公开(公告)号：US07948695B2

公开(公告)日：2011-05-24

申请号：US12870877

申请日：2010-08-30

申请人： Ryo Nawata ,  Makoto Mizuno ,  Shigeyuki Uzawa

发明人： Ryo Nawata ,  Makoto Mizuno ,  Shigeyuki Uzawa

IPC分类号： G02B7/02

CPC分类号： G02B7/005 ,  G02B7/1827 ,  G03F7/70258 ,  G03F7/70825

摘要： An optical element is moved in six-degrees-of-freedom. Three first displacement sensors are disposed on a base plate and measure respective displacement amounts of three mutually different points on the optical element in a first direction. A second displacement sensor measures a displacement amount of one point on the optical element in a second direction. Two third displacement sensors measure respective displacement amounts of two mutually different points on the optical element in a third direction. A transformation processor transforms the six measured displacement amounts. A calibration processor calibrates the transformed displacement amounts with a calibration matrix of which coefficients are previously obtained to calibrate the displacement amounts in the six-degrees-of-freedom, which have errors due to measurement errors of the displacement sensors. A controller outputs command values based on differences between the calibrated displacement amounts and target displacement amounts.

摘要翻译： 光学元件以6自由度移动。 三个第一位移传感器设置在基板上，并且在第一方向上测量光学元件上的三个相互不同的点的相应位移量。 第二位移传感器在第二方向上测量光学元件上的一个点的位移量。 两个第三位移传感器在第三方向测量光学元件上的两个相互不同的点的相应位移量。 变换处理器转换六个测量的位移量。 校准处理器使用预先获得系数的校准矩阵校准变换的位移量，以校准六自由度中的位移量，其由于位移传感器的测量误差而具有误差。 控制器基于校准的位移量和目标位移量之间的差异输出命令值。

公开(公告)号：US07894036B2

公开(公告)日：2011-02-22

申请号：US11537071

申请日：2006-09-29

申请人： Makoto Mizuno ,  Hiroshi Ito

发明人： Makoto Mizuno ,  Hiroshi Ito

IPC分类号： G03B27/52

CPC分类号： G03B27/42 ,  G03F7/70341

摘要： An exposure apparatus includes a projection optical system for projecting a pattern of a reticle onto a substrate to be exposed, via a liquid that is filled in a space between the substrate and a final lens that is closest to the substrate, a movement restricting part for restricting a movement of the liquid by forming a interval between the movement restricting part and the substrate, the interval is smaller than a interval of the space, and a moving part for moving the movement restricting part so that the interval between the movement restricting part and the substrate increases.

摘要翻译： 曝光装置包括：投影光学系统，用于通过填充在基板和最靠近基板的最终透镜之间的空间中的液体将掩模版图案投影到待曝光的基板上;移动限制部件，用于 通过在所述移动限制部和所述基板之间形成间隔来限制所述液体的移动，所述间隔小于所述间隔的间隔，以及移动部，其使所述移动限制部移动，使得所述移动限制部与所述移动限制部之间的间隔， 衬底增加。

公开(公告)号：US07760452B2

公开(公告)日：2010-07-20

申请号：US10830749

申请日：2004-04-23

申请人： Makoto Mizuno

发明人： Makoto Mizuno

IPC分类号： G02B7/02

CPC分类号： G03F7/70825 ,  G02B7/027 ,  G02B7/1822

摘要： A driving apparatus comprising an optical element, a supporting block for supporting said optical element by contacting said optical element onto three supporting contact areas, a driving mechanism for practically connecting said supporting block to three driving contact areas and for moving said supporting block via the driving contact area, wherein a difference between an angle of each of the three supporting contact areas in a rotational direction around a rotation axis and an angle of each of the three driving contact areas corresponding with the three supporting contact areas is 10° or smaller, where the three supporting areas are substantially located on a first plane, and the rotational axis which is perpendicular to the first plane and passes through a barycenter of the three supporting contact areas.

摘要翻译： 一种驱动装置，包括光学元件，支撑块，用于通过将所述光学元件接触到三个支撑接触区域来支撑所述光学元件;驱动机构，用于将所述支撑块实际上连接到三个驱动接触区域，并且用于通过所述驱动来移动所述支撑块 接触区域，其中，围绕旋转轴线的旋转方向上的三个支撑接触区域中的每一个的角度与对应于三个支撑接触区域的三个驱动接触区域中的每一个的角度之间的差为10°或更小，其中 三个支撑区域基本上位于第一平面上，旋转轴线垂直于第一平面并通过三个支撑接触区域的重心。

公开(公告)号：US20100136778A1

公开(公告)日：2010-06-03

申请号：US12700344

申请日：2010-02-04

申请人： Hiraku Chakihara ,  Kousuke Okuyama ,  Masahiro Moniwa ,  Makoto Mizuno ,  Keiji Okamoto ,  Mitsuhiro Noguchi ,  Tadanori Yoshida ,  Yasuhiko Takahshi ,  Akio Nishida

发明人： Hiraku Chakihara ,  Kousuke Okuyama ,  Masahiro Moniwa ,  Makoto Mizuno ,  Keiji Okamoto ,  Mitsuhiro Noguchi ,  Tadanori Yoshida ,  Yasuhiko Takahshi ,  Akio Nishida

IPC分类号： H01L21/28

CPC分类号： H01L29/6675 ,  H01L21/823885 ,  H01L27/105 ,  H01L27/11 ,  H01L27/1104 ,  H01L27/1116 ,  H01L29/7833 ,  H01L29/78642

摘要： Vertical MISFETs are formed over drive MISFETs and transfer MISFETs. The vertical MISFETs comprise rectangular pillar laminated bodies each formed by laminating a lower semiconductor layer (drain), an intermediate semiconductor layer, and an upper semiconductor layer (source), and gate electrodes formed on corresponding side walls of the laminated bodies with gate insulating films interposed therebetween. In each vertical MISFET, the lower semiconductor layer constitutes a drain, the intermediate semiconductor layer constitutes a substrate (channel region), and the upper semiconductor layer constitutes a source. The lower semiconductor layer, the intermediate semiconductor layer and the upper semiconductor layer are each comprised of a silicon film. The lower semiconductor layer and the upper semiconductor layer are doped with a p type and constituted of a p type silicon film.

摘要翻译： 垂直MISFET形成在驱动MISFET和传输MISFET上。 垂直MISFET包括通过层叠下半导体层（漏极），中间半导体层和上半导体层（源极）形成的矩形柱层叠体以及在层叠体的相应侧壁上形成有栅极绝缘膜的栅电极 插入其间。 在每个垂直MISFET中，下半导体层构成漏极，中间半导体层构成衬底（沟道区），上半导体层构成源极。 下半导体层，中间半导体层和上半导体层均由硅膜构成。 下半导体层和上半导体层掺杂有p型并由p型硅膜构成。

公开(公告)号：US07719052B2

公开(公告)日：2010-05-18

申请号：US12020393

申请日：2008-01-25

申请人： Fumitoshi Ito ,  Yoshiyuki Kawashima ,  Takeshi Sakai ,  Yasushi Ishii ,  Yasuhiro Kanamaru ,  Takashi Hashimoto ,  Makoto Mizuno ,  Kousuke Okuyama ,  Yukiko Manabe

发明人： Fumitoshi Ito ,  Yoshiyuki Kawashima ,  Takeshi Sakai ,  Yasushi Ishii ,  Yasuhiro Kanamaru ,  Takashi Hashimoto ,  Makoto Mizuno ,  Kousuke Okuyama ,  Yukiko Manabe

IPC分类号： H01L29/792

CPC分类号： H01L27/11568 ,  G11C16/0466 ,  H01L21/28282 ,  H01L27/115 ,  H01L29/42344 ,  H01L29/66833 ,  H01L29/792

摘要： The degree of integration and the number of rewriting of a semiconductor device having a nonvolatile memory element are improved. A first MONOS nonvolatile-memory-element and a second MONOS nonvolatile-memory-element having a large gate width compared with the first MONOS nonvolatile-memory-element are mounted together on the same substrate, and the first MONOS nonvolatile-memory-element is used for storing program data which is scarcely rewritten, and the second MONOS nonvolatile-memory-element is used for storing processed data which is frequently rewritten.

摘要翻译： 改善了具有非易失性存储元件的半导体器件的积分度和重写次数。 与第一MONOS非易失性存储元件相比，具有大门宽度的第一MONOS非易失性存储元件和第二MONOS非易失性存储元件一起安装在同一衬底上，并且第一MONOS非易失性存储元件是 用于存储几乎不被重写的程序数据，并且第二MONOS非易失性存储元件用于存储频繁重写的处理数据。

公开(公告)号：US07221463B2

公开(公告)日：2007-05-22

申请号：US10798812

申请日：2004-03-10

申请人： Makoto Mizuno ,  Ryo Nawata ,  Mitsuru Inoue

发明人： Makoto Mizuno ,  Ryo Nawata ,  Mitsuru Inoue

IPC分类号： G01B11/14 ,  G03B27/42

CPC分类号： G02B7/005 ,  G02B7/023 ,  G02B7/1828 ,  G03F7/70825 ,  G03F7/70833

摘要： The present invention provides a positioning apparatus capable of performing six-axis micro adjustment of an optical element in an exposure apparatus with high accuracy, and the exposure apparatus. The positioning apparatus of the present invention includes a first measurement unit for measuring a position/inclination of a moving part having an optical element while being kept from contact with the moving part, and a driving unit capable of driving the moving part in directions of six axes with respect to a fixed part while being kept from contact with the moving part, based on the result of measurement by the first measurement unit.

摘要翻译： 本发明提供一种能够以高精度对曝光装置中的光学元件进行六轴微调的定位装置和曝光装置。 本发明的定位装置包括：第一测量单元，用于测量具有光学元件的运动部件的位置/倾斜度，同时不与运动部件接触;以及驱动单元，其能够沿六方向驱动运动部件 基于第一测量单元的测量结果，相对于固定部分的轴线与运动部件保持接触。

公开(公告)号：US07187106B2

公开(公告)日：2007-03-06

申请号：US10898444

申请日：2004-07-23

申请人： Naoto Fuse ,  Hiroshi Ito ,  Makoto Mizuno

发明人： Naoto Fuse ,  Hiroshi Ito ,  Makoto Mizuno

IPC分类号： H01L41/04 ,  H01L41/08

CPC分类号： G03F7/70825 ,  G02B7/003 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70916 ,  H01L41/053 ,  H01L41/0536

摘要： The present invention provides a positioning mechanism and an exposure apparatus that can be used in a vacuum ambience and has a damping function with small degassing and small dust creation. A positioning mechanism according to the present invention, when used with first and second members, serve to position the second member with respect to the first member, wherein the positioning mechanism include a positioning portion capable of relatively positioning the second member relative to the first member, and an attenuating material provided at least at a portion of a periphery of the positioning portion.

摘要翻译： 本发明提供一种能够在真空环境中使用的定位机构和曝光装置，并且具有减少小的脱气和小的粉尘产生的阻尼功能。 根据本发明的定位机构，当与第一和第二构件一起使用时，用于相对于第一构件定位第二构件，其中定位机构包括能够相对于第二构件相对于第一构件相对定位的定位部 以及设置在所述定位部的周边的至少一部分的衰减材料。

公开(公告)号：US20050035684A1

公开(公告)日：2005-02-17

申请号：US10898444

申请日：2004-07-23

申请人： Naoto Fuse ,  Hiroshi Ito ,  Makoto Mizuno

发明人： Naoto Fuse ,  Hiroshi Ito ,  Makoto Mizuno

IPC分类号： F16F15/02 ,  G02B7/00 ,  G03F7/20 ,  H01L21/027 ,  H01L41/053 ,  D05B23/00

CPC分类号： G03F7/70825 ,  G02B7/003 ,  G03F7/70891 ,  G03F7/709 ,  G03F7/70916 ,  H01L41/053 ,  H01L41/0536

摘要： The present invention provides a positioning mechanism and an exposure apparatus that can be used in a vacuum ambience and has a damping function with small degassing and small dust creation. A positioning mechanism according to the present invention, when used with first and second members, serve to position the second member with respect to the first member, wherein the positioning mechanism include a positioning portion capable of relatively positioning the second member relative to the first member, and an attenuating material provided at least at a portion of a periphery of the positioning portion.

摘要翻译： 本发明提供一种能够在真空环境中使用的定位机构和曝光装置，并且具有减少小的脱气和小的粉尘产生的阻尼功能。 根据本发明的定位机构，当与第一和第二构件一起使用时，用于相对于第一构件定位第二构件，其中定位机构包括能够相对于第二构件相对于第一构件相对定位的定位部 以及设置在所述定位部的周边的至少一部分的衰减材料。

公开(公告)号：US5822133A

公开(公告)日：1998-10-13

申请号：US695203

申请日：1996-08-01

申请人： Makoto Mizuno ,  Ryuichi Ebinuma ,  Toshinori Minowa

发明人： Makoto Mizuno ,  Ryuichi Ebinuma ,  Toshinori Minowa

IPC分类号： G02B7/04 ,  G02B3/14 ,  G02B7/02 ,  G02B26/08 ,  G02B27/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/68 ,  G02B15/14

CPC分类号： G03F7/70241 ,  G02B26/0875 ,  G02B27/0025 ,  G02B3/14 ,  G02B7/023 ,  G02B7/026 ,  G03F7/70825 ,  G03F7/70883

摘要： An optical component moving device having a driving portion and guiding portion, for moving an optical component, wherein the driving portion includes fluid enclosure system being expandable and contractible and the guiding portion includes a leaf spring.

摘要翻译： 一种具有用于移动光学部件的驱动部分和引导部分的光学部件移动装置，其中驱动部分包括可扩张和收缩的流体封闭系统，并且引导部分包括板簧。

公开(公告)号：US09880463B2

公开(公告)日：2018-01-30

申请号：US13490547

申请日：2012-06-07

申请人： Kohei Wakabayashi ,  Hideki Matsumoto ,  Fumio Sakai ,  Makoto Mizuno

发明人： Kohei Wakabayashi ,  Hideki Matsumoto ,  Fumio Sakai ,  Makoto Mizuno

IPC分类号： B28B1/14 ,  B28B13/02 ,  G03F7/00 ,  B82Y10/00 ,  B82Y40/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： A method of performing an imprint process on each of a plurality of shot regions of a substrate, wherein each shot region includes at least one of at least one valid chip area and at least one invalid chip area, the invalid chip area including an inhibited area in which resin coating is inhibited, the imprint process for a shot region including both the invalid chip area and the valid chip area includes coating the valid chip area of the shot region with the resin, bringing a pattern surface of a mold into contact with the resin, and curing the resin, and in the step of coating, at least the inhibited area of the invalid chip area is not coated with the resin.