kato

发明人： Masanori Sakuranaga ,  Kinya Kato

IPC分类号： B09C1/10 ,  B09B3/00

CPC分类号： B09C1/10

摘要： Provided is a process for remedying a contaminated soil characterized in that a contaminated region of the ground is purified by the steps of first freezing the contaminated region, then injecting to the same a microorganism and a liquid agent or gas which is required for a biological treatment using the microorganism's ability to decomposing a pollutant, to enable more efficient and rapid remediation.

摘要翻译： 提供了一种补救污染土壤的方法，其特征在于，通过首先冷冻污染区域的步骤净化地面的污染区域，然后向其中注入微生物和生物处理所需的液体试剂或气体 利用微生物分解污染物的能力，实现更有效快速的补救。

公开(公告)号：US6049372A

公开(公告)日：2000-04-11

申请号：US881902

申请日：1997-06-23

申请人： Kinya Kato ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kei Nara

发明人： Kinya Kato ,  Hiroshi Shirasu ,  Yukio Kakizaki ,  Kei Nara

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42

CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70775 ,  G03F9/70

摘要： Apparatus and methods are disclosed for transferring a pattern defined by a mask onto a surface of a substrate. The apparatus includes an illumination optical system for illuminating the pattern on the mask. A projection optical system forms an erect image of the pattern on the substrate. For exposure, the mask and substrate are movable together in a scanning direction relative to the projection optical system. First and second relative-displacement measuring systems, the first being separated from the second by a predetermined distance perpendicular to the scanning direction, measure displacement of the mask relative to the substrate in the scanning direction. First and second detection systems detect displacement of the mask and substrate, respectively, in the direction perpendicular to the scanning direction. A position-adjusting system adjusts the position of at least one of the mask and substrate. A calculation system calculates a position-adjusting amount based on outputs from the first and second relative-displacement measuring systems and from the first and second detection systems. A control system controls the position-adjusting system based on an output from the calculation system.

摘要翻译： 公开了用于将由掩模限定的图案转印到基板的表面上的装置和方法。 该装置包括用于照亮掩模上的图案的照明光学系统。 投影光学系统在基板上形成图案的直立图像。 为了曝光，掩模和基板可相对于投影光学系统沿扫描方向一起移动。 第一和第二相对位移测量系统，第一和第二相对位移测量系统，其中第一相对位移测量系统从垂直于扫描方向的预定距离与第二相对位移测量系统分离，测量掩模相对于基板在扫描方向 第一和第二检测系统分别在与扫描方向垂直的方向上检测掩模和基板的位移。 位置调整系统调整至少一个掩模和基底的位置。 计算系统基于来自第一和第二相对位移测量系统以及第一和第二检测系统的输出来计算位置调整量。 控制系统根据计算系统的输出控制位置调整系统。

公开(公告)号：US5640227A

公开(公告)日：1997-06-17

申请号：US349869

申请日：1994-12-06

申请人： Kinya Kato ,  Kazuaki Saiki ,  Masami Seki ,  Masaki Kato

发明人： Kinya Kato ,  Kazuaki Saiki ,  Masami Seki ,  Masaki Kato

IPC分类号： G03F7/20 ,  G03F9/00 ,  H01L21/027

CPC分类号： G03F9/7026 ,  G03F7/70358

摘要： An exposure apparatus and an exposure method which minimize defocusing of the transferred pattern even with a large-sized mask. When the exposure apparatus is used which transfers the pattern formed on a first substrate through a substantially real-size projection optical system onto a second substrate, the positions of the mask and the substrate are detected, and based on the information on the positions the distance between the mask and the substrate is controlled to be substantially constant. According to the present invention, defocusing of the transferred pattern may be substantially avoided by detecting positions of the mask and the plate by making use of, e.g., an obliquely incident light focus detection optical system, and controlling the distance therebetween to be held constant or at a predetermined distance.

摘要翻译： 曝光装置和曝光方法，即使用大尺寸的掩模，也能最小化转印图案的散焦。 当使用通过基本上实际尺寸的投影光学系统将形成在第一基板上的图案转印到第二基板上的曝光装置时，检测掩模和基板的位置，并且基于关于位置的信息，距离 掩模和基板之间的距离被控制为基本恒定。 根据本发明，通过利用例如倾斜入射的光聚焦检测光学系统来检测掩模和板的位置，并且控制其之间的距离保持不变，可以基本上避免转印图案的散焦 在预定距离处。

公开(公告)号：US4965630A

公开(公告)日：1990-10-23

申请号：US451166

申请日：1989-12-15

申请人： Kinya Kato ,  Kazuo Ushida ,  Toshiyuki Namikawa ,  Koichi Matsumoto ,  Kyoichi Suwa ,  Koichi Ohno

发明人： Kinya Kato ,  Kazuo Ushida ,  Toshiyuki Namikawa ,  Koichi Matsumoto ,  Kyoichi Suwa ,  Koichi Ohno

IPC分类号： G03F7/20 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F7/70241

摘要： The present invention provides a projection exposure apparatus comprising: a reticle stage; an illumination optical system for illuminating a reticle on the reticle stage; a stage on which a substrate is supported; and a projection optical system having a predetermined numerical aperture to project a pattern formed on the reticle and illuminated by the illumination optical system onto the substrate, and in which a longitudinal spherial aberration thereof regarding the focusing of the pattern formed on the reticle onto the substrate are excessively corrected.

摘要翻译： 本发明提供一种投影曝光装置，包括：标线片台; 照明光学系统，用于照亮标线片台上的掩模版; 支撑衬底的阶段; 以及具有预定数值孔径的投影光学系统，以将形成在标线上的图案投影并由照明光学系统照射到基板上，并且其中将关于在掩模版上形成的图案聚焦到基板上的纵向球面像差 被过度纠正。

公开(公告)号：US4918504A

公开(公告)日：1990-04-17

申请号：US222844

申请日：1988-07-22

申请人： Kinya Kato ,  Nobuhiko Kakuda ,  Noboru Naito ,  Tsutomu Wada

发明人： Kinya Kato ,  Nobuhiko Kakuda ,  Noboru Naito ,  Tsutomu Wada

IPC分类号： G02F1/1362 ,  G02F1/1368 ,  H01L21/77 ,  H01L21/84 ,  H01L27/12

CPC分类号： G02F1/1368 ,  H01L27/1214 ,  G02F2001/136263 ,  G02F2001/13629

摘要： An active matrix cell includes a first conductor group formed on a transparent substrate, two-layered regions consisting of a semiconductor film and a first insulating film, a second insulating film and a second conductor group. The first conductor group forms the source and drain of a thin film transistor, pixel electrode, data line. One of the two-layered regions serves as an active region of the thin film transistor and the other of the two-layered regions serves as the intersection between the data and scanning lines. The second insulating film is buried in the gap between the two-layered regions and the first conductor group, and has substantially a same thickness as the two-layered regions. The second conductor group forms the scanning line and the part of the data line. A method of manufacturing the active matrix cell is also disclosed.

公开(公告)号：US4769551A

公开(公告)日：1988-09-06

申请号：US66241

申请日：1987-06-25

申请人： Muneki Hamashima ,  Kinya Kato ,  Tatsumi Ishizeki ,  Kou Sekiba ,  Hiroaki Iseya

发明人： Muneki Hamashima ,  Kinya Kato ,  Tatsumi Ishizeki ,  Kou Sekiba ,  Hiroaki Iseya

IPC分类号： G03F7/20 ,  G01N21/86

CPC分类号： G03F7/70616 ,  G03F7/70358

摘要： Pattern detection and measurement comprises: first irradiation means for irradiating a workpiece with a first energy beam; detection means for receiving a second energy beam emitted from a portion of the workpiece irradiated by the first energy beam, thereby detecting a pattern in the irradiated portion; second irradiation means for irradiating the workpiece with a third energy beam; discrimination means for receiving a fourth energy beam emitted from a portion of the workpiece irradiated by the third energy beam, thereby discriminating whether the portion irradiated by the third energy beam is sensitive to the first energy beam; and control means for controlling, in response to the output of the discrimination means, the first energy beam in irradiating the sensitive portion, thereby preventing the damage of the sensitive portion by the first energy beam.

摘要翻译： 图案检测和测量包括：用第一能量束照射工件的第一照射装置; 检测装置，用于接收从由第一能量束照射的工件的一部分发射的第二能量束，从而检测照射部分中的图案; 第二照射装置，用于用第三能量束照射所述工件; 用于接收从由第三能量束照射的工件的一部分发射的第四能量束的识别装置，从而判断由第三能量束照射的部分是否对第一能量束敏感; 以及控制装置，用于响应于识别装置的输出，控制第一能量束照射敏感部分，从而防止敏感部分被第一能量束损坏。