公开(公告)号：US20090027638A1

公开(公告)日：2009-01-29

申请号：US12232861

申请日：2008-09-25

申请人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

发明人： Tjarko Adriaan Rudolf Van Empel ,  Erik Roelof Loopstra ,  Antonius Johannes Van Der Net ,  Yuri Johannes Gabriel Van De Vijver ,  Bernhard Gellrich ,  Bauke Jansen ,  Rens Sanderse

IPC分类号： G03B27/52 ,  G01N7/00

CPC分类号： G03F7/70933 ,  G03F7/70908

摘要： A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.

摘要翻译： 光刻设备包括投影系统，该投影系统被配置为将图案化的辐射束投影到基板的目标部分上。 投影系统包括第一气体调节子环境和第二气体调节子环境。 该装置包括：气体控制单元，被配置为控制经由第一子环境将调节气体进入第一子环境并进入第二子环境，以防止从第二子环境到第一子环境的污染， 环境。 该装置包括：门，该门被配置为以从第二子环境到环境大气的速率泄漏经调节的气体;以及检测器，被配置为检测第二气体条件环境的至少一个性质。

公开(公告)号：US07106412B2

公开(公告)日：2006-09-12

申请号：US10776641

申请日：2004-02-12

申请人： Pieter Klaas De Bokx ,  Tjarko Adriaan Rudolf Van Empel ,  Ronald Johannes Hultermans ,  Adrianus Cornelius Antonius Jonkers

发明人： Pieter Klaas De Bokx ,  Tjarko Adriaan Rudolf Van Empel ,  Ronald Johannes Hultermans ,  Adrianus Cornelius Antonius Jonkers

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70933

摘要： A lithographic projection apparatus includes a radiation system constructed and arranged to supply a projection beam of radiation, a support structure constructed and arranged to support a patterning structure, the patterning structure constructed and arranged to pattern the projection beam according to a desired pattern, a substrate support constructed and arranged to support a substrate, and a projection system constructed and arranged to project the patterned beam onto a target portion of the substrate. The apparatus further includes a gas flushing system comprising radial gas flow outlets, said gas flushing system being constructed and arranged to generate a radial gas flow through said radial gas flow outlets in an intermediate space defined between said gas flushing system and said substrate, wherein the radial gas flow has a radial velocity directed outwards in said space with a magnitude larger than zero at every location in said space.

摘要翻译： 一种光刻投影设备包括一个辐射系统，该辐射系统被构造和布置成提供一个投影辐射束，一个构造和布置成支撑图形结构的支撑结构，该图形结构被构造和布置成根据期望的图案对投影光束进行图案化， 支撑构造和布置成支撑衬底;以及投影系统，其构造和布置成将图案化的光束投影到衬底的目标部分上。 所述设备还包括气体冲洗系统，其包括径向气体流出口，所述气体冲洗系统被构造和布置成在所述气体冲洗系统和所述基板之间限定的中间空间中产生径向气流通过所述径向气流出口，其中， 径向气流在所述空间中的每个位置处具有在所述空间中向外指向的幅度大于零的径向速度。

公开(公告)号：US06707530B2

公开(公告)日：2004-03-16

申请号：US10138506

申请日：2002-05-06

申请人： Raymond Laurentius Johannes Schrijver ,  Tjarko Adriaan Rudolf Van Empel ,  Marcel Koenraad Marie Baggen

发明人： Raymond Laurentius Johannes Schrijver ,  Tjarko Adriaan Rudolf Van Empel ,  Marcel Koenraad Marie Baggen

IPC分类号： G03B2752

CPC分类号： G03F7/70933 ,  G03F7/70716 ,  G03F7/70866

摘要： A lithographic apparatus has an inner purge compartment surrounding and moving with a moveable component such as a mask table or a substrate table and an outer purge compartment surrounding the inner purge compartment. Purge gas is supplied to the inner compartment and exhausted from the outer compartment so that the inner purge compartment is at an average pressure higher than ambient and the outer compartment is at a pressure lower than ambient. Even when acceleration of the moveable object and compartments cause local pressure variations, the inner compartment is at a higher pressure than the outer compartment so that any gas flow is outward and contamination is prevented from reaching the inner compartment.

摘要翻译： 光刻设备具有围绕并且与可移动部件（例如掩模台或基板台）和围绕内部净化隔室的外部净化室一起移动的内部净化室。 吹扫气体被供应到内部隔室并从外部隔室排出，使得内部净化室处于高于环境的平均压力，并且外部隔室处于低于环境的压力。 即使可移动物体和隔间的加速导致局部压力变化，内部隔室处于比外部隔室更高的压力，使得任何气体流向外，并且防止污染物到达内部隔室。

公开(公告)号：US09766558B2

公开(公告)日：2017-09-19

申请号：US12710752

申请日：2010-02-23

申请人： Tjarko Adriaan Rudolf Van Empel ,  Martijn Houkes ,  Norbert Erwin Therenzo Jansen

发明人： Tjarko Adriaan Rudolf Van Empel ,  Martijn Houkes ,  Norbert Erwin Therenzo Jansen

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/709 ,  G03F7/70725

摘要： A positioning apparatus includes a first object and a second object; a positioning system configured to position the first and the second objects with respect to each other; and a flexible transportation line that is connected to the first and the second objects, the flexible transportation line having a stiffness that varies along the flexible transportation line such that the flexible transportation line can be represented by a dynamic transfer function, the dynamic transfer function being adapted to a closed-loop transfer function of the positioning system.

公开(公告)号：US08901521B2

公开(公告)日：2014-12-02

申请号：US12197693

申请日：2008-08-25

申请人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

发明人： Tjarko Adriaan Rudolf Van Empel ,  Vadim Yevgenyevich Banine ,  Vladimir Vitalevich Ivanov ,  Erik Roelof Loopstra ,  Johannes Hubertus Josephina Moors ,  Jan Bernard Plechelmus Van Schoot ,  Yuri Johannes Gabriël Van De Vijver ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski

IPC分类号： G01J3/10 ,  G03F7/20 ,  H05G2/00

CPC分类号： H05G2/008 ,  G03F7/70175 ,  G03F7/70891 ,  G03F7/70916 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/006 ,  H05K7/2039

摘要： A module for producing extreme ultraviolet radiation includes a supply configured to supply droplets of an ignition material to a predetermined target ignition position and a laser arranged to be focused on the predetermined target ignition position and to produce a plasma by hitting such a droplet which is located at the predetermined target ignition position in order to change the droplet into an extreme ultraviolet producing plasma. Also, the module includes a collector mirror having a mirror surface constructed and arranged to reflect the radiation in order to focus the radiation on a focal point. A fluid supply is constructed and arranged to form a gas flow flowing away from the mirror surface in a direction transverse with respect to the mirror surface in order to mitigate particle debris produced by the plasma.

摘要翻译： 用于产生极紫外线辐射的模块包括被配置为将点火材料的液滴供应到预定的目标点火位置的电源和布置成聚焦在预定的目标点火位置上的激光器，并且通过击打位于 在预定的目标点火位置，以便将液滴变成极紫外线产生等离子体。 此外，模块包括收集器反射镜，其具有构造和布置成反射辐射的镜面，以便将辐射聚焦在焦点上。 流体供应器被构造和布置成在相对于镜面横向的方向上形成从镜面流出的气流，以便减轻由等离子体产生的颗粒碎片。

公开(公告)号：US08115900B2

公开(公告)日：2012-02-14

申请号：US11898933

申请日：2007-09-17

申请人： Yuri Johannes Gabriël Van De Vijver ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski ,  Tjarko Adriaan Rudolf Van Empel

发明人： Yuri Johannes Gabriël Van De Vijver ,  Jan Bernard Plechelmus Van Schoot ,  Gerardus Hubertus Petrus Maria Swinkels ,  Hendrikus Gijsbertus Schimmel ,  Dzmitry Labetski ,  Tjarko Adriaan Rudolf Van Empel

IPC分类号： G03B27/52

CPC分类号： G03F7/70033 ,  B82Y10/00 ,  G03F7/70841 ,  G03F7/70908 ,  G03F7/70916 ,  G03F7/70933 ,  H05G2/003 ,  H05G2/008

摘要： A lithographic apparatus is arranged to project a pattern from a patterning device onto a substrate is disclosed. The lithographic apparatus includes an illumination system and an outlet connected to a pumping system to pump away gas from between an inner wall and outer wall of the illumination system or, if a radiation source is present, between the inner wall of the illumination system and an inner wall of the radiation source.

摘要翻译： 公开了一种光刻设备，用于将图案从图案形成装置突出到衬底上。 光刻设备包括照明系统和连接到泵送系统的出口，以从照明系统的内壁和外壁之间泵送气体，或者如果存在辐射源，则在照明系统的内壁和 辐射源的内壁。

公开(公告)号：US20110188049A1

公开(公告)日：2011-08-04

申请号：US13084372

申请日：2011-04-11

申请人： Ronald VAN DER HAM ,  Tjarko Adriaan Rudolf Van Empel ,  Herman Vogel ,  Niek Jacobus Johannes Roset

发明人： Ronald VAN DER HAM ,  Tjarko Adriaan Rudolf Van Empel ,  Herman Vogel ,  Niek Jacobus Johannes Roset

IPC分类号： G01B11/02

CPC分类号： G03F7/70933 ,  G03F7/70775 ,  G03F7/70858 ,  G03F7/70866 ,  Y10T137/8593

摘要： An assembly including a conditioning system and an object moveable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.

摘要翻译： 公开了一种组件，其包括调节系统和可移动到待调节区域中和/或之外的物体。 调节系统具有流体出口通道，以将调节流体供应到待调节的区域，并且构造成根据物体的位置调节调节流体与流体出口通道的流出。

公开(公告)号：US07978339B2

公开(公告)日：2011-07-12

申请号：US11242130

申请日：2005-10-04

申请人： Tjarko Adriaan Rudolf Van Empel ,  Marcel Hendrikus Maria Beems ,  Emiel Jozef Melanie Eussen

发明人： Tjarko Adriaan Rudolf Van Empel ,  Marcel Hendrikus Maria Beems ,  Emiel Jozef Melanie Eussen

IPC分类号： G01B9/02

CPC分类号： G03F7/70891

摘要： A lithographic apparatus includes a position measurement system to determine along a measurement path a position of a first part of the lithographic apparatus with respect to a position of a second part of the lithographic apparatus. The position determination system comprises a plurality of temperature sensors to measure a temperature of a medium along the measurement path. The position measurement system corrects the determined position making use of the temperature as measured by the temperature sensors.

摘要翻译： 光刻设备包括位置测量系统，用于沿着测量路径确定光刻设备的第一部分相对于光刻设备的第二部分的位置的位置。 位置确定系统包括多个温度传感器，用于测量沿着测量路径的介质的温度。 位置测量系统使用由温度传感器测量的温度校正确定的位置。

公开(公告)号：US07924399B2

公开(公告)日：2011-04-12

申请号：US11389493

申请日：2006-03-27

申请人： Ronald Van Der Ham ,  Tjarko Adriaan Rudolf Van Empel ,  Herman Vogel ,  Niek Jacobus Johannes Roset

发明人： Ronald Van Der Ham ,  Tjarko Adriaan Rudolf Van Empel ,  Herman Vogel ,  Niek Jacobus Johannes Roset

IPC分类号： A61N5/00 ,  G03B27/32 ,  G03B27/42 ,  G03B27/52 ,  G03B27/58 ,  G03B27/62

CPC分类号： G03F7/70933 ,  G03F7/70775 ,  G03F7/70858 ,  G03F7/70866 ,  Y10T137/8593

摘要： An assembly including a conditioning system and an object movable into and/or out of an area to be conditioned is disclosed. The conditioning system has fluid outlet passages to supply conditioning fluid to the area to be conditioned and is configured to adjust outflow of the conditioning fluid from the fluid outlet passages depending on a position of the object.

摘要翻译： 公开了一种组件，其包括调节系统和可移动到待调节区域中和/或之外的物体。 调节系统具有流体出口通道，以将调节流体供应到待调节的区域，并且构造成根据物体的位置调节调节流体与流体出口通道的流出。

公开(公告)号：US07629593B2

公开(公告)日：2009-12-08

申请号：US11819707

申请日：2007-06-28

申请人： Edwin Johan Buis ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

发明人： Edwin Johan Buis ,  Vadim Yevgenyevich Banine ,  Tjarko Adriaan Rudolf Van Empel ,  Maarten Marinus Johannes Wilhelmus Van Herpen ,  Wouter Anthon Soer

IPC分类号： G21K5/04

CPC分类号： G03F7/70916

摘要： A lithographic apparatus includes a radiation system constructed to provide a beam of radiation from radiation emitted by a radiation source. The radiation system includes a contaminant trap configured to trap material emanating from the radiation source. The contaminant trap includes a contaminant engaging surface arranged in the path of the radiation beam that receives the material emanating from the radiation source during propagation of the radiation beam in the radiation system. The radiation system also includes a liquid tin cooling system constructed to cooling the contaminant trap with liquid tin. The apparatus includes an illumination system configured to condition the radiation beam, a support constructed to support a patterning device configured to impart the radiation beam with a pattern in its cross-section, a substrate table constructed to hold a substrate, and a projection system configured to project the patterned radiation beam onto a target portion of the substrate.

摘要翻译： 光刻设备包括辐射系统，该辐射系统构造成从辐射源发射的辐射提供辐射束。 辐射系统包括被配置为捕获从辐射源发出的材料的污染物阱。 污染物捕集阱包括布置在辐射束的路径中的污染物接合表面，该辐射束在辐射束在辐射系统中传播期间接收从辐射源发出的材料。 辐射系统还包括液体锡冷却系统，其被构造成用液体锡冷却污染物阱。 该装置包括被配置为调节辐射束的照明系统，构造成支撑配置成在其横截面中赋予辐射束图案的图案形成装置的支撑件，被构造成保持基板的基板台和配置成 以将图案化的辐射束投射到基板的目标部分上。