Periodic gain-type semiconductor laser device
    11.
    发明授权
    Periodic gain-type semiconductor laser device 失效
    周期性增益型半导体激光器件

    公开(公告)号:US5182758A

    公开(公告)日:1993-01-26

    申请号:US802118

    申请日:1991-12-04

    摘要: A periodic gain-type semiconductor laser device in which a mesa stripe has wide portions and narrow portions alternately arranged with a period that is an integral multiple of the half-wavelength of the emitted light. A multilayer structure including an n-AlGaAs first cladding layer 103 and an AlGaAs non-doped active layer 104 formed on the mesa stripe also have wide portions and narrow portions. An n-AlGaAs current confining layer 106 covers the sides of the AlGaAs non-doped active layer 104. The height of the top surface of the n-AlGaAs current confining layer 106 matches the height of the AlGaAs non-doped active layer 104. A p-AlGaAs second cladding layer 105 is formed on the AlGaAs non-doped active layer 104 and the current confining layer 106. A driving current is not injected into the narrow portions of the AlGaAs non-doped active layer 104.

    摘要翻译: 一种周期性增益型半导体激光装置,其中台面条具有宽的部分,并且窄周期以发射的光的半波长的整数倍的周期交替布置。 包括形成在台面条上的n-AlGaAs第一包层103和AlGaAs非掺杂有源层104的多层结构也具有宽部分和窄部分。 n-AlGaAs电流限制层106覆盖AlGaAs非掺杂有源层104的侧面.n-AlGaAs电流限制层106的顶表面的高度与AlGaAs非掺杂有源层104的高度匹配。 在AlGaAs非掺杂有源层104和电流限制层106上形成p-AlGaAs第二包层105.驱动电流不被注入到AlGaAs非掺杂有源层104的窄部分中。

    Semiconductor VSIS laser
    14.
    发明授权
    Semiconductor VSIS laser 失效
    半导体VSIS激光器

    公开(公告)号:US4901328A

    公开(公告)日:1990-02-13

    申请号:US380745

    申请日:1989-07-17

    摘要: A V-channeled substrate inner strip (VSIS) semiconductor laser includes a p-Ga.sub.1-31 y Al.sub.y As active layer sandwiched between a P-Ga.sub.1-x Al.sub.x As first cladding layer and an n-Ga.sub.1-x Al.sub.x As second cladding layer. The AlAs mole fraction x of the first and second cladding layers is selected between about 0.45 and 0.52 in order to minimize the mode competition noise at an operating temperature. In a preferred form, the cavity length is longer than 300 .mu.m so as to minimize the occurrence of the mode competition noise at the operating temperature. Furthermore, the reflectivity R.sub.1 of the front facet and the reflectivity R.sub.2 of the rear facet are selected to satisfy the condition 0.1.ltoreq.ln(1/R.sub.1 .multidot.R.sub.2).ltoreq.1.

    摘要翻译: V沟道衬底内条(VSIS)半导体激光器包括夹在P-Ga1-xAlxAs第一包层和n-Ga1-xAlxAs第二覆层之间的p-Ga1-31 yAlyAs有源层。 第一和第二包覆层的AlAs摩尔分数x在约0.45和0.52之间选择,以便使工作温度下的模式竞争噪声最小化。 在优选的形式中,空腔长度大于300μm,以便在工作温度下最小化模式竞争噪声的发生。 此外,选择前面的反射率R1和后面的反射率R2以满足条件0.1

    Semiconductor laser device with a diffraction grating
    18.
    发明授权
    Semiconductor laser device with a diffraction grating 失效
    具有衍射光栅的半导体激光器件

    公开(公告)号:US4745616A

    公开(公告)日:1988-05-17

    申请号:US830864

    申请日:1986-02-19

    IPC分类号: H01S5/00 H01S5/12 H01S3/19

    CPC分类号: H01S5/12

    摘要: A semiconductor laser device comprising a GaAlAs first cladding layer, a Ga.sub.1-x Al.sub.x As (0.ltoreq.x.ltoreq.0.4) active layer for laser oscillation, an In.sub.1-y Ga.sub.y P.sub.1-z As.sub.z (z=2.04y-1.04, and 0.ltoreq.z.ltoreq.1) optical guiding layer with a diffraction grating thereon, a GaAlAs buffer layer disposed between said active layer and said optical guiding layer, and a GaAlAs second cladding layer, the width of the forbidden band of said buffer layer being greater than that of the active layer and smaller than that of the optical guiding layer.

    摘要翻译: 包括GaAlAs第一包层,用于激光振荡的Ga1-xAlxAs(0≤x≤0.4)有源层,In1-yGayP1-zAsz(z = 2.04y-1.04和0)的半导体激光器件, = z 1)具有衍射光栅的光导层,设置在所述有源层和所述光导层之间的GaAlAs缓冲层和GaAlAs第二包层,所述缓冲层的禁带的宽度更大 比活性层的厚度小,而且比光导层的面积小。

    Visible double heterostructure-semiconductor laser
    20.
    发明授权
    Visible double heterostructure-semiconductor laser 失效
    可见双异质结半导体激光器

    公开(公告)号:US4712219A

    公开(公告)日:1987-12-08

    申请号:US716222

    申请日:1985-03-26

    摘要: A visible double heterostructure-semiconductor laser comprising an InGaAs, InAlP, InAlAs, InAlSb or InGaSb layer, a first cladding layer on the InGaAs, InAlP, InAlAs, InAlSb or InGaSb layer; an active layer on the first cladding layer and a second cladding layer on the active layer, wherein a mixed crystal of, respectively InGaAs, InAlP, InAlAs, InAlSb or InGaSb is used, as a substrate crystal for growing of said InGaAs, InAlP, InAlAs, InAlSb or InGaSb layer thereon, and the composition ratio of the substrate crystal and of each of the layers is selected so as to result in the approximate coincidence between the lattice constant of the substrate crystal and the lattice constant of each of these layers, an energy difference of 0.2 eV or more between the direct transition and the indirect transition within said active layer, and an energy difference of 0.2 eV or more between the active layer and either of the first or the second cladding layers.

    摘要翻译: 包括InGaAs,InAlP,InAlAs,InAlSb或InGaSb层的可见双异质结构半导体激光器,InGaAs,InAlP,InAlAs,InAlSb或InGaSb层中的第一包层; 在第一包层上的有源层和有源层上的第二包层,其中使用分别为InGaAs,InAlP,InAlAs,InAlSb或InGaSb的混晶,作为用于生长所述InGaAs,InAlP,InAlAs的衬底晶体 ,InAlSb或InGaSb层,并且选择基板晶体和各层的组成比,从而导致基板晶体的晶格常数和这些层的晶格常数之间的近似一致, 所述有源层内的直接跃迁和间接跃迁之间的能量差为0.2eV以上,并且在有源层与第一或第二覆层中的任一层之间的能量差为0.2eV以上。