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公开(公告)号：US08035798B2
公开(公告)日：2011-10-11
申请号：US11482119
申请日：2006-07-07
CPC分类号： G03F7/70775 , G03F7/70058 , G03F7/70191 , G03F7/70341 , G03F7/7055 , G03F7/707 , G03F7/7085 , G03F9/7088
摘要： A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
摘要翻译： 提供了一种光刻设备，其具有在基底水平的传感器，所述传感器包括辐射接收器，支撑辐射接收器的透射板和辐射探测器，其中所述传感器布置成避免辐射接收器与最终的辐射之间的辐射损失 辐射探测器的元件。
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公开(公告)号：US20070132979A1
公开(公告)日：2007-06-14
申请号：US11482122
申请日：2006-07-07
申请人： Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
发明人： Joeri Lof , Erik Maria Bijlaart , Roelof Aeilko Ritsema , Frank Schaik , Timotheus Sengers , Klaus Simon , Joannes De Smit , Arie Den Boef , Hans Butler , Sjoerd Lambertus Donders , Christiaan Hoogendam , Marcus Van De Kerkhof , Aleksey Kolesnychenko , Mark Kroon , Erik Loopstra , Hendricus Maria Meijer , Jeroen Sophia Maria Mertens , Johannes Hubertus Mulkens , Joost Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Santen
IPC分类号： G03B27/72
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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13.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 失效平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07075620B2
公开(公告)日：2006-07-11
申请号：US10820103
申请日：2004-04-08
申请人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
发明人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
IPC分类号： G01B11/00
CPC分类号： G03F7/70558 , G01J1/58 , G03F7/70741 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A lithographic projection apparatus includes a radiation system for providing a projection beam of radiation having a wavelength λ1 smaller than 50 nm; a support structure for supporting patterning structure, the patterning structure serving to pattern the projection beam according to a desired pattern; a substrate table for holding a substrate; and a projection system for projecting the patterned beam onto a target portion of the substrate. The apparatus further includes a radiation sensor which is located so as to be able to receive radiation out of the projection beam, said sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting said secondary radiation emerging from said layer.
摘要翻译： 光刻投影设备包括用于提供具有小于50nm的波长λ1的辐射的投影光束的辐射系统; 用于支撑图案形成结构的支撑结构，用于根据期望图案对投影光束进行图案化的图案形成结构; 用于保持衬底的衬底台; 以及用于将图案化的光束投影到基板的目标部分上的投影系统。 该装置还包括辐射传感器，其被定位成能够将辐射从投影光束中接收，所述传感器包括辐射敏感材料，其将波长λ1的入射辐射转换成二次辐射 ; 以及能够检测从所述层出射的所述次级辐射的感测装置。
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14.发明授权Lithographic apparatus and device manufacturing method involving a sensor detecting a radiation beam through liquid 有权涉及通过液体检测辐射束的传感器的平版印刷设备和设备制造方法公开(公告)号：US09541843B2
公开(公告)日：2017-01-10
申请号：US13306532
申请日：2011-11-29
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Joost Jeroen Ottens , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Joost Jeroen Ottens , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus and device manufacturing method is disclosed in which a space between a projection system and an object on a substrate table, is at least partly filled with a liquid. A sensor is positioned to be illuminated by a beam of radiation once it has passed through the liquid. An edge seal member may be provided to at least partly surround an edge of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.
摘要翻译： 公开了一种光刻投影装置和装置制造方法，其中投影系统和基板上的物体之间的空间至少部分地被填充液体。 一旦传感器通过液体，传感器被定位成被辐射束照射。 可以设置边缘密封构件以至少部分地围绕传感器的边缘并且提供面向基本上与传感器的主表面平行的投影系统的主表面。
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15.发明授权Lithographic apparatus and device manufacturing method involving removal of liquid entering a gap 有权平版印刷设备和器件制造方法，涉及去除进入间隙的液体公开(公告)号：US09081299B2
公开(公告)日：2015-07-14
申请号：US13195248
申请日：2011-08-01
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： An exposure apparatus including a liquid supply system configured to provide a liquid to a space between the projection system and an object, and a movable table having a recess, the recess including therein the object or a surface to hold and support the object, wherein a gap opening into which the liquid can enter is defined between a peripheral wall of the recess and the object, and the recess further including a fluid opening, below the gap opening, to remove the liquid entering the gap opening.
摘要翻译： 一种曝光装置，包括：液体供应系统，被配置为向所述投影系统和物体之间的空间提供液体，以及具有凹部的可移动台，所述凹部包括所述物体或表面以保持和支撑所述物体，其中， 液体可以进入的间隙开口限定在凹部的周壁和物体之间，并且凹部还包括在间隙开口下方的流体开口，以去除进入间隙开口的液体。
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公开(公告)号：US08154708B2
公开(公告)日：2012-04-10
申请号：US11482122
申请日：2006-07-07
申请人： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Erik Theodorus Maria Bijlaart , Christiaan Alexander Hoogendam , Helmar Van Santen , Marcus Adrianus Van De Kerhof , Mark Kroon , Arie Jeffrey Den Boef , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens
发明人： Joeri Lof , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Aleksey Yurievich Kolesnychenko , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Erik Theodorus Maria Bijlaart , Christiaan Alexander Hoogendam , Helmar Van Santen , Marcus Adrianus Van De Kerhof , Mark Kroon , Arie Jeffrey Den Boef , Joost Jeroen Ottens , Jeroen Johannes Sophia Maria Mertens
IPC分类号： G03B27/58
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。
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公开(公告)号：US20110007285A1
公开(公告)日：2011-01-13
申请号：US12698932
申请日：2010-02-02
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeiko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeiko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/58
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。
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公开(公告)号：US20110279800A1
公开(公告)日：2011-11-17
申请号：US13194136
申请日：2011-07-29
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van De Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
IPC分类号： G03B27/42
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
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19.发明授权Lithographic apparatus, device manufacturing method, and device manufactured thereby 有权平版印刷设备，器件制造方法和由此制造的器件公开(公告)号：US07459690B2
公开(公告)日：2008-12-02
申请号：US11432365
申请日：2006-05-12
申请人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
发明人： Jan Evert Van Der Werf , Mark Kroon , Wilhelmus Cornelis Keur , Vadim Yevgenyevich Banine , Hans Van Der Laan , Johannes Hubertus Josephina Moors , Erik Roelof Loopstra
IPC分类号： G01J1/42
CPC分类号： G03F7/70558 , G01J1/58 , G03F7/70741 , G03F7/7085 , G03F7/70916 , G03F7/70983
摘要： A radiation sensor for use with a lithographic apparatus is disclosed, the radiation sensor comprising a radiation-sensitive material which converts incident radiation of wavelength λ1 into secondary radiation; and sensing means capable of detecting the secondary radiation emerging from said layer.
摘要翻译： 公开了一种用于光刻设备的辐射传感器，辐射传感器包括将波长λ1的入射辐射转换成次级辐射的辐射敏感材料; 以及能够检测从所述层出现的二次辐射的感测装置。
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公开(公告)号：US07213963B2
公开(公告)日：2007-05-08
申请号：US10857614
申请日：2004-06-01
申请人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van de Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
发明人： Joeri Lof , Erik Theodorus Maria Bijlaart , Roelof Aeilko Siebrand Ritsema , Frank Van Schaik , Timotheus Franciscus Sengers , Klaus Simon , Joannes Theodoor De Smit , Arie Jeffrey Maria Den Boef , Hans Butler , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Marcus Adrianus Van de Kerkhof , Aleksey Yurievich Kolesnychenko , Mark Kroon , Erik Roelof Loopstra , Hendricus Johannes Maria Meijer , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Joost Jeroen Ottens , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
CPC分类号： G03F7/70141 , G03F7/70341 , G03F7/7085 , G03F7/70883
摘要： A lithographic projection apparatus is disclosed in which a space between the projection system and a sensor is filled with a liquid.
摘要翻译： 公开了一种光刻投影装置，其中投影系统和传感器之间的空间填充有液体。
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