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    Projection exposure method and projection exposure apparatus for microlithography
    12.
    发明授权
    Projection exposure method and projection exposure apparatus for microlithography 有权
    投影曝光法和微光刻投影曝光装置

    公开(公告)号：US07800732B2

    公开(公告)日：2010-09-21

    申请号：US12643637

    申请日：2009-12-21

    申请人： Joerg Zimmermann ,  Heiko Feldmann ,  Tilmann Heil ,  Paul Graeupner ,  Ulrich Gebhardt

    发明人： Joerg Zimmermann ,  Heiko Feldmann ,  Tilmann Heil ,  Paul Graeupner ,  Ulrich Gebhardt

    IPC分类号： G03B27/42 ,  G03B27/52 ,  G03B27/58

    CPC分类号： G03F7/70333 ,  G03F9/7026

    摘要： A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval. An active compensation of at least one portion of at least one imaging aberration induced by the change in the focus positions during the exposure time interval has the effect that the imaging quality is not significantly impaired by the alteration of the focusing during the exposure time interval.

    摘要翻译： 投影曝光方法，用于在布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像的布置在投影物镜的图像区域的区域中的辐射敏感基板的曝光包括曝光 在曝光时间间隔期间在投影物镜的有效图像场中具有图案的图像的基板，并且还可以在曝光时间间隔期间在曝光时间间隔期间改变基板的表面与投影物镜的焦点表面之间的相对定位 在曝光时间间隔期间，有效图像场中的图像点在掩模的图像的不同焦点位置被曝光的方式。 在曝光时间间隔期间由聚焦位置的变化引起的至少一个成像像差的至少一部分的有效补偿具有这样的效果，即在曝光时间间隔期间聚焦改变不会显着地损害成像质量。

    PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY
    13.
    发明申请
    PROJECTION EXPOSURE METHOD AND PROJECTION EXPOSURE APPARATUS FOR MICROLITHOGRAPHY 有权
    投影曝光方法和投影曝光装置

    公开(公告)号：US20100157266A1

    公开(公告)日：2010-06-24

    申请号：US12643637

    申请日：2009-12-21

    申请人： Joerg Zimmermann ,  Heiko Feldmann ,  Tilmann Heil ,  Paul Graeupner ,  Ulrich Gebhardt

    发明人： Joerg Zimmermann ,  Heiko Feldmann ,  Tilmann Heil ,  Paul Graeupner ,  Ulrich Gebhardt

    IPC分类号： G03B27/42

    CPC分类号： G03F7/70333 ,  G03F9/7026

    摘要： A projection exposure method for the exposure of a radiation-sensitive substrate arranged in the region of an image surface of a projection objective with at least one image of a pattern of a mask arranged in the region of an object surface of the projection objective includes exposing the substrate with the image of the pattern in an effective image field of the projection objective during an exposure time interval and also altering a relative positioning between a surface of the substrate and a focus surface of the projection objective during the exposure time interval in such a way that image points in the effective image field are exposed with different focus positions of the image of the mask during the exposure time interval. An active compensation of at least one portion of at least one imaging aberration induced by the change in the focus positions during the exposure time interval has the effect that the imaging quality is not significantly impaired by the alteration of the focusing during the exposure time interval.

    摘要翻译： 投影曝光方法，用于在布置在投影物镜的物体表面的区域中的掩模图案的至少一个图像的布置在投影物镜的图像区域的区域中的辐射敏感基板的曝光包括曝光 在曝光时间间隔期间在投影物镜的有效图像场中具有图案的图像的基板，并且还可以在曝光时间间隔期间在曝光时间间隔期间改变基板的表面与投影物镜的焦点表面之间的相对定位 在曝光时间间隔期间，有效图像场中的图像点在掩模的图像的不同焦点位置被曝光的方式。 在曝光时间间隔期间由聚焦位置的变化引起的至少一个成像像差的至少一部分的有效补偿具有这样的效果，即在曝光时间间隔期间聚焦改变不会显着地损害成像质量。

    PROJECTION EXPOSURE METHODS AND SYSTEMS
    14.
    发明申请
    PROJECTION EXPOSURE METHODS AND SYSTEMS 有权
    投影曝光方法和系统

    公开(公告)号：US20090280437A1

    公开(公告)日：2009-11-12

    申请号：US12483733

    申请日：2009-06-12

    申请人： Paul Graeupner

    发明人： Paul Graeupner

    IPC分类号： G03F7/20 ,  G03F7/207

    CPC分类号： G03F7/70091 ,  G03F7/70066 ,  G03F7/70083 ,  G03F7/701 ,  G03F7/70108 ,  G03F7/70116 ,  G03F7/70125 ,  G03F7/70891

    摘要： Projection exposure methods, systems, sub-systems and components are disclosed. Methods can include performing a first exposure to image a first sub-pattern of the pattern, where the first sub-pattern includes a plurality of first features extending in a first direction and spaced apart essentially periodically at a predominant periodicity length P in a second direction perpendicular to the first direction. The first exposure can be performed using a multipolar illumination mode that includes at least one substantially dipolar intensity distribution having two illumination poles positioned on a pole orientation axis substantially parallel to the second direction and spaced apart from each other. The poles of the dipolar intensity distribution can each have an azimuthal width defined by a pole angle θ, and a pole area APOLE according to: 0.6

    摘要翻译： 公开了投影曝光方法，系统，子系统和组件。 方法可以包括对图案的第一子图案进行第一曝光以对图像进行成像，其中第一子图案包括沿第一方向延伸的多个第一特征，并且在第二方向上以主要周期性长度P基本上周期性地间隔开 垂直于第一方向。 可以使用多极照明模式来执行第一曝光，所述多极照明模式包括至少一个基本上是偶极子强度分布，其具有两个位于基本上平行于第二方向并且彼此间隔开的极取向轴上的照明极。 偶极子强度分布的极点可以各自具有由极角度θ定义的方位角宽度和根据以下的极点面积APOLE：0.6

    Projection objective, especially for microlithography, and method for adjusting a projection objective
    15.
    发明授权
    Projection objective, especially for microlithography, and method for adjusting a projection objective 有权

    公开(公告)号：US07310187B2

    公开(公告)日：2007-12-18

    申请号：US11783966

    申请日：2007-04-13

    申请人： Alexander Epple ,  Paul Graeupner ,  Winfried Kaiser ,  Reiner Garreis ,  Wilhelm Ulrich

    发明人： Alexander Epple ,  Paul Graeupner ,  Winfried Kaiser ,  Reiner Garreis ,  Wilhelm Ulrich

    IPC分类号： G02B3/00 ,  G02B15/02

    CPC分类号： G03F7/70308 ,  G03F7/70258 ,  G03F7/70341

    摘要： A method of adjusting a projection objective permits the projection objective to be adjusted between an immersion configuration and a dry configuration with few interventions in the system, and therefore to be used optionally as an immersion objective or as a dry objective. The projection objective has a multiplicity of optical elements which are arranged along an optical axis of the projection objective, the optical elements comprising a first group of optical elements following the object plane and a last optical element following the first group, arranged next to the image plane and defining an exit surface of the projection objective which is arranged at a working distance from the image plane. The last optical element is substantially without refracting power and has no curvature or only slight curvature. The method comprises varying the thickness of the last optical element, changing the refractive index of the space between the exit surface and the image plane by introducing or removing an immersion medium, and preferably axial displacement of the last optical element in order to set a suitable working distance.

    Method of optimizing imaging performance
    16.
    发明授权
    Method of optimizing imaging performance 有权
    优化成像性能的方法

    公开(公告)号：US07233386B2

    公开(公告)日：2007-06-19

    申请号：US11102835

    申请日：2005-04-11

    申请人： Gerd Reisinger ,  Manfred Maul ,  Paul Graeupner ,  Martin Schriever ,  Ulrich Wegmann

    发明人： Gerd Reisinger ,  Manfred Maul ,  Paul Graeupner ,  Martin Schriever ,  Ulrich Wegmann

    IPC分类号： G03B27/52 ,  G03B27/42

    CPC分类号： G03F7/70191 ,  G03B27/52 ,  G03F7/70216

    摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.

    摘要翻译： 提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。 该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及 将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。

    Method of optimizing imaging performance
    20.
    发明授权
    Method of optimizing imaging performance 有权
    优化成像性能的方法

    公开(公告)号：US07570345B2

    公开(公告)日：2009-08-04

    申请号：US11808316

    申请日：2007-06-08

    申请人： Gerd Reisinger ,  Manfred Maul ,  Paul Graeupner ,  Martin Schriever ,  Ulrich Wegmann

    发明人： Gerd Reisinger ,  Manfred Maul ,  Paul Graeupner ,  Martin Schriever ,  Ulrich Wegmann

    IPC分类号： G03B27/54 ,  G03B27/42

    CPC分类号： G03F7/70191 ,  G03B27/52 ,  G03F7/70216

    摘要： A method of optimizing an imaging performance of a projection exposure system is provided, wherein the projection exposure system includes an illumination optical system for illuminating a patterning structure and a projection optical system for imaging a region of the illuminated patterning structure onto a corresponding field. The method involves setting the field to a first exposure field, setting optical parameters of the projection exposure system to a first setting such that the imaging performance within the first exposure field is a first optimum performance, changing the field to a second exposure field, and changing the optical parameters to a second setting such that the imaging performance within the second exposure field is a second optimum performance.

    摘要翻译： 提供一种优化投影曝光系统的成像性能的方法，其中投影曝光系统包括用于照亮图案形成结构的照明光学系统和用于将照射的图案形成结构的区域成像到相应场上的投影光学系统。 该方法包括将场设置为第一曝光场，将投影曝光系统的光学参数设置为第一设置，使得第一曝光区域内的成像性能是第一最佳性能，将场改为第二曝光场，以及 将光学参数改变为第二设置，使得第二曝光区域内的成像性能是第二最佳性能。