公开(公告)号：US20050004391A1

公开(公告)日：2005-01-06

申请号：US10862423

申请日：2004-06-08

申请人： Naoyoshi Hatakeyama ,  Shinji Tanaka ,  Hidetoshi Ono ,  Kouichi Kodoi

发明人： Naoyoshi Hatakeyama ,  Shinji Tanaka ,  Hidetoshi Ono ,  Kouichi Kodoi

IPC分类号： C07C43/162 ,  C07C43/16 ,  C07C43/30 ,  C07C43/313 ,  C07C49/753 ,  C07C69/52

CPC分类号： C07C43/30 ,  C07C43/313 ,  C07C49/753 ,  C07C2603/74

摘要： Provided by the present invention are an adamantyl vinyl ether compound which is useful as a monomer for functional resins in the photolithography field or a raw material therefor and medical and agricultural intermediates and a production process for the same. The present invention relates to a production process for an adamantyl vinyl ether compound, characterized by subjecting an adamantyl vinyl ether compound having a specific structure and alcohol having an eliminating group in a β position to chloroalkyl-etherification, then subjecting it to etherification to form an adamantyl group-containing ether and then subjecting it to vinyl-etherification.

摘要翻译： 由本发明提供的金刚烷基乙烯基醚化合物可用作光刻领域中的功能性树脂的单体或其原料，医药和农业中间体及其生产方法。 金刚烷基乙烯基醚化合物的制造方法技术领域本发明涉及一种金刚烷基乙烯基醚化合物的制造方法，其特征在于，将具有特定结构的金刚烷基乙烯基醚化合物和具有消除基团的醇在β位置进行氯代烷基醚化，然后使其进行醚化，形成 含有金刚烷基的醚，然后使其进行乙烯基醚化。

公开(公告)号：US20100022730A1

公开(公告)日：2010-01-28

申请号：US12376122

申请日：2007-07-09

申请人： Naoyoshi Hatakeyama ,  Hidetoshi Ono ,  Katsuki Ito

发明人： Naoyoshi Hatakeyama ,  Hidetoshi Ono ,  Katsuki Ito

IPC分类号： C08F18/20 ,  C07C69/54 ,  C07C69/593

CPC分类号： C07C67/10 ,  C07C67/29 ,  C07C2601/14 ,  C07C2603/74 ,  C08F220/24 ,  G03F7/0046 ,  G03F7/027 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  C07C69/653

摘要： A polymerizable compound having a fluorinated substituent (Z) represented by the general formula (1), an adamantane structure and a polymerizable group (A) having the structure represented by the general formula (1), a production method thereof, and a photoresist composition, a thermocurable resin composition and a photocurable resin composition containing a polymer obtained using the polymerizable compound are provided. Use of the polymerizable compound with the adamantane structure and a resin composition thereof in the present invention provides in the field of photolithography the effect of preventing a liquid immersion medium from penetration and improving dry etching resistance in a liquid immersion exposure method as well as reducing adhesion to a mold and improving dry etching resistance in a nanoimprint method.

摘要翻译： 具有由通式（1）表示的氟化取代基（Z），金刚烷结构和具有通式（1）表示的结构的聚合性基团（A）的聚合性化合物，其制造方法和光致抗蚀剂组合物 提供了一种耐热树脂组合物和含有使用该聚合性化合物得到的聚合物的光固化性树脂组合物。 在本发明中使用具有金刚烷结构的可聚合化合物和其树脂组合物在光刻领域中提供了防止液浸介质渗透的效果，并且在液浸曝光方法中提高了耐干蚀刻性以及降低附着力 并且在纳米压印方法中提高干蚀刻电阻。

公开(公告)号：US20090253881A1

公开(公告)日：2009-10-08

申请号：US11910535

申请日：2006-05-15

申请人： Naoyoshi Hatakeyama ,  Katsuki Ito ,  Hidetoshi Ono ,  Nobuaki Matsumoto

发明人： Naoyoshi Hatakeyama ,  Katsuki Ito ,  Hidetoshi Ono ,  Nobuaki Matsumoto

IPC分类号： C08F220/06 ,  C08F24/00

CPC分类号： C08F38/00 ,  C07C69/732 ,  C07C2601/08 ,  C07C2601/14 ,  C07C2602/42 ,  C07C2603/74 ,  C08F220/28 ,  G03F7/0397

摘要： The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer.

摘要翻译： 本发明提供通式（1）或（19）表示的具有脂环结构和聚合性基团的聚合性化合物。 可聚合化合物对基材表现出高粘合性，显影期间溶胀减少，在水中暴露时吸水量减少，耐干蚀刻性能高。 还提供了这种可聚合化合物的聚合物，其制备方法和含有该聚合物的光致抗蚀剂组合物。

公开(公告)号：US20100093947A1

公开(公告)日：2010-04-15

申请号：US12598041

申请日：2008-04-28

申请人： Yasunari Okada ,  Hidetoshi Ono ,  Katsuki Ito

发明人： Yasunari Okada ,  Hidetoshi Ono ,  Katsuki Ito

IPC分类号： C08L63/00 ,  C08G63/06 ,  C08L67/00

CPC分类号： C07D303/16 ,  C08G59/24 ,  C08G59/3218 ,  C08G59/42 ,  C08L63/00 ,  G03F7/038

摘要： Provided are: an adamantane derivative represented by the following general formula (I) giving a cured product excellent in optical characteristics such as transparency and light resistance, durabilities such as heat resistance, and electrical characteristics such as dielectric constant; a method of producing the adamantane derivative; a resin composition containing the adamantane derivative and an epoxy resin curing agent; and a sealing agent for an optical semiconductor using the resin composition: where: Y represents a group selected from a hydrocarbon group, a hydroxyl group, a carboxyl group, and an ═O group formed by two Y's being combined together; Z represents a cyclic ether group; n represents an integer of 0 or more; and p represents an integer of 2 to 4 and q represents an integer of 0 to 14, while satisfying 2≦p+q≦16.

摘要翻译： 提供：由以下通式（I）表示的金刚烷衍生物，其得到透明性和耐光性，耐热性等耐久性，介电常数等光学特性优异的固化物。 生产金刚烷衍生物的方法; 含有金刚烷衍生物和环氧树脂固化剂的树脂组合物; 以及使用该树脂组合物的光学半导体用密封剂，其中：Y表示选自由两个Y组合在一起形成的烃基，羟基，羧基和≡O基的基团; Z表示环状醚基; n表示0以上的整数， p表示2〜4的整数，q表示0〜14的整数，满足2＆nlE; p + q＆nlE; 16。

公开(公告)号：US08022151B2

公开(公告)日：2011-09-20

申请号：US12598041

申请日：2008-04-28

申请人： Yasunari Okada ,  Hidetoshi Ono ,  Katsuki Ito

发明人： Yasunari Okada ,  Hidetoshi Ono ,  Katsuki Ito

IPC分类号： C08G59/12 ,  C08L63/00

CPC分类号： C07D303/16 ,  C08G59/24 ,  C08G59/3218 ,  C08G59/42 ,  C08L63/00 ,  G03F7/038

摘要： Provided are: an adamantane derivative represented by the following general formula (I) giving a cured product excellent in optical characteristics such as transparency and light resistance, durabilities such as heat resistance, and electrical characteristics such as dielectric constant; a method of producing the adamantane derivative; a resin composition containing the adamantane derivative and an epoxy resin curing agent; and a sealing agent for an optical semiconductor using the resin composition: where: Y represents a group selected from a hydrocarbon group, a hydroxyl group, a carboxyl group, and an ═O group formed by two Y's being combined together; Z represents a cyclic ether group; n represents an integer of 0 or more; and p represents an integer of 2 to 4 and q represents an integer of 0 to 14, while satisfying 2≦p+q≦16.

摘要翻译： 提供：由以下通式（I）表示的金刚烷衍生物，其得到透明性和耐光性，耐热性等耐久性，介电常数等光学特性优异的固化物。 生产金刚烷衍生物的方法; 含有金刚烷衍生物和环氧树脂固化剂的树脂组合物; 以及使用该树脂组合物的光学半导体用密封剂，其中：Y表示选自由两个Y组合在一起形成的烃基，羟基，羧基和≡O基的基团; Z表示环状醚基; n表示0以上的整数， p表示2〜4的整数，q表示0〜14的整数，满足2＆nlE; p + q＆nlE; 16。

公开(公告)号：US20130143157A1

公开(公告)日：2013-06-06

申请号：US13816071

申请日：2011-07-26

申请人： Shinji Tanaka ,  Yoshitaka Uenoyama ,  Hidetoshi Ono ,  Naoya Kawano ,  Katsuki Ito

发明人： Shinji Tanaka ,  Yoshitaka Uenoyama ,  Hidetoshi Ono ,  Naoya Kawano ,  Katsuki Ito

IPC分类号： G03F7/004 ,  C07D313/06

CPC分类号： G03F7/004 ,  C07D313/06 ,  C07D313/10 ,  C08F220/28 ,  C08F220/30 ,  G03F7/0397

摘要： A compound represented by the following formula (I), wherein R1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group.

摘要翻译： 由下式（I）表示的化合物，其中R 1是氢原子，卤素原子，甲基或三氟甲基。

公开(公告)号：US09513545B2

公开(公告)日：2016-12-06

申请号：US13816071

申请日：2011-07-26

申请人： Shinji Tanaka ,  Yoshitaka Uenoyama ,  Hidetoshi Ono ,  Naoya Kawano ,  Katsuki Ito

发明人： Shinji Tanaka ,  Yoshitaka Uenoyama ,  Hidetoshi Ono ,  Naoya Kawano ,  Katsuki Ito

IPC分类号： C08F220/28 ,  C08F220/30 ,  C07D313/06 ,  C07D313/10 ,  G03F7/004 ,  G03F7/039

CPC分类号： G03F7/004 ,  C07D313/06 ,  C07D313/10 ,  C08F220/28 ,  C08F220/30 ,  G03F7/0397

摘要： A compound represented by the following formula (I), wherein R1 is a hydrogen atom, a halogen atom, a methyl group or a trifluoromethyl group.

公开(公告)号：US20130022914A1

公开(公告)日：2013-01-24

申请号：US13638979

申请日：2011-03-16

申请人： Shinji Tanaka ,  Yoshitaka Uenoyama ,  Hidetoshi Ono ,  Naoya Kawano ,  Katsuki Ito

发明人： Shinji Tanaka ,  Yoshitaka Uenoyama ,  Hidetoshi Ono ,  Naoya Kawano ,  Katsuki Ito

IPC分类号： C07D313/06 ,  G03F7/004 ,  G03F7/20 ,  C08F122/20

CPC分类号： G03F7/039 ,  C07D313/10 ,  C08F20/26 ,  C08F222/10 ,  C08F224/00 ,  G03F7/0397 ,  G03F7/165 ,  G03F7/20 ,  G03F7/30 ,  G03F7/322

摘要： A homoadamantane derivative represented by the following formula (I): wherein R1 and R2 are independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms, x is a hydroxyl group or a halogen atom, and n and m are independently an integer of 0 to 3, provided that n and m are not simultaneously 0.

摘要翻译： 由下式（I）表示的高金刚烷衍生物：其中R1和R2独立地为氢原子或具有1至6个碳原子的直链，支链或环状烃基，x为羟基或卤素原子，n和 m独立地为0〜3的整数，条件是n和m不同时为0。

公开(公告)号：US20100266954A1

公开(公告)日：2010-10-21

申请号：US12742379

申请日：2008-11-10

申请人： Katsuki Ito ,  Shinji Tanaka ,  Naoya Kawano ,  Hideki Yamane ,  Hidetoshi Ono

发明人： Katsuki Ito ,  Shinji Tanaka ,  Naoya Kawano ,  Hideki Yamane ,  Hidetoshi Ono

IPC分类号： G03F7/004 ,  G03F7/20 ,  C07C69/608 ,  C08F20/10

CPC分类号： C07C69/54 ,  C07C2603/74 ,  C08F220/18 ,  C08F220/28 ,  G03F7/027 ,  G03F7/0397

摘要： An adamantane derivative capable of affording a cured product which is excellent in optical characteristics such as transparency and light resistance, durability such as long-term heat resistance, and electrical characteristics such as dielectric constant, a process for producing such an adamantane derivative, and a curable composition containing such an adamantane derivative, the adamantane derivative being represented by the general formula (I) shown below and having a group selected from an acrylate group, a methacrylate group and a trifluoromethacrylate group, where R1 represents a group selected from a hydroxyl group, an acrylate group, a methacrylate group and a trifluoromethacrylate group, R2 represents a group selected from a hydrogen atom, a methyl group and a trifluoromethyl group, k is an integer of 0 to 4 and n is an integer of 1 to 6.

摘要翻译： 能够提供透明性，耐光性等光学特性，长期耐热性等耐久性，介电常数等电气特性，制造金刚烷衍生物的方法等的固化物的金刚烷衍生物，以及 含有这种金刚烷衍生物的固化性组合物，金刚烷衍生物由下述通式（I）表示，具有选自丙烯酸酯基，甲基丙烯酸酯基和三氟甲基丙烯酸酯基的基团，其中R 1表示选自羟基的基团 丙烯酸酯基，甲基丙烯酸酯基和三氟甲基丙烯酸酯基，R 2表示选自氢原子，甲基和三氟甲基的基团，k为0​​〜4的整数，n为1〜6的整数。

公开(公告)号：US20150316847A1

公开(公告)日：2015-11-05

申请号：US14798990

申请日：2015-07-14

申请人： Shinji TANAKA ,  Yoshitaka Uenoyama ,  Hidetoshi Ono ,  Naoya Kawano ,  Katsuki Ito

发明人： Shinji TANAKA ,  Yoshitaka Uenoyama ,  Hidetoshi Ono ,  Naoya Kawano ,  Katsuki Ito

IPC分类号： G03F7/039 ,  C08F222/10 ,  G03F7/30 ,  G03F7/16 ,  G03F7/20

CPC分类号： G03F7/039 ,  C07D313/10 ,  C08F20/26 ,  C08F222/10 ,  C08F224/00 ,  G03F7/0397 ,  G03F7/165 ,  G03F7/20 ,  G03F7/30 ,  G03F7/322

摘要： A (meth)acrylic polymer obtained by polymerizing a (meth)acrylic ester of formula wherein R1 and R2 are each independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms; R3 is a hydrogen atom, a methyl group, or a trifluoromethyl group; and n and m are each independently an integer of 0 to 3, provided that n and m are not simultaneously 0. Also, a positive photoresist composition including the (meth)acrylic polymer and a method of forming a photoresist pattern with the positive photoresist composition.

摘要翻译： 通过使下式的（甲基）丙烯酸酯聚合而得到的（甲基）丙烯酸系聚合物，其中R 1和R 2各自独立地为氢原子或具有1〜6个碳原子的直链，支链或环状烃基; R3是氢原子，甲基或三氟甲基; n和m各自独立地为0〜3的整数，条件是n和m不同时为O.此外，包含（甲基）丙烯酸类聚合物的正性光致抗蚀剂组合物和形成具有正性光致抗蚀剂组合物的光刻胶图案的方法 。