摘要:
Provided are: an adamantane derivative represented by the following general formula (I) giving a cured product excellent in optical characteristics such as transparency and light resistance, durabilities such as heat resistance, and electrical characteristics such as dielectric constant; a method of producing the adamantane derivative; a resin composition containing the adamantane derivative and an epoxy resin curing agent; and a sealing agent for an optical semiconductor using the resin composition: where: Y represents a group selected from a hydrocarbon group, a hydroxyl group, a carboxyl group, and an ═O group formed by two Y's being combined together; Z represents a cyclic ether group; n represents an integer of 0 or more; and p represents an integer of 2 to 4 and q represents an integer of 0 to 14, while satisfying 2≦p+q≦16.
摘要:
Provided are: an adamantane derivative represented by the following general formula (I) giving a cured product excellent in optical characteristics such as transparency and light resistance, durabilities such as heat resistance, and electrical characteristics such as dielectric constant; a method of producing the adamantane derivative; a resin composition containing the adamantane derivative and an epoxy resin curing agent; and a sealing agent for an optical semiconductor using the resin composition: where: Y represents a group selected from a hydrocarbon group, a hydroxyl group, a carboxyl group, and an ═O group formed by two Y's being combined together; Z represents a cyclic ether group; n represents an integer of 0 or more; and p represents an integer of 2 to 4 and q represents an integer of 0 to 14, while satisfying 2≦p+q≦16.
摘要:
A polymerizable compound having a fluorinated substituent (Z) represented by the general formula (1), an adamantane structure and a polymerizable group (A) having the structure represented by the general formula (1), a production method thereof, and a photoresist composition, a thermocurable resin composition and a photocurable resin composition containing a polymer obtained using the polymerizable compound are provided. Use of the polymerizable compound with the adamantane structure and a resin composition thereof in the present invention provides in the field of photolithography the effect of preventing a liquid immersion medium from penetration and improving dry etching resistance in a liquid immersion exposure method as well as reducing adhesion to a mold and improving dry etching resistance in a nanoimprint method.
摘要:
The present invention provides an adamantane derivative (I) having a structure represented by the general formula (I); an adamantane derivative (II) having a structure represented by the general formula (II); and a process for producing those adamantane derivatives. An alcohol form of an adamantane compound is reacted with a sulfonyl compound to obtain the adamantane derivative (II), which is then reacted with an alcohol to obtain the adamantane derivative (I). The adamantane derivative (I) and adamantane derivative (II) each having the structure represented by the general formula (I) and general formula (II), respectively, is a novel adamantyl(meth)acrylate compound and useful as a monomer for functional resins such as a photosensitive resin in the field of photolithography.
摘要:
The present invention provides an adamantane derivative (I) having a structure represented by the general formula (I); an adamantane derivative (II) having a structure represented by the general formula (II); and a process for producing those adamantane derivatives. An alcohol form of an adamantane compound is reacted with a sulfonyl compound to obtain the adamantane derivative (II), which is then reacted with an alcohol to obtain the adamantane derivative (I). The adamantane derivative (I) and adamantane derivative (II) each having the structure represented by the general formula (I) and general formula (II), respectively, is a novel adamantyl (meth)acrylate compound and useful as a monomer for functional resins such as a photosensitive resin in the field of photolithography.
摘要:
The present invention provides an adamantane derivative (I) having a structure represented by the general formula (I); an adamantane derivative (II) having a structure represented by the general formula (II); and a process for producing those adamantane derivatives. An alcohol form of an adamantane compound is reacted with a sulfonyl compound to obtain the adamantane derivative (II), which is then reacted with an alcohol to obtain the adamantane derivative (I). The adamantane derivative (I) and adamantane derivative (II) each having the structure represented by the general formula (I) and general formula (II), respectively, is a novel adamantyl(meth)acrylate compound and useful as a monomer for functional resins such as a photosensitive resin in the field of photolithography.
摘要:
The present invention provides a polymerizable compound having an alicyclic structure and a polymerizable group and represented by the general formula (1) or (19). The polymerizable compound exhibits high adhesion to substrates, reduced swelling during development, a reduced amount of water absorption during exposure in water, and high dry-etching resistance. Also provided are a polymer of such a polymerizable compound, a process for producing the same and a photoresist composition containing the polymer.
摘要:
A homoadamantane derivative represented by the following formula (I): wherein R1 and R2 are independently a hydrogen atom or a linear, branched or cyclic hydrocarbon group having 1 to 6 carbon atoms, x is a hydroxyl group or a halogen atom, and n and m are independently an integer of 0 to 3, provided that n and m are not simultaneously 0.