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17 条记录 (耗时 0.031 秒)

    Self aligning non contact shadow ring process kit
    11.
    发明授权
    Self aligning non contact shadow ring process kit 有权
    自对准非接触阴影环工艺套件

    公开(公告)号：US06589352B1

    公开(公告)日：2003-07-08

    申请号：US09459313

    申请日：1999-12-10

    申请人： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

    发明人： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy ,  Tom Madar ,  Girish Dixit ,  Gwo-Chuan Tzu

    IPC分类号： C23C1600

    CPC分类号： C23C16/4585 ,  C30B25/12 ,  C30B31/14

    摘要： The invention provides a removable first edge ring configured for pin and recess/slot coupling with a second edge ring disposed on the substrate support. In one embodiment, a first edge ring includes a plurality of pins, and a second edge ring includes one or more alignment recesses and one or more alignment slots for mating engagement with the pins. Each of the alignment recesses and alignment slots are at least as wide as the corresponding pins, and each of the alignment slots extends in the radial direction a length that is sufficient to compensate for the difference in thermal expansion between the first edge ring and the second edge ring.

    摘要翻译： 本发明提供了可拆卸的第一边缘环，其被配置用于与设置在基板支撑件上的第二边缘环的销和凹槽/狭槽联接。 在一个实施例中，第一边缘环包括多个销，并且第二边缘环包括一个或多个对准凹槽和用于与销配合接合的一个或多个对准槽。 每个对准凹槽和对准槽至少与相应的销一样宽，并且每个对准槽在径向方向上延伸的长度足以补偿第一边缘环和第二边缘之间的热膨胀差 边缘环。

    Tungsten chamber with stationary heater
    12.
    发明授权
    Tungsten chamber with stationary heater 有权
    带固定加热器的钨室

    公开(公告)号：US06503331B1

    公开(公告)日：2003-01-07

    申请号：US09660006

    申请日：2000-09-12

    申请人： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy

    发明人： Joseph Yudovsky ,  Lawrence C. Lei ,  Salvador Umotoy

    IPC分类号： C23C1600

    CPC分类号： H01J37/3244 ,  H01J2237/022

    摘要： Provided herewith is a chamber for depositing a film on a substrate comprising a process compartment; a purge compartment, a purge ring located on the chamber body to separate the two compartments, a heater, and a shadow ring covering the periphery of the substrate. Alternatively, the chamber may further comprise a shield interconnected with the shadow ring. Still provided is a method for depositing a film of uniformity on a substrate in such a chamber. The method comprises the steps of positioning the substrate in a process compartment; flowing a process gas into the process compartment; flowing a purge gas in a purge compartment; and exhausting the process and purge gas from the chamber, thereby depositing a film of uniformity on the substrate.

    摘要翻译： 提供了一种用于在包括处理隔室的基板上沉积膜的室; 净化室，位于室主体上以分离两个隔室的清洗环，加热器和覆盖基板周边的阴影环。 或者，腔室可以进一步包括与阴影环互连的护罩。 仍然提供了一种在这种室中的基板上沉积均匀膜的方法。 该方法包括以下步骤：将基板定位在处理室中; 将工艺气体流入加工室; 将吹扫气体流入净化室; 并排出该过程并从室中吹扫气体，从而在衬底上沉积均匀的膜。

    Fastening device for a purge ring
    13.
    发明授权
    Fastening device for a purge ring 有权
    用于清洗环的紧固装置

    公开(公告)号：US06223447B1

    公开(公告)日：2001-05-01

    申请号：US09504288

    申请日：2000-02-15

    申请人： Joseph Yudovsky ,  Salvador Umotoy ,  Lawrence C. Lei ,  Ronald Rose

    发明人： Joseph Yudovsky ,  Salvador Umotoy ,  Lawrence C. Lei ,  Ronald Rose

    IPC分类号： F26B1724

    CPC分类号： H01L21/68721 ,  H01L21/68735

    摘要： A fastening device which prevents rotational and vertical displacement of a purge ring caused by purge gas exiting the purge ring or caused by other processing conditions. The fastening device comprises a clamp which releasably holds the purge ring together with the wafer support. A pin is inserted into a bore through the purge ring, wafer support and the clamp to releasably secure the clamp in place. Slots may be formed in the purge ring to guide placement of the clamp.

    摘要翻译： 一种紧固装置，其防止由吹扫气体离开吹扫环或由其它加工条件引起的清洗环的旋转和垂直位移。 紧固装置包括可拆卸地将清洗环与晶片支撑件一起保持的夹具。 销通过清洗环，晶片支架和夹具插入孔中，以将夹具可释放地固定到位。 槽可以形成在清洗环中以引导夹具的放置。

    Temperature controlled gas distribution plate
    16.
    发明授权
    Temperature controlled gas distribution plate 失效
    温控气体分布板

    公开(公告)号：US06379466B1

    公开(公告)日：2002-04-30

    申请号：US08238598

    申请日：1994-05-05

    申请人： Turgut Sahin ,  Salvador Umotoy ,  Avi Tepman ,  Ronald Lloyd Rose

    发明人： Turgut Sahin ,  Salvador Umotoy ,  Avi Tepman ,  Ronald Lloyd Rose

    IPC分类号： C23C1600

    CPC分类号： C23C16/45565 ,  C23C16/455 ,  C23C16/45572 ,  F28F3/12

    摘要： The temperature controlled gas distribution plate of the present invention includes a liquid cooling passage, with inlet and outlet ports, that is formed within the gas distribution plate. In the preferred embodiment, the plate is formed with an upper passage cover and a lower base having a liquid passage channel formed within the side walls thereof. The cover and base are welded together to form a sealed liquid passage within the plate through which the liquid coolant flows.

    摘要翻译： 本发明的温度控制气体分配板包括形成在气体分配板内的具有入口和出口的液体冷却通道。 在优选实施例中，板形成有上通道盖和下基部，其具有形成在其侧壁内的液体通道通道。 盖和基座焊接在一起，以在液体冷却剂流过的板内形成密封的液体通道。

    Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfaces
    17.
    发明授权
    Dispersion plate for flowing vaporizes compounds used in chemical vapor deposition of films onto semiconductor surfaces 失效
    用于流动的分散板将用于化学气相沉积膜的化合物蒸发到半导体表面上

    公开(公告)号：US06302965B1

    公开(公告)日：2001-10-16

    申请号：US09638506

    申请日：2000-08-15

    申请人： Salvador Umotoy ,  Vincent Ku ,  Xiaoxiong Yuan ,  Lawrence Chung-Lai Lei

    发明人： Salvador Umotoy ,  Vincent Ku ,  Xiaoxiong Yuan ,  Lawrence Chung-Lai Lei

    IPC分类号： C23C1600

    CPC分类号： C23C16/45576 ,  C23C16/16 ,  C23C16/455

    摘要： A dispersion plate for evenly flowing at low pressure into a processing chamber vaporized material, such as a tungsten compound for deposition of metal layers onto a semiconductor, has a disc-like body with a center axis, an input face and an output face. The dispersion plate has a cup-like entrance along the center axis in its input face for receiving a stream of vaporized material and a plurality of passages for flow of vapor with each passage having a length and a diameter and extending radially from the entrance like the spokes of a wheel at inclined angles relative to the center axis from the input face to the output face. Two annular grooves are cut into the output face and intersect with the respective ends of the passages. The plate has a center hole with a flared diameter extending along the center axis from the entrance in the input face to the output face. The hole and plurality of passages are designed to have sufficiently large diameters so as to keep pressure drops low with respect to vapor flowing through the plate.

    摘要翻译： 用于在低压下均匀流动到处理室的分散板，例如用于将金属层沉积到半导体上的钨化合物的气化材料具有中心轴，输入面和输出面的盘状体。 分散板在其输入面中具有沿着中心轴线的杯状入口，用于接收气化材料流和多个用于蒸汽流动的通道，每个通道具有长度和直径并且从入口径向延伸，如 轮的轮辐相对于从输入面到输出面的中心轴线呈倾斜角。 两个环形槽被切割成输出面并与通道的相应端相交。 该板具有中心孔，该中心孔具有沿着中心轴线从输入面入口到输出面延伸的扩口直径。 孔和多个通道被设计成具有足够大的直径，以便相对于流过板的蒸气保持压力降低。