公开(公告)号：US20180335346A1

公开(公告)日：2018-11-22

申请号：US16052044

申请日：2018-08-01

Applicant: KLA-Tencor Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Yuri Paskover ,  Yuval Lubashevsky

IPC: G01J4/04 ,  G01B11/27 ,  G03F7/20

CPC classification number: G01J4/04 ,  G01B11/272 ,  G03F7/70633

Abstract: Metrology methods and systems are provided, in which the detected image is split at a field plane of the collection path of the metrology system's optical system into at least two pupil plane images. Optical elements such as prisms may be used to split the field plane images, and multiple targets or target cells may be measured simultaneously by spatially splitting the field plane and/or the illumination sources and/or by using two polarization types. The simultaneous capturing of multiple targets or target cells increases the throughput of the disclosed metrology systems.

公开(公告)号：US20180292326A1

公开(公告)日：2018-10-11

申请号：US15608766

申请日：2017-05-30

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Daria Negri ,  Andrew V. Hill ,  Ohad Bachar ,  Vladimir Levinski ,  Yuri Paskover

IPC: G01N21/88 ,  G01B11/27 ,  G01N21/33 ,  G01N21/3563 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01B11/0633 ,  G01B11/272 ,  G01B2210/56 ,  G01N21/33 ,  G01N21/3563 ,  G01N21/8422 ,  G01N21/9505 ,  G01N21/956 ,  G01N2021/8438 ,  G01N2021/8845 ,  G01N2201/06113 ,  G03F7/70633

Abstract: A metrology system includes an image device and a controller. The image device includes a spectrally-tunable illumination device and a detector to generate images of a sample having metrology target elements on two or more sample layers based on radiation emanating from the sample in response to illumination from the spectrally-tunable illumination device. The controller determines layer-specific imaging configurations of the imaging device to image the metrology target elements on the two or more sample layers within a selected image quality tolerance in which each layer-specific imaging configuration includes an illumination spectrum from the spectrally-tunable illumination device. The controller further receives one or more images of the metrology target elements on the two or more sample layers generated using the layer-specific imaging configurations. The controller further provides a metrology measurement based on the one or more images of the metrology target elements on the two or more sample layers.

公开(公告)号：US20180292198A1

公开(公告)日：2018-10-11

申请号：US15574294

申请日：2017-09-14

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew Hill

IPC: G01B9/02 ,  G01B11/27

Abstract: Methods and systems for focusing and measuring by mean of an interferometer device, having an optical coherence tomography (OCT) focusing system, by separately directing an overlapped measurement and reference wavefront towards a focus sensor and towards an imaging sensor; where a predefined focusing illumination spectrum of the overlapped wavefront is directed towards the focus sensor, and where a predefined measurement illumination spectrum of the overlapped wavefront is directed towards the imaging sensor. Methods and systems for maintaining focus of an interferometer device, having an OCT focusing system, during sample's stage moves.

公开(公告)号：US20180157784A1

公开(公告)日：2018-06-07

申请号：US15502950

申请日：2016-11-04

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Levinski ,  Eitan Hajaj ,  Tal Itzkovich ,  Sharon Aharon ,  Michael E. Adel ,  Yuri Paskover ,  Daria Negri ,  Yuval Lubashevsky ,  Amnon Manassen ,  Myungjun Lee ,  Mark D. Smith

IPC: G06F17/50 ,  G03F7/20

Abstract: Metrology targets and target design methods are provided, in which target elements are defined by replacing elements from a periodic pattern having a pitch p, by assist elements having at least one geometric difference from the replaced elements, to form a composite periodic structure that maintains the pitch p as a single pitch. Constructing targets within the bounds of compatibility with advanced multiple patterning techniques improves the fidelity of the targets and fill factor modulation enables adjustment of the targets to produce sufficient metrology sensitivity for extracting the overlay while achieving process compatibility of the targets.

公开(公告)号：US20180106723A1

公开(公告)日：2018-04-19

申请号：US15841219

申请日：2017-12-13

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Andrew Hill ,  Daniel Kandel ,  Ilan Sela ,  Ohad Bachar ,  Barak Bringoltz

IPC: G01N21/55 ,  G01B11/00 ,  G01N21/956 ,  G01N21/95

CPC classification number: G01N21/55 ,  G01B11/00 ,  G01N21/9501 ,  G01N21/956 ,  G01N2201/06113 ,  G01N2201/104

Abstract: Angle-resolved reflectometers and reflectometry methods are provided, which comprise a coherent light source, an optical system arranged to scan a test pattern using a spot of coherent light from the light source to yield realizations of the light distribution in the collected pupil, wherein the spot covers a part of the test pattern and the scanning is carried out optically or mechanically according to a scanning pattern, and a processing unit arranged to generate a composite image of the collected pupil distribution by combining the pupil images. Metrology systems and methods are provided, which reduce diffraction errors by estimating, quantitatively, a functional dependency of measurement parameters on aperture sizes and deriving, from identified diffraction components of the functional dependency which relate to the aperture sizes, correction terms for the measurement parameters with respect to the measurement conditions.

公开(公告)号：US20180031424A1

公开(公告)日：2018-02-01

申请号：US15222503

申请日：2016-07-28

Applicant: KLA-Tencor Corporation

Inventor： Andrew V. Hill ,  Amnon Manassen ,  Yuri Paskover ,  Yuval Lubashevsky

IPC: G01J4/04 ,  G01B11/27

CPC classification number: G01J4/04 ,  G01B11/272 ,  G03F7/70633

Abstract: Metrology methods and systems are provided, in which the detected image is split at a field plane of the collection path of the metrology system's optical system into at least two pupil plane images. Optical elements such as prisms may be used to split the field plane images, and multiple targets or target cells may be measured simultaneously by spatially splitting the field plane and/or the illumination sources and/or by using two polarization types. The simultaneous capturing of multiple targets or target cells increases the throughput of the disclosed metrology systems.

公开(公告)号：US20170268869A1

公开(公告)日：2017-09-21

申请号：US15305166

申请日：2016-08-18

Applicant: KLA-Tencor Corporation

Inventor： Vladimir Levinski ,  Yuri Paskover ,  Yuval Lubashevsky ,  Amnon Manassen

IPC: G01B11/27 ,  G01B9/02 ,  G01N21/47

CPC classification number: G01B11/272 ,  G01B9/0201 ,  G01N21/4788 ,  G03F7/70633

Abstract: Metrology measurement methods and tools are provided, which illuminate a stationary diffractive target by a stationary illumination source, measure a signal composed of a sum of a zeroth order diffraction signal and a first order diffraction signal, repeat the measuring for a plurality of relations between the zeroth and the first diffraction signals, while maintaining the diffractive target and the illumination source stationary, and derive the first order diffraction signal from the measured sums. Illumination may be coherent and measurements may be in the pupil plane, or illumination may be incoherent and measurements may be in the field plane, in either case, partial overlapping of the zeroth and the first diffraction orders are measured. Illumination may be annular and the diffractive target may be a one cell SCOL target with periodic structures having different pitches to separate the overlap regions.

公开(公告)号：US20170146399A1

公开(公告)日：2017-05-25

申请号：US15369560

申请日：2016-12-05

Applicant: KLA-Tencor Corporation

Inventor： Gregory R. Brady ,  Andrei V. Shchegrov ,  Lawrence D. Rotter ,  Derrick A. Shaughnessy ,  Anatoly Shchemelinin ,  Ilya Bezel ,  Muzammil A. Arain ,  Anatoly A. Vasiliev ,  James Andrew Allen ,  Oleg Shulepov ,  Andrew V. Hill ,  Ohad Bachar ,  Moshe Markowitz ,  Yaron Ish-Shalom ,  Ilan Sela ,  Amnon Manassen ,  Alexander Svizher ,  Maxim Khokhlov ,  Avi Abramov ,  Oleg Tsibulevsky ,  Daniel Kandel ,  Mark Ghinovker

IPC: G01J3/10 ,  H01J65/04 ,  G01J3/02 ,  G02B6/293 ,  G01J3/12

CPC classification number: G01J3/10 ,  F21V13/00 ,  F21V13/08 ,  F21V13/12 ,  G01J3/0218 ,  G01J3/12 ,  G02B6/29332 ,  G02B6/29362 ,  G02B6/29388 ,  G02B6/29395 ,  G02B6/3508 ,  G02B6/353 ,  H01J65/04

Abstract: A system for providing illumination to a measurement head for optical metrology is configured to combine illumination beams from a plurality of illumination sources to deliver illumination at one or more selected wavelengths to the measurement head. The intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. Illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

公开(公告)号：US09512985B2

公开(公告)日：2016-12-06

申请号：US13774025

申请日：2013-02-22

Applicant: KLA-Tencor Corporation

Inventor： Gregory R. Brady ,  Andrei V. Shchegrov ,  Lawrence D. Rotter ,  Derrick Shaughnessy ,  Anatoly Shchemelinin ,  Ilya Bezel ,  Muzammil A. Arain ,  Anatoly A. Vasiliev ,  James Andrew Allen ,  Oleg Shulepov ,  Andrew V. Hill ,  Ohad Bachar ,  Moshe Markowitz ,  Yaron Ish-Shalom ,  Ilan Sela ,  Amnon Manassen ,  Alexander Svizher ,  Maxim Khokhlov ,  Avi Abramov ,  Oleg Tsibulevsky ,  Daniel Kandel ,  Mark Ghinovker

IPC: F21S8/10 ,  F21V13/08 ,  F21V13/00 ,  F21V13/12 ,  G02B6/35 ,  G02B6/293

CPC classification number: G01J3/10 ,  F21V13/00 ,  F21V13/08 ,  F21V13/12 ,  G01J3/0218 ,  G01J3/12 ,  G02B6/29332 ,  G02B6/29362 ,  G02B6/29388 ,  G02B6/29395 ,  G02B6/3508 ,  G02B6/353 ,  H01J65/04

Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.

Abstract translation: 本公开涉及用于向用于光学测量的测量头提供照明的系统。 在本公开的一些实施例中，来自多个照明源的照明光束被组合以将一个或多个所选波长的照明传送到测量头。 在本公开的一些实施例中，控制传送到测量头的照明的强度和/或空间相干性。 在本公开的一些实施例中，一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。

公开(公告)号：US09123649B1

公开(公告)日：2015-09-01

申请号：US14160154

申请日：2014-01-21

Applicant: KLA-Tencor Corporation

Inventor： Amnon Manassen ,  Barry Loevsky

IPC: G06K9/00 ,  H01L21/66 ,  G06T7/00

CPC classification number: G03F7/70633 ,  G01B11/02 ,  G01B11/14 ,  G06K9/00 ,  G06K9/3216 ,  G06T7/0004 ,  H01L22/30 ,  H01L23/544 ,  H01L2924/0002 ,  H01L2924/00

Abstract: Various target configurations are disclosed. A target may include multiple lines spaced equally apart according to a pitch distance. The target may also include a first mark having at least one edge parallel to the lines, wherein the edge is configured to have at least one of: a periodically repetitive edge pattern having an amplitude that is a multiple of the pitch, a length that is a multiple of the pitch, or a thickness that is a multiple of the pitch. The target may further include a second mark having at least one edge parallel to the plurality of lines, wherein the edge is configured to have at least one of: a periodically repetitive edge pattern having a second amplitude that is a multiple of the pitch, a length that is a multiple of the pitch, or a thickness that is a multiple of the pitch.

Abstract translation: 公开了各种目标结构。 目标可以包括根据间距距离间隔相等的多条线。 目标还可以包括具有平行于线路的至少一个边缘的第一标记，其中边缘被配置为具有以下至少一个：周期性重复边缘图案，其幅度是音高的倍数，长度是 间距的倍数，或者是音高倍数的厚度。 目标还可以包括具有平行于多条线的至少一个边缘的第二标记，其中边缘被配置为具有以下至少一个：周期性重复边缘图案，具有作为间距的倍数的第二幅度， 长度是音高的倍数，或者是音高倍数的厚度。