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64 条记录 (耗时 0.025 秒)

    NEGATIVE ELECTRODE MATERIAL, MAKING METHOD, LITHIUM ION SECONDARY BATTERY, AND ELECTROCHEMICAL CAPACITOR
    12.
    发明申请
    NEGATIVE ELECTRODE MATERIAL, MAKING METHOD, LITHIUM ION SECONDARY BATTERY, AND ELECTROCHEMICAL CAPACITOR 审中-公开
    负极电极材料，制造方法，锂离子二次电池和电化学电容器

    公开(公告)号：US20090311606A1

    公开(公告)日：2009-12-17

    申请号：US12484898

    申请日：2009-06-15

    申请人： Hirofumi FUKUOKA ,  Koichiro Watanabe ,  Meguru Kashida ,  Satoru Miyawaki ,  Toshio Ohba

    发明人： Hirofumi FUKUOKA ,  Koichiro Watanabe ,  Meguru Kashida ,  Satoru Miyawaki ,  Toshio Ohba

    IPC分类号： H01M4/58 ,  H01G9/04

    CPC分类号： H01M4/134 ,  H01M4/48 ,  H01M10/0525

    摘要： A conductive powder is provided in which particles having silicon crystallites dispersed in a silicon compound are coated on their surface with carbon. The conductive powder develops a diffraction peak assigned to Si(111) around 2θ=28.4° on x-ray diffractometry (Cu—Kα) using copper as the counter cathode, the peak having a half width of at least 1.0°, and has a specific resistance of up to 50 mΩ. The powder is used as a negative electrode material to construct a non-aqueous electrolyte secondary battery, which has a high charge/discharge capacity and improved cycle performance.

    摘要翻译： 提供了一种导电粉末，其中具有分散在硅化合物中的硅微晶的颗粒在其表面上涂覆有碳。 使用铜作为对阴极，导电粉末在x射线衍射（Cu-Kalpha）上形成分配给Si（111）约2θ= 28.4°的衍射峰，该峰具有至少1.0°的半宽度，并且具有 比电阻高达50 mOmega。 该粉末用作负极材料，以构建具有高充电/放电容量和改进的循环性能的非水电解质二次电池。

    Method for dust-proofing in the manufacture of electronic devices and pellicle therefor
    14.
    发明授权
    Method for dust-proofing in the manufacture of electronic devices and pellicle therefor 失效
    制造电子设备和防护薄膜的防尘方法

    公开(公告)号：US5254419A

    公开(公告)日：1993-10-19

    申请号：US817438

    申请日：1992-01-06

    申请人： Meguru Kashida ,  Satoshi Watanabe ,  Toshinobu Ishihara ,  Yoshihiro Kubota ,  Ikuo Fukui

    发明人： Meguru Kashida ,  Satoshi Watanabe ,  Toshinobu Ishihara ,  Yoshihiro Kubota ,  Ikuo Fukui

    IPC分类号： C08F16/06 ,  C08F16/14 ,  G03F1/62 ,  H01L21/027 ,  H01L21/30 ,  G03F9/00

    CPC分类号： G03F1/62

    摘要： Disclosed is a method for dust-proofing of a photomask in the photolithographic processing of electronic devices, e.g., LSIs and liquid-crystal display panels, in which the photomask is covered with a pellicle having a frame-supported light-transmitting membrane made from a polyvinyl alcohol modified by silylating the hydroxy groups of the polyvinyl alcohol with triorganosilyl groups of the formula R.sub.3 Si--, in which R is a monovalent hydrocarbon group, e.g., alkyl, in a degree of substitution of at least 40%. The membrane of the pellicle is highly transparent to light of short wavelength in the ultraviolet region and excellently durable under prolonged irradiation with ultraviolet light not to cause yellowing or mechanical breaking.

    摘要翻译： 公开了一种在电子器件（例如LSI和液晶显示面板）的光刻处理中的光掩模的防尘方法，其中光掩模被具有框架支撑的透光膜的防护薄膜组件覆盖，所述框架支撑的透光膜由 通过使式R3Sii-的三有机甲硅烷基甲硅烷基化聚乙烯醇的羟基而改性的聚乙烯醇，其中R是一价烃基，例如烷基，取代度至少为40％。 防护薄膜的膜对于紫外线区域的短波长的光是高度透明的，并且在紫外线的长时间照射下不会导致黄变或机械断裂。

    X-ray permeable membrane for X-ray lithographic mask
    15.
    发明授权
    X-ray permeable membrane for X-ray lithographic mask 失效
    X射线透视膜用于X光平版印刷掩模

    公开(公告)号：US5246802A

    公开(公告)日：1993-09-21

    申请号：US788568

    申请日：1991-11-06

    申请人： Meguru Kashida ,  Yoshihiro Kubota ,  Yoshihiko Nagata ,  Hitoshi Noguchi

    发明人： Meguru Kashida ,  Yoshihiro Kubota ,  Yoshihiko Nagata ,  Hitoshi Noguchi

    IPC分类号： C23C14/06 ,  C23C14/34 ,  G03F1/22 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F1/22 ,  C23C14/0635 ,  C23C14/3414

    摘要： An X-ray permeable membrane for an X-ray lithographic mask consisting of an inorganic thin film obtained by the sputtering method using a target and consisting of silicon carbide and carbon, said target consisting of silicon carbide and carbon in a molar ratio of 99.9:0.1 to 70:30, having a transmission of at least 37% at a light wavelength of 633 nm and a tensile strength of 1.times.10.sup.8 to 1.times.10.sup.10 dyn/cm.sup.2, and the membrane consisting of a silicon carbide constituted form silicon and carbon in a molar ratio in the range form 50.1:49.9 to 49.9:50.1.

    摘要翻译： 一种用于X射线光刻掩模的X射线透过膜，其由通过使用靶的溅射法由碳化硅和碳组成的无机薄膜组成，所述靶由碳化硅和碳组成，摩尔比为99.9： 0.1至70:30，在633nm的光波长和1×10 8至1×10 10 dyn / cm 2的透光率下具有至少37％的透射率，并且该膜由以硅和碳组成的摩尔比构成的碳膜 范围为50.1：49.9至49.9：50.1。

    Curable organopolysiloxane composition
    16.
    发明授权
    Curable organopolysiloxane composition 失效
    固化有机聚硅氧烷组合物

    公开(公告)号：US4849491A

    公开(公告)日：1989-07-18

    申请号：US165165

    申请日：1988-03-07

    申请人： Masahiko Ogawa ,  Meguru Kashida ,  Kenichi Isobe

    发明人： Masahiko Ogawa ,  Meguru Kashida ,  Kenichi Isobe

    IPC分类号： C08L83/07 ,  C08G77/50 ,  C08L83/04 ,  C08L83/05 ,  C09D5/00 ,  C09D183/04 ,  C09D183/07

    CPC分类号： C08G77/50 ,  C08L83/04 ,  C08G77/12 ,  C08G77/20

    摘要： A curable organopolysiloxane composition comprising:(A) an organopolysiloxane having at least two aliphatic unsaturated hydrocarbon groups,(B) a particular organohydrogenpolysiloxane having a group represented by the formula: ##STR1## wherein R.sup.3 is a substituted or unsubstituted monovalent hydrocarbon group and a is an integer of 2 or 3, and(C) a platinum catalyst.This composition has good curing properties, and the silicone film obtained by curing has good release properties which is stable for a long period of time.

    摘要翻译： 一种可固化的有机基聚硅氧烷组合物，其包含：（A）具有至少两个脂族不饱和烃基的有机聚硅氧烷，（B）具有由下式表示的基团的特定有机氢聚硅氧烷：其中R3是取代或未取代的一价烃基， 2或3的整数，和（C）铂催化剂。 该组合物具有良好的固化性能，并且通过固化获得的硅酮膜具有良好的剥离性能，其长期稳定。

    Frame-supported dustproof pellicle for photolithographic photomask
    19.
    发明授权
    Frame-supported dustproof pellicle for photolithographic photomask 失效
    用于光刻光掩模的框架式防尘薄膜

    公开(公告)号：US5834143A

    公开(公告)日：1998-11-10

    申请号：US754777

    申请日：1996-11-21

    申请人： Takashi Matsuoka ,  Yoshihiro Kubota ,  Meguru Kashida

    发明人： Takashi Matsuoka ,  Yoshihiro Kubota ,  Meguru Kashida

    IPC分类号： G03F1/64 ,  H01L21/027 ,  G03F9/00

    CPC分类号： G03F1/64

    摘要： Proposed is a frame-supported pellicle used for dustproof protection of a photomask in the photolithographic patterning work for the manufacture of electronic fine devices such as LSIs, VLSIs and the like by mounting thereon. The inventive frame-supported pellicle is characterized in that the pellicle frame, to which a pellicle membrane is adhesively bonded on one of the end surfaces, is partly subjected to smoothing treatment. The inventive frame-supported pellicle can solve the heretofore unavoidable problems of dust particle deposition on the photomask even under dustproof protection with a pellicle as well as the high cost of the preparation of the pellicle and the difficulty of finding of any dust particles deposited on the surface of the frame.

    摘要翻译： 提出在用于制造诸如LSI，VLSI等的电子精密装置的光刻图案作业中用于光掩模的防尘保护的框架支撑防护薄膜组件。 本发明的框架式防护薄膜组件的特征在于，将防护薄膜组件膜粘附在一个端面上的防护薄膜组件框架部分进行平滑处理。 本发明的框架式防护薄膜组件即使在防尘薄膜组件的防尘保护下也可以解决光掩模上尘埃颗粒沉积的先天不可避免的问题，以及制备防护薄膜组件的高成本和难以发现沉积在防护薄膜上的任何灰尘颗粒 框架表面。

    Pellicle for protection of photolithographic mask
    20.
    发明授权
    Pellicle for protection of photolithographic mask 失效
    用于保护光刻掩模的防护薄膜

    公开(公告)号：US5691088A

    公开(公告)日：1997-11-25

    申请号：US949389

    申请日：1992-09-22

    申请人： Yoshihiro Kubota ,  Meguru Kashida ,  Yoshihiko Nagata ,  Hitoshi Noguchi ,  Yuichi Hamada ,  Kimitaka Kumagae

    发明人： Yoshihiro Kubota ,  Meguru Kashida ,  Yoshihiko Nagata ,  Hitoshi Noguchi ,  Yuichi Hamada ,  Kimitaka Kumagae

    IPC分类号： C08L83/04 ,  C08J7/04 ,  G03F1/62 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30 ,  G03F9/00

    CPC分类号： G03F1/62 ,  Y10T428/161 ,  Y10T428/28 ,  Y10T428/2852

    摘要： Disclosed is a frame-supported pellicle for dust-proofing of a photolithographic photomask used for patteriwse light exposure in the manufacturing process of, for example, semiconductor devices, which comprises (a) a frame member, (b) a transparent polymeric film supported by the frame member and (c) a coating layer of a sticky adhesive on one surface of the polymeric film to capture any dust particles in the space between the photomask and the pellicle. The inventive pellicle is imparted with a greatly improved serviceable life with stability against ultraviolet irradiation relative to the adhesive coating layer which is formed from a specific organo-polysiloxane-based adhesive composition.

    摘要翻译： 公开了一种用于防止在例如半导体器件的制造过程中用于眩光曝光的光刻光掩模的框架支撑的防护薄膜，其包括（a）框架构件，（b）由 框架构件和（c）在聚合物膜的一个表面上的粘性粘合剂的涂层以捕获光掩模和防护薄膜之间的空间中的任何灰尘颗粒。 赋予本发明的防护薄膜相对于由特定的有机聚硅氧烷类粘合剂组合物形成的粘合剂涂层，具有大大改善的使用寿命，具有抗紫外线照射的稳定性。